JP2008532273A - マイクロ・リソグラフィー投影露光装置のための光学システム - Google Patents

マイクロ・リソグラフィー投影露光装置のための光学システム Download PDF

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Publication number
JP2008532273A
JP2008532273A JP2007556602A JP2007556602A JP2008532273A JP 2008532273 A JP2008532273 A JP 2008532273A JP 2007556602 A JP2007556602 A JP 2007556602A JP 2007556602 A JP2007556602 A JP 2007556602A JP 2008532273 A JP2008532273 A JP 2008532273A
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JP
Japan
Prior art keywords
lens
optical system
lenses
retardation
respect
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Pending
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JP2007556602A
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English (en)
Japanese (ja)
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JP2008532273A5 (enExample
Inventor
トツェック ミヒャエル
クレーマー ダニエル
グルーナー トラルフ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
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Carl Zeiss SMT GmbH
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Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Publication of JP2008532273A publication Critical patent/JP2008532273A/ja
Publication of JP2008532273A5 publication Critical patent/JP2008532273A5/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/02—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of crystals, e.g. rock-salt, semi-conductors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/08—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of polarising materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G03F7/70966—Birefringence
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3083—Birefringent or phase retarding elements

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Toxicology (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Polarising Elements (AREA)
JP2007556602A 2005-02-25 2006-02-22 マイクロ・リソグラフィー投影露光装置のための光学システム Pending JP2008532273A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US65627205P 2005-02-25 2005-02-25
PCT/EP2006/060196 WO2006089919A1 (en) 2005-02-25 2006-02-22 Optical system, in particular objective or illumination system for a microlithographic projection exposure apparatus

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2009006343A Division JP2009086692A (ja) 2005-02-25 2009-01-15 マイクロ・リソグラフィー投影露光装置のための光学システム

Publications (2)

Publication Number Publication Date
JP2008532273A true JP2008532273A (ja) 2008-08-14
JP2008532273A5 JP2008532273A5 (enExample) 2009-04-09

Family

ID=36499284

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2007556602A Pending JP2008532273A (ja) 2005-02-25 2006-02-22 マイクロ・リソグラフィー投影露光装置のための光学システム
JP2009006343A Pending JP2009086692A (ja) 2005-02-25 2009-01-15 マイクロ・リソグラフィー投影露光装置のための光学システム

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2009006343A Pending JP2009086692A (ja) 2005-02-25 2009-01-15 マイクロ・リソグラフィー投影露光装置のための光学システム

Country Status (5)

Country Link
US (1) US20080198455A1 (enExample)
EP (1) EP1851574A1 (enExample)
JP (2) JP2008532273A (enExample)
KR (1) KR20070105976A (enExample)
WO (1) WO2006089919A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017194697A (ja) * 2007-10-02 2017-10-26 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ用の投影対物系

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1701179A1 (de) * 2005-03-08 2006-09-13 Schott AG Verfahren zur Herstellung von optischen Elementen für die Mikrolithographie, damit erhältliche Linsensysteme und deren Verwendung
DE102006025044A1 (de) 2005-08-10 2007-02-15 Carl Zeiss Smt Ag Abbildungssystem, insbesondere Projektionsobjektiv einer mikrolithographischen Projektionsbelichtungsanlage
DE102006038454A1 (de) 2005-12-23 2007-07-05 Carl Zeiss Smt Ag Projektionsobjektiv einer mikrolithographischen Projektionsbelichtungsanlage
DE102006038398A1 (de) * 2006-08-15 2008-02-21 Carl Zeiss Smt Ag Projektionsobjektiv einer mikrolithographischen Projektionsbelichtungsanlage
JP2008216498A (ja) * 2007-03-01 2008-09-18 Canon Inc 投影光学系、露光装置及びデバイス製造方法
JP2009031603A (ja) 2007-07-27 2009-02-12 Canon Inc 投影光学系、露光装置及びデバイス製造方法
JP5476565B2 (ja) * 2008-07-25 2014-04-23 独立行政法人物質・材料研究機構 Ｙａｇ単結晶、それを用いた光学部品およびその関連機器

Citations (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000331927A (ja) * 1999-03-12 2000-11-30 Canon Inc 投影光学系及びそれを用いた投影露光装置
WO2003001271A1 (en) * 2001-06-20 2003-01-03 Nikon Corporation Optical system and exposure system provided with the optical system
JP2003050349A (ja) * 2001-05-30 2003-02-21 Nikon Corp 光学系および該光学系を備えた露光装置
JP2003131002A (ja) * 2001-06-27 2003-05-08 Canon Inc 光学素子及び製造方法
JP2003161882A (ja) * 2001-11-29 2003-06-06 Nikon Corp 投影光学系、露光装置および露光方法
WO2003077007A2 (de) * 2002-03-12 2003-09-18 Carl Zeiss Smt Ag Objektiv mit kristall-linsen
JP2003279854A (ja) * 2002-03-26 2003-10-02 Canon Inc 投影光学系、露光装置、デバイス製造方法及びデバイス
JP2003297729A (ja) * 2002-04-03 2003-10-17 Nikon Corp 投影光学系、露光装置および露光方法
JP2004045692A (ja) * 2002-07-11 2004-02-12 Canon Inc 投影光学系、露光装置及びデバイス製造方法
JP2004526331A (ja) * 2001-05-15 2004-08-26 カール・ツアイス・エスエムテイ・アーゲー フッ化物結晶レンズを含む対物レンズ
JP2005521227A (ja) * 2001-06-01 2005-07-14 エイエスエムエル ネザランドス ベスローテン フェンノートシャップ 立方晶系光学系における複屈折の補正
JP2005524985A (ja) * 2002-05-08 2005-08-18 カール・ツアイス・エスエムテイ・アーゲー 結晶材料からなるレンズ
JP2005530333A (ja) * 2002-03-06 2005-10-06 コーニング トローペル コーポレイション 放射対称複屈折のための補償器
JP2005535939A (ja) * 2002-08-22 2005-11-24 オプティカル リサーチ アソシエイツ 光学系の偏光収差を低減する構造および方法
JP2005537512A (ja) * 2002-09-03 2005-12-08 カール・ツアイス・エスエムテイ・アーゲー 複屈折レンズを伴う対物レンズ
JP2007529762A (ja) * 2003-12-19 2007-10-25 カール ツァイス エスエムテー アクチエンゲゼルシャフト 結晶素子を有するマイクロリソグラフィー投影用対物レンズ

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4757354A (en) * 1986-05-02 1988-07-12 Matsushita Electrical Industrial Co., Ltd. Projection optical system
US6775063B2 (en) * 2001-07-10 2004-08-10 Nikon Corporation Optical system and exposure apparatus having the optical system
TW571344B (en) * 2001-07-10 2004-01-11 Nikon Corp Manufacturing method for projection optic system
WO2004023172A1 (de) * 2002-09-03 2004-03-18 Carl Zeiss Smt Ag Optimierverfahren für ein objektiv mit fluorid-kristall-linsen sowie objektiv mit fluorid-kristall-linsen
DE10253353A1 (de) * 2002-09-03 2004-03-11 Carl Zeiss Smt Ag Objektiv mit doppelbrechenden Linsen
DE10304116A1 (de) * 2002-09-03 2004-03-11 Carl Zeiss Smt Ag Optimierverfahren für ein Objektiv mit Fluorid-Kristall-Linsen sowie Objektiv mit Fluorid-Kristall-Linsen
JP2006113533A (ja) * 2004-08-03 2006-04-27 Nikon Corp 投影光学系、露光装置、および露光方法
WO2006047127A1 (en) * 2004-10-21 2006-05-04 Saint-Gobain Ceramics & Plastics, Inc. Optical lens elements, semiconductor lithographic patterning apparatus, and methods for processing semiconductor devices
DE102006013560A1 (de) * 2005-04-19 2006-10-26 Carl Zeiss Smt Ag Projektionsobjektiv einer mikrolithographischen Projektionsbelichtungsanlage sowie Verfahren zu dessen Herstellung
DE102006025044A1 (de) * 2005-08-10 2007-02-15 Carl Zeiss Smt Ag Abbildungssystem, insbesondere Projektionsobjektiv einer mikrolithographischen Projektionsbelichtungsanlage
JP2009031603A (ja) * 2007-07-27 2009-02-12 Canon Inc 投影光学系、露光装置及びデバイス製造方法

Patent Citations (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000331927A (ja) * 1999-03-12 2000-11-30 Canon Inc 投影光学系及びそれを用いた投影露光装置
JP2004526331A (ja) * 2001-05-15 2004-08-26 カール・ツアイス・エスエムテイ・アーゲー フッ化物結晶レンズを含む対物レンズ
JP2003050349A (ja) * 2001-05-30 2003-02-21 Nikon Corp 光学系および該光学系を備えた露光装置
JP2005521227A (ja) * 2001-06-01 2005-07-14 エイエスエムエル ネザランドス ベスローテン フェンノートシャップ 立方晶系光学系における複屈折の補正
WO2003001271A1 (en) * 2001-06-20 2003-01-03 Nikon Corporation Optical system and exposure system provided with the optical system
JP2003131002A (ja) * 2001-06-27 2003-05-08 Canon Inc 光学素子及び製造方法
JP2003161882A (ja) * 2001-11-29 2003-06-06 Nikon Corp 投影光学系、露光装置および露光方法
JP2005530333A (ja) * 2002-03-06 2005-10-06 コーニング トローペル コーポレイション 放射対称複屈折のための補償器
WO2003077007A2 (de) * 2002-03-12 2003-09-18 Carl Zeiss Smt Ag Objektiv mit kristall-linsen
JP2005520187A (ja) * 2002-03-12 2005-07-07 カール・ツァイス・エスエムティー・アーゲー 結晶レンズを有する対物レンズ
JP2003279854A (ja) * 2002-03-26 2003-10-02 Canon Inc 投影光学系、露光装置、デバイス製造方法及びデバイス
JP2003297729A (ja) * 2002-04-03 2003-10-17 Nikon Corp 投影光学系、露光装置および露光方法
JP2005524985A (ja) * 2002-05-08 2005-08-18 カール・ツアイス・エスエムテイ・アーゲー 結晶材料からなるレンズ
JP2004045692A (ja) * 2002-07-11 2004-02-12 Canon Inc 投影光学系、露光装置及びデバイス製造方法
JP2005535939A (ja) * 2002-08-22 2005-11-24 オプティカル リサーチ アソシエイツ 光学系の偏光収差を低減する構造および方法
JP2005537512A (ja) * 2002-09-03 2005-12-08 カール・ツアイス・エスエムテイ・アーゲー 複屈折レンズを伴う対物レンズ
JP2007529762A (ja) * 2003-12-19 2007-10-25 カール ツァイス エスエムテー アクチエンゲゼルシャフト 結晶素子を有するマイクロリソグラフィー投影用対物レンズ

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017194697A (ja) * 2007-10-02 2017-10-26 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ用の投影対物系

Also Published As

Publication number Publication date
US20080198455A1 (en) 2008-08-21
EP1851574A1 (en) 2007-11-07
KR20070105976A (ko) 2007-10-31
WO2006089919A1 (en) 2006-08-31
JP2009086692A (ja) 2009-04-23

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