JP2006093721A5

JP2006093721A5 -

Info

Publication number: JP2006093721A5
Application number: JP2005291809A
Authority: JP
Filing date: 2005-10-04
Publication date: 2007-08-23
Anticipated expiration: 2023-06-27

Claims

Includes a projection optical system for projecting a pattern of an original onto a substrate, with the gap filled with liquid between a final surface and the substrate of the projection optical system, an exposure apparatus for exposing a substrate,
A substrate stage movable with respect to the projection optical system and holding the substrate;
A flat plate movable with respect to the projection optical system and having an upper surface substantially the same height as the upper surface of the substrate held by the substrate stage ;
Supply means for supplying the liquid to the gap ;
A recovery means for recovering the liquid from the gap ,
After the exposure of the preceding substrate is completed and before the exposure of the subsequent substrate is started, the liquid supply by the supply means and the liquid by the recovery means are applied to the flat plate opposed to the final surface. An exposure apparatus that performs recovery in parallel with each other .

The pattern of the original plate has a projection optical system for projecting onto the substrate, with the gap filled with liquid between a final surface and the substrate of the projection optical system, an exposure apparatus for exposing a substrate,
A substrate stage movable with respect to the projection optical system and holding the substrate;
A plane plate movable relative to the projection optical system and having an upper surface substantially the same height as the upper surface of the substrate held by the substrate stage;
Supply means for supplying the liquid to the gap;
A recovery means for recovering the liquid from the gap,
An exposure apparatus according to claim 1, wherein the planar plate moves independently of the substrate stage.

During the exchange of the substrate with respect to the substrate stage, the liquid supply by the supply means and the liquid recovery by the recovery means are performed in parallel to the flat plate opposed to the final surface. The exposure apparatus according to claim 1.

The supply means supplies the liquid to a gap between the flat plate opposed to the final surface and the final surface, and the recovery means includes the flat plate opposed to the final surface and the final surface. The exposure apparatus according to claim 2, wherein the liquid is collected from the gap.

The exposure apparatus according to claim 1, wherein the flat plate is disposed on the substrate stage.

After the exposure of the preceding substrate is completed and before the exposure of the subsequent substrate is started, the flat plate is opposed to the final surface, and the substrate is supplied to or recovered from the substrate stage. The exposure apparatus according to claim 1, wherein the exposure apparatus is characterized in that:

After the exposure of the preceding substrate is completed and before the exposure of the succeeding substrate is started, the alignment measurement of the substrate held on the substrate stage is performed with the flat plate facing the final surface. The exposure apparatus according to claim 1, wherein the exposure apparatus performs the exposure.

After the exposure of the preceding substrate is completed and before the exposure of the subsequent substrate is started, the flat plate is opposed to the final surface, and work for maintaining or managing the exposure apparatus is performed. The exposure apparatus according to claim 1, wherein the exposure apparatus is characterized in that:

After the exposure of the preceding substrate is completed and before the exposure of the subsequent substrate is started, the liquid supply amount and the liquid recovery amount with respect to the flat plate opposed to the final surface are the liquid supply at the time of exposure. The exposure apparatus according to claim 1, wherein the exposure apparatus is larger than the amount and the liquid recovery amount.

The exposure apparatus according to any one of claims 1 to 9, wherein the flat plate includes any one of stainless steel and fluororesin.

A master stage that is movable with respect to the projection optical system and holds the master;
11. The substrate according to claim 1, wherein the substrate is exposed through a pattern of the original while the original and the substrate are scanned and moved with respect to the projection optical system. Exposure device.

A step of exposing a substrate using the exposure apparatus according to any one of claims 1 to 11,
And developing the substrate exposed in the step.