JP2012524988A5 - - Google Patents
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- JP2012524988A5 JP2012524988A5 JP2012506419A JP2012506419A JP2012524988A5 JP 2012524988 A5 JP2012524988 A5 JP 2012524988A5 JP 2012506419 A JP2012506419 A JP 2012506419A JP 2012506419 A JP2012506419 A JP 2012506419A JP 2012524988 A5 JP2012524988 A5 JP 2012524988A5
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- final mirror
- time interval
- projection system
- during
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims 19
- 238000000034 method Methods 0.000 claims 12
- 230000005855 radiation Effects 0.000 claims 9
- 230000001360 synchronised effect Effects 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US17288609P | 2009-04-27 | 2009-04-27 | |
| US61/172,886 | 2009-04-27 | ||
| PCT/EP2010/053506 WO2010124903A1 (en) | 2009-04-27 | 2010-03-18 | Lithographic apparatus and method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2012524988A JP2012524988A (ja) | 2012-10-18 |
| JP2012524988A5 true JP2012524988A5 (enExample) | 2013-05-02 |
Family
ID=42225080
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012506419A Pending JP2012524988A (ja) | 2009-04-27 | 2010-03-18 | リソグラフィ装置および方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20120044471A1 (enExample) |
| JP (1) | JP2012524988A (enExample) |
| KR (1) | KR20120020135A (enExample) |
| CN (1) | CN102414623A (enExample) |
| NL (1) | NL2004425A (enExample) |
| TW (1) | TW201044122A (enExample) |
| WO (1) | WO2010124903A1 (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105929641A (zh) * | 2016-07-13 | 2016-09-07 | 无锡宏纳科技有限公司 | 透镜可移动的光刻机 |
| CN105954979A (zh) * | 2016-07-13 | 2016-09-21 | 无锡宏纳科技有限公司 | 通过移动透镜进行光刻的方法 |
| CN105954978A (zh) * | 2016-07-13 | 2016-09-21 | 无锡宏纳科技有限公司 | 透镜可移动的浸入式光刻机 |
| CN105974749A (zh) * | 2016-07-13 | 2016-09-28 | 无锡宏纳科技有限公司 | 通过浸入式光刻机进行光刻的方法 |
| US10775700B2 (en) | 2018-08-14 | 2020-09-15 | Taiwan Semiconductor Manufacturing Co., Ltd. | Lithography system and method for exposing wafer |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4708420A (en) * | 1984-05-24 | 1987-11-24 | The Commonwealth Of Australia | Focal plane scanning device |
| JP2714838B2 (ja) * | 1989-01-09 | 1998-02-16 | コニカ株式会社 | 電子写真感光体 |
| JPH0490552A (ja) * | 1990-08-02 | 1992-03-24 | Canon Inc | 露光装置 |
| JPH05343283A (ja) * | 1992-06-04 | 1993-12-24 | Hitachi Ltd | 半導体露光装置 |
| JP3028028B2 (ja) * | 1994-04-22 | 2000-04-04 | キヤノン株式会社 | 投影露光装置及びそれを用いた半導体デバイスの製造方法 |
| JP3231241B2 (ja) * | 1996-05-01 | 2001-11-19 | キヤノン株式会社 | Ｘ線縮小露光装置、及び該装置を用いた半導体製造方法 |
| US6147818A (en) * | 1998-12-21 | 2000-11-14 | The Regents Of The University Of California | Projection optics box |
| DE10134387A1 (de) * | 2001-07-14 | 2003-01-23 | Zeiss Carl | Optisches System mit mehreren optischen Elementen |
| JP4146673B2 (ja) * | 2002-06-18 | 2008-09-10 | 株式会社 液晶先端技術開発センター | 露光方法及び装置 |
| CN1466001A (zh) * | 2002-06-24 | 2004-01-07 | 中国科学院光电技术研究所 | 自适应全反射极紫外投影光刻物镜 |
| JP4497831B2 (ja) * | 2003-04-15 | 2010-07-07 | キヤノン株式会社 | 露光装置及びデバイスの製造方法 |
| US7760452B2 (en) * | 2003-04-25 | 2010-07-20 | Canon Kabushiki Kaisha | Driving apparatus, optical system, exposure apparatus and device fabrication method |
| JP4378109B2 (ja) * | 2003-05-30 | 2009-12-02 | キヤノン株式会社 | 露光装置、投影光学系、デバイスの製造方法 |
| JP2004140390A (ja) * | 2003-12-01 | 2004-05-13 | Canon Inc | 照明光学系、露光装置及びデバイス製造方法 |
| EP1806610B1 (en) * | 2004-10-26 | 2011-12-21 | Nikon Corporation | Optical system, lens barrel, exposure system, and production method for a device |
| US7307262B2 (en) * | 2004-12-23 | 2007-12-11 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| JP4817702B2 (ja) * | 2005-04-14 | 2011-11-16 | キヤノン株式会社 | 光学装置及びそれを備えた露光装置 |
| EP1981066B1 (en) * | 2006-01-30 | 2014-01-22 | Nikon Corporation | Optical member holding apparatus and exposure apparatus |
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2010
- 2010-03-18 JP JP2012506419A patent/JP2012524988A/ja active Pending
- 2010-03-18 KR KR1020117028222A patent/KR20120020135A/ko not_active Withdrawn
- 2010-03-18 CN CN2010800183873A patent/CN102414623A/zh active Pending
- 2010-03-18 US US13/266,565 patent/US20120044471A1/en not_active Abandoned
- 2010-03-18 WO PCT/EP2010/053506 patent/WO2010124903A1/en not_active Ceased
- 2010-03-18 NL NL2004425A patent/NL2004425A/en not_active Application Discontinuation
- 2010-04-06 TW TW099110622A patent/TW201044122A/zh unknown