JP2008046641A5 - - Google Patents

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Publication number
JP2008046641A5
JP2008046641A5 JP2007211846A JP2007211846A JP2008046641A5 JP 2008046641 A5 JP2008046641 A5 JP 2008046641A5 JP 2007211846 A JP2007211846 A JP 2007211846A JP 2007211846 A JP2007211846 A JP 2007211846A JP 2008046641 A5 JP2008046641 A5 JP 2008046641A5
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JP
Japan
Prior art keywords
lens
projection objective
crystal
members
orientation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2007211846A
Other languages
English (en)
Japanese (ja)
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JP5317156B2 (ja
JP2008046641A (ja
Filing date
Publication date
Priority claimed from DE102006038398A external-priority patent/DE102006038398A1/de
Application filed filed Critical
Publication of JP2008046641A publication Critical patent/JP2008046641A/ja
Publication of JP2008046641A5 publication Critical patent/JP2008046641A5/ja
Application granted granted Critical
Publication of JP5317156B2 publication Critical patent/JP5317156B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2007211846A 2006-08-15 2007-08-15 マイクロリソグラフィ投影露光装置の投影対物レンズ Expired - Fee Related JP5317156B2 (ja)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US82242706P 2006-08-15 2006-08-15
US60/822427 2006-08-15
DE102006038398A DE102006038398A1 (de) 2006-08-15 2006-08-15 Projektionsobjektiv einer mikrolithographischen Projektionsbelichtungsanlage
DE102006038398.2 2006-08-15

Publications (3)

Publication Number Publication Date
JP2008046641A JP2008046641A (ja) 2008-02-28
JP2008046641A5 true JP2008046641A5 (enExample) 2010-09-30
JP5317156B2 JP5317156B2 (ja) 2013-10-16

Family

ID=38954802

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007211846A Expired - Fee Related JP5317156B2 (ja) 2006-08-15 2007-08-15 マイクロリソグラフィ投影露光装置の投影対物レンズ

Country Status (8)

Country Link
US (1) US7679831B2 (enExample)
EP (1) EP1890193B1 (enExample)
JP (1) JP5317156B2 (enExample)
KR (1) KR101388297B1 (enExample)
CN (1) CN101126907B (enExample)
AT (1) ATE486302T1 (enExample)
DE (2) DE102006038398A1 (enExample)
TW (1) TWI425245B (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008087827A1 (ja) * 2007-01-16 2008-07-24 Nikon Corporation 結像光学系、露光装置、およびデバイス製造方法
JP2008216498A (ja) * 2007-03-01 2008-09-18 Canon Inc 投影光学系、露光装置及びデバイス製造方法
JP2009031603A (ja) * 2007-07-27 2009-02-12 Canon Inc 投影光学系、露光装置及びデバイス製造方法
JP2009086038A (ja) * 2007-09-27 2009-04-23 Canon Inc 投影光学系、露光装置及びデバイス製造方法
CN111302297A (zh) * 2020-02-17 2020-06-19 福建晶安光电有限公司 图形化镥铝石榴石晶片结构及其制备方法、包括该结构的发光装置封装件和投影仪

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2699706A (en) * 1949-11-08 1955-01-18 Boone Philip Ornamental object having birefringent and polarizing layers
JPH1020197A (ja) * 1996-06-28 1998-01-23 Nikon Corp 反射屈折光学系及びその調整方法
DE60124524T2 (de) * 2000-04-25 2007-03-08 Asml Holding, N.V. Optisches reduktionssystem mit kontrolle der belichtungspolarisation
DE10040998A1 (de) * 2000-08-22 2002-03-14 Zeiss Carl Projektionsbelichtungsanlage
WO2002093209A2 (de) * 2001-05-15 2002-11-21 Carl Zeiss Objektiv mit fluorid-kristall-linsen
US6683710B2 (en) * 2001-06-01 2004-01-27 Optical Research Associates Correction of birefringence in cubic crystalline optical systems
US6775063B2 (en) * 2001-07-10 2004-08-10 Nikon Corporation Optical system and exposure apparatus having the optical system
DE10133841A1 (de) * 2001-07-18 2003-02-06 Zeiss Carl Objektiv mit Kristall-Linsen
US6844972B2 (en) * 2001-10-30 2005-01-18 Mcguire, Jr. James P. Reducing aberration in optical systems comprising cubic crystalline optical elements
US6958864B2 (en) 2002-08-22 2005-10-25 Asml Netherlands B.V. Structures and methods for reducing polarization aberration in integrated circuit fabrication systems
US7239450B2 (en) * 2004-11-22 2007-07-03 Carl Zeiss Smt Ag Method of determining lens materials for a projection exposure apparatus
KR20070105976A (ko) * 2005-02-25 2007-10-31 칼 짜이스 에스엠티 아게 광학시스템, 특히 마이크로리소그래픽 투사노출장치용대물렌즈 또는 조명장치
DE102006013560A1 (de) 2005-04-19 2006-10-26 Carl Zeiss Smt Ag Projektionsobjektiv einer mikrolithographischen Projektionsbelichtungsanlage sowie Verfahren zu dessen Herstellung
DE102006025044A1 (de) 2005-08-10 2007-02-15 Carl Zeiss Smt Ag Abbildungssystem, insbesondere Projektionsobjektiv einer mikrolithographischen Projektionsbelichtungsanlage

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