JP2006261606A - 露光装置、露光方法及びデバイス製造方法 - Google Patents

露光装置、露光方法及びデバイス製造方法 Download PDF

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Publication number
JP2006261606A
JP2006261606A JP2005080587A JP2005080587A JP2006261606A JP 2006261606 A JP2006261606 A JP 2006261606A JP 2005080587 A JP2005080587 A JP 2005080587A JP 2005080587 A JP2005080587 A JP 2005080587A JP 2006261606 A JP2006261606 A JP 2006261606A
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JP
Japan
Prior art keywords
liquid
space
substrate
exposure apparatus
optical system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2005080587A
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English (en)
Japanese (ja)
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JP2006261606A5 (enExample
Inventor
Tatsuya Hayashi
林　　達也
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2005080587A priority Critical patent/JP2006261606A/ja
Priority to US11/375,203 priority patent/US7561249B2/en
Publication of JP2006261606A publication Critical patent/JP2006261606A/ja
Publication of JP2006261606A5 publication Critical patent/JP2006261606A5/ja
Withdrawn legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/42—Projection printing apparatus, e.g. enlarger, copying camera for automatic sequential copying of the same original
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2005080587A 2005-03-18 2005-03-18 露光装置、露光方法及びデバイス製造方法 Withdrawn JP2006261606A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2005080587A JP2006261606A (ja) 2005-03-18 2005-03-18 露光装置、露光方法及びデバイス製造方法
US11/375,203 US7561249B2 (en) 2005-03-18 2006-03-15 Exposure apparatus, exposure method, and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005080587A JP2006261606A (ja) 2005-03-18 2005-03-18 露光装置、露光方法及びデバイス製造方法

Publications (2)

Publication Number Publication Date
JP2006261606A true JP2006261606A (ja) 2006-09-28
JP2006261606A5 JP2006261606A5 (enExample) 2008-08-28

Family

ID=37009938

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005080587A Withdrawn JP2006261606A (ja) 2005-03-18 2005-03-18 露光装置、露光方法及びデバイス製造方法

Country Status (2)

Country Link
US (1) US7561249B2 (enExample)
JP (1) JP2006261606A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008139913A1 (ja) * 2007-05-10 2008-11-20 Nikon Corporation 露光方法及び露光用平板
JP2009200492A (ja) * 2008-02-19 2009-09-03 Asml Netherlands Bv リソグラフィ装置及び方法

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006261606A (ja) 2005-03-18 2006-09-28 Canon Inc 露光装置、露光方法及びデバイス製造方法
JP2006269942A (ja) * 2005-03-25 2006-10-05 Canon Inc 露光装置及びデバイス製造方法
US7385673B2 (en) * 2005-06-10 2008-06-10 International Business Machines Corporation Immersion lithography with equalized pressure on at least projection optics component and wafer
US7969548B2 (en) * 2006-05-22 2011-06-28 Asml Netherlands B.V. Lithographic apparatus and lithographic apparatus cleaning method
JP2008218653A (ja) * 2007-03-02 2008-09-18 Canon Inc 露光装置及びデバイス製造方法
US8654306B2 (en) * 2008-04-14 2014-02-18 Nikon Corporation Exposure apparatus, cleaning method, and device fabricating method
US20110222030A1 (en) * 2010-03-09 2011-09-15 Nanya Technology Corporation Immersion lithographic apparatuses
US20120062858A1 (en) * 2010-04-02 2012-03-15 Nikon Corporation Cleaning method, device manufacturing method, exposure apparatus, and device manufacturing system
JP5241862B2 (ja) 2011-01-01 2013-07-17 キヤノン株式会社 露光装置及びデバイスの製造方法
US20130016041A1 (en) * 2011-07-13 2013-01-17 Kuo-Ching Chiang High Resolution Mouse

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06124873A (ja) 1992-10-09 1994-05-06 Canon Inc 液浸式投影露光装置
JP2753930B2 (ja) * 1992-11-27 1998-05-20 キヤノン株式会社 液浸式投影露光装置
AU2747999A (en) 1998-03-26 1999-10-18 Nikon Corporation Projection exposure method and system
SG121822A1 (en) 2002-11-12 2006-05-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
EP1598855B1 (en) * 2003-02-26 2015-04-22 Nikon Corporation Exposure apparatus and method, and method of producing apparatus
US6954256B2 (en) * 2003-08-29 2005-10-11 Asml Netherlands B.V. Gradient immersion lithography
JP4492539B2 (ja) * 2003-09-29 2010-06-30 株式会社ニコン 液浸型光学系及び投影露光装置、並びにデバイス製造方法
US7880860B2 (en) * 2004-12-20 2011-02-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2006261606A (ja) 2005-03-18 2006-09-28 Canon Inc 露光装置、露光方法及びデバイス製造方法
JP2006269942A (ja) 2005-03-25 2006-10-05 Canon Inc 露光装置及びデバイス製造方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008139913A1 (ja) * 2007-05-10 2008-11-20 Nikon Corporation 露光方法及び露光用平板
JP2009200492A (ja) * 2008-02-19 2009-09-03 Asml Netherlands Bv リソグラフィ装置及び方法

Also Published As

Publication number Publication date
US7561249B2 (en) 2009-07-14
US20060209281A1 (en) 2006-09-21

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