JP2006261606A5 - - Google Patents

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Publication number
JP2006261606A5
JP2006261606A5 JP2005080587A JP2005080587A JP2006261606A5 JP 2006261606 A5 JP2006261606 A5 JP 2006261606A5 JP 2005080587 A JP2005080587 A JP 2005080587A JP 2005080587 A JP2005080587 A JP 2005080587A JP 2006261606 A5 JP2006261606 A5 JP 2006261606A5
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JP
Japan
Prior art keywords
liquid
space
optical system
projection optical
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2005080587A
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Japanese (ja)
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JP2006261606A (en
Filing date
Publication date
Application filed filed Critical
Priority to JP2005080587A priority Critical patent/JP2006261606A/en
Priority claimed from JP2005080587A external-priority patent/JP2006261606A/en
Priority to US11/375,203 priority patent/US7561249B2/en
Publication of JP2006261606A publication Critical patent/JP2006261606A/en
Publication of JP2006261606A5 publication Critical patent/JP2006261606A5/ja
Withdrawn legal-status Critical Current

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Claims (7)

原板のパターンを基板に投影する投影光学系と、
前記基板を支持するステージと、
前記投影光学系と前記ステージとの間に配置された光透過性部材と、
前記投影光学系と前記光透過性部材との間の第１空間に純水よりも屈折率が高い第１液体を供給する第１供給器と、
前記光透過性部材と前記基板との間の第２空間に純水よりも屈折率が高く、かつ前記第１液体とは異なる第２液体を供給する第２供給器と、
を備えることを特徴とする露光装置。 A projection optical system that projects the pattern of the original plate onto the substrate;
A stage for supporting the substrate;
A light transmissive member disposed between the projection optical system and the stage;
A first supply for supplying a first liquid having a refractive index higher than that of pure water to a first space between the projection optical system and the light transmissive member;
A second feeder for supplying a second liquid having a refractive index higher than that of pure water and different from the first liquid into a second space between the light transmissive member and the substrate;
An exposure apparatus comprising: 前記第１液体として無機物系の液体を使用し、前記第２液体として有機物系の液体を使用することを特徴とする請求項１に記載の露光装置。   2. The exposure apparatus according to claim 1, wherein an inorganic liquid is used as the first liquid, and an organic liquid is used as the second liquid. 前記第１液体として、前記第２液体よりも前記投影光学系の端面を構成する光学部品を汚染しにくい液体を使用し、前記第２液体として、前記第１液体よりも前記基板を腐食させにくい液体を使用することを特徴とする請求項１又は２に記載の露光装置。   As the first liquid, a liquid that is less likely to contaminate optical components constituting the end surface of the projection optical system than the second liquid is used, and as the second liquid, the substrate is less likely to corrode than the first liquid. The exposure apparatus according to claim 1, wherein a liquid is used. 前記第１空間に供給された第１液体を回収する第１回収器と、
前記第２空間に供給された第２液体を回収する第２回収器と、
を更に備えることを特徴とする請求項１乃至３のいずれか１項に記載の露光装置。 A first recovery device for recovering the first liquid supplied to the first space;
A second recovery device for recovering the second liquid supplied to the second space;
The exposure apparatus according to claim 1, further comprising: 前記第１空間を外部空間から仕切る仕切り部材と、
前記第２空間を外部空間から仕切るエアカーテンを形成する機構と、
を更に備えることを特徴とする請求項１乃至４のいずれか１項に記載の露光装置。 A partition member that partitions the first space from an external space;
A mechanism for forming an air curtain that partitions the second space from an external space;
The exposure apparatus according to claim 1, further comprising: 前記第１空間を外部空間から仕切るエアカーテンを形成する機構と、
前記第２空間を外部空間から仕切る仕切り部材と、
を更に備えることを特徴とする請求項１乃至４のいずれか１項に記載の露光装置。 A mechanism for forming an air curtain that partitions the first space from an external space;
A partition member for partitioning the second space from the external space;
The exposure apparatus according to claim 1, further comprising: ステージに載置された基板に対して投影光学系を介して原板のパターンを投影し転写する露光方法であって、
前記投影光学系と前記ステージとの間に配置された光透過性部材と前記投影光学系との間の第１空間に純水よりも屈折率が高い第１液体を満たすとともに、前記光透過性部材と前記基板との間の第２空間に純水よりも屈折率が高く、かつ前記第１液体とは異なる第２液体を満たす工程と、
前記原板のパターンを前記投影光学系、前記第１液体、前記光透過性部材及び前記第２液体を介して前記基板に投影し転写する工程と、
を含むことを特徴とする露光方法。 An exposure method for projecting and transferring a pattern of an original plate through a projection optical system to a substrate placed on a stage,
The first space between the projection optical system and the light transmissive member disposed between the projection optical system and the stage is filled with a first liquid having a refractive index higher than that of pure water , and the light transmissive property is increased. Filling the second space between the member and the substrate with a second liquid having a refractive index higher than that of pure water and different from the first liquid;
Projecting and transferring the pattern of the original plate onto the substrate via the projection optical system, the first liquid, the light transmissive member, and the second liquid;
An exposure method comprising:
JP2005080587A 2005-03-18 2005-03-18 Exposure device, exposure method and device manufacturing method Withdrawn JP2006261606A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2005080587A JP2006261606A (en) 2005-03-18 2005-03-18 Exposure device, exposure method and device manufacturing method
US11/375,203 US7561249B2 (en) 2005-03-18 2006-03-15 Exposure apparatus, exposure method, and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005080587A JP2006261606A (en) 2005-03-18 2005-03-18 Exposure device, exposure method and device manufacturing method

Publications (2)

Publication Number Publication Date
JP2006261606A JP2006261606A (en) 2006-09-28
JP2006261606A5 true JP2006261606A5 (en) 2008-08-28

Family

ID=37009938

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005080587A Withdrawn JP2006261606A (en) 2005-03-18 2005-03-18 Exposure device, exposure method and device manufacturing method

Country Status (2)

Country Link
US (1) US7561249B2 (en)
JP (1) JP2006261606A (en)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006261606A (en) 2005-03-18 2006-09-28 Canon Inc Exposure device, exposure method and device manufacturing method
JP2006269942A (en) * 2005-03-25 2006-10-05 Canon Inc Aligner and device manufacturing method
US7385673B2 (en) * 2005-06-10 2008-06-10 International Business Machines Corporation Immersion lithography with equalized pressure on at least projection optics component and wafer
US7969548B2 (en) * 2006-05-22 2011-06-28 Asml Netherlands B.V. Lithographic apparatus and lithographic apparatus cleaning method
JP2008218653A (en) * 2007-03-02 2008-09-18 Canon Inc Exposure apparatus and device manufacturing method
WO2008139913A1 (en) * 2007-05-10 2008-11-20 Nikon Corporation Exposure method and flat plate for exposure
NL1036579A1 (en) * 2008-02-19 2009-08-20 Asml Netherlands Bv Lithographic apparatus and methods.
US8654306B2 (en) * 2008-04-14 2014-02-18 Nikon Corporation Exposure apparatus, cleaning method, and device fabricating method
US20110222030A1 (en) * 2010-03-09 2011-09-15 Nanya Technology Corporation Immersion lithographic apparatuses
US20120062858A1 (en) * 2010-04-02 2012-03-15 Nikon Corporation Cleaning method, device manufacturing method, exposure apparatus, and device manufacturing system
JP5241862B2 (en) 2011-01-01 2013-07-17 キヤノン株式会社 Exposure apparatus and device manufacturing method
US20130016041A1 (en) * 2011-07-13 2013-01-17 Kuo-Ching Chiang High Resolution Mouse

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06124873A (en) 1992-10-09 1994-05-06 Canon Inc Liquid-soaking type projection exposure apparatus
JP2753930B2 (en) * 1992-11-27 1998-05-20 キヤノン株式会社 Immersion type projection exposure equipment
WO1999049504A1 (en) 1998-03-26 1999-09-30 Nikon Corporation Projection exposure method and system
SG121822A1 (en) * 2002-11-12 2006-05-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
SG2012087615A (en) * 2003-02-26 2015-08-28 Nippon Kogaku Kk Exposure apparatus, exposure method, and method for producing device
US6954256B2 (en) * 2003-08-29 2005-10-11 Asml Netherlands B.V. Gradient immersion lithography
TW200513809A (en) * 2003-09-29 2005-04-16 Nippon Kogaku Kk Liquid-soaked lens system and projecting exposure apparatus as well as component manufacturing method
US7880860B2 (en) * 2004-12-20 2011-02-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2006261606A (en) 2005-03-18 2006-09-28 Canon Inc Exposure device, exposure method and device manufacturing method
JP2006269942A (en) * 2005-03-25 2006-10-05 Canon Inc Aligner and device manufacturing method

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