JP2012523705A5 - - Google Patents

Download PDF

Info

Publication number
JP2012523705A5
JP2012523705A5 JP2012504828A JP2012504828A JP2012523705A5 JP 2012523705 A5 JP2012523705 A5 JP 2012523705A5 JP 2012504828 A JP2012504828 A JP 2012504828A JP 2012504828 A JP2012504828 A JP 2012504828A JP 2012523705 A5 JP2012523705 A5 JP 2012523705A5
Authority
JP
Japan
Prior art keywords
guide
laser beam
optical
wavelength
optical component
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2012504828A
Other languages
English (en)
Japanese (ja)
Other versions
JP2012523705A (ja
JP5859426B2 (ja
Filing date
Publication date
Priority claimed from US12/638,413 external-priority patent/US8304752B2/en
Application filed filed Critical
Publication of JP2012523705A publication Critical patent/JP2012523705A/ja
Publication of JP2012523705A5 publication Critical patent/JP2012523705A5/ja
Application granted granted Critical
Publication of JP5859426B2 publication Critical patent/JP5859426B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2012504828A 2009-04-10 2010-04-07 光学部品を光軸調整するためのシステム及び方法 Expired - Fee Related JP5859426B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US16833209P 2009-04-10 2009-04-10
US61/168,332 2009-04-10
US12/638,413 2009-12-15
US12/638,413 US8304752B2 (en) 2009-04-10 2009-12-15 EUV light producing system and method utilizing an alignment laser
PCT/US2010/030258 WO2010118146A1 (en) 2009-04-10 2010-04-07 Alignment laser

Publications (3)

Publication Number Publication Date
JP2012523705A JP2012523705A (ja) 2012-10-04
JP2012523705A5 true JP2012523705A5 (enExample) 2013-05-30
JP5859426B2 JP5859426B2 (ja) 2016-02-10

Family

ID=42936560

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012504828A Expired - Fee Related JP5859426B2 (ja) 2009-04-10 2010-04-07 光学部品を光軸調整するためのシステム及び方法

Country Status (4)

Country Link
US (1) US8304752B2 (enExample)
JP (1) JP5859426B2 (enExample)
KR (1) KR101548289B1 (enExample)
WO (1) WO2010118146A1 (enExample)

Families Citing this family (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5368261B2 (ja) * 2008-11-06 2013-12-18 ギガフォトン株式会社 極端紫外光源装置、極端紫外光源装置の制御方法
US8283643B2 (en) * 2008-11-24 2012-10-09 Cymer, Inc. Systems and methods for drive laser beam delivery in an EUV light source
WO2011018295A1 (en) * 2009-08-14 2011-02-17 Asml Netherlands B.V. Euv radiation system and lithographic apparatus
US9265136B2 (en) 2010-02-19 2016-02-16 Gigaphoton Inc. System and method for generating extreme ultraviolet light
JP5701618B2 (ja) * 2010-03-04 2015-04-15 ギガフォトン株式会社 極端紫外光生成装置
JP5864949B2 (ja) 2010-11-29 2016-02-17 ギガフォトン株式会社 極端紫外光生成システム
JP5641958B2 (ja) 2011-01-31 2014-12-17 ギガフォトン株式会社 チャンバ装置およびそれを備える極端紫外光生成装置
JP2012178534A (ja) * 2011-02-02 2012-09-13 Gigaphoton Inc 光学システムおよびそれを用いた極端紫外光生成システム
JP5816440B2 (ja) 2011-02-23 2015-11-18 ギガフォトン株式会社 光学装置、レーザ装置および極端紫外光生成装置
JP2012199512A (ja) 2011-03-10 2012-10-18 Gigaphoton Inc 極端紫外光生成装置及び極端紫外光生成方法
US8604452B2 (en) * 2011-03-17 2013-12-10 Cymer, Llc Drive laser delivery systems for EUV light source
JP5856898B2 (ja) * 2011-06-02 2016-02-10 ギガフォトン株式会社 極端紫外光生成装置および極端紫外光生成方法
US9516730B2 (en) * 2011-06-08 2016-12-06 Asml Netherlands B.V. Systems and methods for buffer gas flow stabilization in a laser produced plasma light source
CN103748968A (zh) * 2011-09-02 2014-04-23 Asml荷兰有限公司 辐射源和光刻设备
CN103843463A (zh) * 2011-10-07 2014-06-04 Asml荷兰有限公司 辐射源
JP5657139B2 (ja) * 2011-12-07 2015-01-21 三菱電機株式会社 Ｃｏ２レーザ装置およびｃｏ２レーザ加工装置
TWI611731B (zh) 2012-12-21 2018-01-11 Gigaphoton Inc 雷射束控制裝置及極端紫外光產生裝置
US8872123B2 (en) * 2013-01-10 2014-10-28 Asml Netherlands B.V. Method of timing laser beam pulses to regulate extreme ultraviolet light dosing
US8872122B2 (en) * 2013-01-10 2014-10-28 Asml Netherlands B.V. Method of timing laser beam pulses to regulate extreme ultraviolet light dosing
JP6168797B2 (ja) * 2013-03-08 2017-07-26 ギガフォトン株式会社 極端紫外光生成装置
US8680495B1 (en) 2013-03-15 2014-03-25 Cymer, Llc Extreme ultraviolet light source
WO2015033426A1 (ja) 2013-09-05 2015-03-12 ギガフォトン株式会社 レーザ増幅器、及びレーザ装置、並びに極端紫外光生成システム
US9241395B2 (en) * 2013-09-26 2016-01-19 Asml Netherlands B.V. System and method for controlling droplet timing in an LPP EUV light source
US9497840B2 (en) * 2013-09-26 2016-11-15 Asml Netherlands B.V. System and method for creating and utilizing dual laser curtains from a single laser in an LPP EUV light source
JP6215334B2 (ja) 2013-09-27 2017-10-18 ギガフォトン株式会社 レーザ装置及び極端紫外光生成システム
WO2015086232A1 (en) 2013-12-09 2015-06-18 Asml Netherlands B.V. Radiation source device, lithographic apparatus and device manufacturing method
WO2015118687A1 (ja) * 2014-02-10 2015-08-13 ギガフォトン株式会社 レーザ装置及び極端紫外光生成システム
KR102695912B1 (ko) 2014-12-05 2024-08-14 컨버전트 덴탈 인크 레이저 빔의 정렬을 위한 시스템들 및 방법들
KR102269695B1 (ko) 2015-03-19 2021-06-25 삼성전자주식회사 극자외선 광 생성 장치
US9735069B2 (en) 2015-09-23 2017-08-15 Lam Research Corporation Method and apparatus for determining process rate
US10302553B2 (en) * 2017-08-30 2019-05-28 Lam Research Corporation Gas exhaust by-product measurement system
US10784174B2 (en) 2017-10-13 2020-09-22 Lam Research Corporation Method and apparatus for determining etch process parameters
CN109724919A (zh) * 2017-10-27 2019-05-07 曲阜师范大学 基于太阳跟踪的多组分大气污染气体检测光声光谱装置
NL2023633A (en) * 2018-09-25 2020-04-30 Asml Netherlands Bv Laser system for target metrology and alteration in an euv light source
CN110190499A (zh) * 2019-06-21 2019-08-30 苏州英谷激光有限公司 一种有效防止谐振腔失谐的方法
US12085860B2 (en) 2021-01-15 2024-09-10 Taiwan Semiconductor Manufacturing Co., Ltd. System and method for monitoring and controlling extreme ultraviolet photolithography processes

Family Cites Families (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IL48554A (en) 1975-11-27 1978-07-31 Laser Ind Ltd Laser beam aligning apparatus
US5022033A (en) 1989-10-30 1991-06-04 The United States Of America As Represented By The United States Department Of Energy Ring laser having an output at a single frequency
JPH06104520A (ja) * 1992-09-22 1994-04-15 Komatsu Ltd 狭帶域発振レーザ装置
US5577092A (en) 1995-01-25 1996-11-19 Kublak; Glenn D. Cluster beam targets for laser plasma extreme ultraviolet and soft x-ray sources
JPH0936466A (ja) * 1995-07-17 1997-02-07 Terumo Corp 固体レーザ共振器
JPH1098224A (ja) * 1996-09-25 1998-04-14 Terumo Corp 多波長レーザ装置及び波長連続可変レーザ装置
US6881925B1 (en) 1997-12-09 2005-04-19 Kabushiki Kaisha Toshiba Laser emission head, laser beam transmission device, laser beam transmission device adjustment method and preventive maintenance/repair device of structure in nuclear reactor
US6567450B2 (en) 1999-12-10 2003-05-20 Cymer, Inc. Very narrow band, two chamber, high rep rate gas discharge laser system
US6549551B2 (en) 1999-09-27 2003-04-15 Cymer, Inc. Injection seeded laser with precise timing control
US6625191B2 (en) 1999-12-10 2003-09-23 Cymer, Inc. Very narrow band, two chamber, high rep rate gas discharge laser system
US6972421B2 (en) 2000-06-09 2005-12-06 Cymer, Inc. Extreme ultraviolet light source
US7491954B2 (en) * 2006-10-13 2009-02-17 Cymer, Inc. Drive laser delivery systems for EUV light source
US7405416B2 (en) * 2005-02-25 2008-07-29 Cymer, Inc. Method and apparatus for EUV plasma source target delivery
US7598509B2 (en) * 2004-11-01 2009-10-06 Cymer, Inc. Laser produced plasma EUV light source
US7439530B2 (en) * 2005-06-29 2008-10-21 Cymer, Inc. LPP EUV light source drive laser system
US7897947B2 (en) * 2007-07-13 2011-03-01 Cymer, Inc. Laser produced plasma EUV light source having a droplet stream produced using a modulated disturbance wave
US7164144B2 (en) * 2004-03-10 2007-01-16 Cymer Inc. EUV light source
US7087914B2 (en) * 2004-03-17 2006-08-08 Cymer, Inc High repetition rate laser produced plasma EUV light source
US7109503B1 (en) * 2005-02-25 2006-09-19 Cymer, Inc. Systems for protecting internal components of an EUV light source from plasma-generated debris
JP4875879B2 (ja) 2005-10-12 2012-02-15 株式会社小松製作所 極端紫外光源装置の初期アライメント方法
US7920616B2 (en) 2005-11-01 2011-04-05 Cymer, Inc. Laser system
US7453077B2 (en) * 2005-11-05 2008-11-18 Cymer, Inc. EUV light source
US8158960B2 (en) * 2007-07-13 2012-04-17 Cymer, Inc. Laser produced plasma EUV light source
JP4800145B2 (ja) 2006-08-09 2011-10-26 株式会社小松製作所 極端紫外光源装置用ドライバーレーザ
JP5076079B2 (ja) 2006-10-18 2012-11-21 ギガフォトン株式会社 極端紫外光源装置
JP5372349B2 (ja) 2007-08-23 2013-12-18 浜松ホトニクス株式会社 量子カスケードレーザ素子
US7872245B2 (en) * 2008-03-17 2011-01-18 Cymer, Inc. Systems and methods for target material delivery in a laser produced plasma EUV light source
US8283643B2 (en) * 2008-11-24 2012-10-09 Cymer, Inc. Systems and methods for drive laser beam delivery in an EUV light source
US8138487B2 (en) * 2009-04-09 2012-03-20 Cymer, Inc. System, method and apparatus for droplet catcher for prevention of backsplash in a EUV generation chamber
US8173985B2 (en) * 2009-12-15 2012-05-08 Cymer, Inc. Beam transport system for extreme ultraviolet light source
US8000212B2 (en) * 2009-12-15 2011-08-16 Cymer, Inc. Metrology for extreme ultraviolet light source
US8368039B2 (en) * 2010-04-05 2013-02-05 Cymer, Inc. EUV light source glint reduction system
US8263953B2 (en) * 2010-04-09 2012-09-11 Cymer, Inc. Systems and methods for target material delivery protection in a laser produced plasma EUV light source

Similar Documents

Publication Publication Date Title
JP2012523705A5 (enExample)
US10064261B2 (en) Extreme ultraviolet light source
TWI636709B (zh) 極紫外線(euv)光源及產生euv光之方法
JP2014510377A5 (enExample)
US9832855B2 (en) Optical isolation module
WO2012125287A3 (en) Drive laser delivery systems for euv light source
WO2008143084A1 (ja) ファイバレーザ
WO2012150149A3 (de) Laserbearbeitungssystem mit einem in seiner brillanz einstellbaren bearbeitungslaserstrahl
WO2012107815A3 (en) Laser apparatus, extreme ultraviolet light generation system, method for controlling the laser apparatus, and method for generating the extreme ultraviolet light
WO2010026197A3 (de) Wellenlängenabstimmbare lichtquelle
JP2006135298A5 (enExample)
JP2010506425A5 (enExample)
US8680495B1 (en) Extreme ultraviolet light source
WO2009055687A3 (en) Laser energy source device and method
CN105874887A (zh) 极紫外光源
JP6545899B2 (ja) セルフシーディング高出力レーザー
CN103346470A (zh) 一种脉冲泵浦的低重复频率光纤激光相干合成系统
US10186827B2 (en) Amplifying pulsed laser radiation for EUV radiation production
WO2021025741A3 (en) Single-frequency fiber amplifier with distal cladding stripper
JP2019507501A (ja) 光アイソレータを備えたドライバレーザ装置および該ドライバレーザ装置を備えたｅｕｖビーム生成装置
WO2016125917A3 (ja) レーザ光源装置及びレーザパルス光生成方法
US20120307847A1 (en) Laser apparatus
CN104600549B (zh) 一种模式可控的相干反馈光纤随机激光器
US20180323567A1 (en) Laser beam generation apparatus, laser machining device, and laser machining method
WO2010026317A3 (fr) Cavite optique amplificatrice de type fabry-perot