JP2011018915A5 - - Google Patents
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- Publication number
- JP2011018915A5 JP2011018915A5 JP2010187099A JP2010187099A JP2011018915A5 JP 2011018915 A5 JP2011018915 A5 JP 2011018915A5 JP 2010187099 A JP2010187099 A JP 2010187099A JP 2010187099 A JP2010187099 A JP 2010187099A JP 2011018915 A5 JP2011018915 A5 JP 2011018915A5
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- liquid
- die
- radiation
- projection system
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/523,743 | 2006-09-20 | ||
| US11/523,743 US8330936B2 (en) | 2006-09-20 | 2006-09-20 | Lithographic apparatus and device manufacturing method |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007237470A Division JP4839288B2 (ja) | 2006-09-20 | 2007-09-13 | リソグラフィ装置およびデバイス製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2011018915A JP2011018915A (ja) | 2011-01-27 |
| JP2011018915A5 true JP2011018915A5 (enExample) | 2011-03-24 |
| JP5214678B2 JP5214678B2 (ja) | 2013-06-19 |
Family
ID=38782682
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007237470A Expired - Fee Related JP4839288B2 (ja) | 2006-09-20 | 2007-09-13 | リソグラフィ装置およびデバイス製造方法 |
| JP2010187099A Expired - Fee Related JP5214678B2 (ja) | 2006-09-20 | 2010-08-24 | リソグラフィ装置およびデバイス製造方法 |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007237470A Expired - Fee Related JP4839288B2 (ja) | 2006-09-20 | 2007-09-13 | リソグラフィ装置およびデバイス製造方法 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US8330936B2 (enExample) |
| EP (1) | EP1903398B1 (enExample) |
| JP (2) | JP4839288B2 (enExample) |
| KR (1) | KR100933000B1 (enExample) |
| CN (1) | CN101221363B (enExample) |
| DE (1) | DE602007012032D1 (enExample) |
| SG (1) | SG141385A1 (enExample) |
| TW (1) | TWI375129B (enExample) |
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5089143B2 (ja) * | 2006-11-20 | 2012-12-05 | キヤノン株式会社 | 液浸露光装置 |
| US8134685B2 (en) | 2007-03-23 | 2012-03-13 | Nikon Corporation | Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method |
| US20090310115A1 (en) * | 2008-06-12 | 2009-12-17 | Nikon Corporation | Apparatus and method for exposing adjacent sites on a substrate |
| EP2151717A1 (en) * | 2008-08-05 | 2010-02-10 | ASML Holding N.V. | Full wafer width scanning using step and scan system |
| NL2003226A (en) * | 2008-08-19 | 2010-03-09 | Asml Netherlands Bv | Lithographic apparatus, drying device, metrology apparatus and device manufacturing method. |
| JP5354339B2 (ja) * | 2008-12-18 | 2013-11-27 | 株式会社ニコン | 露光方法及び露光装置、並びにデバイス製造方法 |
| US8953143B2 (en) * | 2009-04-24 | 2015-02-10 | Nikon Corporation | Liquid immersion member |
| US8610878B2 (en) * | 2010-03-04 | 2013-12-17 | Asml Netherlands B.V. | Lithographic apparatus and method |
| NL2006818A (en) | 2010-07-02 | 2012-01-03 | Asml Netherlands Bv | A method of adjusting speed and/or routing of a table movement plan and a lithographic apparatus. |
| NL2008157A (en) * | 2011-02-22 | 2012-08-24 | Asml Netherlands Bv | Lithographic apparatus and lithographic projection method. |
| US8906599B2 (en) | 2012-05-17 | 2014-12-09 | Taiwan Semiconductor Manufacturing Co., Ltd. | Enhanced scanner throughput system and method |
| US9568828B2 (en) * | 2012-10-12 | 2017-02-14 | Nikon Corporation | Exposure apparatus, exposing method, device manufacturing method, program, and recording medium |
| JP5986538B2 (ja) | 2013-06-10 | 2016-09-06 | キヤノン株式会社 | 露光装置および物品の製造方法 |
| JP5960198B2 (ja) | 2013-07-02 | 2016-08-02 | キヤノン株式会社 | パターン形成方法、リソグラフィ装置、リソグラフィシステムおよび物品製造方法 |
| JP2016154241A (ja) * | 2013-07-02 | 2016-08-25 | キヤノン株式会社 | パターン形成方法、リソグラフィ装置、リソグラフィシステムおよび物品製造方法 |
| US9760027B2 (en) * | 2013-10-17 | 2017-09-12 | United Microelectronics Corp. | Scanner routing method for particle removal |
| CN104793467B (zh) * | 2014-01-20 | 2017-05-17 | 中芯国际集成电路制造(上海)有限公司 | 曝光装置、掩膜板及曝光方法 |
| KR102224767B1 (ko) | 2017-11-21 | 2021-03-08 | 누리온 케미칼즈 인터내셔널 비.브이. | 생물-기반 단량체로부터 제조된 열팽창성 마이크로스피어 |
| JP7504168B2 (ja) * | 2022-08-10 | 2024-06-21 | キヤノン株式会社 | 露光装置、露光方法及び物品の製造方法 |
Family Cites Families (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4509852A (en) | 1980-10-06 | 1985-04-09 | Werner Tabarelli | Apparatus for the photolithographic manufacture of integrated circuit elements |
| US6118515A (en) * | 1993-12-08 | 2000-09-12 | Nikon Corporation | Scanning exposure method |
| JPH10303126A (ja) * | 1997-02-28 | 1998-11-13 | Nikon Corp | 移動シーケンスの決定方法 |
| AU2746799A (en) * | 1998-03-09 | 1999-09-27 | Nikon Corporation | Scanning exposure method, scanning exposure apparatus and its manufacturing method, and device and its manufacturing method |
| AU2747999A (en) | 1998-03-26 | 1999-10-18 | Nikon Corporation | Projection exposure method and system |
| JP2000021702A (ja) | 1998-06-30 | 2000-01-21 | Canon Inc | 露光装置ならびにデバイス製造方法 |
| US6734117B2 (en) * | 2002-03-12 | 2004-05-11 | Nikon Corporation | Periodic clamping method and apparatus to reduce thermal stress in a wafer |
| SG121822A1 (en) | 2002-11-12 | 2006-05-26 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
| EP1420299B1 (en) | 2002-11-12 | 2011-01-05 | ASML Netherlands B.V. | Immersion lithographic apparatus and device manufacturing method |
| EP1420300B1 (en) | 2002-11-12 | 2015-07-29 | ASML Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| SG121818A1 (en) * | 2002-11-12 | 2006-05-26 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
| US7110081B2 (en) * | 2002-11-12 | 2006-09-19 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| EP1571697A4 (en) * | 2002-12-10 | 2007-07-04 | Nikon Corp | EXPOSURE SYSTEM AND DEVICE PRODUCTION METHOD |
| JP2005072132A (ja) | 2003-08-21 | 2005-03-17 | Nikon Corp | 露光装置及びデバイス製造方法 |
| DE60319087T2 (de) | 2003-10-16 | 2009-02-05 | Asml Netherlands B.V. | Lithographische Methode zur Herstellung einer Vorrichtung |
| KR100585108B1 (ko) * | 2003-11-14 | 2006-06-01 | 삼성전자주식회사 | 스캔 방식의 노광 장치를 이용한 웨이퍼 노광 방법 |
| US7244534B2 (en) | 2004-04-23 | 2007-07-17 | Asml Netherlands B.V. | Device manufacturing method |
| JPWO2005106930A1 (ja) | 2004-04-27 | 2008-03-21 | 株式会社ニコン | 露光方法、露光装置及びデバイス製造方法 |
| US7701550B2 (en) | 2004-08-19 | 2010-04-20 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| JP4003885B2 (ja) * | 2004-08-23 | 2007-11-07 | Ｔｄｋ株式会社 | 露光方法および露光装置 |
| JP4625673B2 (ja) | 2004-10-15 | 2011-02-02 | 株式会社東芝 | 露光方法及び露光装置 |
| SG124359A1 (en) | 2005-01-14 | 2006-08-30 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
| US7462429B2 (en) | 2005-10-12 | 2008-12-09 | Asml Netherlands B.V. | Method and arrangement for correcting thermally-induced field deformations of a lithographically exposed substrate |
| US7864292B2 (en) | 2005-11-16 | 2011-01-04 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7666576B2 (en) * | 2006-06-07 | 2010-02-23 | Taiwan Semiconductor Manufacturing Company, Ltd. | Exposure scan and step direction optimization |
| US7656502B2 (en) | 2006-06-22 | 2010-02-02 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
-
2006
- 2006-09-20 US US11/523,743 patent/US8330936B2/en not_active Expired - Fee Related
-
2007
- 2007-09-13 JP JP2007237470A patent/JP4839288B2/ja not_active Expired - Fee Related
- 2007-09-13 TW TW096134261A patent/TWI375129B/zh not_active IP Right Cessation
- 2007-09-13 SG SG200708777-8A patent/SG141385A1/en unknown
- 2007-09-18 EP EP07253692A patent/EP1903398B1/en not_active Not-in-force
- 2007-09-18 DE DE602007012032T patent/DE602007012032D1/de active Active
- 2007-09-19 KR KR1020070095195A patent/KR100933000B1/ko not_active Expired - Fee Related
- 2007-09-20 CN CN2007101527498A patent/CN101221363B/zh not_active Expired - Fee Related
-
2010
- 2010-08-24 JP JP2010187099A patent/JP5214678B2/ja not_active Expired - Fee Related