JP2010186990A5 - - Google Patents

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Publication number
JP2010186990A5
JP2010186990A5 JP2010001421A JP2010001421A JP2010186990A5 JP 2010186990 A5 JP2010186990 A5 JP 2010186990A5 JP 2010001421 A JP2010001421 A JP 2010001421A JP 2010001421 A JP2010001421 A JP 2010001421A JP 2010186990 A5 JP2010186990 A5 JP 2010186990A5
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JP2010001421A
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JP5474576B2 (ja
JP2010186990A (ja
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JP2010001421A 2009-01-14 2010-01-06 レーザ光増幅器及びそれを用いたレーザ装置 Active JP5474576B2 (ja)

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Application Number Priority Date Filing Date Title
JP2010001421A JP5474576B2 (ja) 2009-01-14 2010-01-06 レーザ光増幅器及びそれを用いたレーザ装置

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2009005771 2009-01-14
JP2009005771 2009-01-14
JP2010001421A JP5474576B2 (ja) 2009-01-14 2010-01-06 レーザ光増幅器及びそれを用いたレーザ装置

Publications (3)

Publication Number Publication Date
JP2010186990A JP2010186990A (ja) 2010-08-26
JP2010186990A5 true JP2010186990A5 (enExample) 2012-12-20
JP5474576B2 JP5474576B2 (ja) 2014-04-16

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JP2010001421A Active JP5474576B2 (ja) 2009-01-14 2010-01-06 レーザ光増幅器及びそれを用いたレーザ装置

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US (2) US8559099B2 (enExample)
JP (1) JP5474576B2 (enExample)
DE (1) DE102010000032B4 (enExample)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5666285B2 (ja) 2010-03-15 2015-02-12 ギガフォトン株式会社 再生増幅器、レーザ装置および極端紫外光生成装置
JP2012109417A (ja) 2010-11-17 2012-06-07 Komatsu Ltd スラブ型増幅装置、レーザ装置および極端紫外光源装置
DE102010064147B4 (de) * 2010-12-23 2013-09-12 Rofin-Sinar Laser Gmbh Bandleiter-Laserverstärker und Laseranordnung mit einem Bandleiter-Laserverstärker
US8810902B2 (en) * 2010-12-29 2014-08-19 Asml Netherlands B.V. Multi-pass optical apparatus
DE112011105360B4 (de) 2011-06-20 2023-05-04 Mitsubishi Electric Corp. Gaslaser-vorrichtung
JP2013207004A (ja) * 2012-03-27 2013-10-07 Gigaphoton Inc レーザ装置
JP2013207003A (ja) * 2012-03-27 2013-10-07 Gigaphoton Inc レーザ装置
WO2013144695A1 (en) * 2012-03-29 2013-10-03 Gigaphoton Inc. Laser apparatus, laser system, and extreme ultraviolet light generation apparatus
JP2013207298A (ja) * 2012-03-29 2013-10-07 Gigaphoton Inc レーザ装置、レーザシステムおよび極端紫外光生成装置
WO2014045889A1 (ja) 2012-09-18 2014-03-27 ギガフォトン株式会社 スラブ型増幅器、それを含むレーザ装置および極短紫外光生成装置
DE102012217120A1 (de) * 2012-09-24 2014-03-27 Trumpf Laser- Und Systemtechnik Gmbh EUV-Strahlungserzeugungsvorrichtung und Betriebsverfahren dafür
CN205452776U (zh) 2013-07-18 2016-08-10 三菱电机株式会社 气体激光装置
WO2015033426A1 (ja) * 2013-09-05 2015-03-12 ギガフォトン株式会社 レーザ増幅器、及びレーザ装置、並びに極端紫外光生成システム
WO2015115624A1 (ja) * 2014-01-30 2015-08-06 京セラ株式会社 筒体、プラズマ装置、ガスレーザー装置、および筒体の製造方法
JP6521870B2 (ja) 2014-02-10 2019-05-29 ギガフォトン株式会社 レーザ装置
WO2016026523A1 (de) * 2014-08-20 2016-02-25 Trumpf Lasersystems For Semiconductor Manufacturing Gmbh Verfahren zum verlängern eines laufwegs eines lichtstrahls, optische verzögerungseinrichtung und treiberlaseranordnung damit
WO2016116147A1 (de) * 2015-01-21 2016-07-28 Trumpf Lasersystems For Semiconductor Manufacturing Gmbh Strahlführungseinrichtung, euv-strahlungserzeugungsvorrichtung und verfahren zum einstellen eines strahldurchmessers und eines öffnungswinkels eines laserstrahls
RU2607839C2 (ru) * 2015-06-25 2017-01-20 Федеральное государственное бюджетное учреждение науки Институт прикладной физики Российской академии наук (ИПФ РАН) Многопроходный лазерный усилитель на дисковом активном элементе
US10268128B2 (en) 2015-07-08 2019-04-23 Asml Netherlands B.V. Lithographic apparatus
US10585215B2 (en) 2017-06-29 2020-03-10 Cymer, Llc Reducing optical damage on an optical element
CN110231288B (zh) * 2018-03-06 2022-04-08 徐州旭海光电科技有限公司 一种紧凑和稳定的光程气室
EP3997518A1 (en) * 2019-07-11 2022-05-18 ASML Netherlands B.V. A measurement system for use with a light amplification cavity
EP3793044B1 (en) * 2019-09-12 2021-11-03 Kern Technologies, LLC Output coupling from unstable laser resonators
DE102020113631B3 (de) 2020-05-20 2021-10-21 Helmut-Schmidt-Universität Universität der Bundeswehr Hamburg Vorrichtung zur spektralen Verbreiterung eines Laserimpulses und Lasersystem

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US4622675A (en) * 1983-07-29 1986-11-11 P.R.C., Ltd. Forced transport molecular gas laser and method
JPS63296382A (ja) * 1987-05-28 1988-12-02 Fanuc Ltd レ−ザ発振装置
US4918395A (en) * 1988-11-21 1990-04-17 Spectra-Physics Multipass laser amplifier with at least one expanded pass
DE9003331U1 (de) * 1990-03-21 1991-07-18 Rofin-Sinar Laser GmbH, 2000 Hamburg Gaslaser
DE4112311A1 (de) * 1991-04-15 1992-10-22 Max Planck Gesellschaft Transversal elektrisch gepumpter gaslaser mit schraeg ausgefuehrtem strahldurchgang
DE4300700A1 (en) 1992-01-14 1993-07-29 Boreal Laser Inc Carbon di:oxide plate laser group arrangement - has channel between wave-conducting electrode surfaces subdivided into multiple parallel laser resonators
GB9420954D0 (en) * 1994-10-18 1994-12-07 Univ Keele An infrared radiation emitting device
DE19609851A1 (de) * 1996-03-13 1997-09-18 Rofin Sinar Laser Gmbh Bandleiterlaser
FR2756672B1 (fr) * 1996-12-04 1999-03-12 Thomson Csf Dispositif amplificateur de lumiere a deux faisceaux incidents
DE10025874B4 (de) * 1999-06-01 2005-03-17 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Optische Verstärker-Anordnung
JP2001007421A (ja) * 1999-06-18 2001-01-12 Ishikawajima Harima Heavy Ind Co Ltd 固体レーザ光伝搬装置
WO2002082600A2 (en) * 2001-04-04 2002-10-17 Coherent Deos Q-switched cavity dumped co2 laser for material processing
US7439530B2 (en) * 2005-06-29 2008-10-21 Cymer, Inc. LPP EUV light source drive laser system
JP2005294393A (ja) * 2004-03-31 2005-10-20 Fanuc Ltd レーザ発振器
JP2008028316A (ja) * 2006-07-25 2008-02-07 Ihi Corp 伝送光学系
JP5086677B2 (ja) * 2006-08-29 2012-11-28 ギガフォトン株式会社 極端紫外光源装置用ドライバーレーザ
JP5758569B2 (ja) * 2008-06-12 2015-08-05 ギガフォトン株式会社 スラブ型レーザ装置
US8536551B2 (en) * 2008-06-12 2013-09-17 Gigaphoton Inc. Extreme ultra violet light source apparatus
JP5666285B2 (ja) * 2010-03-15 2015-02-12 ギガフォトン株式会社 再生増幅器、レーザ装置および極端紫外光生成装置

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