JP2007142366A5 - - Google Patents

Download PDF

Info

Publication number
JP2007142366A5
JP2007142366A5 JP2006219032A JP2006219032A JP2007142366A5 JP 2007142366 A5 JP2007142366 A5 JP 2007142366A5 JP 2006219032 A JP2006219032 A JP 2006219032A JP 2006219032 A JP2006219032 A JP 2006219032A JP 2007142366 A5 JP2007142366 A5 JP 2007142366A5
Authority
JP
Japan
Prior art keywords
gas
supply port
exposure apparatus
gas supply
vapor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2006219032A
Other languages
English (en)
Japanese (ja)
Other versions
JP2007142366A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2006219032A priority Critical patent/JP2007142366A/ja
Priority claimed from JP2006219032A external-priority patent/JP2007142366A/ja
Priority to PCT/JP2006/321001 priority patent/WO2007046523A1/en
Priority to US11/994,240 priority patent/US7907251B2/en
Priority to KR1020087001419A priority patent/KR20080022201A/ko
Priority to TW095138405A priority patent/TW200731335A/zh
Publication of JP2007142366A publication Critical patent/JP2007142366A/ja
Publication of JP2007142366A5 publication Critical patent/JP2007142366A5/ja
Withdrawn legal-status Critical Current

Links

JP2006219032A 2005-10-18 2006-08-10 露光装置及びデバイス製造方法 Withdrawn JP2007142366A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2006219032A JP2007142366A (ja) 2005-10-18 2006-08-10 露光装置及びデバイス製造方法
PCT/JP2006/321001 WO2007046523A1 (en) 2005-10-18 2006-10-17 Exposure apparatus and device manufacturing method
US11/994,240 US7907251B2 (en) 2005-10-18 2006-10-17 Exposure apparatus and device manufacturing method
KR1020087001419A KR20080022201A (ko) 2005-10-18 2006-10-17 노광장치 및 디바이스의 제조방법
TW095138405A TW200731335A (en) 2005-10-18 2006-10-18 Exposure apparatus and device manufacturing method

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005302577 2005-10-18
JP2006219032A JP2007142366A (ja) 2005-10-18 2006-08-10 露光装置及びデバイス製造方法

Publications (2)

Publication Number Publication Date
JP2007142366A JP2007142366A (ja) 2007-06-07
JP2007142366A5 true JP2007142366A5 (enExample) 2008-02-28

Family

ID=37962610

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006219032A Withdrawn JP2007142366A (ja) 2005-10-18 2006-08-10 露光装置及びデバイス製造方法

Country Status (5)

Country Link
US (1) US7907251B2 (enExample)
JP (1) JP2007142366A (enExample)
KR (1) KR20080022201A (enExample)
TW (1) TW200731335A (enExample)
WO (1) WO2007046523A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9256136B2 (en) 2010-04-22 2016-02-09 Asml Netherlands B.V. Fluid handling structure, lithographic apparatus and device manufacturing method involving gas supply

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101162938B1 (ko) 2004-04-19 2012-07-05 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
EP2023378B1 (en) * 2006-05-10 2013-03-13 Nikon Corporation Exposure apparatus and device manufacturing method
US8289497B2 (en) * 2008-03-18 2012-10-16 Nikon Corporation Apparatus and methods for recovering fluid in immersion lithography
NL1036631A1 (nl) 2008-03-24 2009-09-25 Asml Netherlands Bv Immersion Lithographic Apparatus and Device Manufacturing Method.
KR101712219B1 (ko) * 2009-03-10 2017-03-03 가부시키가이샤 니콘 노광 장치, 노광 방법, 및 디바이스 제조 방법
JP5016705B2 (ja) 2009-06-09 2012-09-05 エーエスエムエル ネザーランズ ビー．ブイ． 流体ハンドリング構造
NL2005089A (nl) 2009-09-23 2011-03-28 Asml Netherlands Bv Fluid handling structure, lithographic apparatus and device manufacturing method.
NL2005655A (en) 2009-12-09 2011-06-14 Asml Netherlands Bv A lithographic apparatus and a device manufacturing method.
NL2006054A (en) 2010-02-09 2011-08-10 Asml Netherlands Bv Fluid handling structure, lithographic apparatus and device manufacturing method.
NL2007182A (en) * 2010-08-23 2012-02-27 Asml Netherlands Bv Fluid handling structure, module for an immersion lithographic apparatus, lithographic apparatus and device manufacturing method.
EP2423749B1 (en) 2010-08-24 2013-09-11 ASML Netherlands BV A lithographic apparatus and device manufacturing method
NL2007453A (en) 2010-10-18 2012-04-19 Asml Netherlands Bv A fluid handling structure, a lithographic apparatus and a device manufacturing method.
NL2008199A (en) 2011-02-28 2012-08-29 Asml Netherlands Bv A fluid handling structure, a lithographic apparatus and a device manufacturing method.
NL2008979A (en) 2011-07-11 2013-01-14 Asml Netherlands Bv A fluid handling structure, a lithographic apparatus and a device manufacturing method.
US9256137B2 (en) * 2011-08-25 2016-02-09 Nikon Corporation Exposure apparatus, liquid holding method, and device manufacturing method
US20130050666A1 (en) * 2011-08-26 2013-02-28 Nikon Corporation Exposure apparatus, liquid holding method, and device manufacturing method
NL2009271A (en) * 2011-09-15 2013-03-18 Asml Netherlands Bv A fluid handling structure, a lithographic apparatus and a device manufacturing method.
NL2009378A (en) 2011-10-07 2013-04-09 Asml Netherlands Bv Lithographic apparatus and method of cooling a component in a lithographic apparatus.
NL2009899A (en) * 2011-12-20 2013-06-24 Asml Netherlands Bv A pump system, a carbon dioxide supply system, an extraction system, a lithographic apparatus and a device manufacturing method.
US10551748B2 (en) 2014-12-19 2020-02-04 Asml Netherlands B.V. Fluid handling structure, a lithographic apparatus and a device manufacturing method
JP6503606B2 (ja) * 2015-10-29 2019-04-24 国立研究開発法人産業技術総合研究所 インプリント装置
US11372336B2 (en) 2016-12-14 2022-06-28 Asml Netherlands B.V. Lithography apparatus and device manufacturing method
US10503085B2 (en) * 2017-11-16 2019-12-10 Taiwan Semiconductor Manufacturing Co., Ltd. Lithography apparatus and method
JP7166089B2 (ja) * 2018-06-29 2022-11-07 東京エレクトロン株式会社 基板処理装置、基板処理システムおよび基板処理方法
WO2021047911A1 (en) 2019-09-13 2021-03-18 Asml Netherlands B.V. Fluid handling system and lithographic apparatus
CN112684665B (zh) * 2020-12-25 2024-06-25 浙江启尔机电技术有限公司 一种浸液供给回收装置

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU2747999A (en) 1998-03-26 1999-10-18 Nikon Corporation Projection exposure method and system
KR100585476B1 (ko) * 2002-11-12 2006-06-07 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치 및 디바이스 제조방법
JP4184346B2 (ja) * 2002-12-13 2008-11-19 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ 層上のスポットを照射するための方法及び装置における液体除去
WO2004086470A1 (ja) 2003-03-25 2004-10-07 Nikon Corporation 露光装置及びデバイス製造方法
KR101177331B1 (ko) 2003-04-09 2012-08-30 가부시키가이샤 니콘 액침 리소그래피 유체 제어 시스템
EP1498778A1 (en) * 2003-06-27 2005-01-19 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
US7352433B2 (en) 2003-10-28 2008-04-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2005183744A (ja) 2003-12-22 2005-07-07 Nikon Corp 露光装置及びデバイス製造方法
KR101204157B1 (ko) * 2004-01-20 2012-11-22 칼 짜이스 에스엠테 게엠베하 마이크로 리소그래픽 투영 노광 장치 및 그 투영 렌즈를 위한 측정 장치
WO2006101120A1 (ja) * 2005-03-23 2006-09-28 Nikon Corporation 露光装置及び露光方法、並びにデバイス製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9256136B2 (en) 2010-04-22 2016-02-09 Asml Netherlands B.V. Fluid handling structure, lithographic apparatus and device manufacturing method involving gas supply

Similar Documents

Publication Publication Date Title
JP2007142366A5 (enExample)
JP2011044736A5 (ja) 露光装置、露光方法、及びデバイス製造方法
JP2005085789A5 (enExample)
TW200731335A (en) Exposure apparatus and device manufacturing method
JP2005197384A5 (enExample)
ATE513309T1 (de) Belichtungsvorrichtung und verfahren zur bauelementeherstellung
SG142213A1 (en) Etching of nano-imprint templates using an etch reactor
TW200745727A (en) Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system
TW200832050A (en) Method for cleaning photo mask
TWI471901B (zh) 浸漬微影蝕刻系統
JP2004289151A5 (enExample)
TWI297174B (enExample)
JP2008288589A5 (ja) 露光装置、及びデバイス製造方法
TW200745769A (en) Photo apparatus and method
TW200700927A (en) Lithographic device, device manufacturing method and device manufactured thereby
SG143284A1 (en) Lithographic apparatus and device manufacturing method
JP2006270057A5 (enExample)
TW200729292A (en) Apparatus for preserving and using at least one photolithograph projection photo mask and the method using the same in the exposure apparatus
TW200842501A (en) Exposure method and apparatus for reducing photomask haze via ventilation
GB0413110D0 (en) Cooling apparatus
JP2005150533A5 (enExample)
TW200702801A (en) Method of forming bank, method of forming film pattern, semiconductor device, electro optic device, and electronic apparatus
TW200801831A (en) Exposure apparatus, exposure method, and exposure system
JP2005322765A5 (enExample)
EP1669806A3 (en) Lithographic apparatus, reticle exchange unit and device manufacturing method