JP2006113533A5 - - Google Patents

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Publication number
JP2006113533A5
JP2006113533A5 JP2005136902A JP2005136902A JP2006113533A5 JP 2006113533 A5 JP2006113533 A5 JP 2006113533A5 JP 2005136902 A JP2005136902 A JP 2005136902A JP 2005136902 A JP2005136902 A JP 2005136902A JP 2006113533 A5 JP2006113533 A5 JP 2006113533A5
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JP
Japan
Prior art keywords
optical system
optical element
projection optical
crystal material
projection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2005136902A
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English (en)
Japanese (ja)
Other versions
JP2006113533A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2005136902A priority Critical patent/JP2006113533A/ja
Priority claimed from JP2005136902A external-priority patent/JP2006113533A/ja
Priority to PCT/JP2005/013447 priority patent/WO2006013734A1/ja
Priority to HK07110333.8A priority patent/HK1102284B/xx
Priority to US11/658,918 priority patent/US8102508B2/en
Priority to KR1020077005157A priority patent/KR20070041609A/ko
Priority to EP05766167A priority patent/EP1783525A4/en
Priority to CN2005800263699A priority patent/CN101002127B/zh
Priority to TW094125534A priority patent/TW200609690A/zh
Publication of JP2006113533A publication Critical patent/JP2006113533A/ja
Priority to IL181136A priority patent/IL181136A0/en
Publication of JP2006113533A5 publication Critical patent/JP2006113533A5/ja
Pending legal-status Critical Current

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JP2005136902A 2004-08-03 2005-05-10 投影光学系、露光装置、および露光方法 Pending JP2006113533A (ja)

Priority Applications (9)

Application Number Priority Date Filing Date Title
JP2005136902A JP2006113533A (ja) 2004-08-03 2005-05-10 投影光学系、露光装置、および露光方法
CN2005800263699A CN101002127B (zh) 2004-08-03 2005-07-22 投影光学系统、曝光装置以及曝光方法
KR1020077005157A KR20070041609A (ko) 2004-08-03 2005-07-22 투영 광학계, 노광 장치 및 노광 방법
HK07110333.8A HK1102284B (en) 2004-08-03 2005-07-22 Projection optical system, exposure apparatus, and exposure method
US11/658,918 US8102508B2 (en) 2004-08-03 2005-07-22 Projection optical system, exposure apparatus, and exposure method
PCT/JP2005/013447 WO2006013734A1 (ja) 2004-08-03 2005-07-22 投影光学系、露光装置、および露光方法
EP05766167A EP1783525A4 (en) 2004-08-03 2005-07-22 OPTICAL PROJECTION SYSTEM, EXPOSURE DEVICE AND EXPOSURE METHOD
TW094125534A TW200609690A (en) 2004-08-03 2005-07-28 Projection optical system, exposure device and method of exposure
IL181136A IL181136A0 (en) 2004-08-03 2007-02-01 Projection optical system, exposure apparatus, and exposure method

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2004227226 2004-08-03
JP2004267319 2004-09-14
JP2005136902A JP2006113533A (ja) 2004-08-03 2005-05-10 投影光学系、露光装置、および露光方法

Publications (2)

Publication Number Publication Date
JP2006113533A JP2006113533A (ja) 2006-04-27
JP2006113533A5 true JP2006113533A5 (enExample) 2008-05-08

Family

ID=35787025

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005136902A Pending JP2006113533A (ja) 2004-08-03 2005-05-10 投影光学系、露光装置、および露光方法

Country Status (7)

Country Link
US (1) US8102508B2 (enExample)
EP (1) EP1783525A4 (enExample)
JP (1) JP2006113533A (enExample)
KR (1) KR20070041609A (enExample)
IL (1) IL181136A0 (enExample)
TW (1) TW200609690A (enExample)
WO (1) WO2006013734A1 (enExample)

Families Citing this family (21)

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US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
US7466489B2 (en) * 2003-12-15 2008-12-16 Susanne Beder Projection objective having a high aperture and a planar end surface
US20080151364A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
KR20170129271A (ko) 2004-05-17 2017-11-24 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
KR20070105976A (ko) * 2005-02-25 2007-10-31 칼 짜이스 에스엠티 아게 광학시스템, 특히 마이크로리소그래픽 투사노출장치용대물렌즈 또는 조명장치
EP2280295A1 (de) * 2005-03-08 2011-02-02 Schott Ag Verfahren zur Herstellung von optischen Elementen für die Mikrolithographie, damit erhältliche Linsensysteme und deren Verwendung
JP2006309220A (ja) * 2005-04-29 2006-11-09 Carl Zeiss Smt Ag 投影対物レンズ
EP1913445B1 (de) * 2005-08-10 2011-05-25 Carl Zeiss SMT GmbH Abbildungssystem, insbesondere projektionsobjektiv einer mikrolithographischen projektionsbelichtungsanlage
WO2007132619A1 (ja) * 2006-05-12 2007-11-22 Nikon Corporation 結像光学系、露光装置、およびデバイス製造方法
US7557997B2 (en) * 2006-09-28 2009-07-07 Nikon Corporation Immersion objective optical system, exposure apparatus, device fabrication method, and boundary optical element
KR101399768B1 (ko) * 2006-12-28 2014-05-27 칼 짜이스 에스엠티 게엠베하 기울어진 편향 미러를 갖는 반사굴절식 투영 대물렌즈, 투영 노광 장치, 투영 노광 방법 및 미러
JP2008216498A (ja) 2007-03-01 2008-09-18 Canon Inc 投影光学系、露光装置及びデバイス製造方法
JP2009031603A (ja) 2007-07-27 2009-02-12 Canon Inc 投影光学系、露光装置及びデバイス製造方法
JP2009086038A (ja) 2007-09-27 2009-04-23 Canon Inc 投影光学系、露光装置及びデバイス製造方法
US20090091728A1 (en) * 2007-09-28 2009-04-09 Carl Zeiss Smt Ag Compact High Aperture Folded Catadioptric Projection Objective
FR2927708A1 (fr) * 2008-02-19 2009-08-21 Commissariat Energie Atomique Procede de photolithographie ultraviolette a immersion
US8345350B2 (en) 2008-06-20 2013-01-01 Carl Zeiss Smt Gmbh Chromatically corrected objective with specifically structured and arranged dioptric optical elements and projection exposure apparatus including the same
DE102009011329A1 (de) 2009-03-05 2010-09-09 Carl Zeiss Smt Ag Kompaktes katadioptrisches Projektionsobjektiv für die Immersionslithographie sowie Projektionsbelichtungsverfahren
DE102009037077B3 (de) 2009-08-13 2011-02-17 Carl Zeiss Smt Ag Katadioptrisches Projektionsobjektiv
US9651873B2 (en) * 2012-12-27 2017-05-16 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
US10353204B2 (en) * 2016-10-31 2019-07-16 Tectus Corporation Femtoprojector optical systems

Family Cites Families (26)

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JP2830492B2 (ja) * 1991-03-06 1998-12-02 株式会社ニコン 投影露光装置及び投影露光方法
JP3246615B2 (ja) 1992-07-27 2002-01-15 株式会社ニコン 照明光学装置、露光装置、及び露光方法
JPH06188169A (ja) 1992-08-24 1994-07-08 Canon Inc 結像方法及び該方法を用いる露光装置及び該方法を用いるデバイス製造方法
JPH06124873A (ja) 1992-10-09 1994-05-06 Canon Inc 液浸式投影露光装置
JP3555230B2 (ja) * 1994-05-18 2004-08-18 株式会社ニコン 投影露光装置
CN1244018C (zh) 1996-11-28 2006-03-01 株式会社尼康 曝光方法和曝光装置
DE69717975T2 (de) 1996-12-24 2003-05-28 Asml Netherlands B.V., Veldhoven In zwei richtungen ausgewogenes positioniergerät, sowie lithographisches gerät mit einem solchen positioniergerät
JP3747566B2 (ja) 1997-04-23 2006-02-22 株式会社ニコン 液浸型露光装置
AU2747999A (en) 1998-03-26 1999-10-18 Nikon Corporation Projection exposure method and system
US6451507B1 (en) * 1998-08-18 2002-09-17 Nikon Corporation Exposure apparatus and method
JP2000133588A (ja) * 1998-08-18 2000-05-12 Nikon Corp 露光装置及び方法、該露光装置の製造方法並びに該露光装置を用いたデバイス製造方法
WO2001023935A1 (en) 1999-09-29 2001-04-05 Nikon Corporation Projection exposure method and apparatus and projection optical system
WO2001023933A1 (en) * 1999-09-29 2001-04-05 Nikon Corporation Projection optical system
US7301605B2 (en) * 2000-03-03 2007-11-27 Nikon Corporation Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices
JP2001345245A (ja) 2000-05-31 2001-12-14 Nikon Corp 露光方法及び露光装置並びにデバイス製造方法
GB2368219A (en) * 2000-09-13 2002-04-24 Roke Manor Research Camera system with GPS
TW571344B (en) 2001-07-10 2004-01-11 Nikon Corp Manufacturing method for projection optic system
US6788389B2 (en) * 2001-07-10 2004-09-07 Nikon Corporation Production method of projection optical system
JP4333078B2 (ja) 2002-04-26 2009-09-16 株式会社ニコン 投影光学系、該投影光学系を備えた露光装置および該投影光学系を用いた露光方法並びにデバイス製造方法
JP4338434B2 (ja) * 2002-06-07 2009-10-07 富士フイルム株式会社 透過型２次元光変調素子及びそれを用いた露光装置
JP4305611B2 (ja) * 2002-07-18 2009-07-29 株式会社ニコン 照明光学装置、露光装置および露光方法
TWI249082B (en) * 2002-08-23 2006-02-11 Nikon Corp Projection optical system and method for photolithography and exposure apparatus and method using same
DE10253679A1 (de) * 2002-11-18 2004-06-03 Infineon Technologies Ag Optische Einrichtung zur Verwendung bei einem Lithographie-Verfahren, insbesondere zur Herstellung eines Halbleiter-Bauelements, sowie optisches Lithographieverfahren
JP2004205698A (ja) 2002-12-24 2004-07-22 Nikon Corp 投影光学系、露光装置および露光方法
WO2007071569A1 (en) 2005-12-23 2007-06-28 Carl Zeiss Smt Ag Projection objective of a microlithographic projection exposure apparatus
US7557997B2 (en) * 2006-09-28 2009-07-07 Nikon Corporation Immersion objective optical system, exposure apparatus, device fabrication method, and boundary optical element

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