WO2012118280A3 - Apparatus for generating stabilized extreme ultraviolet light using plasma - Google Patents

Apparatus for generating stabilized extreme ultraviolet light using plasma Download PDF

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Publication number
WO2012118280A3
WO2012118280A3 PCT/KR2012/000734 KR2012000734W WO2012118280A3 WO 2012118280 A3 WO2012118280 A3 WO 2012118280A3 KR 2012000734 W KR2012000734 W KR 2012000734W WO 2012118280 A3 WO2012118280 A3 WO 2012118280A3
Authority
WO
WIPO (PCT)
Prior art keywords
ultraviolet light
plasma
gas
extreme ultraviolet
laser beam
Prior art date
Application number
PCT/KR2012/000734
Other languages
French (fr)
Korean (ko)
Other versions
WO2012118280A2 (en
Inventor
장명식
임재원
Original Assignee
주식회사 에프에스티
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 주식회사 에프에스티 filed Critical 주식회사 에프에스티
Publication of WO2012118280A2 publication Critical patent/WO2012118280A2/en
Publication of WO2012118280A3 publication Critical patent/WO2012118280A3/en

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/008—X-ray radiation generated from plasma involving a beam of energy, e.g. laser or electron beam in the process of exciting the plasma
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K5/00—Irradiation devices
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • X-Ray Techniques (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

The present invention relates to an apparatus for generating stabilized extreme ultraviolet light using plasma, which comprises: a laser source which outputs a laser beam; a gas cell which receives the laser beam outputted from the laser source, receives gas supplied from a gas supply path, and generates extreme ultraviolet light by forming plasma by the laser beam and gas with respect to a plasma induction path corresponding to a section at which a focus is formed; a first vacuum chamber unit which accommodates the gas cell and maintains a constant vacuum; a second vacuum chamber unit which has a space to receive the extreme ultraviolet light generated by the gas cell and to emit the extreme ultraviolet light to the outside, and maintains a constant vacuum; a gas supply unit which supplies the gas supply path of the gas cell with gas for inducing the laser beam and plasma; and a first vacuum pump and a second vacuum pump for forming the vacuums of the first vacuum chamber unit and second vacuum chamber unit, respectively.
PCT/KR2012/000734 2011-02-28 2012-01-31 Apparatus for generating stabilized extreme ultraviolet light using plasma WO2012118280A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2011-0017579 2011-02-28
KR1020110017579A KR101172622B1 (en) 2011-02-28 2011-02-28 Stabilized euv generation device using the plasma

Publications (2)

Publication Number Publication Date
WO2012118280A2 WO2012118280A2 (en) 2012-09-07
WO2012118280A3 true WO2012118280A3 (en) 2012-11-01

Family

ID=46758350

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2012/000734 WO2012118280A2 (en) 2011-02-28 2012-01-31 Apparatus for generating stabilized extreme ultraviolet light using plasma

Country Status (2)

Country Link
KR (1) KR101172622B1 (en)
WO (1) WO2012118280A2 (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101849978B1 (en) * 2012-12-18 2018-04-19 삼성전자 주식회사 Apparatus and method for generating extreme ultra violet radiation
US9544984B2 (en) * 2013-07-22 2017-01-10 Kla-Tencor Corporation System and method for generation of extreme ultraviolet light
KR101736055B1 (en) * 2015-07-24 2017-05-29 한국기초과학지원연구원 Tunable UV LASER GENERATOR FOR ULTRA HIGH RESOLUTION MICROSCOPE LIGHT SOURCE AND GENERATING METHOD THEREOF
KR102529565B1 (en) * 2018-02-01 2023-05-04 삼성전자주식회사 Extreme ultra violet(EUV) generating device
KR102244638B1 (en) 2019-04-18 2021-04-26 주식회사 에프에스티 Extreme ultraviolet ray generator using high harmonic wave with improved pollution prevention performance
KR102243189B1 (en) * 2020-10-12 2021-04-21 김윤호 Beam profiling imaging apparatus for vacuum
KR20230123576A (en) 2022-02-16 2023-08-24 주식회사 에프에스티 A thermal damage reduction device of an extreme ultraviolet generating device using high-order harmonic generation
KR20230157795A (en) 2022-05-10 2023-11-17 주식회사 이솔 Device for EUV Light Source
KR20230171246A (en) 2022-06-13 2023-12-20 주식회사 이솔 Device for EUV Light Source

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20040007454A (en) * 2001-02-26 2004-01-24 가부시키가이샤 니콘 Extreme ultraviolet generating device, exposure device using the generating device, and semiconductor manufacturing method
KR20080088392A (en) * 2007-03-28 2008-10-02 도오쿄 인스티튜드 오브 테크놀로지 Extreme ultraviolet light source apparatus and method for generating extreme ultraviolet light
KR20090039589A (en) * 2007-10-17 2009-04-22 도오쿄 인스티튜드 오브 테크놀로지 Light source apparatus of extreme ultraviolet light and method of generating extreme ultraviolet light
JP2010147138A (en) * 2008-12-17 2010-07-01 Ushio Inc Extreme ultraviolet light source device and maintenance method of same

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20040007454A (en) * 2001-02-26 2004-01-24 가부시키가이샤 니콘 Extreme ultraviolet generating device, exposure device using the generating device, and semiconductor manufacturing method
KR20080088392A (en) * 2007-03-28 2008-10-02 도오쿄 인스티튜드 오브 테크놀로지 Extreme ultraviolet light source apparatus and method for generating extreme ultraviolet light
KR20090039589A (en) * 2007-10-17 2009-04-22 도오쿄 인스티튜드 오브 테크놀로지 Light source apparatus of extreme ultraviolet light and method of generating extreme ultraviolet light
JP2010147138A (en) * 2008-12-17 2010-07-01 Ushio Inc Extreme ultraviolet light source device and maintenance method of same

Also Published As

Publication number Publication date
WO2012118280A2 (en) 2012-09-07
KR101172622B1 (en) 2012-08-08

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