JP2005150533A5 - - Google Patents

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Publication number
JP2005150533A5
JP2005150533A5 JP2003388198A JP2003388198A JP2005150533A5 JP 2005150533 A5 JP2005150533 A5 JP 2005150533A5 JP 2003388198 A JP2003388198 A JP 2003388198A JP 2003388198 A JP2003388198 A JP 2003388198A JP 2005150533 A5 JP2005150533 A5 JP 2005150533A5
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JP
Japan
Prior art keywords
gas
recovery
port
recovery port
cover
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2003388198A
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English (en)
Japanese (ja)
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JP2005150533A (ja
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Publication date
Application filed filed Critical
Priority to JP2003388198A priority Critical patent/JP2005150533A/ja
Priority claimed from JP2003388198A external-priority patent/JP2005150533A/ja
Priority to US10/988,514 priority patent/US7218377B2/en
Publication of JP2005150533A publication Critical patent/JP2005150533A/ja
Publication of JP2005150533A5 publication Critical patent/JP2005150533A5/ja
Priority to US11/688,955 priority patent/US7538852B2/en
Withdrawn legal-status Critical Current

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JP2003388198A 2003-11-18 2003-11-18 露光装置 Withdrawn JP2005150533A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2003388198A JP2005150533A (ja) 2003-11-18 2003-11-18 露光装置
US10/988,514 US7218377B2 (en) 2003-11-18 2004-11-16 Exposure apparatus and device manufacturing method
US11/688,955 US7538852B2 (en) 2003-11-18 2007-03-21 Exposure apparatus and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003388198A JP2005150533A (ja) 2003-11-18 2003-11-18 露光装置

Publications (2)

Publication Number Publication Date
JP2005150533A JP2005150533A (ja) 2005-06-09
JP2005150533A5 true JP2005150533A5 (enExample) 2007-01-11

Family

ID=34567470

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003388198A Withdrawn JP2005150533A (ja) 2003-11-18 2003-11-18 露光装置

Country Status (2)

Country Link
US (2) US7218377B2 (enExample)
JP (1) JP2005150533A (enExample)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7446849B2 (en) * 2004-07-22 2008-11-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4614386B2 (ja) * 2005-02-04 2011-01-19 キヤノン株式会社 位置決め装置、露光装置およびそれを用いたデバイス製造方法
JP4125315B2 (ja) * 2005-10-11 2008-07-30 キヤノン株式会社 露光装置及びデバイス製造方法
JP5448724B2 (ja) * 2009-10-29 2014-03-19 キヤノン株式会社 露光装置及びデバイスの製造方法
NL2006243A (en) * 2010-03-19 2011-09-20 Asml Netherlands Bv A lithographic apparatus, an illumination system, a projection system and a method of manufacturing a device using a lithographic apparatus.
KR101919963B1 (ko) * 2011-02-21 2018-11-19 어플라이드 머티어리얼스, 인코포레이티드 레이저 프로세싱 시스템들에서의 주변 층류 가스 유동 분포
US11267012B2 (en) * 2014-06-25 2022-03-08 Universal Display Corporation Spatial control of vapor condensation using convection
US11220737B2 (en) 2014-06-25 2022-01-11 Universal Display Corporation Systems and methods of modulating flow during vapor jet deposition of organic materials
EP2960059B1 (en) 2014-06-25 2018-10-24 Universal Display Corporation Systems and methods of modulating flow during vapor jet deposition of organic materials
US10566534B2 (en) 2015-10-12 2020-02-18 Universal Display Corporation Apparatus and method to deliver organic material via organic vapor-jet printing (OVJP)
KR102362600B1 (ko) * 2016-07-29 2022-02-15 유니버셜 디스플레이 코포레이션 증착 노즐
CN109283797B (zh) * 2017-07-21 2021-04-30 上海微电子装备（集团）股份有限公司 物镜保护装置、物镜系统以及光刻设备
CN107255907B (zh) * 2017-08-17 2021-01-22 京东方科技集团股份有限公司 一种补偿装置、曝光装置及曝光补偿方法
CN111712766B (zh) * 2018-02-16 2024-04-02 Asml荷兰有限公司 包括气锁的设备
CN112987505B (zh) * 2021-02-23 2022-07-01 青岛芯微半导体科技有限公司 一种晶圆光刻设备

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5997963A (en) 1998-05-05 1999-12-07 Ultratech Stepper, Inc. Microchamber
JP2001118783A (ja) * 1999-10-21 2001-04-27 Nikon Corp 露光方法及び装置、並びにデバイス製造方法
US6933513B2 (en) 1999-11-05 2005-08-23 Asml Netherlands B.V. Gas flushing system for use in lithographic apparatus
TW480372B (en) 1999-11-05 2002-03-21 Asm Lithography Bv Lithographic projection apparatus, method of manufacturing a device using the apparatus, and device manufactured according to the method
TW563002B (en) 1999-11-05 2003-11-21 Asml Netherlands Bv Lithographic projection apparatus, method of manufacturing a device using a lithographic projection apparatus, and device manufactured by the method
JP2001358056A (ja) * 2000-06-15 2001-12-26 Canon Inc 露光装置
JP2003115451A (ja) * 2001-07-30 2003-04-18 Canon Inc 露光装置及びそれを用いたデバイスの製造方法
JP2003053892A (ja) 2001-08-20 2003-02-26 Eidai Co Ltd 化粧板
EP1571697A4 (en) * 2002-12-10 2007-07-04 Nikon Corp EXPOSURE SYSTEM AND DEVICE PRODUCTION METHOD
JP4289906B2 (ja) 2003-02-28 2009-07-01 キヤノン株式会社 露光装置
KR101345474B1 (ko) * 2003-03-25 2013-12-27 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
CN101061429B (zh) * 2003-04-10 2015-02-04 株式会社尼康 包括用于沉浸光刻装置的真空清除的环境系统

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