JP2004289151A5 - - Google Patents

Download PDF

Info

Publication number
JP2004289151A5
JP2004289151A5 JP2004076081A JP2004076081A JP2004289151A5 JP 2004289151 A5 JP2004289151 A5 JP 2004289151A5 JP 2004076081 A JP2004076081 A JP 2004076081A JP 2004076081 A JP2004076081 A JP 2004076081A JP 2004289151 A5 JP2004289151 A5 JP 2004289151A5
Authority
JP
Japan
Prior art keywords
gas
chamber
storage device
light
pumping
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2004076081A
Other languages
English (en)
Japanese (ja)
Other versions
JP3957695B2 (ja
JP2004289151A (ja
Filing date
Publication date
Priority claimed from US10/392,793 external-priority patent/US6919573B2/en
Application filed filed Critical
Publication of JP2004289151A publication Critical patent/JP2004289151A/ja
Publication of JP2004289151A5 publication Critical patent/JP2004289151A5/ja
Application granted granted Critical
Publication of JP3957695B2 publication Critical patent/JP3957695B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2004076081A 2003-03-20 2004-03-17 リソグラフィツールにおいて使用されるガスをリサイクルするための方法及び装置 Expired - Fee Related JP3957695B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/392,793 US6919573B2 (en) 2003-03-20 2003-03-20 Method and apparatus for recycling gases used in a lithography tool

Publications (3)

Publication Number Publication Date
JP2004289151A JP2004289151A (ja) 2004-10-14
JP2004289151A5 true JP2004289151A5 (enExample) 2005-05-26
JP3957695B2 JP3957695B2 (ja) 2007-08-15

Family

ID=32824890

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004076081A Expired - Fee Related JP3957695B2 (ja) 2003-03-20 2004-03-17 リソグラフィツールにおいて使用されるガスをリサイクルするための方法及び装置

Country Status (7)

Country Link
US (2) US6919573B2 (enExample)
EP (1) EP1460479A3 (enExample)
JP (1) JP3957695B2 (enExample)
KR (1) KR100730675B1 (enExample)
CN (1) CN1275099C (enExample)
SG (1) SG115636A1 (enExample)
TW (1) TW200421018A (enExample)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7856044B2 (en) 1999-05-10 2010-12-21 Cymer, Inc. Extendable electrode for gas discharge laser
US7671349B2 (en) * 2003-04-08 2010-03-02 Cymer, Inc. Laser produced plasma EUV light source
US6770895B2 (en) * 2002-11-21 2004-08-03 Asml Holding N.V. Method and apparatus for isolating light source gas from main chamber gas in a lithography tool
US6919573B2 (en) * 2003-03-20 2005-07-19 Asml Holding N.V Method and apparatus for recycling gases used in a lithography tool
JP4763684B2 (ja) * 2004-03-31 2011-08-31 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ 放射線源により生じる粒子の除去
US8094288B2 (en) 2004-05-11 2012-01-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4710463B2 (ja) * 2005-07-21 2011-06-29 ウシオ電機株式会社 極端紫外光発生装置
US7696492B2 (en) * 2006-12-13 2010-04-13 Asml Netherlands B.V. Radiation system and lithographic apparatus
US7894037B2 (en) * 2007-07-30 2011-02-22 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7812329B2 (en) 2007-12-14 2010-10-12 Cymer, Inc. System managing gas flow between chambers of an extreme ultraviolet (EUV) photolithography apparatus
US7655925B2 (en) * 2007-08-31 2010-02-02 Cymer, Inc. Gas management system for a laser-produced-plasma EUV light source
TWI402628B (zh) * 2007-08-31 2013-07-21 Cymer Inc 控管極遠紫外線（ｅｕｖ）光微影裝置腔室間之氣體流動的系統
US8115900B2 (en) * 2007-09-17 2012-02-14 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
NL1036153A1 (nl) * 2007-11-08 2009-05-11 Asml Netherlands Bv Method and system for determining a suppression factor of a suppression system and a lithographic apparatus.
NL1036181A1 (nl) * 2007-11-30 2009-06-04 Asml Netherlands Bv A lithographic apparatus, a projection system and a device manufacturing method.
JP5339742B2 (ja) * 2008-03-04 2013-11-13 ウシオ電機株式会社 極端紫外光が出射する装置と極端紫外光が導入される装置との接続装置
US8519366B2 (en) 2008-08-06 2013-08-27 Cymer, Inc. Debris protection system having a magnetic field for an EUV light source
JP5559562B2 (ja) 2009-02-12 2014-07-23 ギガフォトン株式会社 極端紫外光光源装置
JP5578482B2 (ja) * 2009-09-01 2014-08-27 株式会社Ｉｈｉ Ｌｐｐ方式のｅｕｖ光源とその発生方法
JP5578483B2 (ja) * 2009-09-01 2014-08-27 株式会社Ｉｈｉ Ｌｐｐ方式のｅｕｖ光源とその発生方法
JP5687488B2 (ja) 2010-02-22 2015-03-18 ギガフォトン株式会社 極端紫外光生成装置
US8587768B2 (en) * 2010-04-05 2013-11-19 Media Lario S.R.L. EUV collector system with enhanced EUV radiation collection
US8686381B2 (en) 2010-06-28 2014-04-01 Media Lario S.R.L. Source-collector module with GIC mirror and tin vapor LPP target system
EP2533078B1 (en) * 2011-06-09 2014-02-12 ASML Netherlands BV Radiation source and lithographic apparatus
US9389180B2 (en) 2013-02-15 2016-07-12 Kla-Tencor Corporation Methods and apparatus for use with extreme ultraviolet light having contamination protection
US9585236B2 (en) 2013-05-03 2017-02-28 Media Lario Srl Sn vapor EUV LLP source system for EUV lithography
WO2024044165A1 (en) * 2022-08-24 2024-02-29 Lam Research Corporation A plasma processing system with a gas recycling system

Family Cites Families (41)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2195070B (en) * 1986-09-11 1991-04-03 Hoya Corp Laser plasma x-ray generator capable of continuously generating x-rays
US5103102A (en) 1989-02-24 1992-04-07 Micrion Corporation Localized vacuum apparatus and method
DE69535412D1 (de) 1994-04-08 2007-04-12 Canon Kk Verarbeitungssystem zur Herstellung von Halbleiterbauelementen
US6341006B1 (en) * 1995-04-07 2002-01-22 Nikon Corporation Projection exposure apparatus
ATE228101T1 (de) 1996-08-27 2002-12-15 Boc Group Inc Rückgewinnung von edelgasen
US6133577A (en) * 1997-02-04 2000-10-17 Advanced Energy Systems, Inc. Method and apparatus for producing extreme ultra-violet light for use in photolithography
JPH10221499A (ja) 1997-02-07 1998-08-21 Hitachi Ltd レーザプラズマｘ線源およびそれを用いた半導体露光装置並びに半導体露光方法
US6031241A (en) 1997-03-11 2000-02-29 University Of Central Florida Capillary discharge extreme ultraviolet lamp source for EUV microlithography and other related applications
US6586757B2 (en) * 1997-05-12 2003-07-01 Cymer, Inc. Plasma focus light source with active and buffer gas control
US6064072A (en) * 1997-05-12 2000-05-16 Cymer, Inc. Plasma focus high energy photon source
US6566667B1 (en) * 1997-05-12 2003-05-20 Cymer, Inc. Plasma focus light source with improved pulse power system
US6376329B1 (en) * 1997-08-04 2002-04-23 Nikon Corporation Semiconductor wafer alignment using backside illumination
JPH11204411A (ja) 1998-01-19 1999-07-30 Nikon Corp 塗布現像露光装置
WO1999063790A1 (en) 1998-05-29 1999-12-09 Nikon Corporation Laser-excited plasma light source, exposure apparatus and its manufacturing method, and device manufacturing method
EP0981066A1 (de) 1998-08-20 2000-02-23 Gretag Imaging Ag Lichtdichtesteuerung mittels LCD-Einrichtung
US6385290B1 (en) 1998-09-14 2002-05-07 Nikon Corporation X-ray apparatus
JP2001108799A (ja) * 1999-10-08 2001-04-20 Nikon Corp Ｘ線発生装置、ｘ線露光装置及び半導体デバイスの製造方法
EP1098226A3 (en) 1999-11-05 2002-01-09 Asm Lithography B.V. Lithographic apparatus with gas flushing system
TWI246872B (en) * 1999-12-17 2006-01-01 Asml Netherlands Bv Radiation source for use in lithographic projection apparatus
TW508980B (en) 1999-12-23 2002-11-01 Koninkl Philips Electronics Nv Method of generating extremely short-wave radiation, method of manufacturing a device by means of said radiation, extremely short-wave radiation source unit and lithographic projection apparatus provided with such a radiation source unit
US6493423B1 (en) * 1999-12-24 2002-12-10 Koninklijke Philips Electronics N.V. Method of generating extremely short-wave radiation, method of manufacturing a device by means of said radiation, extremely short-wave radiation source unit and lithographic projection apparatus provided with such a radiation source unit
JP2001345263A (ja) * 2000-03-31 2001-12-14 Nikon Corp 露光装置及び露光方法、並びにデバイス製造方法
DE60130754T2 (de) 2000-05-03 2008-01-24 Asml Holding, N.V. Apparat zur Erzeugung eines gespülten optischen Weges in einer photolithographischen Projektionsanlage sowie ein entsprechendes Verfahren
EP1186958B1 (en) 2000-09-04 2007-03-14 ASML Netherlands B.V. Lithographic projection apparatus
DE10061248B4 (de) * 2000-12-09 2004-02-26 Carl Zeiss Verfahren und Vorrichtung zur In-situ-Dekontamination eines EUV-Lithographiegerätes
US6576912B2 (en) * 2001-01-03 2003-06-10 Hugo M. Visser Lithographic projection apparatus equipped with extreme ultraviolet window serving simultaneously as vacuum window
JPWO2002056332A1 (ja) * 2001-01-10 2004-05-20 株式会社荏原製作所 電子線による検査装置、検査方法、及びその検査装置を用いたデバイス製造方法
US6614505B2 (en) 2001-01-10 2003-09-02 Asml Netherlands B.V. Lithographic projection apparatus, device manufacturing method, and device manufactured thereby
JP2002289585A (ja) 2001-03-26 2002-10-04 Ebara Corp 中性粒子ビーム処理装置
DE10134033A1 (de) 2001-04-06 2002-10-17 Fraunhofer Ges Forschung Verfahren und Vorrichtung zum Erzeugen von Extrem-Ultraviolettstrahlung/weicher Röntgenstrahlung
DE10139677A1 (de) 2001-04-06 2002-10-17 Fraunhofer Ges Forschung Verfahren und Vorrichtung zum Erzeugen von extrem ultravioletter Strahlung und weicher Röntgenstrahlung
JP2004519868A (ja) 2001-04-17 2004-07-02 コーニンクレッカ　フィリップス　エレクトロニクス　エヌ　ヴィ Ｅｕｖに透明な境界構造
US6895145B2 (en) * 2001-08-02 2005-05-17 Edward Ho Apparatus and method for collecting light
WO2003034153A2 (en) 2001-10-12 2003-04-24 Koninklijke Philips Electronics N.V. Lithographic apparatus and device manufacturing method
US6762424B2 (en) * 2002-07-23 2004-07-13 Intel Corporation Plasma generation
DE10238096B3 (de) 2002-08-21 2004-02-19 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Gasentladungslampe
US6770895B2 (en) 2002-11-21 2004-08-03 Asml Holding N.V. Method and apparatus for isolating light source gas from main chamber gas in a lithography tool
DE10256663B3 (de) 2002-12-04 2005-10-13 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Gasentladungslampe für EUV-Strahlung
DE10310623B8 (de) 2003-03-10 2005-12-01 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren und Vorrichtung zum Erzeugen eines Plasmas durch elektrische Entladung in einem Entladungsraum
EP1606980B1 (en) 2003-03-18 2010-08-04 Philips Intellectual Property & Standards GmbH Device for and method of generating extreme ultraviolet and/or soft x-ray radiation by means of a plasma
US6919573B2 (en) 2003-03-20 2005-07-19 Asml Holding N.V Method and apparatus for recycling gases used in a lithography tool

Similar Documents

Publication Publication Date Title
JP2004289151A5 (enExample)
ES2634539T3 (es) Dispositivo para terapia por inhalación
ES2565021T3 (es) Composición de resina fotosensible, placa de impresión flexográfica y procedimiento para producir una placa de impresión flexográfica
JP2008541989A5 (enExample)
NL1031673A1 (nl) Lichtbronmodule en beeldprojectie-inrichting waarin deze wordt gebruikt.
EP1726028A4 (en) EXTREME ULTRAVIOLET LIGHT SOURCE FOR PLASMA PRODUCED BY LASER WITH HIGH FREQUENCY REPRESENTING PULSES
JP2006135298A5 (enExample)
TW200834246A (en) Optical arrangement, in particular projection exposure apparatus for EUV lithography, as well as reflective optical element with reduced contamination
JP2008518480A5 (enExample)
ATE356531T1 (de) Verfahren und vorrichtung zur herstellung von extrem-ultraviolettstrahlung oder weicher röntgenstrahlung
WO2009047683A3 (en) Lighting device, array of lighting devices and optical projection device
JP2005286026A5 (enExample)
JP2005532680A5 (enExample)
JP2011530823A5 (enExample)
ES2499391T3 (es) Método para la producción de anticuerpos
EP2093592A4 (en) ANTIBLEND FILM, DISPLAY DAMIT, LIGHT DIFFUSION FILM AND SURFACE LIGHT SOURCE SYSTEM THEREWITH
JP2017168252A5 (enExample)
JP2009522599A5 (enExample)
ATE499668T1 (de) Verteilte und wiederholte bildwiederherstellung
JP2011129376A5 (enExample)
TW200632582A (en) Polarized radiation in lithographic apparatus and device manufacturing method
ES2505643T3 (es) Galectina para uso en el tratamiento del síndrome del ojo seco
ES2537517T3 (es) Adsorbente de los componentes del humo de la corriente principal del cigarrillo y filtro del cigarrillo
EP1602116A4 (en) DISCHARGE PRODUCTION PLASMA EUV LIGHT SOURCE
EP2455808A3 (en) Projector device