JP3957695B2 - リソグラフィツールにおいて使用されるガスをリサイクルするための方法及び装置 - Google Patents

リソグラフィツールにおいて使用されるガスをリサイクルするための方法及び装置 Download PDF

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Publication number
JP3957695B2
JP3957695B2 JP2004076081A JP2004076081A JP3957695B2 JP 3957695 B2 JP3957695 B2 JP 3957695B2 JP 2004076081 A JP2004076081 A JP 2004076081A JP 2004076081 A JP2004076081 A JP 2004076081A JP 3957695 B2 JP3957695 B2 JP 3957695B2
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Japan
Prior art keywords
gas
chamber
light
recycling
group
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Expired - Fee Related
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JP2004076081A
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Japanese (ja)
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JP2004289151A5 (enExample
JP2004289151A (ja
Inventor
ルー スティーヴン
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ASML Holding NV
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ASML Holding NV
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants
    • A—HUMAN NECESSITIES
    • A44—HABERDASHERY; JEWELLERY
    • A44B—BUTTONS, PINS, BUCKLES, SLIDE FASTENERS, OR THE LIKE
    • A44B15/00—Key-rings
    • A44B15/005—Fobs
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70841—Constructional issues related to vacuum environment, e.g. load-lock chamber
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Public Health (AREA)
  • Epidemiology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Toxicology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • X-Ray Techniques (AREA)
JP2004076081A 2003-03-20 2004-03-17 リソグラフィツールにおいて使用されるガスをリサイクルするための方法及び装置 Expired - Fee Related JP3957695B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/392,793 US6919573B2 (en) 2003-03-20 2003-03-20 Method and apparatus for recycling gases used in a lithography tool

Publications (3)

Publication Number Publication Date
JP2004289151A JP2004289151A (ja) 2004-10-14
JP2004289151A5 JP2004289151A5 (enExample) 2005-05-26
JP3957695B2 true JP3957695B2 (ja) 2007-08-15

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Family Applications (1)

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JP2004076081A Expired - Fee Related JP3957695B2 (ja) 2003-03-20 2004-03-17 リソグラフィツールにおいて使用されるガスをリサイクルするための方法及び装置

Country Status (7)

Country Link
US (2) US6919573B2 (enExample)
EP (1) EP1460479A3 (enExample)
JP (1) JP3957695B2 (enExample)
KR (1) KR100730675B1 (enExample)
CN (1) CN1275099C (enExample)
SG (1) SG115636A1 (enExample)
TW (1) TW200421018A (enExample)

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US7655925B2 (en) * 2007-08-31 2010-02-02 Cymer, Inc. Gas management system for a laser-produced-plasma EUV light source
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US8115900B2 (en) * 2007-09-17 2012-02-14 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
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Also Published As

Publication number Publication date
SG115636A1 (en) 2005-10-28
KR20040083013A (ko) 2004-09-30
TW200421018A (en) 2004-10-16
CN1532634A (zh) 2004-09-29
CN1275099C (zh) 2006-09-13
US20040183030A1 (en) 2004-09-23
KR100730675B1 (ko) 2007-06-21
EP1460479A2 (en) 2004-09-22
JP2004289151A (ja) 2004-10-14
EP1460479A3 (en) 2006-02-01
US20050263720A1 (en) 2005-12-01
US6919573B2 (en) 2005-07-19
US7135693B2 (en) 2006-11-14

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