JP2013529848A5 - - Google Patents

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Publication number
JP2013529848A5
JP2013529848A5 JP2013516580A JP2013516580A JP2013529848A5 JP 2013529848 A5 JP2013529848 A5 JP 2013529848A5 JP 2013516580 A JP2013516580 A JP 2013516580A JP 2013516580 A JP2013516580 A JP 2013516580A JP 2013529848 A5 JP2013529848 A5 JP 2013529848A5
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JP
Japan
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pulse
seed laser
output
amped
prepulse
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JP2013516580A
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Japanese (ja)
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JP2013529848A (ja
JP5893014B2 (ja
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Priority claimed from US13/077,236 external-priority patent/US8654438B2/en
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JP2013516580A 2010-06-24 2011-05-24 Ｅｕｖ光源のためのプレパルスを有する主発振器−電力増幅器駆動レーザ Active JP5893014B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US39845210P 2010-06-24 2010-06-24
US61/398,452 2010-06-24
US13/077,236 2011-03-31
US13/077,236 US8654438B2 (en) 2010-06-24 2011-03-31 Master oscillator-power amplifier drive laser with pre-pulse for EUV light source
PCT/US2011/037793 WO2011162903A1 (en) 2010-06-24 2011-05-24 Master oscillator-power amplifier drive laser with pre-pulse for euv light source

Publications (3)

Publication Number Publication Date
JP2013529848A JP2013529848A (ja) 2013-07-22
JP2013529848A5 true JP2013529848A5 (enExample) 2014-07-17
JP5893014B2 JP5893014B2 (ja) 2016-03-23

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JP2013516580A Active JP5893014B2 (ja) 2010-06-24 2011-05-24 Ｅｕｖ光源のためのプレパルスを有する主発振器−電力増幅器駆動レーザ

Country Status (7)

Country Link
US (2) US8654438B2 (enExample)
EP (1) EP2586107A1 (enExample)
JP (1) JP5893014B2 (enExample)
KR (1) KR101835561B1 (enExample)
CN (1) CN102971922B (enExample)
TW (1) TWI535338B (enExample)
WO (1) WO2011162903A1 (enExample)

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TWI788998B (zh) * 2015-08-12 2023-01-01 荷蘭商Ａｓｍｌ荷蘭公司 極紫外線光源中之目標擴張率控制
US9536631B1 (en) * 2015-11-19 2017-01-03 Asml Netherlands B.V. Systems and methods to avoid instability conditions in a source plasma chamber
EP3381244B1 (de) 2015-11-27 2022-06-08 TRUMPF Lasersystems for Semiconductor Manufacturing GmbH Treiberlaseranordnung, euv-strahlungserzeugungsvorrichtung und verfahren zum verstärken von laserpulsen
JP6714397B2 (ja) * 2016-03-08 2020-06-24 株式会社サタケ 圧電式バルブ、該圧電式バルブの駆動方法、及び該圧電式バルブを利用した噴風手段を備える光学式粒状物選別機
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US10048199B1 (en) * 2017-03-20 2018-08-14 Asml Netherlands B.V. Metrology system for an extreme ultraviolet light source
US10299361B2 (en) * 2017-03-24 2019-05-21 Asml Netherlands B.V. Optical pulse generation for an extreme ultraviolet light source
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US10925142B2 (en) * 2018-07-31 2021-02-16 Taiwan Semiconductor Manufacturing Co., Ltd. EUV radiation source for lithography exposure process
US12078934B2 (en) * 2018-09-25 2024-09-03 Asml Netherlands B.V. Laser system for target metrology and alteration in an EUV light source
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