JP2013502600A5 - - Google Patents

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JP2013502600A5
JP2013502600A5 JP2011549367A JP2011549367A JP2013502600A5 JP 2013502600 A5 JP2013502600 A5 JP 2013502600A5 JP 2011549367 A JP2011549367 A JP 2011549367A JP 2011549367 A JP2011549367 A JP 2011549367A JP 2013502600 A5 JP2013502600 A5 JP 2013502600A5
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processing apparatus
dimensional plane
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JP2011549367A
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JP5573849B2 (ja
JP2013502600A (ja
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JP2011549367A 2009-08-20 2010-08-19 物体処理装置、露光装置及び露光方法、並びにデバイス製造方法 Active JP5573849B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2011549367A JP5573849B2 (ja) 2009-08-20 2010-08-19 物体処理装置、露光装置及び露光方法、並びにデバイス製造方法

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2009190654 2009-08-20
JP2009190654 2009-08-20
JP2011549367A JP5573849B2 (ja) 2009-08-20 2010-08-19 物体処理装置、露光装置及び露光方法、並びにデバイス製造方法
PCT/JP2010/064430 WO2011021723A1 (en) 2009-08-20 2010-08-19 Object processing apparatus, exposure apparatus and exposure method, and device manufacturing method

Publications (3)

Publication Number Publication Date
JP2013502600A JP2013502600A (ja) 2013-01-24
JP2013502600A5 true JP2013502600A5 (enExample) 2013-09-05
JP5573849B2 JP5573849B2 (ja) 2014-08-20

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ID=43063876

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JP2011549367A Active JP5573849B2 (ja) 2009-08-20 2010-08-19 物体処理装置、露光装置及び露光方法、並びにデバイス製造方法

Country Status (6)

Country Link
US (1) US20110053092A1 (enExample)
JP (1) JP5573849B2 (enExample)
KR (2) KR101862234B1 (enExample)
CN (1) CN102483580B (enExample)
TW (2) TWI587436B (enExample)
WO (1) WO2011021723A1 (enExample)

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CN111965948B (zh) * 2015-09-30 2023-06-27 株式会社尼康 曝光装置、曝光方法、平面显示器的制造方法、及元件制造方法
JPWO2017122763A1 (ja) * 2016-01-15 2018-10-18 株式会社ナノテム 非接触搬送装置および非接触搬送システム
CN109791369B (zh) * 2016-09-30 2022-01-14 株式会社尼康 物体保持装置、曝光装置、平板显示器之制造方法、元件制造方法、以及物体保持方法
CN113238461B (zh) 2016-09-30 2024-01-12 株式会社尼康 曝光装置、平板显示器的制造方法、元件制造方法、及曝光方法
TWI765918B (zh) 2016-09-30 2022-06-01 日商尼康股份有限公司 搬運裝置、曝光裝置、曝光方法、平板顯示器的製造方法、元件製造方法以及搬運方法
CN108983552B (zh) * 2017-05-31 2020-01-24 上海微电子装备（集团）股份有限公司 一种移入移出机构及光刻机工件台移入移出装置
CN118343498A (zh) * 2018-03-01 2024-07-16 杭州孚亚科技有限公司 吸紧装置
JP7114277B2 (ja) * 2018-03-07 2022-08-08 キヤノン株式会社 パターン形成装置及び物品の製造方法
JP7017239B2 (ja) * 2018-06-25 2022-02-08 株式会社ブイ・テクノロジー 露光装置および高さ調整方法
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TWI691715B (zh) * 2019-06-17 2020-04-21 華矽創新股份有限公司 檢測矽晶圓缺陷的自動光學檢測機構及方法
JP7185674B2 (ja) * 2020-09-30 2022-12-07 キヤノントッキ株式会社 成膜装置、調整方法及び電子デバイスの製造方法

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