JP6037594B2 - Ｅｕｖ光源のための駆動レーザ - Google Patents

Ｅｕｖ光源のための駆動レーザ Download PDF

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Publication number
JP6037594B2
JP6037594B2 JP2009515472A JP2009515472A JP6037594B2 JP 6037594 B2 JP6037594 B2 JP 6037594B2 JP 2009515472 A JP2009515472 A JP 2009515472A JP 2009515472 A JP2009515472 A JP 2009515472A JP 6037594 B2 JP6037594 B2 JP 6037594B2
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Japan
Prior art keywords
pulse
amplifier
gain medium
laser
energy
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Japanese (ja)
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JP2009540607A5 (enExample
JP2009540607A (ja
Inventor
アーショフ　アレクサンダー　アイ
アレクサンダー アイ アーショフ
アレクサンダー エヌ ビカノフ
アレクサンダー エヌ ビカノフ
ジャージー アール ホフマン
ジャージー アール ホフマン
イゴー ヴィー フォーメンコフ
イゴー ヴィー フォーメンコフ
パートロ　ウィリアム　エヌ
ウィリアム エヌ パートロ
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ASML Netherlands BV
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ASML Netherlands BV
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • H01S3/2308—Amplifier arrangements, e.g. MOPA
    • H01S3/2316—Cascaded amplifiers
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G1/00—X-ray apparatus involving X-ray tubes; Circuits therefor
    • H05G1/08—Electrical details
    • H05G1/26—Measuring, controlling or protecting
    • H05G1/54—Protecting or lifetime prediction
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
    • H05G2/0082—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation the energy-carrying beam being a laser beam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • H01S3/0057—Temporal shaping, e.g. pulse compression, frequency chirping
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/2232—Carbon dioxide (CO2) or monoxide [CO]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex

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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Electromagnetism (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • X-Ray Techniques (AREA)
  • Lasers (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2009515472A 2006-06-14 2007-06-11 Ｅｕｖ光源のための駆動レーザ Active JP6037594B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/452,558 US7518787B2 (en) 2006-06-14 2006-06-14 Drive laser for EUV light source
US11/452,558 2006-06-14
PCT/US2007/013862 WO2007146329A2 (en) 2006-06-14 2007-06-11 Drive laser for euv light source

Publications (3)

Publication Number Publication Date
JP2009540607A JP2009540607A (ja) 2009-11-19
JP2009540607A5 JP2009540607A5 (enExample) 2010-07-29
JP6037594B2 true JP6037594B2 (ja) 2016-12-07

Family

ID=38832514

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009515472A Active JP6037594B2 (ja) 2006-06-14 2007-06-11 Ｅｕｖ光源のための駆動レーザ

Country Status (4)

Country Link
US (1) US7518787B2 (enExample)
JP (1) JP6037594B2 (enExample)
TW (1) TWI360271B (enExample)
WO (1) WO2007146329A2 (enExample)

Families Citing this family (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7856044B2 (en) 1999-05-10 2010-12-21 Cymer, Inc. Extendable electrode for gas discharge laser
US7916388B2 (en) 2007-12-20 2011-03-29 Cymer, Inc. Drive laser for EUV light source
US7897947B2 (en) * 2007-07-13 2011-03-01 Cymer, Inc. Laser produced plasma EUV light source having a droplet stream produced using a modulated disturbance wave
US7491954B2 (en) 2006-10-13 2009-02-17 Cymer, Inc. Drive laser delivery systems for EUV light source
US8653437B2 (en) 2010-10-04 2014-02-18 Cymer, Llc EUV light source with subsystem(s) for maintaining LPP drive laser output during EUV non-output periods
US7671349B2 (en) 2003-04-08 2010-03-02 Cymer, Inc. Laser produced plasma EUV light source
US8654438B2 (en) 2010-06-24 2014-02-18 Cymer, Llc Master oscillator-power amplifier drive laser with pre-pulse for EUV light source
US8158960B2 (en) 2007-07-13 2012-04-17 Cymer, Inc. Laser produced plasma EUV light source
US7655925B2 (en) 2007-08-31 2010-02-02 Cymer, Inc. Gas management system for a laser-produced-plasma EUV light source
US7812329B2 (en) 2007-12-14 2010-10-12 Cymer, Inc. System managing gas flow between chambers of an extreme ultraviolet (EUV) photolithography apparatus
WO2009140270A2 (en) * 2008-05-13 2009-11-19 The Regents Of The University Of California System and method for light source employing laser-produced plasma
US8519366B2 (en) 2008-08-06 2013-08-27 Cymer, Inc. Debris protection system having a magnetic field for an EUV light source
US8138487B2 (en) 2009-04-09 2012-03-20 Cymer, Inc. System, method and apparatus for droplet catcher for prevention of backsplash in a EUV generation chamber
US8275007B2 (en) * 2009-05-04 2012-09-25 Ipg Photonics Corporation Pulsed laser system with optimally configured saturable absorber
JP2011192961A (ja) * 2010-02-19 2011-09-29 Komatsu Ltd レーザ装置、極端紫外光生成装置、およびメンテナンス方法
JP5687488B2 (ja) 2010-02-22 2015-03-18 ギガフォトン株式会社 極端紫外光生成装置
JP5666285B2 (ja) 2010-03-15 2015-02-12 ギガフォトン株式会社 再生増幅器、レーザ装置および極端紫外光生成装置
US8462425B2 (en) 2010-10-18 2013-06-11 Cymer, Inc. Oscillator-amplifier drive laser with seed protection for an EUV light source
JP6054028B2 (ja) 2011-02-09 2016-12-27 ギガフォトン株式会社 レーザ装置および極端紫外光生成システム
US8604452B2 (en) 2011-03-17 2013-12-10 Cymer, Llc Drive laser delivery systems for EUV light source
WO2014192872A1 (ja) * 2013-05-31 2014-12-04 ギガフォトン株式会社 極端紫外光生成システム
DE102013212685A1 (de) 2013-06-28 2014-12-31 Trumpf Laser- Und Systemtechnik Gmbh Strahlbeeinflussungsoptik und Strahlformungssystem
WO2015028103A1 (de) * 2013-09-02 2015-03-05 Trumpf Laser- Und Systemtechnik Gmbh Strahlführungseinrichtung und euv-strahlungserzeugungsvorrichtung damit
JP6285450B2 (ja) * 2013-09-27 2018-02-28 ギガフォトン株式会社 レーザ装置、及び極端紫外光生成システム
US9357625B2 (en) * 2014-07-07 2016-05-31 Asml Netherlands B.V. Extreme ultraviolet light source
WO2016131583A1 (en) * 2015-02-19 2016-08-25 Asml Netherlands B.V. Radiation source
US10359710B2 (en) 2015-11-11 2019-07-23 Asml Netherlands B.V. Radiation system and optical device
CN107426911B (zh) * 2016-05-23 2019-04-05 中国科学院物理研究所 一种使用团簇靶材的电子加速器设备
WO2018020564A1 (ja) * 2016-07-26 2018-02-01 ギガフォトン株式会社 レーザシステム
CN108110602A (zh) * 2017-12-05 2018-06-01 天水师范学院 一种全固态Tm:LuScO3调Q锁模陶瓷激光器
CN108036930A (zh) * 2017-12-28 2018-05-15 长春长光精密仪器集团有限公司 一种透射光栅衍射效率的检测系统
JP7121383B2 (ja) * 2018-04-25 2022-08-18 精電舎電子工業株式会社 ガスレーザ発振方法、及びこの方法を用いたガスレーザ発振装置、レーザ溶着装置、レーザ加工装置
CN114355735A (zh) * 2022-01-20 2022-04-15 广东省智能机器人研究院 极紫外光产生方法和系统

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4174504A (en) * 1978-01-25 1979-11-13 United Technologies Corporation Apparatus and method for cavity dumping a Q-switched laser
JP2597845B2 (ja) * 1987-06-09 1997-04-09 浜松ホトニクス株式会社 高繰り返しパルスレーザー装置
JPH0666501B2 (ja) * 1987-10-09 1994-08-24 理化学研究所 多波長同期型パルスレーザ発振方法
JPH0278283A (ja) * 1988-09-14 1990-03-19 Toshiba Corp レーザ装置
US5117303A (en) 1990-08-23 1992-05-26 At&T Bell Laboratories Method of operating concatenated optical amplifiers
JP3317013B2 (ja) * 1994-04-15 2002-08-19 石川島播磨重工業株式会社 放電励起型ｃｏガスレーザ
US5818630A (en) * 1997-06-25 1998-10-06 Imra America, Inc. Single-mode amplifiers and compressors based on multi-mode fibers
JPH11186635A (ja) * 1997-12-18 1999-07-09 Hoya Corp 光ファイバ増幅器
US5991069A (en) * 1998-01-22 1999-11-23 Tyco Submarine Systems, Ltd. Split-pumped dual stage optical fiber amplifier
US6389045B1 (en) * 1999-04-19 2002-05-14 Lambda Physik Ag Optical pulse stretching and smoothing for ArF and F2 lithography excimer lasers
US6625191B2 (en) * 1999-12-10 2003-09-23 Cymer, Inc. Very narrow band, two chamber, high rep rate gas discharge laser system
US6693939B2 (en) 2001-01-29 2004-02-17 Cymer, Inc. Laser lithography light source with beam delivery
US7079564B2 (en) * 2001-04-09 2006-07-18 Cymer, Inc. Control system for a two chamber gas discharge laser
US20050259709A1 (en) 2002-05-07 2005-11-24 Cymer, Inc. Systems and methods for implementing an interaction between a laser shaped as a line beam and a film deposited on a substrate
US6928093B2 (en) 2002-05-07 2005-08-09 Cymer, Inc. Long delay and high TIS pulse stretcher
JP3888673B2 (ja) * 2001-12-28 2007-03-07 ウシオ電機株式会社 露光用フッ素分子レーザシステム
JP4229275B2 (ja) * 2003-10-20 2009-02-25 株式会社小松製作所 露光用２ステージＡｒＦエキシマレーザ装置
JP4367836B2 (ja) * 2003-12-04 2009-11-18 株式会社小松製作所 Ｍｏｐｏ方式２ステージレーザ装置
JP4798687B2 (ja) * 2004-07-09 2011-10-19 株式会社小松製作所 狭帯域化レーザ装置
JP2006093560A (ja) * 2004-09-27 2006-04-06 Toshiba Corp 固体レーザ装置
JP2006128157A (ja) * 2004-10-26 2006-05-18 Komatsu Ltd 極端紫外光源装置用ドライバレーザシステム

Also Published As

Publication number Publication date
WO2007146329A3 (en) 2008-11-27
WO2007146329A2 (en) 2007-12-21
US7518787B2 (en) 2009-04-14
TW200807827A (en) 2008-02-01
TWI360271B (en) 2012-03-11
JP2009540607A (ja) 2009-11-19
US20070291350A1 (en) 2007-12-20

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