JP2006135298A5 - - Google Patents

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Publication number
JP2006135298A5
JP2006135298A5 JP2005230619A JP2005230619A JP2006135298A5 JP 2006135298 A5 JP2006135298 A5 JP 2006135298A5 JP 2005230619 A JP2005230619 A JP 2005230619A JP 2005230619 A JP2005230619 A JP 2005230619A JP 2006135298 A5 JP2006135298 A5 JP 2006135298A5
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JP
Japan
Prior art keywords
laser
oscillation
short pulse
light source
source device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2005230619A
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English (en)
Japanese (ja)
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JP5100990B2 (ja
JP2006135298A (ja
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Publication date
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Priority to JP2005230619A priority Critical patent/JP5100990B2/ja
Priority claimed from JP2005230619A external-priority patent/JP5100990B2/ja
Priority to US11/242,016 priority patent/US7680158B2/en
Publication of JP2006135298A publication Critical patent/JP2006135298A/ja
Priority to US11/783,387 priority patent/US7649188B2/en
Publication of JP2006135298A5 publication Critical patent/JP2006135298A5/ja
Application granted granted Critical
Publication of JP5100990B2 publication Critical patent/JP5100990B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2005230619A 2004-10-07 2005-08-09 極端紫外光源装置用ドライバーレーザ及びｌｐｐ型極端紫外光源装置 Expired - Fee Related JP5100990B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2005230619A JP5100990B2 (ja) 2004-10-07 2005-08-09 極端紫外光源装置用ドライバーレーザ及びｌｐｐ型極端紫外光源装置
US11/242,016 US7680158B2 (en) 2004-10-07 2005-10-04 LPP type extreme ultra violet light source apparatus and driver laser for the same
US11/783,387 US7649188B2 (en) 2004-10-07 2007-04-09 LPP type extreme ultra violet light source apparatus and driver laser for the same

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2004295272 2004-10-07
JP2004295272 2004-10-07
JP2005230619A JP5100990B2 (ja) 2004-10-07 2005-08-09 極端紫外光源装置用ドライバーレーザ及びｌｐｐ型極端紫外光源装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2011253149A Division JP5242758B2 (ja) 2004-10-07 2011-11-18 極端紫外光源装置用ドライバーレーザ及びｌｐｐ型極端紫外光源装置

Publications (3)

Publication Number Publication Date
JP2006135298A JP2006135298A (ja) 2006-05-25
JP2006135298A5 true JP2006135298A5 (enExample) 2008-12-04
JP5100990B2 JP5100990B2 (ja) 2012-12-19

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Family Applications (1)

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JP2005230619A Expired - Fee Related JP5100990B2 (ja) 2004-10-07 2005-08-09 極端紫外光源装置用ドライバーレーザ及びｌｐｐ型極端紫外光源装置

Country Status (2)

Country Link
US (2) US7680158B2 (enExample)
JP (1) JP5100990B2 (enExample)

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JP5551722B2 (ja) * 2006-08-29 2014-07-16 ギガフォトン株式会社 極端紫外光源装置用ドライバーレーザ
JP5086677B2 (ja) * 2006-08-29 2012-11-28 ギガフォトン株式会社 極端紫外光源装置用ドライバーレーザ
JP5086664B2 (ja) * 2007-03-02 2012-11-28 ギガフォトン株式会社 極端紫外光源装置
DE102007017212A1 (de) * 2007-04-12 2008-10-16 Forschungszentrum Jülich GmbH Verfahren und Vorrichtung zur Kühlung eines Gases
JP5179776B2 (ja) * 2007-04-20 2013-04-10 ギガフォトン株式会社 極端紫外光源用ドライバレーザ
JP2009246345A (ja) * 2008-03-12 2009-10-22 Komatsu Ltd レーザシステム
US20110122387A1 (en) * 2008-05-13 2011-05-26 The Regents Of The University Of California System and method for light source employing laser-produced plasma
JP5758569B2 (ja) * 2008-06-12 2015-08-05 ギガフォトン株式会社 スラブ型レーザ装置
JP5833806B2 (ja) * 2008-09-19 2015-12-16 ギガフォトン株式会社 極端紫外光源装置、極端紫外光源装置用レーザ光源装置及び極端紫外光源装置用レーザ光源の調整方法
JP5914742B2 (ja) * 2008-09-19 2016-05-11 ギガフォトン株式会社 極端紫外光源装置用レーザ光源装置、及びレーザ光源装置
JP5587578B2 (ja) * 2008-09-26 2014-09-10 ギガフォトン株式会社 極端紫外光源装置およびパルスレーザ装置
JP5536401B2 (ja) 2008-10-16 2014-07-02 ギガフォトン株式会社 レーザ装置および極端紫外光光源装置
JP5607383B2 (ja) 2009-02-23 2014-10-15 ギガフォトン株式会社 ガスレーザ装置用温度調節装置
JP5675127B2 (ja) * 2009-02-27 2015-02-25 ギガフォトン株式会社 レーザ装置および極端紫外光源装置
US8755103B2 (en) * 2009-10-23 2014-06-17 Hamamatsu Photonics K.K. Plasma shutter forming apparatus and forming method
JP5419739B2 (ja) * 2010-02-03 2014-02-19 三菱電機株式会社 ガスレーザ装置
EP2534672B1 (en) 2010-02-09 2016-06-01 Energetiq Technology Inc. Laser-driven light source
JP2011192961A (ja) * 2010-02-19 2011-09-29 Komatsu Ltd レーザ装置、極端紫外光生成装置、およびメンテナンス方法
JP5666285B2 (ja) 2010-03-15 2015-02-12 ギガフォトン株式会社 再生増幅器、レーザ装置および極端紫外光生成装置
JP5075951B2 (ja) * 2010-07-16 2012-11-21 ギガフォトン株式会社 極端紫外光源装置及びドライバレーザシステム
JP6054028B2 (ja) 2011-02-09 2016-12-27 ギガフォトン株式会社 レーザ装置および極端紫外光生成システム
DE102012002470A1 (de) * 2012-02-03 2013-08-08 Iai Industrial Systems B.V. CO2-Laser mit schneller Leistungssteuerung
JP2015536545A (ja) * 2012-11-07 2015-12-21 エーエスエムエル ネザーランズ ビー．ブイ． 放射を発生させる方法及び装置
EP3218700B1 (en) 2014-11-10 2020-04-15 General Electric Company Multi-phase fluid fraction measurement
US9711950B2 (en) * 2015-05-13 2017-07-18 Trumpf Laser Gmbh Dense wavelength beam combining with variable feedback control
US20210391683A1 (en) * 2018-10-10 2021-12-16 Mitsubishi Electric Corporation Laser device
WO2020148069A1 (en) * 2019-01-15 2020-07-23 Stichting Vu Euv radiation source and related methods
EP3968739A1 (en) * 2020-09-09 2022-03-16 Deutsches Elektronen-Synchrotron DESY Apparatus and method for generating x-rays by laser irradiation of superfluid helium droplets
US11587781B2 (en) 2021-05-24 2023-02-21 Hamamatsu Photonics K.K. Laser-driven light source with electrodeless ignition
CN113916855A (zh) * 2021-09-29 2022-01-11 深圳大学 一种显微成像装置
US12165856B2 (en) 2022-02-21 2024-12-10 Hamamatsu Photonics K.K. Inductively coupled plasma light source
US12144072B2 (en) 2022-03-29 2024-11-12 Hamamatsu Photonics K.K. All-optical laser-driven light source with electrodeless ignition
US12156322B2 (en) 2022-12-08 2024-11-26 Hamamatsu Photonics K.K. Inductively coupled plasma light source with switched power supply
DE102024105833A1 (de) * 2024-02-29 2025-09-04 TRUMPF Lasersystems for Semiconductor Manufacturing SE Vorrichtung zur Bereitstellung von Anregungsenergie für ein Target-Material zur Erzeugung von EUV-Strahlung, Anlage zur Erzeugung von EUV-Strahlung und Verfahren zum Betreiben einer Vorrichtung zur Bereitstellung von Anregungsenergie für ein Target-Material zur Erzeugung von EUV-Strahlung
CN120879320A (zh) * 2025-09-28 2025-10-31 中国科学院长春光学精密机械与物理研究所 一种面向euv光源的腔倒空co2激光器及其控制方法

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