JP2006113533A - 投影光学系、露光装置、および露光方法 - Google Patents

投影光学系、露光装置、および露光方法 Download PDF

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Publication number
JP2006113533A
JP2006113533A JP2005136902A JP2005136902A JP2006113533A JP 2006113533 A JP2006113533 A JP 2006113533A JP 2005136902 A JP2005136902 A JP 2005136902A JP 2005136902 A JP2005136902 A JP 2005136902A JP 2006113533 A JP2006113533 A JP 2006113533A
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JP
Japan
Prior art keywords
optical system
optical element
projection optical
projection
mgo
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2005136902A
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English (en)
Japanese (ja)
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JP2006113533A5 (enExample
Inventor
Yasuhiro Omura
泰弘 大村
Soichi Yamato
壮一 大和
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP2005136902A priority Critical patent/JP2006113533A/ja
Priority to PCT/JP2005/013447 priority patent/WO2006013734A1/ja
Priority to KR1020077005157A priority patent/KR20070041609A/ko
Priority to HK07110333.8A priority patent/HK1102284B/xx
Priority to US11/658,918 priority patent/US8102508B2/en
Priority to CN2005800263699A priority patent/CN101002127B/zh
Priority to EP05766167A priority patent/EP1783525A4/en
Priority to TW094125534A priority patent/TW200609690A/zh
Publication of JP2006113533A publication Critical patent/JP2006113533A/ja
Priority to IL181136A priority patent/IL181136A0/en
Publication of JP2006113533A5 publication Critical patent/JP2006113533A5/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2005136902A 2004-08-03 2005-05-10 投影光学系、露光装置、および露光方法 Pending JP2006113533A (ja)

Priority Applications (9)

Application Number Priority Date Filing Date Title
JP2005136902A JP2006113533A (ja) 2004-08-03 2005-05-10 投影光学系、露光装置、および露光方法
CN2005800263699A CN101002127B (zh) 2004-08-03 2005-07-22 投影光学系统、曝光装置以及曝光方法
KR1020077005157A KR20070041609A (ko) 2004-08-03 2005-07-22 투영 광학계, 노광 장치 및 노광 방법
HK07110333.8A HK1102284B (en) 2004-08-03 2005-07-22 Projection optical system, exposure apparatus, and exposure method
US11/658,918 US8102508B2 (en) 2004-08-03 2005-07-22 Projection optical system, exposure apparatus, and exposure method
PCT/JP2005/013447 WO2006013734A1 (ja) 2004-08-03 2005-07-22 投影光学系、露光装置、および露光方法
EP05766167A EP1783525A4 (en) 2004-08-03 2005-07-22 OPTICAL PROJECTION SYSTEM, EXPOSURE DEVICE AND EXPOSURE METHOD
TW094125534A TW200609690A (en) 2004-08-03 2005-07-28 Projection optical system, exposure device and method of exposure
IL181136A IL181136A0 (en) 2004-08-03 2007-02-01 Projection optical system, exposure apparatus, and exposure method

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2004227226 2004-08-03
JP2004267319 2004-09-14
JP2005136902A JP2006113533A (ja) 2004-08-03 2005-05-10 投影光学系、露光装置、および露光方法

Publications (2)

Publication Number Publication Date
JP2006113533A true JP2006113533A (ja) 2006-04-27
JP2006113533A5 JP2006113533A5 (enExample) 2008-05-08

Family

ID=35787025

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005136902A Pending JP2006113533A (ja) 2004-08-03 2005-05-10 投影光学系、露光装置、および露光方法

Country Status (7)

Country Link
US (1) US8102508B2 (enExample)
EP (1) EP1783525A4 (enExample)
JP (1) JP2006113533A (enExample)
KR (1) KR20070041609A (enExample)
IL (1) IL181136A0 (enExample)
TW (1) TW200609690A (enExample)
WO (1) WO2006013734A1 (enExample)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006309220A (ja) * 2005-04-29 2006-11-09 Carl Zeiss Smt Ag 投影対物レンズ
WO2007132619A1 (ja) * 2006-05-12 2007-11-22 Nikon Corporation 結像光学系、露光装置、およびデバイス製造方法
EP1965228A1 (en) 2007-03-01 2008-09-03 Canon Kabushiki Kaisha Projection optical system, exposure apparatus, and device fabrication method
JP2008547039A (ja) * 2005-06-14 2008-12-25 カール・ツァイス・エスエムティー・アーゲー 高開口かつ平面的な端面を有する投影対物レンズ
JP2009505124A (ja) * 2005-08-10 2009-02-05 カール・ツァイス・エスエムティー・アーゲー 像投影システム、特に、マイクロリソグラフィ投影露光装置の投影対物レンズ
JP2009086692A (ja) * 2005-02-25 2009-04-23 Carl Zeiss Smt Ag マイクロ・リソグラフィー投影露光装置のための光学システム
US7706075B2 (en) 2007-07-27 2010-04-27 Canon Kabushiki Kaisha Projection optical system, exposure apparatus, and device fabrication method
US7843645B2 (en) 2007-09-27 2010-11-30 Canon Kabushiki Kaisha Projection optical system, exposure apparatus, and method of manufacturing device
JP2012185503A (ja) * 2009-08-13 2012-09-27 Carl Zeiss Smt Gmbh 反射屈折投影対物系
JP2016095523A (ja) * 2006-12-28 2016-05-26 カール・ツァイス・エスエムティー・ゲーエムベーハー 傾斜偏向ミラーを有する反射屈折投影対物器械、投影露光装置、投影露光方法、及びミラー
JPWO2014104139A1 (ja) * 2012-12-27 2017-01-12 株式会社ニコン 液浸部材及び露光装置

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
US20080151364A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
KR20170129271A (ko) 2004-05-17 2017-11-24 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
EP2280295A1 (de) * 2005-03-08 2011-02-02 Schott Ag Verfahren zur Herstellung von optischen Elementen für die Mikrolithographie, damit erhältliche Linsensysteme und deren Verwendung
US7557997B2 (en) * 2006-09-28 2009-07-07 Nikon Corporation Immersion objective optical system, exposure apparatus, device fabrication method, and boundary optical element
US20090091728A1 (en) * 2007-09-28 2009-04-09 Carl Zeiss Smt Ag Compact High Aperture Folded Catadioptric Projection Objective
FR2927708A1 (fr) * 2008-02-19 2009-08-21 Commissariat Energie Atomique Procede de photolithographie ultraviolette a immersion
US8345350B2 (en) 2008-06-20 2013-01-01 Carl Zeiss Smt Gmbh Chromatically corrected objective with specifically structured and arranged dioptric optical elements and projection exposure apparatus including the same
DE102009011329A1 (de) 2009-03-05 2010-09-09 Carl Zeiss Smt Ag Kompaktes katadioptrisches Projektionsobjektiv für die Immersionslithographie sowie Projektionsbelichtungsverfahren
US10353204B2 (en) * 2016-10-31 2019-07-16 Tectus Corporation Femtoprojector optical systems

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WO2004019128A2 (en) * 2002-08-23 2004-03-04 Nikon Corporation Projection optical system and method for photolithography and exposure apparatus and method using same

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JP2830492B2 (ja) * 1991-03-06 1998-12-02 株式会社ニコン 投影露光装置及び投影露光方法
JP3246615B2 (ja) 1992-07-27 2002-01-15 株式会社ニコン 照明光学装置、露光装置、及び露光方法
JPH06188169A (ja) 1992-08-24 1994-07-08 Canon Inc 結像方法及び該方法を用いる露光装置及び該方法を用いるデバイス製造方法
JPH06124873A (ja) 1992-10-09 1994-05-06 Canon Inc 液浸式投影露光装置
JP3555230B2 (ja) * 1994-05-18 2004-08-18 株式会社ニコン 投影露光装置
CN1244018C (zh) 1996-11-28 2006-03-01 株式会社尼康 曝光方法和曝光装置
DE69717975T2 (de) 1996-12-24 2003-05-28 Asml Netherlands B.V., Veldhoven In zwei richtungen ausgewogenes positioniergerät, sowie lithographisches gerät mit einem solchen positioniergerät
JP3747566B2 (ja) 1997-04-23 2006-02-22 株式会社ニコン 液浸型露光装置
AU2747999A (en) 1998-03-26 1999-10-18 Nikon Corporation Projection exposure method and system
US6451507B1 (en) * 1998-08-18 2002-09-17 Nikon Corporation Exposure apparatus and method
JP2000133588A (ja) * 1998-08-18 2000-05-12 Nikon Corp 露光装置及び方法、該露光装置の製造方法並びに該露光装置を用いたデバイス製造方法
WO2001023935A1 (en) 1999-09-29 2001-04-05 Nikon Corporation Projection exposure method and apparatus and projection optical system
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US7301605B2 (en) * 2000-03-03 2007-11-27 Nikon Corporation Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices
JP2001345245A (ja) 2000-05-31 2001-12-14 Nikon Corp 露光方法及び露光装置並びにデバイス製造方法
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JP4333078B2 (ja) 2002-04-26 2009-09-16 株式会社ニコン 投影光学系、該投影光学系を備えた露光装置および該投影光学系を用いた露光方法並びにデバイス製造方法
JP4338434B2 (ja) * 2002-06-07 2009-10-07 富士フイルム株式会社 透過型２次元光変調素子及びそれを用いた露光装置
JP4305611B2 (ja) * 2002-07-18 2009-07-29 株式会社ニコン 照明光学装置、露光装置および露光方法
DE10253679A1 (de) * 2002-11-18 2004-06-03 Infineon Technologies Ag Optische Einrichtung zur Verwendung bei einem Lithographie-Verfahren, insbesondere zur Herstellung eines Halbleiter-Bauelements, sowie optisches Lithographieverfahren
JP2004205698A (ja) 2002-12-24 2004-07-22 Nikon Corp 投影光学系、露光装置および露光方法
WO2007071569A1 (en) 2005-12-23 2007-06-28 Carl Zeiss Smt Ag Projection objective of a microlithographic projection exposure apparatus
US7557997B2 (en) * 2006-09-28 2009-07-07 Nikon Corporation Immersion objective optical system, exposure apparatus, device fabrication method, and boundary optical element

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Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009086692A (ja) * 2005-02-25 2009-04-23 Carl Zeiss Smt Ag マイクロ・リソグラフィー投影露光装置のための光学システム
JP2006309220A (ja) * 2005-04-29 2006-11-09 Carl Zeiss Smt Ag 投影対物レンズ
JP2008547039A (ja) * 2005-06-14 2008-12-25 カール・ツァイス・エスエムティー・アーゲー 高開口かつ平面的な端面を有する投影対物レンズ
JP2009505124A (ja) * 2005-08-10 2009-02-05 カール・ツァイス・エスエムティー・アーゲー 像投影システム、特に、マイクロリソグラフィ投影露光装置の投影対物レンズ
WO2007132619A1 (ja) * 2006-05-12 2007-11-22 Nikon Corporation 結像光学系、露光装置、およびデバイス製造方法
JP2016095523A (ja) * 2006-12-28 2016-05-26 カール・ツァイス・エスエムティー・ゲーエムベーハー 傾斜偏向ミラーを有する反射屈折投影対物器械、投影露光装置、投影露光方法、及びミラー
US7474380B2 (en) 2007-03-01 2009-01-06 Canon Kabushiki Kaisha Projection optical system, exposure apparatus, and device fabrication method
EP1965228A1 (en) 2007-03-01 2008-09-03 Canon Kabushiki Kaisha Projection optical system, exposure apparatus, and device fabrication method
US7706075B2 (en) 2007-07-27 2010-04-27 Canon Kabushiki Kaisha Projection optical system, exposure apparatus, and device fabrication method
US7843645B2 (en) 2007-09-27 2010-11-30 Canon Kabushiki Kaisha Projection optical system, exposure apparatus, and method of manufacturing device
JP2012185503A (ja) * 2009-08-13 2012-09-27 Carl Zeiss Smt Gmbh 反射屈折投影対物系
US8873137B2 (en) 2009-08-13 2014-10-28 Carl Zeiss Smt Gmbh Catadioptric projection objective
US9279969B2 (en) 2009-08-13 2016-03-08 Carl Zeiss Smt Gmbh Catadioptric projection objective
US9726870B2 (en) 2009-08-13 2017-08-08 Carl Zeiss Smt Gmbh Catadioptric projection objective
US10042146B2 (en) 2009-08-13 2018-08-07 Carl Zeiss Smt Gmbh Catadioptric projection objective
JPWO2014104139A1 (ja) * 2012-12-27 2017-01-12 株式会社ニコン 液浸部材及び露光装置

Also Published As

Publication number Publication date
KR20070041609A (ko) 2007-04-18
HK1102284A1 (en) 2007-11-09
US8102508B2 (en) 2012-01-24
EP1783525A1 (en) 2007-05-09
WO2006013734A1 (ja) 2006-02-09
IL181136A0 (en) 2007-07-04
US20080165336A1 (en) 2008-07-10
TW200609690A (en) 2006-03-16
EP1783525A4 (en) 2009-09-23

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