JP2009540607A5 - - Google Patents

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Publication number
JP2009540607A5
JP2009540607A5 JP2009515472A JP2009515472A JP2009540607A5 JP 2009540607 A5 JP2009540607 A5 JP 2009540607A5 JP 2009515472 A JP2009515472 A JP 2009515472A JP 2009515472 A JP2009515472 A JP 2009515472A JP 2009540607 A5 JP2009540607 A5 JP 2009540607A5
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JP
Japan
Prior art keywords
gas
amplifier
light source
gain medium
laser light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2009515472A
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English (en)
Japanese (ja)
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JP6037594B2 (ja
JP2009540607A (ja
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Publication date
Priority claimed from US11/452,558 external-priority patent/US7518787B2/en
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Publication of JP2009540607A publication Critical patent/JP2009540607A/ja
Publication of JP2009540607A5 publication Critical patent/JP2009540607A5/ja
Application granted granted Critical
Publication of JP6037594B2 publication Critical patent/JP6037594B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2009515472A 2006-06-14 2007-06-11 Euv光源のための駆動レーザ Active JP6037594B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/452,558 US7518787B2 (en) 2006-06-14 2006-06-14 Drive laser for EUV light source
US11/452,558 2006-06-14
PCT/US2007/013862 WO2007146329A2 (en) 2006-06-14 2007-06-11 Drive laser for euv light source

Publications (3)

Publication Number Publication Date
JP2009540607A JP2009540607A (ja) 2009-11-19
JP2009540607A5 true JP2009540607A5 (enExample) 2010-07-29
JP6037594B2 JP6037594B2 (ja) 2016-12-07

Family

ID=38832514

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009515472A Active JP6037594B2 (ja) 2006-06-14 2007-06-11 Euv光源のための駆動レーザ

Country Status (4)

Country Link
US (1) US7518787B2 (enExample)
JP (1) JP6037594B2 (enExample)
TW (1) TWI360271B (enExample)
WO (1) WO2007146329A2 (enExample)

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US7856044B2 (en) 1999-05-10 2010-12-21 Cymer, Inc. Extendable electrode for gas discharge laser
US7491954B2 (en) * 2006-10-13 2009-02-17 Cymer, Inc. Drive laser delivery systems for EUV light source
US7916388B2 (en) 2007-12-20 2011-03-29 Cymer, Inc. Drive laser for EUV light source
US7897947B2 (en) * 2007-07-13 2011-03-01 Cymer, Inc. Laser produced plasma EUV light source having a droplet stream produced using a modulated disturbance wave
US8653437B2 (en) 2010-10-04 2014-02-18 Cymer, Llc EUV light source with subsystem(s) for maintaining LPP drive laser output during EUV non-output periods
US7671349B2 (en) 2003-04-08 2010-03-02 Cymer, Inc. Laser produced plasma EUV light source
US8654438B2 (en) * 2010-06-24 2014-02-18 Cymer, Llc Master oscillator-power amplifier drive laser with pre-pulse for EUV light source
US8158960B2 (en) 2007-07-13 2012-04-17 Cymer, Inc. Laser produced plasma EUV light source
US7655925B2 (en) 2007-08-31 2010-02-02 Cymer, Inc. Gas management system for a laser-produced-plasma EUV light source
US7812329B2 (en) 2007-12-14 2010-10-12 Cymer, Inc. System managing gas flow between chambers of an extreme ultraviolet (EUV) photolithography apparatus
WO2009140270A2 (en) * 2008-05-13 2009-11-19 The Regents Of The University Of California System and method for light source employing laser-produced plasma
US8519366B2 (en) 2008-08-06 2013-08-27 Cymer, Inc. Debris protection system having a magnetic field for an EUV light source
US8138487B2 (en) 2009-04-09 2012-03-20 Cymer, Inc. System, method and apparatus for droplet catcher for prevention of backsplash in a EUV generation chamber
US8275007B2 (en) * 2009-05-04 2012-09-25 Ipg Photonics Corporation Pulsed laser system with optimally configured saturable absorber
JP2011192961A (ja) * 2010-02-19 2011-09-29 Komatsu Ltd レーザ装置、極端紫外光生成装置、およびメンテナンス方法
JP5687488B2 (ja) 2010-02-22 2015-03-18 ギガフォトン株式会社 極端紫外光生成装置
JP5666285B2 (ja) 2010-03-15 2015-02-12 ギガフォトン株式会社 再生増幅器、レーザ装置および極端紫外光生成装置
US8462425B2 (en) 2010-10-18 2013-06-11 Cymer, Inc. Oscillator-amplifier drive laser with seed protection for an EUV light source
JP6054028B2 (ja) 2011-02-09 2016-12-27 ギガフォトン株式会社 レーザ装置および極端紫外光生成システム
US8604452B2 (en) 2011-03-17 2013-12-10 Cymer, Llc Drive laser delivery systems for EUV light source
WO2014192872A1 (ja) * 2013-05-31 2014-12-04 ギガフォトン株式会社 極端紫外光生成システム
DE102013212685A1 (de) * 2013-06-28 2014-12-31 Trumpf Laser- Und Systemtechnik Gmbh Strahlbeeinflussungsoptik und Strahlformungssystem
WO2015028103A1 (de) * 2013-09-02 2015-03-05 Trumpf Laser- Und Systemtechnik Gmbh Strahlführungseinrichtung und euv-strahlungserzeugungsvorrichtung damit
WO2015045098A1 (ja) * 2013-09-27 2015-04-02 ギガフォトン株式会社 レーザ装置、及び極端紫外光生成システム
US9357625B2 (en) * 2014-07-07 2016-05-31 Asml Netherlands B.V. Extreme ultraviolet light source
WO2016131583A1 (en) * 2015-02-19 2016-08-25 Asml Netherlands B.V. Radiation source
JP6810741B2 (ja) 2015-11-11 2021-01-06 エーエスエムエル ネザーランズ ビー.ブイ. 放射システムおよび光デバイス
CN107426911B (zh) * 2016-05-23 2019-04-05 中国科学院物理研究所 一种使用团簇靶材的电子加速器设备
JP6762364B2 (ja) * 2016-07-26 2020-09-30 ギガフォトン株式会社 レーザシステム
CN108110602A (zh) * 2017-12-05 2018-06-01 天水师范学院 一种全固态Tm:LuScO3调Q锁模陶瓷激光器
CN108036930A (zh) * 2017-12-28 2018-05-15 长春长光精密仪器集团有限公司 一种透射光栅衍射效率的检测系统
JP7121383B2 (ja) * 2018-04-25 2022-08-18 精電舎電子工業株式会社 ガスレーザ発振方法、及びこの方法を用いたガスレーザ発振装置、レーザ溶着装置、レーザ加工装置
CN114355735A (zh) * 2022-01-20 2022-04-15 广东省智能机器人研究院 极紫外光产生方法和系统

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JP2006128157A (ja) * 2004-10-26 2006-05-18 Komatsu Ltd 極端紫外光源装置用ドライバレーザシステム

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