JP2014170957A5 - - Google Patents
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- Publication number
- JP2014170957A5 JP2014170957A5 JP2014093766A JP2014093766A JP2014170957A5 JP 2014170957 A5 JP2014170957 A5 JP 2014170957A5 JP 2014093766 A JP2014093766 A JP 2014093766A JP 2014093766 A JP2014093766 A JP 2014093766A JP 2014170957 A5 JP2014170957 A5 JP 2014170957A5
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- lithographic apparatus
- substrate surface
- surface actuator
- actuator
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims 30
- 239000012530 fluid Substances 0.000 claims 3
- 239000007788 liquid Substances 0.000 claims 2
- 230000002706 hydrostatic effect Effects 0.000 claims 1
- 238000001459 lithography Methods 0.000 claims 1
- 230000003287 optical effect Effects 0.000 claims 1
- 230000005855 radiation Effects 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201161489850P | 2011-05-25 | 2011-05-25 | |
| US61/489,850 | 2011-05-25 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012113908A Division JP5539440B2 (ja) | 2011-05-25 | 2012-05-18 | 基板テーブルを備えるリソグラフィ装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2014170957A JP2014170957A (ja) | 2014-09-18 |
| JP2014170957A5 true JP2014170957A5 (enExample) | 2015-07-02 |
| JP6013396B2 JP6013396B2 (ja) | 2016-10-25 |
Family
ID=47198207
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012113908A Active JP5539440B2 (ja) | 2011-05-25 | 2012-05-18 | 基板テーブルを備えるリソグラフィ装置 |
| JP2014093766A Active JP6013396B2 (ja) | 2011-05-25 | 2014-04-30 | 基板テーブルを備えるリソグラフィ装置 |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012113908A Active JP5539440B2 (ja) | 2011-05-25 | 2012-05-18 | 基板テーブルを備えるリソグラフィ装置 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US9110387B2 (enExample) |
| JP (2) | JP5539440B2 (enExample) |
| KR (1) | KR101477681B1 (enExample) |
| CN (1) | CN102799071B (enExample) |
| NL (1) | NL2008695A (enExample) |
| TW (1) | TWI559092B (enExample) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0677869B2 (ja) | 1990-02-07 | 1994-10-05 | 昭和アルミニウム株式会社 | アルミニウム合金ろう材 |
| NL2009692A (en) * | 2011-12-07 | 2013-06-10 | Asml Netherlands Bv | A lithographic apparatus and a device manufacturing method. |
| JP6087669B2 (ja) * | 2013-03-06 | 2017-03-01 | キヤノン株式会社 | 基板処理装置、リソグラフィ装置および物品の製造方法 |
| JP6363217B2 (ja) * | 2014-04-04 | 2018-07-25 | エーエスエムエル ネザーランズ ビー．ブイ． | 制御システム、位置決めシステム、リソグラフィ装置、制御方法、デバイス製造方法及び制御プログラム |
| KR102544701B1 (ko) | 2014-11-17 | 2023-06-16 | 에이에스엠엘 네델란즈 비.브이. | 장치 |
| DE102014225199A1 (de) * | 2014-12-09 | 2016-06-09 | Carl Zeiss Smt Gmbh | Verbindungsanordnung für eine Lithographieanlage |
| US10274849B2 (en) * | 2015-07-20 | 2019-04-30 | Asml Netherlands B.V. | Methods for controlling lithographic apparatus, lithographic apparatus and device manufacturing method |
| CN108292111B (zh) * | 2015-11-30 | 2020-03-20 | Asml荷兰有限公司 | 用于在光刻设备中处理衬底的方法和设备 |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6246520A (ja) * | 1985-08-23 | 1987-02-28 | Mitsubishi Electric Corp | 露光装置 |
| JP2004111653A (ja) * | 2002-09-18 | 2004-04-08 | Canon Inc | 位置決め装置及びそれを適用した露光装置並びに半導体デバイスの製造方法 |
| TWI295414B (en) | 2003-05-13 | 2008-04-01 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
| CN101436003B (zh) * | 2003-06-19 | 2011-08-17 | 株式会社尼康 | 曝光装置及器件制造方法 |
| EP2037489A3 (en) * | 2004-01-15 | 2010-01-06 | Nikon Corporation | Exposure apparatus and device producing method |
| US7295283B2 (en) * | 2004-04-02 | 2007-11-13 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| JP2005297109A (ja) * | 2004-04-09 | 2005-10-27 | Canon Inc | 微動ステージ |
| US7057702B2 (en) * | 2004-06-23 | 2006-06-06 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| JP4884708B2 (ja) * | 2005-06-21 | 2012-02-29 | 株式会社ニコン | 露光装置及びデバイス製造方法 |
| JP2007273608A (ja) * | 2006-03-30 | 2007-10-18 | Dainippon Screen Mfg Co Ltd | 基板処理装置および基板処理方法 |
| US7502103B2 (en) * | 2006-05-31 | 2009-03-10 | Asml Netherlands B.V. | Metrology tool, system comprising a lithographic apparatus and a metrology tool, and a method for determining a parameter of a substrate |
| NL1036557A1 (nl) * | 2008-03-11 | 2009-09-14 | Asml Netherlands Bv | Method and lithographic apparatus for measuring and acquiring height data relating to a substrate surface. |
| US8144310B2 (en) * | 2008-04-14 | 2012-03-27 | Asml Netherlands B.V. | Positioning system, lithographic apparatus and device manufacturing method |
| JP2010267144A (ja) * | 2009-05-15 | 2010-11-25 | Nikon Corp | 制御装置及び露光装置 |
| NL2004807A (en) | 2009-06-30 | 2011-01-04 | Asml Netherlands Bv | Substrate table for a lithographic apparatus, litographic apparatus, method of using a substrate table and device manufacturing method. |
| NL2005013A (en) * | 2009-07-31 | 2011-02-02 | Asml Netherlands Bv | Positioning system, lithographic apparatus and method. |
| NL2006804A (en) * | 2010-06-24 | 2011-12-28 | Asml Netherlands Bv | Measurement system, method and lithographic apparatus. |
| NL2009692A (en) * | 2011-12-07 | 2013-06-10 | Asml Netherlands Bv | A lithographic apparatus and a device manufacturing method. |
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2012
- 2012-04-24 NL NL2008695A patent/NL2008695A/en not_active Application Discontinuation
- 2012-05-08 TW TW101116395A patent/TWI559092B/zh not_active IP Right Cessation
- 2012-05-14 CN CN201210149034.8A patent/CN102799071B/zh active Active
- 2012-05-18 JP JP2012113908A patent/JP5539440B2/ja active Active
- 2012-05-22 US US13/477,748 patent/US9110387B2/en active Active
- 2012-05-25 KR KR1020120055865A patent/KR101477681B1/ko not_active Expired - Fee Related
-
2014
- 2014-04-30 JP JP2014093766A patent/JP6013396B2/ja active Active