JP2009544146A5 - - Google Patents

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Publication number
JP2009544146A5
JP2009544146A5 JP2009518757A JP2009518757A JP2009544146A5 JP 2009544146 A5 JP2009544146 A5 JP 2009544146A5 JP 2009518757 A JP2009518757 A JP 2009518757A JP 2009518757 A JP2009518757 A JP 2009518757A JP 2009544146 A5 JP2009544146 A5 JP 2009544146A5
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JP
Japan
Prior art keywords
illumination system
strips
light beam
light
strip
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2009518757A
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English (en)
Japanese (ja)
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JP2009544146A (ja
JP5369319B2 (ja
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Publication date
Priority claimed from DE102006032878A external-priority patent/DE102006032878A1/de
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Publication of JP2009544146A publication Critical patent/JP2009544146A/ja
Publication of JP2009544146A5 publication Critical patent/JP2009544146A5/ja
Application granted granted Critical
Publication of JP5369319B2 publication Critical patent/JP5369319B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2009518757A 2006-07-15 2007-07-05 マイクロリソグラフィ投影露光装置の照明システム Expired - Fee Related JP5369319B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102006032878.7 2006-07-15
DE102006032878A DE102006032878A1 (de) 2006-07-15 2006-07-15 Beleuchtungssystem einer mikrolithographischen Projektionsbelichtungsanlage
PCT/EP2007/005943 WO2008009353A1 (de) 2006-07-15 2007-07-05 Beleuchtungssystem einer mikrolithographischen projektionsbelichtungsanlage

Publications (3)

Publication Number Publication Date
JP2009544146A JP2009544146A (ja) 2009-12-10
JP2009544146A5 true JP2009544146A5 (enExample) 2010-08-19
JP5369319B2 JP5369319B2 (ja) 2013-12-18

Family

ID=38536021

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009518757A Expired - Fee Related JP5369319B2 (ja) 2006-07-15 2007-07-05 マイクロリソグラフィ投影露光装置の照明システム

Country Status (5)

Country Link
US (1) US20090115991A1 (enExample)
EP (1) EP2041625B1 (enExample)
JP (1) JP5369319B2 (enExample)
DE (1) DE102006032878A1 (enExample)
WO (1) WO2008009353A1 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102008009601A1 (de) * 2008-02-15 2009-08-20 Carl Zeiss Smt Ag Optisches System für eine mikrolithographische Projektionsbelichtungsanlage sowie mikrolithographisches Belichtungsverfahren
US9116303B2 (en) * 2010-03-05 2015-08-25 Canon Kabushiki Kaisha Hologram with cells to control phase in two polarization directions and exposure apparatus
WO2012041339A1 (en) * 2010-09-28 2012-04-05 Carl Zeiss Smt Gmbh Optical system of a microlithographic projection exposure apparatus and method of reducing image placement errors
DE102011085334A1 (de) * 2011-10-27 2013-05-02 Carl Zeiss Smt Gmbh Optisches System in einer Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0967524A3 (en) * 1990-11-15 2000-01-05 Nikon Corporation Projection exposure method and apparatus
US5459000A (en) * 1992-10-14 1995-10-17 Canon Kabushiki Kaisha Image projection method and device manufacturing method using the image projection method
JP3985346B2 (ja) * 1998-06-12 2007-10-03 株式会社ニコン 投影露光装置、投影露光装置の調整方法、及び投影露光方法
DE19829612A1 (de) * 1998-07-02 2000-01-05 Zeiss Carl Fa Beleuchtungssystem der Mikrolithographie mit Depolarisator
US6563567B1 (en) * 1998-12-17 2003-05-13 Nikon Corporation Method and apparatus for illuminating a surface using a projection imaging apparatus
JP3927753B2 (ja) * 2000-03-31 2007-06-13 キヤノン株式会社 露光装置及びデバイス製造方法
DE10124474A1 (de) * 2001-05-19 2002-11-21 Zeiss Carl Mikrolithographisches Belichtungsverfahren sowie Projektionsobjektiv zur Durchführung des Verfahrens
JP2003090978A (ja) * 2001-09-17 2003-03-28 Canon Inc 照明装置、露光装置及びデバイス製造方法
EP1367446A1 (en) * 2002-05-31 2003-12-03 ASML Netherlands B.V. Lithographic apparatus
TW200412617A (en) 2002-12-03 2004-07-16 Nikon Corp Optical illumination device, method for adjusting optical illumination device, exposure device and exposure method
WO2005024516A2 (de) * 2003-08-14 2005-03-17 Carl Zeiss Smt Ag Beleuchtungseinrichtung für eine mikrolithographische projektionsbelichtungsanlage
US7408616B2 (en) * 2003-09-26 2008-08-05 Carl Zeiss Smt Ag Microlithographic exposure method as well as a projection exposure system for carrying out the method
TWI569308B (zh) * 2003-10-28 2017-02-01 尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造 方法
WO2005050325A1 (en) * 2003-11-05 2005-06-02 Carl Zeiss Smt Ag Polarization-optimizing illumination system
TWI385414B (zh) * 2003-11-20 2013-02-11 尼康股份有限公司 光學照明裝置、照明方法、曝光裝置、曝光方法以及元件製造方法
JP4497968B2 (ja) * 2004-03-18 2010-07-07 キヤノン株式会社 照明装置、露光装置及びデバイス製造方法
US7324280B2 (en) * 2004-05-25 2008-01-29 Asml Holding N.V. Apparatus for providing a pattern of polarization
JP2006005319A (ja) 2004-06-21 2006-01-05 Canon Inc 照明光学系及び方法、露光装置及びデバイス製造方法
US7548370B2 (en) * 2004-06-29 2009-06-16 Asml Holding N.V. Layered structure for a tile wave plate assembly
JP2006196715A (ja) * 2005-01-13 2006-07-27 Nikon Corp 光束変換素子、照明光学装置、露光装置、および露光方法
JP2006269462A (ja) * 2005-03-22 2006-10-05 Sony Corp 露光装置および照明装置
US7317512B2 (en) * 2005-07-11 2008-01-08 Asml Netherlands B.V. Different polarization in cross-section of a radiation beam in a lithographic apparatus and device manufacturing method
US20070058151A1 (en) * 2005-09-13 2007-03-15 Asml Netherlands B.V. Optical element for use in lithography apparatus and method of conditioning radiation beam
US7525642B2 (en) * 2006-02-23 2009-04-28 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method

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