JP2008016516A5 - - Google Patents

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Publication number
JP2008016516A5
JP2008016516A5 JP2006183851A JP2006183851A JP2008016516A5 JP 2008016516 A5 JP2008016516 A5 JP 2008016516A5 JP 2006183851 A JP2006183851 A JP 2006183851A JP 2006183851 A JP2006183851 A JP 2006183851A JP 2008016516 A5 JP2008016516 A5 JP 2008016516A5
Authority
JP
Japan
Prior art keywords
phase difference
exposure apparatus
polarization component
optical system
adjustment unit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2006183851A
Other languages
English (en)
Japanese (ja)
Other versions
JP2008016516A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2006183851A priority Critical patent/JP2008016516A/ja
Priority claimed from JP2006183851A external-priority patent/JP2008016516A/ja
Priority to TW096123989A priority patent/TW200815941A/zh
Priority to US11/772,437 priority patent/US7602474B2/en
Priority to KR1020070066342A priority patent/KR100847634B1/ko
Publication of JP2008016516A publication Critical patent/JP2008016516A/ja
Publication of JP2008016516A5 publication Critical patent/JP2008016516A5/ja
Withdrawn legal-status Critical Current

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JP2006183851A 2006-07-03 2006-07-03 露光装置 Withdrawn JP2008016516A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2006183851A JP2008016516A (ja) 2006-07-03 2006-07-03 露光装置
TW096123989A TW200815941A (en) 2006-07-03 2007-07-02 Exposure apparatus
US11/772,437 US7602474B2 (en) 2006-07-03 2007-07-02 Exposure apparatus
KR1020070066342A KR100847634B1 (ko) 2006-07-03 2007-07-03 노광장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006183851A JP2008016516A (ja) 2006-07-03 2006-07-03 露光装置

Publications (2)

Publication Number Publication Date
JP2008016516A JP2008016516A (ja) 2008-01-24
JP2008016516A5 true JP2008016516A5 (enExample) 2009-08-20

Family

ID=39073278

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006183851A Withdrawn JP2008016516A (ja) 2006-07-03 2006-07-03 露光装置

Country Status (4)

Country Link
US (1) US7602474B2 (enExample)
JP (1) JP2008016516A (enExample)
KR (1) KR100847634B1 (enExample)
TW (1) TW200815941A (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8035803B2 (en) * 2006-09-06 2011-10-11 Carl Zeiss Smt Gmbh Subsystem of an illumination system of a microlithographic projection exposure apparatus
TW200938957A (en) * 2008-03-05 2009-09-16 Nanya Technology Corp Feedback system and feedback method for controlling power ratio of light source
JP5319766B2 (ja) * 2008-06-20 2013-10-16 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光装置の光学系及びマイクロリソグラフィ露光方法
US8325417B1 (en) 2008-09-23 2012-12-04 The United States Of America As Represented By The Secretary Of The Navy Apparatus and method for producing an annular far-field patterned beam(s)
JP2010097986A (ja) * 2008-10-14 2010-04-30 Nikon Corp 投影光学系、露光装置、及びデバイス製造方法
JP2012004465A (ja) 2010-06-19 2012-01-05 Nikon Corp 照明光学系、露光装置、およびデバイス製造方法
JP6084507B2 (ja) * 2012-04-16 2017-02-22 Hoya株式会社 マスクブランク用基板の製造方法、マスクブランクの製造方法、転写用マスクの製造方法、及び半導体デバイスの製造方法
US8957374B2 (en) * 2012-09-28 2015-02-17 Corning Incorporated Systems and methods for measuring birefringence in glass and glass-ceramics
JP5839076B2 (ja) * 2014-04-25 2016-01-06 株式会社ニコン 照明光学系、露光装置、およびデバイス製造方法
CN116909107B (zh) * 2023-07-25 2024-03-01 上海图双精密装备有限公司 一种光刻设备照明用光源系统

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3803991A (en) * 1972-05-22 1974-04-16 H Leader Method of inserting liners in bags
US5677757A (en) 1994-03-29 1997-10-14 Nikon Corporation Projection exposure apparatus
JP2000277413A (ja) * 1999-03-24 2000-10-06 Canon Inc 露光量制御方法、露光装置およびデバイス製造方法
JP3710321B2 (ja) * 1999-04-01 2005-10-26 キヤノン株式会社 露光量制御方法、露光装置およびデバイス製造方法
JP4521896B2 (ja) * 1999-06-08 2010-08-11 キヤノン株式会社 照明装置、投影露光装置及びデバイス製造方法
KR100338932B1 (ko) * 1999-10-28 2002-05-30 박종섭 웨이퍼 노광 장치
JP4289755B2 (ja) 2000-02-24 2009-07-01 キヤノン株式会社 露光量制御方法、デバイス製造方法および露光装置
JP4545874B2 (ja) * 2000-04-03 2010-09-15 キヤノン株式会社 照明光学系、および該照明光学系を備えた露光装置と該露光装置によるデバイスの製造方法
JP2003133216A (ja) 2001-10-26 2003-05-09 Canon Inc 露光方法及び露光装置
JP2003297729A (ja) 2002-04-03 2003-10-17 Nikon Corp 投影光学系、露光装置および露光方法
TW200412617A (en) 2002-12-03 2004-07-16 Nikon Corp Optical illumination device, method for adjusting optical illumination device, exposure device and exposure method
US7245353B2 (en) * 2004-10-12 2007-07-17 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method

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