JP5893014B2 - Euv光源のためのプレパルスを有する主発振器−電力増幅器駆動レーザ - Google Patents
Euv光源のためのプレパルスを有する主発振器−電力増幅器駆動レーザ Download PDFInfo
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- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
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- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/105—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length
- H01S3/1055—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length one of the reflectors being constituted by a diffraction grating
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- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/11—Mode locking; Q-switching; Other giant-pulse techniques, e.g. cavity dumping
- H01S3/1123—Q-switching
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Description
本出願は、2011年3月31日出願の米国一般特許出願第13/077236号の恩典を請求し、かつ代理人整理番号第2009−0038−01号である2010年6月24日出願の「EUV光源のためのプレパルスを有する主発振器−電力増幅器駆動レーザ」という名称の米国特許仮出願第61/398,452号の恩典を主張するものであり、これら特許の開示内容全体は、引用によりここで本明細書に組み込まれる。
Iout α Isat x[2go Lcavity−ln(1/R1R2)]
ここで、Lcavityは光キャビティ長であり、R1及びR2は一般的なCO2レーザのミラー反射率である。具体的には、Iが強度であり、Aが出力ビームの領域である場合のI=P/Aに注意すると、表1〜表4の縦列5に示す相対的な利得(すなわち、IOut,selected lineのIOut、10P20に対する比)は、以下のように相対電力(表1〜表4の縦列4)から計算することができる。
G = exp[go L]
ここで、Lは、増幅器利得媒体の長さである。上述の解析では、異なるタイプのCO2レーザの小信号利得帯域の全体的な形状はほぼ同じであると仮定している。代替手法では、使用される特定の増幅器におけるこのような特定の線に対して小信号利得係数g0を測定することができる。
EPP-SEED = EPP-TARGET / G
プレパルスレーザの出力パルスエネルギ作動範囲と比較することができる[判断ボックス212]。選択されたプレパルスシード出力パルスエネルギEPP-SEEDが出力パルスエネルギ作動範囲である場合に[ボックス214]、選択されたプレパルスλは適切である。それに反し、選択されたプレパルスシード出力パルスエネルギEPP-SEEDが出力パルスエネルギ作動範囲の外側にある場合に、選択されたプレパルス(λ)は不適切であり、ボックス[208]、[210]、及び[212]をやり直すことにより、別のプレパルス波長を解析する[ボックス216]。この工程は、次に、適切なプレパルス波長が得られるまで必要に応じて繰り返される。
EPP-SEED = EPP-TARGET / G
70 回折格子
74a、74b ミラー
76 ビーム経路
78 活性媒体
81 光学系
Claims (9)
- λ1≠λ2の波長λ1及びλ2を含む利得帯域を有する光増幅器と、
プレパルス出力を波長λ1に同調させるための同調モジュールを有するプレパルスシードレーザと、
波長λ2を有するレーザ出力を発生させる主パルスシードレーザと、
前記光増幅器を通る共通光路上に前記プレパルス出力及び前記主パルス出力を向けるためのビーム結合器と、
を含み、
前記同調モジュールは、
a)前記主パルスシードレーザのための波長λ2を選択すること、
b)前記選択の後に、種々のプレパルス波長のうちの1つのプレパルス波長を用いて計算されたプレパルスシード出力パルスエネルギが第1の条件及び第2の条件のうちの少なくとも一方を確実に満たすようにするために、試行錯誤による手法を用いて前記種々のプレパルス波長を反復的にテストすること、ここで前記第1の条件とは、前記プレパルス波長に基づいて計算されたプレパルスシード出力パルスエネルギが前記プレパルスシードレーザのための作動出力パルスエネルギ範囲にあることであり、そして前記第2の条件とは、計算されたプレパルスシード出力パルスエネルギの主パルスレーザ出力エネルギに対する比が予め決められた範囲にあることであり、
c)前記プレパルス波長が前記第1の条件及び第2の条件の少なくとも一方を満たす場合は、前記プレパルス波長を前記λ1と指定すること、
によって前記同調を行うことを特徴とするデバイス。
- 前記同調モジュールは、回折格子を含むことを特徴とする請求項1に記載のデバイス。
- 前記プレパルスシードレーザ及び前記主パルスシードレーザは、CO2を含む利得媒体を有し、λ1及びλ2は、共通の振動ブランチ内の回転線に対応することを特徴とする請求項1に記載のデバイス。
- 前記プレパルスシードレーザ及び前記主パルスシードレーザは、CO2を含む利得媒体を有し、λ1及びλ2は、異なる振動ブランチ内の回転線に対応することを特徴とする請求項1に記載のデバイス。
- 前記プレパルスシードレーザ及び前記主パルスシードレーザは、CO2を含む利得媒体を有し、λ1及びλ2は、異なる振動ブランチ内の回転線に対応し、
前記振動ブランチは、共通の上側レベルを共有しない、
ことを特徴とする請求項1に記載のデバイス。 - 前記プレパルスシードレーザは、減圧密封高周波放電CO2レーザを含むことを特徴とする請求項1に記載のデバイス。
- 前記プレパルス出力はパルスエネルギEPPを有し、前記主パルス出力はパルスエネルギEMPを有し、EMP<1000×EPPであることを特徴とする請求項1に記載のデバイス。
- 前記光増幅器は、CO2を含む利得媒体を有し、かつプレパルス増幅器出力パルスエネルギEPP-AMPED及びEMP−AMPED>10×EPP-AMPEDである主パルス増幅器出力パルスエネルギEMP−AMPEDを生成することを特徴とする請求項7に記載のデバイス。
- EMP<10×EPPであることを特徴とする請求項7に記載のデバイス。
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US39845210P | 2010-06-24 | 2010-06-24 | |
US61/398,452 | 2010-06-24 | ||
US13/077,236 US8654438B2 (en) | 2010-06-24 | 2011-03-31 | Master oscillator-power amplifier drive laser with pre-pulse for EUV light source |
US13/077,236 | 2011-03-31 | ||
PCT/US2011/037793 WO2011162903A1 (en) | 2010-06-24 | 2011-05-24 | Master oscillator-power amplifier drive laser with pre-pulse for euv light source |
Publications (3)
Publication Number | Publication Date |
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JP2013529848A JP2013529848A (ja) | 2013-07-22 |
JP2013529848A5 JP2013529848A5 (ja) | 2014-07-17 |
JP5893014B2 true JP5893014B2 (ja) | 2016-03-23 |
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JP2013516580A Active JP5893014B2 (ja) | 2010-06-24 | 2011-05-24 | Euv光源のためのプレパルスを有する主発振器−電力増幅器駆動レーザ |
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US (2) | US8654438B2 (ja) |
EP (1) | EP2586107A1 (ja) |
JP (1) | JP5893014B2 (ja) |
KR (1) | KR101835561B1 (ja) |
CN (1) | CN102971922B (ja) |
TW (1) | TWI535338B (ja) |
WO (1) | WO2011162903A1 (ja) |
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US9091754B2 (en) | 2009-09-02 | 2015-07-28 | Trimble A.B. | Distance measurement methods and apparatus |
US8872142B2 (en) | 2010-03-18 | 2014-10-28 | Gigaphoton Inc. | Extreme ultraviolet light generation apparatus |
DE102013002064A1 (de) * | 2012-02-11 | 2013-08-14 | Media Lario S.R.L. | Quell-kollektor-module für euv-lithographie unter verwendung eines gic-spiegels und einer lpp-quelle |
US8681427B2 (en) * | 2012-05-31 | 2014-03-25 | Cymer, Inc. | System and method for separating a main pulse and a pre-pulse beam from a laser source |
DE102012209837A1 (de) | 2012-06-12 | 2013-12-12 | Trumpf Laser- Und Systemtechnik Gmbh | EUV-Anregungslichtquelle mit einer Laserstrahlquelle und einer Strahlführungsvorrichtung zum Manipulieren des Laserstrahls |
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US8958143B2 (en) | 2015-02-17 |
CN102971922A (zh) | 2013-03-13 |
KR101835561B1 (ko) | 2018-03-07 |
JP2013529848A (ja) | 2013-07-22 |
EP2586107A1 (en) | 2013-05-01 |
KR20130121809A (ko) | 2013-11-06 |
US20140146387A1 (en) | 2014-05-29 |
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