CN1275099C - 回收平版印刷工具中所用气体的方法和装置 - Google Patents

回收平版印刷工具中所用气体的方法和装置 Download PDF

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Publication number
CN1275099C
CN1275099C CNB2004100301471A CN200410030147A CN1275099C CN 1275099 C CN1275099 C CN 1275099C CN B2004100301471 A CNB2004100301471 A CN B2004100301471A CN 200410030147 A CN200410030147 A CN 200410030147A CN 1275099 C CN1275099 C CN 1275099C
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CN
China
Prior art keywords
gas
gases
room
retracting device
light
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Expired - Fee Related
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CNB2004100301471A
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English (en)
Chinese (zh)
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CN1532634A (zh
Inventor
斯蒂芬·鲁
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ASML Holding NV
ASML Netherlands BV
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ASML Holding NV
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Publication of CN1532634A publication Critical patent/CN1532634A/zh
Application granted granted Critical
Publication of CN1275099C publication Critical patent/CN1275099C/zh
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants
    • A—HUMAN NECESSITIES
    • A44—HABERDASHERY; JEWELLERY
    • A44B—BUTTONS, PINS, BUCKLES, SLIDE FASTENERS, OR THE LIKE
    • A44B15/00—Key-rings
    • A44B15/005—Fobs
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70841—Constructional issues related to vacuum environment, e.g. load-lock chamber
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Public Health (AREA)
  • Epidemiology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Toxicology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • X-Ray Techniques (AREA)
CNB2004100301471A 2003-03-20 2004-03-19 回收平版印刷工具中所用气体的方法和装置 Expired - Fee Related CN1275099C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/392,793 2003-03-20
US10/392,793 US6919573B2 (en) 2003-03-20 2003-03-20 Method and apparatus for recycling gases used in a lithography tool

Publications (2)

Publication Number Publication Date
CN1532634A CN1532634A (zh) 2004-09-29
CN1275099C true CN1275099C (zh) 2006-09-13

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Family Applications (1)

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CNB2004100301471A Expired - Fee Related CN1275099C (zh) 2003-03-20 2004-03-19 回收平版印刷工具中所用气体的方法和装置

Country Status (7)

Country Link
US (2) US6919573B2 (enExample)
EP (1) EP1460479A3 (enExample)
JP (1) JP3957695B2 (enExample)
KR (1) KR100730675B1 (enExample)
CN (1) CN1275099C (enExample)
SG (1) SG115636A1 (enExample)
TW (1) TW200421018A (enExample)

Cited By (2)

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Publication number Priority date Publication date Assignee Title
CN102819194A (zh) * 2011-06-09 2012-12-12 Asml荷兰有限公司 辐射源和光刻设备
CN102495538B (zh) * 2007-11-30 2015-04-08 Asml荷兰有限公司 光刻设备、投影系统和器件制造方法

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US6770895B2 (en) * 2002-11-21 2004-08-03 Asml Holding N.V. Method and apparatus for isolating light source gas from main chamber gas in a lithography tool
US6919573B2 (en) * 2003-03-20 2005-07-19 Asml Holding N.V Method and apparatus for recycling gases used in a lithography tool
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US8115900B2 (en) * 2007-09-17 2012-02-14 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102495538B (zh) * 2007-11-30 2015-04-08 Asml荷兰有限公司 光刻设备、投影系统和器件制造方法
US10310394B2 (en) 2007-11-30 2019-06-04 Asml Netherlands B.V. Lithographic apparatus, a projection system and a device manufacturing method
CN102819194A (zh) * 2011-06-09 2012-12-12 Asml荷兰有限公司 辐射源和光刻设备

Also Published As

Publication number Publication date
JP3957695B2 (ja) 2007-08-15
KR20040083013A (ko) 2004-09-30
EP1460479A2 (en) 2004-09-22
CN1532634A (zh) 2004-09-29
SG115636A1 (en) 2005-10-28
KR100730675B1 (ko) 2007-06-21
JP2004289151A (ja) 2004-10-14
US20050263720A1 (en) 2005-12-01
TW200421018A (en) 2004-10-16
US6919573B2 (en) 2005-07-19
US20040183030A1 (en) 2004-09-23
US7135693B2 (en) 2006-11-14
EP1460479A3 (en) 2006-02-01

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