WO2009024860A3 - Euv radiation source - Google Patents
Euv radiation source Download PDFInfo
- Publication number
- WO2009024860A3 WO2009024860A3 PCT/IB2008/002201 IB2008002201W WO2009024860A3 WO 2009024860 A3 WO2009024860 A3 WO 2009024860A3 IB 2008002201 W IB2008002201 W IB 2008002201W WO 2009024860 A3 WO2009024860 A3 WO 2009024860A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- radiation source
- chamber
- euv radiation
- source
- conduit
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—X-ray radiation generated from plasma
- H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—X-ray radiation generated from plasma
- H05G2/008—X-ray radiation generated from plasma involving a beam of energy, e.g. laser or electron beam in the process of exciting the plasma
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- X-Ray Techniques (AREA)
- Plasma Technology (AREA)
Abstract
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010521496A JP5659015B2 (en) | 2007-08-23 | 2008-08-20 | Radiation source |
EP08806915A EP2191698B1 (en) | 2007-08-23 | 2008-08-20 | Radiation source |
CN200880103732.6A CN101785368B (en) | 2007-08-23 | 2008-08-20 | Radiation source |
KR1020107003754A KR101528581B1 (en) | 2007-08-23 | 2008-08-20 | Euv radiation source |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US93564307P | 2007-08-23 | 2007-08-23 | |
US60/935,643 | 2007-08-23 | ||
US12/078,663 | 2008-04-02 | ||
US12/078,663 US7763871B2 (en) | 2008-04-02 | 2008-04-02 | Radiation source |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2009024860A2 WO2009024860A2 (en) | 2009-02-26 |
WO2009024860A3 true WO2009024860A3 (en) | 2009-04-16 |
Family
ID=40019398
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/IB2008/002201 WO2009024860A2 (en) | 2007-08-23 | 2008-08-20 | Euv radiation source |
Country Status (7)
Country | Link |
---|---|
EP (1) | EP2191698B1 (en) |
JP (1) | JP5659015B2 (en) |
KR (1) | KR101528581B1 (en) |
CN (1) | CN101785368B (en) |
NL (2) | NL1035846A1 (en) |
TW (1) | TWI448828B (en) |
WO (1) | WO2009024860A2 (en) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20120003916A (en) * | 2009-04-02 | 2012-01-11 | 에테하 취리히 | Extreme ultraviolet light source with a debris-mitigated and cooled collector optics |
NL2004706A (en) * | 2009-07-22 | 2011-01-25 | Asml Netherlands Bv | RADIATION SOURCE. |
JP5717761B2 (en) * | 2010-01-07 | 2015-05-13 | エーエスエムエル ネザーランズ ビー.ブイ. | EUV radiation source and lithographic apparatus |
EP2561407B1 (en) * | 2010-04-22 | 2014-12-10 | ASML Netherlands B.V. | Collector mirror assembly and method for producing extreme ultraviolet radiation |
CN102621815B (en) * | 2011-01-26 | 2016-12-21 | Asml荷兰有限公司 | Reflection optics and device making method for lithographic equipment |
NL2009117A (en) * | 2011-08-05 | 2013-02-06 | Asml Netherlands Bv | Radiation source and method for lithographic apparatus and device manufacturing method. |
US20150261095A1 (en) * | 2011-10-07 | 2015-09-17 | Asml Netherlands B.V. | Radiation Source |
NL2011484A (en) | 2012-10-26 | 2014-04-29 | Asml Netherlands Bv | Lithographic apparatus. |
US10101664B2 (en) * | 2014-11-01 | 2018-10-16 | Kla-Tencor Corporation | Apparatus and methods for optics protection from debris in plasma-based light source |
US10034362B2 (en) * | 2014-12-16 | 2018-07-24 | Kla-Tencor Corporation | Plasma-based light source |
EP3291650B1 (en) * | 2016-09-02 | 2019-06-05 | ETH Zürich | Device and method for generating uv or x-ray radiation by means of a plasma |
WO2023159205A1 (en) * | 2022-02-18 | 2023-08-24 | Lawrence Livermore National Security, Llc | Plasma and gas based optical components to control radiation damage |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2001031678A1 (en) * | 1999-10-27 | 2001-05-03 | Jmar Research, Inc. | Method and radiation generating system using microtargets |
US6493423B1 (en) * | 1999-12-24 | 2002-12-10 | Koninklijke Philips Electronics N.V. | Method of generating extremely short-wave radiation, method of manufacturing a device by means of said radiation, extremely short-wave radiation source unit and lithographic projection apparatus provided with such a radiation source unit |
US20060186356A1 (en) * | 2004-09-09 | 2006-08-24 | Yousuke Imai | Extreme ultra violet light source device |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09245992A (en) * | 1996-03-12 | 1997-09-19 | Nikon Corp | X-ray generating device |
SG129259A1 (en) * | 2002-10-03 | 2007-02-26 | Asml Netherlands Bv | Radiation source lithographic apparatus, and device manufacturing method |
JP4189658B2 (en) * | 2003-05-15 | 2008-12-03 | ウシオ電機株式会社 | Extreme ultraviolet light generator |
DE102005015274B4 (en) * | 2005-03-31 | 2012-02-23 | Xtreme Technologies Gmbh | Radiation source for generating short-wave radiation |
US8298336B2 (en) * | 2005-04-01 | 2012-10-30 | Lam Research Corporation | High strip rate downstream chamber |
JP2006294606A (en) * | 2005-04-12 | 2006-10-26 | Xtreme Technologies Gmbh | Plasma radioactive source |
JP2006329664A (en) * | 2005-05-23 | 2006-12-07 | Ushio Inc | Extreme ultra-violet ray generator |
JP2007018931A (en) * | 2005-07-08 | 2007-01-25 | Canon Inc | Light source device, exposure device, and manufacturing method of device |
JP2007134166A (en) * | 2005-11-10 | 2007-05-31 | Ushio Inc | Extreme ultraviolet ray light source device |
JP4904809B2 (en) * | 2005-12-28 | 2012-03-28 | ウシオ電機株式会社 | Extreme ultraviolet light source device |
JP2008041391A (en) * | 2006-08-04 | 2008-02-21 | Canon Inc | Light source device, exposure system, and device manufacturing method |
-
2008
- 2008-08-19 NL NL1035846A patent/NL1035846A1/en active Search and Examination
- 2008-08-20 CN CN200880103732.6A patent/CN101785368B/en active Active
- 2008-08-20 WO PCT/IB2008/002201 patent/WO2009024860A2/en active Application Filing
- 2008-08-20 JP JP2010521496A patent/JP5659015B2/en active Active
- 2008-08-20 EP EP08806915A patent/EP2191698B1/en active Active
- 2008-08-20 KR KR1020107003754A patent/KR101528581B1/en active IP Right Grant
- 2008-08-22 TW TW097132223A patent/TWI448828B/en active
- 2008-08-25 NL NL1035863A patent/NL1035863A1/en active Search and Examination
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2001031678A1 (en) * | 1999-10-27 | 2001-05-03 | Jmar Research, Inc. | Method and radiation generating system using microtargets |
US6493423B1 (en) * | 1999-12-24 | 2002-12-10 | Koninklijke Philips Electronics N.V. | Method of generating extremely short-wave radiation, method of manufacturing a device by means of said radiation, extremely short-wave radiation source unit and lithographic projection apparatus provided with such a radiation source unit |
US20060186356A1 (en) * | 2004-09-09 | 2006-08-24 | Yousuke Imai | Extreme ultra violet light source device |
Also Published As
Publication number | Publication date |
---|---|
KR101528581B1 (en) | 2015-06-12 |
JP2010537377A (en) | 2010-12-02 |
KR20100049607A (en) | 2010-05-12 |
CN101785368B (en) | 2013-01-02 |
NL1035863A1 (en) | 2009-02-24 |
TW200919112A (en) | 2009-05-01 |
JP5659015B2 (en) | 2015-01-28 |
WO2009024860A2 (en) | 2009-02-26 |
EP2191698A2 (en) | 2010-06-02 |
CN101785368A (en) | 2010-07-21 |
EP2191698B1 (en) | 2012-10-03 |
TWI448828B (en) | 2014-08-11 |
NL1035846A1 (en) | 2009-02-24 |
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