JP2014521111A5 - - Google Patents

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JP2014521111A5
JP2014521111A5 JP2014517551A JP2014517551A JP2014521111A5 JP 2014521111 A5 JP2014521111 A5 JP 2014521111A5 JP 2014517551 A JP2014517551 A JP 2014517551A JP 2014517551 A JP2014517551 A JP 2014517551A JP 2014521111 A5 JP2014521111 A5 JP 2014521111A5
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JP
Japan
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substrate table
mode
support structure
target portion
patterning device
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JP2014517551A
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English (en)
Japanese (ja)
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JP6236000B2 (ja
JP2014521111A (ja
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Priority claimed from PCT/EP2012/060133 external-priority patent/WO2013007442A1/en
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JP2014517551A 2011-07-08 2012-05-30 リソグラフィパターニングプロセスおよび同プロセス内で使用するレジスト Active JP6236000B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201161505768P 2011-07-08 2011-07-08
US61/505,768 2011-07-08
PCT/EP2012/060133 WO2013007442A1 (en) 2011-07-08 2012-05-30 Lithographic patterning process and resists to use therein

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2017208377A Division JP6637943B2 (ja) 2011-07-08 2017-10-27 リソグラフィパターニングプロセスおよび同プロセス内で使用するレジスト

Publications (3)

Publication Number Publication Date
JP2014521111A JP2014521111A (ja) 2014-08-25
JP2014521111A5 true JP2014521111A5 (enExample) 2015-07-16
JP6236000B2 JP6236000B2 (ja) 2017-11-22

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JP2014517551A Active JP6236000B2 (ja) 2011-07-08 2012-05-30 リソグラフィパターニングプロセスおよび同プロセス内で使用するレジスト
JP2017208377A Active JP6637943B2 (ja) 2011-07-08 2017-10-27 リソグラフィパターニングプロセスおよび同プロセス内で使用するレジスト

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JP2017208377A Active JP6637943B2 (ja) 2011-07-08 2017-10-27 リソグラフィパターニングプロセスおよび同プロセス内で使用するレジスト

Country Status (7)

Country Link
US (1) US9261784B2 (enExample)
EP (1) EP2729844B1 (enExample)
JP (2) JP6236000B2 (enExample)
KR (2) KR101909567B1 (enExample)
CN (2) CN108594599B (enExample)
TW (1) TWI631423B (enExample)
WO (1) WO2013007442A1 (enExample)

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