JP2004526331A5 - - Google Patents
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- JP2004526331A5 JP2004526331A5 JP2002589833A JP2002589833A JP2004526331A5 JP 2004526331 A5 JP2004526331 A5 JP 2004526331A5 JP 2002589833 A JP2002589833 A JP 2002589833A JP 2002589833 A JP2002589833 A JP 2002589833A JP 2004526331 A5 JP2004526331 A5 JP 2004526331A5
- Authority
- JP
- Japan
- Prior art keywords
- lens
- lenses
- crystal direction
- objective
- lens axis
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000013078 crystal Substances 0.000 claims 40
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 claims 16
- 230000003287 optical effect Effects 0.000 claims 5
- 230000000694 effects Effects 0.000 claims 3
- 238000005286 illumination Methods 0.000 claims 3
- 238000001393 microlithography Methods 0.000 claims 3
- 238000004519 manufacturing process Methods 0.000 claims 2
- 230000010287 polarization Effects 0.000 claims 2
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 claims 1
- 229910001634 calcium fluoride Inorganic materials 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 239000002994 raw material Substances 0.000 claims 1
Applications Claiming Priority (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE2001123727 DE10123727A1 (de) | 2001-05-15 | 2001-05-15 | Optisches Element, Projektionsobjektiv und Mikrolithographie-Projektionsbelichtungsanlage mit Fluoridkristall-Linsen |
| DE10123725A DE10123725A1 (de) | 2001-05-15 | 2001-05-15 | Projektionsbelichtungsanlage der Mikrolithographie, Optisches System und Herstellverfahren |
| DE2001125487 DE10125487A1 (de) | 2001-05-23 | 2001-05-23 | Optisches Element, Projektionsobjektiv und Mikrolithographic-Projektionsbelichtungsanlage mit Fluoridkristall-Linsen |
| DE2001127320 DE10127320A1 (de) | 2001-06-06 | 2001-06-06 | Objektiv mit Fluorid-Kristall-Linsen |
| DE2002110782 DE10210782A1 (de) | 2002-03-12 | 2002-03-12 | Objektiv mit Kristall-Linsen |
| PCT/EP2002/005050 WO2002093209A2 (de) | 2001-05-15 | 2002-05-08 | Objektiv mit fluorid-kristall-linsen |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2004526331A JP2004526331A (ja) | 2004-08-26 |
| JP2004526331A5 true JP2004526331A5 (enExample) | 2005-12-22 |
Family
ID=27512416
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002589833A Pending JP2004526331A (ja) | 2001-05-15 | 2002-05-08 | フッ化物結晶レンズを含む対物レンズ |
Country Status (6)
| Country | Link |
|---|---|
| US (4) | US7145720B2 (enExample) |
| EP (1) | EP1390783A2 (enExample) |
| JP (1) | JP2004526331A (enExample) |
| KR (1) | KR20040015251A (enExample) |
| TW (1) | TW591242B (enExample) |
| WO (1) | WO2002093209A2 (enExample) |
Families Citing this family (80)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6870668B2 (en) * | 2000-10-10 | 2005-03-22 | Nikon Corporation | Method for evaluating image formation performance |
| DE10210782A1 (de) * | 2002-03-12 | 2003-10-09 | Zeiss Carl Smt Ag | Objektiv mit Kristall-Linsen |
| US7239447B2 (en) | 2001-05-15 | 2007-07-03 | Carl Zeiss Smt Ag | Objective with crystal lenses |
| WO2002093209A2 (de) | 2001-05-15 | 2002-11-21 | Carl Zeiss | Objektiv mit fluorid-kristall-linsen |
| AU2002257270A1 (en) * | 2001-05-16 | 2002-11-25 | Corning Incorporated | Preferred crystal orientation optical elements from cubic materials |
| US6683710B2 (en) * | 2001-06-01 | 2004-01-27 | Optical Research Associates | Correction of birefringence in cubic crystalline optical systems |
| EP1780570A3 (en) * | 2001-06-01 | 2008-01-02 | ASML Netherlands B.V. | Correction of birefringence in cubic crystalline optical systems |
| US6831731B2 (en) | 2001-06-28 | 2004-12-14 | Nikon Corporation | Projection optical system and an exposure apparatus with the projection optical system |
| US6788389B2 (en) | 2001-07-10 | 2004-09-07 | Nikon Corporation | Production method of projection optical system |
| US6775063B2 (en) | 2001-07-10 | 2004-08-10 | Nikon Corporation | Optical system and exposure apparatus having the optical system |
| US6844915B2 (en) | 2001-08-01 | 2005-01-18 | Nikon Corporation | Optical system and exposure apparatus provided with the optical system |
| US6995908B2 (en) | 2001-10-30 | 2006-02-07 | Asml Netherlands B.V. | Methods for reducing aberration in optical systems |
| US6970232B2 (en) | 2001-10-30 | 2005-11-29 | Asml Netherlands B.V. | Structures and methods for reducing aberration in integrated circuit fabrication systems |
| US6844972B2 (en) | 2001-10-30 | 2005-01-18 | Mcguire, Jr. James P. | Reducing aberration in optical systems comprising cubic crystalline optical elements |
| US7453641B2 (en) | 2001-10-30 | 2008-11-18 | Asml Netherlands B.V. | Structures and methods for reducing aberration in optical systems |
| JP4333078B2 (ja) | 2002-04-26 | 2009-09-16 | 株式会社ニコン | 投影光学系、該投影光学系を備えた露光装置および該投影光学系を用いた露光方法並びにデバイス製造方法 |
| AU2002356590A1 (en) * | 2002-05-08 | 2003-11-11 | Carl Zeiss Smt Ag | Lens consisting of a crystalline material |
| US7292388B2 (en) | 2002-05-08 | 2007-11-06 | Carl Zeiss Smt Ag | Lens made of a crystalline material |
| JP2004045692A (ja) * | 2002-07-11 | 2004-02-12 | Canon Inc | 投影光学系、露光装置及びデバイス製造方法 |
| US6958864B2 (en) | 2002-08-22 | 2005-10-25 | Asml Netherlands B.V. | Structures and methods for reducing polarization aberration in integrated circuit fabrication systems |
| AU2002364974A1 (en) | 2002-09-03 | 2004-03-29 | Carl Zeiss Smt Ag | Objective with birefringent lenses |
| WO2004023172A1 (de) * | 2002-09-03 | 2004-03-18 | Carl Zeiss Smt Ag | Optimierverfahren für ein objektiv mit fluorid-kristall-linsen sowie objektiv mit fluorid-kristall-linsen |
| EP3226073A3 (en) | 2003-04-09 | 2017-10-11 | Nikon Corporation | Exposure method and apparatus, and method for fabricating device |
| WO2004092842A1 (en) | 2003-04-17 | 2004-10-28 | Carl Zeiss Smt Ag | Optical system, method of altering retardances therein and photolithography tool |
| DE10324206A1 (de) * | 2003-05-28 | 2004-12-23 | Carl Zeiss Smt Ag | Projektionsbelichtungsanlage |
| DE10324477A1 (de) | 2003-05-30 | 2004-12-30 | Carl Zeiss Smt Ag | Mikrolithographische Projektionsbelichtungsanlage |
| DE10324468B4 (de) * | 2003-05-30 | 2006-11-09 | Carl Zeiss Smt Ag | Mikrolithografische Projektionsbelichtungsanlage, Projektionsobjektiv hierfür sowie darin enthaltenes optisches Element |
| DE10328938A1 (de) * | 2003-06-27 | 2005-01-20 | Carl Zeiss Smt Ag | Korrektureinrichtung zur Kompensation von Störungen der Polarisationsverteilung sowie Projektionsobjektiv für die Mikrolithografie |
| DE10329793A1 (de) * | 2003-07-01 | 2005-01-27 | Carl Zeiss Smt Ag | Projektionsobjektiv für eine mikrolithographische Projektionsbelichtungsanlage |
| KR101094114B1 (ko) | 2003-08-26 | 2011-12-15 | 가부시키가이샤 니콘 | 광학소자 및 노광장치 |
| US8149381B2 (en) | 2003-08-26 | 2012-04-03 | Nikon Corporation | Optical element and exposure apparatus |
| EP2261740B1 (en) | 2003-08-29 | 2014-07-09 | ASML Netherlands BV | Lithographic apparatus |
| US6954256B2 (en) | 2003-08-29 | 2005-10-11 | Asml Netherlands B.V. | Gradient immersion lithography |
| TWI511179B (zh) | 2003-10-28 | 2015-12-01 | 尼康股份有限公司 | 照明光學裝置、曝光裝置、曝光方法以及元件製造方法 |
| TWI512335B (zh) | 2003-11-20 | 2015-12-11 | 尼康股份有限公司 | 光束變換元件、光學照明裝置、曝光裝置、以及曝光方法 |
| DE10355725A1 (de) | 2003-11-28 | 2005-06-30 | Carl Zeiss Smt Ag | Optisches System sowie Verfahren zur mikrolithographischen Herstellung mikrostrukturierter Bauteile |
| WO2005106589A1 (en) * | 2004-05-04 | 2005-11-10 | Carl Zeiss Smt Ag | Microlithographic projection exposure apparatus and immersion liquid therefore |
| JP2007516613A (ja) | 2003-12-15 | 2007-06-21 | カール・ツアイス・エスエムテイ・アーゲー | 少なくとも1つの液体レンズを備えるマイクロリソグラフィー投影対物レンズとしての対物レンズ |
| US7466489B2 (en) * | 2003-12-15 | 2008-12-16 | Susanne Beder | Projection objective having a high aperture and a planar end surface |
| JP5102492B2 (ja) | 2003-12-19 | 2012-12-19 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 結晶素子を有するマイクロリソグラフィー投影用対物レンズ |
| US7460206B2 (en) * | 2003-12-19 | 2008-12-02 | Carl Zeiss Smt Ag | Projection objective for immersion lithography |
| US7239450B2 (en) | 2004-11-22 | 2007-07-03 | Carl Zeiss Smt Ag | Method of determining lens materials for a projection exposure apparatus |
| US7463422B2 (en) | 2004-01-14 | 2008-12-09 | Carl Zeiss Smt Ag | Projection exposure apparatus |
| EP1716457B9 (en) | 2004-01-16 | 2012-04-04 | Carl Zeiss SMT GmbH | Projection system with a polarization-modulating element having a variable thickness profile |
| US8270077B2 (en) | 2004-01-16 | 2012-09-18 | Carl Zeiss Smt Gmbh | Polarization-modulating optical element |
| US20070019179A1 (en) | 2004-01-16 | 2007-01-25 | Damian Fiolka | Polarization-modulating optical element |
| TWI395068B (zh) | 2004-01-27 | 2013-05-01 | 尼康股份有限公司 | 光學系統、曝光裝置以及曝光方法 |
| TWI511182B (zh) | 2004-02-06 | 2015-12-01 | 尼康股份有限公司 | 光學照明裝置、曝光裝置、曝光方法以及元件製造方法 |
| CN100592210C (zh) | 2004-02-13 | 2010-02-24 | 卡尔蔡司Smt股份公司 | 微平版印刷投影曝光装置的投影物镜 |
| EP1714192A1 (en) * | 2004-02-13 | 2006-10-25 | Carl Zeiss SMT AG | Projection objective for a microlithographic projection exposure apparatus |
| EP1586946A3 (en) * | 2004-04-14 | 2007-01-17 | Carl Zeiss SMT AG | Optical system of a microlithographic projection exposure apparatus |
| EP1598681A3 (de) * | 2004-05-17 | 2006-03-01 | Carl Zeiss SMT AG | Optische Komponente mit gekrümmter Oberfläche und Mehrlagenbeschichtung |
| US7324280B2 (en) | 2004-05-25 | 2008-01-29 | Asml Holding N.V. | Apparatus for providing a pattern of polarization |
| JP4913041B2 (ja) * | 2004-06-04 | 2012-04-11 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 強度変化の補償を伴う投影系及びそのための補償素子 |
| DE102004028470A1 (de) * | 2004-06-11 | 2005-12-29 | Leica Microsystems (Schweiz) Ag | Augen-, insbesondere Retinaschutzvorrichtung und optisches Element mit einer Freiformfläche für einen Beleuchtungsstrahlengang, sowie Verwendung eines optischen Elements mit Freiformfläche |
| US7423727B2 (en) * | 2005-01-25 | 2008-09-09 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| KR20070105976A (ko) * | 2005-02-25 | 2007-10-31 | 칼 짜이스 에스엠티 아게 | 광학시스템, 특히 마이크로리소그래픽 투사노출장치용대물렌즈 또는 조명장치 |
| DE102006013560A1 (de) * | 2005-04-19 | 2006-10-26 | Carl Zeiss Smt Ag | Projektionsobjektiv einer mikrolithographischen Projektionsbelichtungsanlage sowie Verfahren zu dessen Herstellung |
| US20060238735A1 (en) * | 2005-04-22 | 2006-10-26 | Vladimir Kamenov | Optical system of a projection exposure apparatus |
| DE102006025044A1 (de) | 2005-08-10 | 2007-02-15 | Carl Zeiss Smt Ag | Abbildungssystem, insbesondere Projektionsobjektiv einer mikrolithographischen Projektionsbelichtungsanlage |
| CN101243359B (zh) * | 2005-08-10 | 2011-04-06 | 卡尔蔡司Smt有限责任公司 | 成像系统、特别是显微光刻投影曝光设备的投影物镜 |
| KR20080043835A (ko) | 2005-09-14 | 2008-05-19 | 칼 짜이스 에스엠테 아게 | 마이크로리소그래피용 노광 시스템의 광학 시스템 |
| EP1984788B1 (en) * | 2006-02-17 | 2011-09-21 | Carl Zeiss SMT GmbH | Optical integrator for an illumination system of a microlithographic projection exposure apparatus |
| TWI545352B (zh) | 2006-02-17 | 2016-08-11 | 卡爾蔡司Smt有限公司 | 用於微影投射曝光設備之照明系統 |
| JP4872679B2 (ja) * | 2006-02-24 | 2012-02-08 | 日立化成工業株式会社 | フッ化物結晶の熱処理方法、フッ化物結晶の判別方法及びフッ化物結晶の加工方法 |
| DE102006038398A1 (de) | 2006-08-15 | 2008-02-21 | Carl Zeiss Smt Ag | Projektionsobjektiv einer mikrolithographischen Projektionsbelichtungsanlage |
| JP2008216498A (ja) * | 2007-03-01 | 2008-09-18 | Canon Inc | 投影光学系、露光装置及びデバイス製造方法 |
| WO2008110501A1 (de) * | 2007-03-13 | 2008-09-18 | Carl Zeiss Smt Ag | Projektionsobjektiv einer mikrolithographischen projektionsbelichtungsanlage |
| DE102007055063A1 (de) * | 2007-11-16 | 2009-05-28 | Carl Zeiss Smt Ag | Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage |
| DE102008054682A1 (de) | 2008-02-15 | 2009-08-20 | Carl Zeiss Smt Ag | Linse, insbesondere für ein Projektionsobjektiv einer mikrolithographischen Projektionsbelichtungsanlage |
| DE102008054683A1 (de) | 2008-03-13 | 2009-09-17 | Carl Zeiss Smt Ag | Optisches System einer mikrolithographischen Projektionsbelichtungsanlage, sowie Verfahren zum Manipulieren der Abbildungseigenschaften eines optischen Systems |
| US8284815B2 (en) * | 2008-10-21 | 2012-10-09 | Cymer, Inc. | Very high power laser chamber optical improvements |
| RU2482522C2 (ru) * | 2011-06-16 | 2013-05-20 | Открытое акционерное общество "Научно-исследовательский и технологический институт оптического материаловедения Всероссийского научного центра "Государственный оптический институт им С.И. Вавилова" (ОАО "НИТИОМ ВНЦ "ГОИ им. С.И. Вавилова") | Плоская линза из лейкосапфира и способ ее получения |
| DE102012200368A1 (de) | 2012-01-12 | 2013-07-18 | Carl Zeiss Smt Gmbh | Polarisationsbeeinflussende optische Anordnung, insbesondere in einer mikrolithographischen Projektionsbelichtungsanlage |
| DE102012212852A1 (de) | 2012-07-23 | 2013-09-05 | Carl Zeiss Smt Gmbh | Optisches System, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage |
| DE102012213553A1 (de) | 2012-08-01 | 2013-08-22 | Carl Zeiss Smt Gmbh | Optisches System, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage |
| DE102012216532A1 (de) | 2012-09-17 | 2013-09-12 | Carl Zeiss Smt Gmbh | Optisches System, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage |
| DE102012218125A1 (de) | 2012-10-04 | 2013-11-07 | Carl Zeiss Smt Gmbh | Axikonsystem, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage |
| DE102013108321B3 (de) * | 2013-08-02 | 2014-10-23 | Leibniz-Institut für Analytische Wissenschaften-ISAS-e.V. | Fresnelsches-Parallelepiped |
| DE102024103989A1 (de) * | 2024-02-13 | 2025-08-14 | Carl Zeiss Smt Gmbh | Verfahren zum Herstellen eines Substrats, eines optischen Systems und einer Lichtquellenanordnung für eine Lithographieanlage und Substrat zur Verwendung als Teil eines optischen Elements in einem optischen System einer Lithographieanlage |
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2002
- 2002-05-08 WO PCT/EP2002/005050 patent/WO2002093209A2/de not_active Ceased
- 2002-05-08 KR KR10-2003-7015260A patent/KR20040015251A/ko not_active Ceased
- 2002-05-08 JP JP2002589833A patent/JP2004526331A/ja active Pending
- 2002-05-08 EP EP02738037A patent/EP1390783A2/de not_active Withdrawn
- 2002-05-09 TW TW091109726A patent/TW591242B/zh not_active IP Right Cessation
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2003
- 2003-02-12 US US10/367,989 patent/US7145720B2/en not_active Expired - Lifetime
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2004
- 2004-04-01 US US10/817,527 patent/US7180667B2/en not_active Expired - Lifetime
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2005
- 2005-01-05 US US11/029,788 patent/US7126765B2/en not_active Expired - Fee Related
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2006
- 2006-03-29 US US11/392,027 patent/US7382536B2/en not_active Expired - Lifetime