JP2005150533A - 露光装置 - Google Patents

露光装置 Download PDF

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Publication number
JP2005150533A
JP2005150533A JP2003388198A JP2003388198A JP2005150533A JP 2005150533 A JP2005150533 A JP 2005150533A JP 2003388198 A JP2003388198 A JP 2003388198A JP 2003388198 A JP2003388198 A JP 2003388198A JP 2005150533 A JP2005150533 A JP 2005150533A
Authority
JP
Japan
Prior art keywords
cover
purge gas
port
flow rate
recovery
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2003388198A
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English (en)
Japanese (ja)
Other versions
JP2005150533A5 (enExample
Inventor
Takashi Chibana
貴史 知花
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2003388198A priority Critical patent/JP2005150533A/ja
Priority to US10/988,514 priority patent/US7218377B2/en
Publication of JP2005150533A publication Critical patent/JP2005150533A/ja
Publication of JP2005150533A5 publication Critical patent/JP2005150533A5/ja
Priority to US11/688,955 priority patent/US7538852B2/en
Withdrawn legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants

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  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2003388198A 2003-11-18 2003-11-18 露光装置 Withdrawn JP2005150533A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2003388198A JP2005150533A (ja) 2003-11-18 2003-11-18 露光装置
US10/988,514 US7218377B2 (en) 2003-11-18 2004-11-16 Exposure apparatus and device manufacturing method
US11/688,955 US7538852B2 (en) 2003-11-18 2007-03-21 Exposure apparatus and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003388198A JP2005150533A (ja) 2003-11-18 2003-11-18 露光装置

Publications (2)

Publication Number Publication Date
JP2005150533A true JP2005150533A (ja) 2005-06-09
JP2005150533A5 JP2005150533A5 (enExample) 2007-01-11

Family

ID=34567470

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003388198A Withdrawn JP2005150533A (ja) 2003-11-18 2003-11-18 露光装置

Country Status (2)

Country Link
US (2) US7218377B2 (enExample)
JP (1) JP2005150533A (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011096859A (ja) * 2009-10-29 2011-05-12 Canon Inc 露光装置及びデバイスの製造方法
JP2011199284A (ja) * 2010-03-19 2011-10-06 Asml Netherlands Bv リソグラフィ装置、照明システム、投影システム、及びリソグラフィ装置を使用してデバイスを製造する方法
CN106229264A (zh) * 2011-02-21 2016-12-14 应用材料公司 在激光处理系统中的周围层气流分布

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7446849B2 (en) * 2004-07-22 2008-11-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4614386B2 (ja) * 2005-02-04 2011-01-19 キヤノン株式会社 位置決め装置、露光装置およびそれを用いたデバイス製造方法
JP4125315B2 (ja) * 2005-10-11 2008-07-30 キヤノン株式会社 露光装置及びデバイス製造方法
US11267012B2 (en) * 2014-06-25 2022-03-08 Universal Display Corporation Spatial control of vapor condensation using convection
US11220737B2 (en) 2014-06-25 2022-01-11 Universal Display Corporation Systems and methods of modulating flow during vapor jet deposition of organic materials
EP2960059B1 (en) 2014-06-25 2018-10-24 Universal Display Corporation Systems and methods of modulating flow during vapor jet deposition of organic materials
US10566534B2 (en) 2015-10-12 2020-02-18 Universal Display Corporation Apparatus and method to deliver organic material via organic vapor-jet printing (OVJP)
KR102362600B1 (ko) * 2016-07-29 2022-02-15 유니버셜 디스플레이 코포레이션 증착 노즐
CN109283797B (zh) * 2017-07-21 2021-04-30 上海微电子装备（集团）股份有限公司 物镜保护装置、物镜系统以及光刻设备
CN107255907B (zh) * 2017-08-17 2021-01-22 京东方科技集团股份有限公司 一种补偿装置、曝光装置及曝光补偿方法
CN111712766B (zh) * 2018-02-16 2024-04-02 Asml荷兰有限公司 包括气锁的设备
CN112987505B (zh) * 2021-02-23 2022-07-01 青岛芯微半导体科技有限公司 一种晶圆光刻设备

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5997963A (en) 1998-05-05 1999-12-07 Ultratech Stepper, Inc. Microchamber
JP2001118783A (ja) * 1999-10-21 2001-04-27 Nikon Corp 露光方法及び装置、並びにデバイス製造方法
US6933513B2 (en) 1999-11-05 2005-08-23 Asml Netherlands B.V. Gas flushing system for use in lithographic apparatus
TW480372B (en) 1999-11-05 2002-03-21 Asm Lithography Bv Lithographic projection apparatus, method of manufacturing a device using the apparatus, and device manufactured according to the method
TW563002B (en) 1999-11-05 2003-11-21 Asml Netherlands Bv Lithographic projection apparatus, method of manufacturing a device using a lithographic projection apparatus, and device manufactured by the method
JP2001358056A (ja) * 2000-06-15 2001-12-26 Canon Inc 露光装置
JP2003115451A (ja) * 2001-07-30 2003-04-18 Canon Inc 露光装置及びそれを用いたデバイスの製造方法
JP2003053892A (ja) 2001-08-20 2003-02-26 Eidai Co Ltd 化粧板
EP1571697A4 (en) * 2002-12-10 2007-07-04 Nikon Corp EXPOSURE SYSTEM AND DEVICE PRODUCTION METHOD
JP4289906B2 (ja) 2003-02-28 2009-07-01 キヤノン株式会社 露光装置
KR101345474B1 (ko) * 2003-03-25 2013-12-27 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
CN101061429B (zh) * 2003-04-10 2015-02-04 株式会社尼康 包括用于沉浸光刻装置的真空清除的环境系统

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011096859A (ja) * 2009-10-29 2011-05-12 Canon Inc 露光装置及びデバイスの製造方法
JP2011199284A (ja) * 2010-03-19 2011-10-06 Asml Netherlands Bv リソグラフィ装置、照明システム、投影システム、及びリソグラフィ装置を使用してデバイスを製造する方法
US8810769B2 (en) 2010-03-19 2014-08-19 Asml Netherlands B.V. Lithographic apparatus, an illumination system, a projection system and a method of manufacturing a device using a lithographic apparatus
CN106229264A (zh) * 2011-02-21 2016-12-14 应用材料公司 在激光处理系统中的周围层气流分布
KR101919963B1 (ko) * 2011-02-21 2018-11-19 어플라이드 머티어리얼스, 인코포레이티드 레이저 프로세싱 시스템들에서의 주변 층류 가스 유동 분포

Also Published As

Publication number Publication date
US20070159608A1 (en) 2007-07-12
US20050105067A1 (en) 2005-05-19
US7538852B2 (en) 2009-05-26
US7218377B2 (en) 2007-05-15

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