JP2009540607A5 - - Google Patents
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- Publication number
- JP2009540607A5 JP2009540607A5 JP2009515472A JP2009515472A JP2009540607A5 JP 2009540607 A5 JP2009540607 A5 JP 2009540607A5 JP 2009515472 A JP2009515472 A JP 2009515472A JP 2009515472 A JP2009515472 A JP 2009515472A JP 2009540607 A5 JP2009540607 A5 JP 2009540607A5
- Authority
- JP
- Japan
- Prior art keywords
- gas
- amplifier
- light source
- gain medium
- laser light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920006395 saturated elastomer Polymers 0.000 claims 4
- 230000002238 attenuated effect Effects 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/452,558 US7518787B2 (en) | 2006-06-14 | 2006-06-14 | Drive laser for EUV light source |
| US11/452,558 | 2006-06-14 | ||
| PCT/US2007/013862 WO2007146329A2 (en) | 2006-06-14 | 2007-06-11 | Drive laser for euv light source |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2009540607A JP2009540607A (ja) | 2009-11-19 |
| JP2009540607A5 true JP2009540607A5 (enExample) | 2010-07-29 |
| JP6037594B2 JP6037594B2 (ja) | 2016-12-07 |
Family
ID=38832514
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009515472A Active JP6037594B2 (ja) | 2006-06-14 | 2007-06-11 | Euv光源のための駆動レーザ |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US7518787B2 (enExample) |
| JP (1) | JP6037594B2 (enExample) |
| TW (1) | TWI360271B (enExample) |
| WO (1) | WO2007146329A2 (enExample) |
Families Citing this family (33)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7856044B2 (en) | 1999-05-10 | 2010-12-21 | Cymer, Inc. | Extendable electrode for gas discharge laser |
| US7491954B2 (en) * | 2006-10-13 | 2009-02-17 | Cymer, Inc. | Drive laser delivery systems for EUV light source |
| US7916388B2 (en) | 2007-12-20 | 2011-03-29 | Cymer, Inc. | Drive laser for EUV light source |
| US7897947B2 (en) * | 2007-07-13 | 2011-03-01 | Cymer, Inc. | Laser produced plasma EUV light source having a droplet stream produced using a modulated disturbance wave |
| US8653437B2 (en) | 2010-10-04 | 2014-02-18 | Cymer, Llc | EUV light source with subsystem(s) for maintaining LPP drive laser output during EUV non-output periods |
| US7671349B2 (en) | 2003-04-08 | 2010-03-02 | Cymer, Inc. | Laser produced plasma EUV light source |
| US8654438B2 (en) * | 2010-06-24 | 2014-02-18 | Cymer, Llc | Master oscillator-power amplifier drive laser with pre-pulse for EUV light source |
| US8158960B2 (en) | 2007-07-13 | 2012-04-17 | Cymer, Inc. | Laser produced plasma EUV light source |
| US7655925B2 (en) | 2007-08-31 | 2010-02-02 | Cymer, Inc. | Gas management system for a laser-produced-plasma EUV light source |
| US7812329B2 (en) | 2007-12-14 | 2010-10-12 | Cymer, Inc. | System managing gas flow between chambers of an extreme ultraviolet (EUV) photolithography apparatus |
| WO2009140270A2 (en) * | 2008-05-13 | 2009-11-19 | The Regents Of The University Of California | System and method for light source employing laser-produced plasma |
| US8519366B2 (en) | 2008-08-06 | 2013-08-27 | Cymer, Inc. | Debris protection system having a magnetic field for an EUV light source |
| US8138487B2 (en) | 2009-04-09 | 2012-03-20 | Cymer, Inc. | System, method and apparatus for droplet catcher for prevention of backsplash in a EUV generation chamber |
| US8275007B2 (en) * | 2009-05-04 | 2012-09-25 | Ipg Photonics Corporation | Pulsed laser system with optimally configured saturable absorber |
| JP2011192961A (ja) * | 2010-02-19 | 2011-09-29 | Komatsu Ltd | レーザ装置、極端紫外光生成装置、およびメンテナンス方法 |
| JP5687488B2 (ja) | 2010-02-22 | 2015-03-18 | ギガフォトン株式会社 | 極端紫外光生成装置 |
| JP5666285B2 (ja) | 2010-03-15 | 2015-02-12 | ギガフォトン株式会社 | 再生増幅器、レーザ装置および極端紫外光生成装置 |
| US8462425B2 (en) | 2010-10-18 | 2013-06-11 | Cymer, Inc. | Oscillator-amplifier drive laser with seed protection for an EUV light source |
| JP6054028B2 (ja) | 2011-02-09 | 2016-12-27 | ギガフォトン株式会社 | レーザ装置および極端紫外光生成システム |
| US8604452B2 (en) | 2011-03-17 | 2013-12-10 | Cymer, Llc | Drive laser delivery systems for EUV light source |
| WO2014192872A1 (ja) * | 2013-05-31 | 2014-12-04 | ギガフォトン株式会社 | 極端紫外光生成システム |
| DE102013212685A1 (de) * | 2013-06-28 | 2014-12-31 | Trumpf Laser- Und Systemtechnik Gmbh | Strahlbeeinflussungsoptik und Strahlformungssystem |
| WO2015028103A1 (de) * | 2013-09-02 | 2015-03-05 | Trumpf Laser- Und Systemtechnik Gmbh | Strahlführungseinrichtung und euv-strahlungserzeugungsvorrichtung damit |
| WO2015045098A1 (ja) * | 2013-09-27 | 2015-04-02 | ギガフォトン株式会社 | レーザ装置、及び極端紫外光生成システム |
| US9357625B2 (en) * | 2014-07-07 | 2016-05-31 | Asml Netherlands B.V. | Extreme ultraviolet light source |
| WO2016131583A1 (en) * | 2015-02-19 | 2016-08-25 | Asml Netherlands B.V. | Radiation source |
| JP6810741B2 (ja) | 2015-11-11 | 2021-01-06 | エーエスエムエル ネザーランズ ビー.ブイ. | 放射システムおよび光デバイス |
| CN107426911B (zh) * | 2016-05-23 | 2019-04-05 | 中国科学院物理研究所 | 一种使用团簇靶材的电子加速器设备 |
| JP6762364B2 (ja) * | 2016-07-26 | 2020-09-30 | ギガフォトン株式会社 | レーザシステム |
| CN108110602A (zh) * | 2017-12-05 | 2018-06-01 | 天水师范学院 | 一种全固态Tm:LuScO3调Q锁模陶瓷激光器 |
| CN108036930A (zh) * | 2017-12-28 | 2018-05-15 | 长春长光精密仪器集团有限公司 | 一种透射光栅衍射效率的检测系统 |
| JP7121383B2 (ja) * | 2018-04-25 | 2022-08-18 | 精電舎電子工業株式会社 | ガスレーザ発振方法、及びこの方法を用いたガスレーザ発振装置、レーザ溶着装置、レーザ加工装置 |
| CN114355735A (zh) * | 2022-01-20 | 2022-04-15 | 广东省智能机器人研究院 | 极紫外光产生方法和系统 |
Family Cites Families (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4174504A (en) * | 1978-01-25 | 1979-11-13 | United Technologies Corporation | Apparatus and method for cavity dumping a Q-switched laser |
| JP2597845B2 (ja) * | 1987-06-09 | 1997-04-09 | 浜松ホトニクス株式会社 | 高繰り返しパルスレーザー装置 |
| JPH0666501B2 (ja) * | 1987-10-09 | 1994-08-24 | 理化学研究所 | 多波長同期型パルスレーザ発振方法 |
| JPH0278283A (ja) * | 1988-09-14 | 1990-03-19 | Toshiba Corp | レーザ装置 |
| US5117303A (en) | 1990-08-23 | 1992-05-26 | At&T Bell Laboratories | Method of operating concatenated optical amplifiers |
| JP3317013B2 (ja) * | 1994-04-15 | 2002-08-19 | 石川島播磨重工業株式会社 | 放電励起型coガスレーザ |
| US5818630A (en) * | 1997-06-25 | 1998-10-06 | Imra America, Inc. | Single-mode amplifiers and compressors based on multi-mode fibers |
| JPH11186635A (ja) * | 1997-12-18 | 1999-07-09 | Hoya Corp | 光ファイバ増幅器 |
| US5991069A (en) * | 1998-01-22 | 1999-11-23 | Tyco Submarine Systems, Ltd. | Split-pumped dual stage optical fiber amplifier |
| US6389045B1 (en) * | 1999-04-19 | 2002-05-14 | Lambda Physik Ag | Optical pulse stretching and smoothing for ArF and F2 lithography excimer lasers |
| US6625191B2 (en) * | 1999-12-10 | 2003-09-23 | Cymer, Inc. | Very narrow band, two chamber, high rep rate gas discharge laser system |
| US6693939B2 (en) | 2001-01-29 | 2004-02-17 | Cymer, Inc. | Laser lithography light source with beam delivery |
| US7079564B2 (en) * | 2001-04-09 | 2006-07-18 | Cymer, Inc. | Control system for a two chamber gas discharge laser |
| US20050259709A1 (en) | 2002-05-07 | 2005-11-24 | Cymer, Inc. | Systems and methods for implementing an interaction between a laser shaped as a line beam and a film deposited on a substrate |
| US6928093B2 (en) | 2002-05-07 | 2005-08-09 | Cymer, Inc. | Long delay and high TIS pulse stretcher |
| JP3888673B2 (ja) * | 2001-12-28 | 2007-03-07 | ウシオ電機株式会社 | 露光用フッ素分子レーザシステム |
| JP4229275B2 (ja) * | 2003-10-20 | 2009-02-25 | 株式会社小松製作所 | 露光用2ステージArFエキシマレーザ装置 |
| JP4367836B2 (ja) * | 2003-12-04 | 2009-11-18 | 株式会社小松製作所 | Mopo方式2ステージレーザ装置 |
| JP4798687B2 (ja) * | 2004-07-09 | 2011-10-19 | 株式会社小松製作所 | 狭帯域化レーザ装置 |
| JP2006093560A (ja) * | 2004-09-27 | 2006-04-06 | Toshiba Corp | 固体レーザ装置 |
| JP2006128157A (ja) * | 2004-10-26 | 2006-05-18 | Komatsu Ltd | 極端紫外光源装置用ドライバレーザシステム |
-
2006
- 2006-06-14 US US11/452,558 patent/US7518787B2/en active Active
-
2007
- 2007-05-28 TW TW096118947A patent/TWI360271B/zh active
- 2007-06-11 WO PCT/US2007/013862 patent/WO2007146329A2/en not_active Ceased
- 2007-06-11 JP JP2009515472A patent/JP6037594B2/ja active Active
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