TWI360271B - Drive laser for euv light source - Google Patents

Drive laser for euv light source Download PDF

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Publication number
TWI360271B
TWI360271B TW096118947A TW96118947A TWI360271B TW I360271 B TWI360271 B TW I360271B TW 096118947 A TW096118947 A TW 096118947A TW 96118947 A TW96118947 A TW 96118947A TW I360271 B TWI360271 B TW I360271B
Authority
TW
Taiwan
Prior art keywords
laser
pulse
gas
expander
gain medium
Prior art date
Application number
TW096118947A
Other languages
English (en)
Chinese (zh)
Other versions
TW200807827A (en
Inventor
Alexander I Ershov
Alexander N Bykanov
Jerzy R Hoffman
Igor V Fomenkov
William N Partlo
Original Assignee
Cymer Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cymer Inc filed Critical Cymer Inc
Publication of TW200807827A publication Critical patent/TW200807827A/zh
Application granted granted Critical
Publication of TWI360271B publication Critical patent/TWI360271B/zh

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • H01S3/2308—Amplifier arrangements, e.g. MOPA
    • H01S3/2316—Cascaded amplifiers
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G1/00—X-ray apparatus involving X-ray tubes; Circuits therefor
    • H05G1/08—Electrical details
    • H05G1/26—Measuring, controlling or protecting
    • H05G1/54—Protecting or lifetime prediction
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
    • H05G2/0082—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation the energy-carrying beam being a laser beam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • H01S3/0057—Temporal shaping, e.g. pulse compression, frequency chirping
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/2232—Carbon dioxide (CO2) or monoxide [CO]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Electromagnetism (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • X-Ray Techniques (AREA)
  • Lasers (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
TW096118947A 2006-06-14 2007-05-28 Drive laser for euv light source TWI360271B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/452,558 US7518787B2 (en) 2006-06-14 2006-06-14 Drive laser for EUV light source

Publications (2)

Publication Number Publication Date
TW200807827A TW200807827A (en) 2008-02-01
TWI360271B true TWI360271B (en) 2012-03-11

Family

ID=38832514

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096118947A TWI360271B (en) 2006-06-14 2007-05-28 Drive laser for euv light source

Country Status (4)

Country Link
US (1) US7518787B2 (enExample)
JP (1) JP6037594B2 (enExample)
TW (1) TWI360271B (enExample)
WO (1) WO2007146329A2 (enExample)

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US7856044B2 (en) 1999-05-10 2010-12-21 Cymer, Inc. Extendable electrode for gas discharge laser
US7916388B2 (en) 2007-12-20 2011-03-29 Cymer, Inc. Drive laser for EUV light source
US7897947B2 (en) * 2007-07-13 2011-03-01 Cymer, Inc. Laser produced plasma EUV light source having a droplet stream produced using a modulated disturbance wave
US7491954B2 (en) 2006-10-13 2009-02-17 Cymer, Inc. Drive laser delivery systems for EUV light source
US8653437B2 (en) 2010-10-04 2014-02-18 Cymer, Llc EUV light source with subsystem(s) for maintaining LPP drive laser output during EUV non-output periods
US7671349B2 (en) 2003-04-08 2010-03-02 Cymer, Inc. Laser produced plasma EUV light source
US8654438B2 (en) 2010-06-24 2014-02-18 Cymer, Llc Master oscillator-power amplifier drive laser with pre-pulse for EUV light source
US8158960B2 (en) 2007-07-13 2012-04-17 Cymer, Inc. Laser produced plasma EUV light source
US7655925B2 (en) 2007-08-31 2010-02-02 Cymer, Inc. Gas management system for a laser-produced-plasma EUV light source
US7812329B2 (en) 2007-12-14 2010-10-12 Cymer, Inc. System managing gas flow between chambers of an extreme ultraviolet (EUV) photolithography apparatus
WO2009140270A2 (en) * 2008-05-13 2009-11-19 The Regents Of The University Of California System and method for light source employing laser-produced plasma
US8519366B2 (en) 2008-08-06 2013-08-27 Cymer, Inc. Debris protection system having a magnetic field for an EUV light source
US8138487B2 (en) 2009-04-09 2012-03-20 Cymer, Inc. System, method and apparatus for droplet catcher for prevention of backsplash in a EUV generation chamber
US8275007B2 (en) * 2009-05-04 2012-09-25 Ipg Photonics Corporation Pulsed laser system with optimally configured saturable absorber
JP2011192961A (ja) * 2010-02-19 2011-09-29 Komatsu Ltd レーザ装置、極端紫外光生成装置、およびメンテナンス方法
JP5687488B2 (ja) 2010-02-22 2015-03-18 ギガフォトン株式会社 極端紫外光生成装置
JP5666285B2 (ja) 2010-03-15 2015-02-12 ギガフォトン株式会社 再生増幅器、レーザ装置および極端紫外光生成装置
US8462425B2 (en) 2010-10-18 2013-06-11 Cymer, Inc. Oscillator-amplifier drive laser with seed protection for an EUV light source
JP6054028B2 (ja) 2011-02-09 2016-12-27 ギガフォトン株式会社 レーザ装置および極端紫外光生成システム
US8604452B2 (en) 2011-03-17 2013-12-10 Cymer, Llc Drive laser delivery systems for EUV light source
WO2014192872A1 (ja) * 2013-05-31 2014-12-04 ギガフォトン株式会社 極端紫外光生成システム
DE102013212685A1 (de) 2013-06-28 2014-12-31 Trumpf Laser- Und Systemtechnik Gmbh Strahlbeeinflussungsoptik und Strahlformungssystem
WO2015028103A1 (de) * 2013-09-02 2015-03-05 Trumpf Laser- Und Systemtechnik Gmbh Strahlführungseinrichtung und euv-strahlungserzeugungsvorrichtung damit
JP6285450B2 (ja) * 2013-09-27 2018-02-28 ギガフォトン株式会社 レーザ装置、及び極端紫外光生成システム
US9357625B2 (en) * 2014-07-07 2016-05-31 Asml Netherlands B.V. Extreme ultraviolet light source
WO2016131583A1 (en) * 2015-02-19 2016-08-25 Asml Netherlands B.V. Radiation source
US10359710B2 (en) 2015-11-11 2019-07-23 Asml Netherlands B.V. Radiation system and optical device
CN107426911B (zh) * 2016-05-23 2019-04-05 中国科学院物理研究所 一种使用团簇靶材的电子加速器设备
WO2018020564A1 (ja) * 2016-07-26 2018-02-01 ギガフォトン株式会社 レーザシステム
CN108110602A (zh) * 2017-12-05 2018-06-01 天水师范学院 一种全固态Tm:LuScO3调Q锁模陶瓷激光器
CN108036930A (zh) * 2017-12-28 2018-05-15 长春长光精密仪器集团有限公司 一种透射光栅衍射效率的检测系统
JP7121383B2 (ja) * 2018-04-25 2022-08-18 精電舎電子工業株式会社 ガスレーザ発振方法、及びこの方法を用いたガスレーザ発振装置、レーザ溶着装置、レーザ加工装置
CN114355735A (zh) * 2022-01-20 2022-04-15 广东省智能机器人研究院 极紫外光产生方法和系统

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Also Published As

Publication number Publication date
WO2007146329A3 (en) 2008-11-27
WO2007146329A2 (en) 2007-12-21
JP6037594B2 (ja) 2016-12-07
US7518787B2 (en) 2009-04-14
TW200807827A (en) 2008-02-01
JP2009540607A (ja) 2009-11-19
US20070291350A1 (en) 2007-12-20

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