JP2013524531A5 - - Google Patents

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Publication number
JP2013524531A5
JP2013524531A5 JP2013503803A JP2013503803A JP2013524531A5 JP 2013524531 A5 JP2013524531 A5 JP 2013524531A5 JP 2013503803 A JP2013503803 A JP 2013503803A JP 2013503803 A JP2013503803 A JP 2013503803A JP 2013524531 A5 JP2013524531 A5 JP 2013524531A5
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JP
Japan
Prior art keywords
chamber
light source
subsystem
light
light beam
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JP2013503803A
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English (en)
Japanese (ja)
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JP5593554B2 (ja
JP2013524531A (ja
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Priority claimed from US12/753,938 external-priority patent/US8368039B2/en
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Publication of JP2013524531A5 publication Critical patent/JP2013524531A5/ja
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JP2013503803A 2010-04-05 2011-04-01 極紫外線光源 Active JP5593554B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US12/753,938 US8368039B2 (en) 2010-04-05 2010-04-05 EUV light source glint reduction system
US12/753,938 2010-04-05
PCT/US2011/030974 WO2011126947A1 (en) 2010-04-05 2011-04-01 Extreme ultraviolet light source

Publications (3)

Publication Number Publication Date
JP2013524531A JP2013524531A (ja) 2013-06-17
JP2013524531A5 true JP2013524531A5 (enExample) 2014-05-29
JP5593554B2 JP5593554B2 (ja) 2014-09-24

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ID=44708533

Family Applications (1)

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JP2013503803A Active JP5593554B2 (ja) 2010-04-05 2011-04-01 極紫外線光源

Country Status (5)

Country Link
US (1) US8368039B2 (enExample)
JP (1) JP5593554B2 (enExample)
KR (1) KR101747120B1 (enExample)
TW (1) TWI469692B (enExample)
WO (1) WO2011126947A1 (enExample)

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DE102012205308B4 (de) * 2012-03-30 2018-05-30 Trumpf Lasersystems For Semiconductor Manufacturing Gmbh Vorrichtung zur Verstärkung eines Laserstrahls
US9396902B2 (en) * 2012-05-22 2016-07-19 Varian Semiconductor Equipment Associates, Inc. Gallium ION source and materials therefore
US8598552B1 (en) * 2012-05-31 2013-12-03 Cymer, Inc. System and method to optimize extreme ultraviolet light generation
US9753383B2 (en) 2012-06-22 2017-09-05 Asml Netherlands B.V. Radiation source and lithographic apparatus
US8872122B2 (en) * 2013-01-10 2014-10-28 Asml Netherlands B.V. Method of timing laser beam pulses to regulate extreme ultraviolet light dosing
US8872123B2 (en) * 2013-01-10 2014-10-28 Asml Netherlands B.V. Method of timing laser beam pulses to regulate extreme ultraviolet light dosing
US8901523B1 (en) * 2013-09-04 2014-12-02 Asml Netherlands B.V. Apparatus for protecting EUV optical elements
KR102197066B1 (ko) * 2014-07-01 2020-12-30 삼성전자 주식회사 플라즈마 광원, 그 광원을 구비한 검사 장치 및 플라즈마 광 생성 방법
US9357625B2 (en) * 2014-07-07 2016-05-31 Asml Netherlands B.V. Extreme ultraviolet light source
DE102016213830B3 (de) * 2016-07-27 2017-12-07 Carl Zeiss Smt Gmbh Quell-Hohlkörper sowie EUV-Plasma-Lichtquelle mit einem derartigen Quell-Hohlkörper
EP3291650B1 (en) * 2016-09-02 2019-06-05 ETH Zürich Device and method for generating uv or x-ray radiation by means of a plasma
US10310380B2 (en) * 2016-12-07 2019-06-04 Taiwan Semiconductor Manufacturing Co., Ltd. High-brightness light source
US10524345B2 (en) * 2017-04-28 2019-12-31 Taiwan Semiconductor Manufacturing Co., Ltd. Residual gain monitoring and reduction for EUV drive laser
US11333621B2 (en) 2017-07-11 2022-05-17 Kla-Tencor Corporation Methods and systems for semiconductor metrology based on polychromatic soft X-Ray diffraction
US10149374B1 (en) * 2017-08-25 2018-12-04 Asml Netherlands B.V. Receptacle for capturing material that travels on a material path
US11317500B2 (en) 2017-08-30 2022-04-26 Kla-Tencor Corporation Bright and clean x-ray source for x-ray based metrology
JP7320505B2 (ja) * 2017-12-15 2023-08-03 エーエスエムエル ネザーランズ ビー．ブイ． 真空容器内のデブリ流束測定システムの再生
US10959318B2 (en) 2018-01-10 2021-03-23 Kla-Tencor Corporation X-ray metrology system with broadband laser produced plasma illuminator
KR102555241B1 (ko) * 2018-08-08 2023-07-13 삼성전자주식회사 극자외선 생성 장치
NL2024077A (en) * 2018-10-25 2020-05-13 Asml Netherlands Bv Target material supply apparatus and method
US11259394B2 (en) 2019-11-01 2022-02-22 Kla Corporation Laser produced plasma illuminator with liquid sheet jet target
US11272607B2 (en) 2019-11-01 2022-03-08 Kla Corporation Laser produced plasma illuminator with low atomic number cryogenic target
US11143604B1 (en) 2020-04-06 2021-10-12 Kla Corporation Soft x-ray optics with improved filtering
US12061423B2 (en) * 2021-04-30 2024-08-13 Taiwan Semiconductor Manufacturing Company, Ltd. Method and apparatus for mitigating tin debris
CN113747644B (zh) * 2021-07-20 2024-05-28 中国工程物理研究院激光聚变研究中心 利用离子分离抑制黑腔辐射源腔壁等离子体膨胀的方法
JP2023148403A (ja) * 2022-03-30 2023-10-13 ウシオ電機株式会社 光源装置

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