JP2015505154A5 - - Google Patents

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JP2015505154A5
JP2015505154A5 JP2014520850A JP2014520850A JP2015505154A5 JP 2015505154 A5 JP2015505154 A5 JP 2015505154A5 JP 2014520850 A JP2014520850 A JP 2014520850A JP 2014520850 A JP2014520850 A JP 2014520850A JP 2015505154 A5 JP2015505154 A5 JP 2015505154A5
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substrate
substrate stage
measurement
exposure
exposure apparatus
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JP2014520850A
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JP6016200B2 (ja
JP2015505154A (ja
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JP2014520850A 2011-12-29 2012-12-28 露光装置及び露光方法、並びにデバイス製造方法 Active JP6016200B2 (ja)

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JP2014520850A JP6016200B2 (ja) 2011-12-29 2012-12-28 露光装置及び露光方法、並びにデバイス製造方法

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Application Number Priority Date Filing Date Title
US201161581293P 2011-12-29 2011-12-29
US201161581360P 2011-12-29 2011-12-29
US61/581,360 2011-12-29
US61/581,293 2011-12-29
JP2012248419 2012-11-12
JP2012248419 2012-11-12
US13/727,286 US9207549B2 (en) 2011-12-29 2012-12-26 Exposure apparatus and exposure method, and device manufacturing method with encoder of higher reliability for position measurement
US13/727,286 2012-12-26
PCT/JP2012/084310 WO2013100202A1 (en) 2011-12-29 2012-12-28 Exposure apparatus, exposure method, and device manufacturing method
JP2014520850A JP6016200B2 (ja) 2011-12-29 2012-12-28 露光装置及び露光方法、並びにデバイス製造方法

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JP2015505154A JP2015505154A (ja) 2015-02-16
JP2015505154A5 true JP2015505154A5 (enExample) 2015-09-24
JP6016200B2 JP6016200B2 (ja) 2016-10-26

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US (1) US9207549B2 (enExample)
JP (1) JP6016200B2 (enExample)
KR (1) KR101698249B1 (enExample)
TW (1) TWI639057B (enExample)
WO (1) WO2013100202A1 (enExample)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8832916B2 (en) * 2011-07-12 2014-09-16 Lam Research Corporation Methods of dechucking and system thereof
NL2009533A (en) * 2011-10-27 2013-05-07 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
US8779635B2 (en) * 2012-04-10 2014-07-15 Kla-Tencor Corporation Arrangement of reticle positioning device for actinic inspection of EUV reticles
KR102169388B1 (ko) 2012-11-30 2020-10-23 가부시키가이샤 니콘 흡인 장치, 반입 방법, 반송 시스템 및 노광 장치, 그리고 디바이스 제조 방법
CN103207529B (zh) * 2013-03-22 2015-04-29 京东方科技集团股份有限公司 曝光方法及曝光设备
DE102013016065B4 (de) * 2013-09-27 2016-02-18 Mecatronix Ag Positioniervorrichtung und Verfahren
US9529280B2 (en) 2013-12-06 2016-12-27 Kla-Tencor Corporation Stage apparatus for semiconductor inspection and lithography systems
IN2014CH00782A (enExample) 2014-02-19 2015-08-28 Kennametal India Ltd
CN106575087B (zh) 2014-08-15 2018-06-26 Asml荷兰有限公司 光刻设备和方法
US9694545B2 (en) 2014-12-18 2017-07-04 Stratasys, Inc. Remotely-adjustable purge station for use in additive manufacturing systems
CN111948913B (zh) * 2015-02-23 2023-09-01 株式会社尼康 基板处理系统及基板处理方法
HK1246849A1 (en) 2015-02-23 2018-09-14 Nikon Corporation Measurement device, lithography system and exposure device, and device manufacturing method
CN111290221B (zh) * 2015-02-23 2023-07-28 株式会社尼康 测量装置、光刻系统、曝光装置、测量方法、曝光方法以及元件制造方法
US10514617B2 (en) * 2015-09-30 2019-12-24 Nikon Corporation Exposure apparatus, manufacturing method of flat-panel display, device manufacturing method, and exposure method
WO2017057560A1 (ja) * 2015-09-30 2017-04-06 株式会社ニコン 露光装置及び露光方法、並びにフラットパネルディスプレイ製造方法
JP6656728B2 (ja) * 2015-10-01 2020-03-04 学校法人 中村産業学園 相関顕微鏡
CN205427436U (zh) * 2016-03-23 2016-08-03 北京京东方光电科技有限公司 显示器件的对位检测设备及曝光工艺系统
KR102181121B1 (ko) * 2016-09-20 2020-11-20 주식회사 원익아이피에스 기판 이송 장치 및 기판 이송 장치의 제어 방법
KR102478705B1 (ko) * 2016-09-30 2022-12-16 가부시키가이샤 니콘 이동체 장치, 이동 방법, 노광 장치, 노광 방법, 플랫 패널 디스플레이의 제조 방법, 그리고 디바이스 제조 방법
JP6981170B2 (ja) * 2017-10-20 2021-12-15 株式会社ニューフレアテクノロジー 荷電粒子ビーム描画装置及び荷電粒子ビーム描画方法
KR102070756B1 (ko) * 2018-03-15 2020-01-29 이노6 주식회사 다축 구조 스테이지
KR102890305B1 (ko) * 2019-02-11 2025-11-24 에이에스엠엘 네델란즈 비.브이. 열 제어 시스템을 갖는 리소그래피 장치 및 방법
US11626305B2 (en) * 2019-06-25 2023-04-11 Applied Materials, Inc. Sensor-based correction of robot-held object
CN110411381B (zh) * 2019-08-06 2021-07-13 许昌学院 一种适用电机定子的自动校正平整度多点检测设备
KR102897291B1 (ko) * 2020-02-06 2025-12-09 에이에스엠엘 네델란즈 비.브이. 듀얼 스테이지 리소그래피 장치를 사용하는 방법 및 리소그래피 장치
CN112835269B (zh) * 2021-01-19 2024-04-12 上海集成电路装备材料产业创新中心有限公司 一种光刻装置及曝光方法
WO2022215692A1 (ja) * 2021-04-09 2022-10-13 株式会社ニコン 露光装置、デバイス製造方法、フラットパネルディスプレイの製造方法および露光方法
CN118576903A (zh) * 2024-06-07 2024-09-03 广州天力能医疗器械有限公司 一种仿生红外往复仪及远红外场效应生成方法

Family Cites Families (113)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57117238A (en) 1981-01-14 1982-07-21 Nippon Kogaku Kk <Nikon> Exposing and baking device for manufacturing integrated circuit with illuminometer
JPS58113706A (ja) 1981-12-26 1983-07-06 Nippon Kogaku Kk <Nikon> 水平位置検出装置
US4780617A (en) 1984-08-09 1988-10-25 Nippon Kogaku K.K. Method for successive alignment of chip patterns on a substrate
DE4033556A1 (de) 1990-10-22 1992-04-23 Suess Kg Karl Messanordnung fuer x,y,(phi)-koordinatentische
US5196745A (en) 1991-08-16 1993-03-23 Massachusetts Institute Of Technology Magnetic positioning device
JPH05102287A (ja) * 1991-10-02 1993-04-23 Hitachi Ltd 板状物搬送装置
KR100300618B1 (ko) 1992-12-25 2001-11-22 오노 시게오 노광방법,노광장치,및그장치를사용하는디바이스제조방법
US6624433B2 (en) 1994-02-22 2003-09-23 Nikon Corporation Method and apparatus for positioning substrate and the like
JPH07270122A (ja) 1994-03-30 1995-10-20 Canon Inc 変位検出装置、該変位検出装置を備えた露光装置およびデバイスの製造方法
CN1244021C (zh) 1996-11-28 2006-03-01 株式会社尼康 光刻装置和曝光方法
JPH10167470A (ja) * 1996-12-02 1998-06-23 Kiyoyuki Horii 非接触保持方法とその装置
EP0900412B1 (en) 1997-03-10 2005-04-06 ASML Netherlands B.V. Lithographic apparatus comprising a positioning device having two object holders
JPH1116816A (ja) 1997-06-25 1999-01-22 Nikon Corp 投影露光装置、該装置を用いた露光方法、及び該装置を用いた回路デバイスの製造方法
CN100578876C (zh) 1998-03-11 2010-01-06 株式会社尼康 紫外激光装置以及使用该紫外激光装置的曝光装置和曝光方法
EP1079223A4 (en) 1998-05-19 2002-11-27 Nikon Corp INSTRUMENT AND METHOD FOR MEASURING ABERRATIONS, APPARATUS AND METHOD FOR PROJECTION SENSITIZATION INCORPORATING THIS INSTRUMENT, AND METHOD FOR MANUFACTURING DEVICES THEREOF
WO2001035168A1 (en) 1999-11-10 2001-05-17 Massachusetts Institute Of Technology Interference lithography utilizing phase-locked scanning beams
SG107560A1 (en) 2000-02-25 2004-12-29 Nikon Corp Exposure apparatus and exposure method capable of controlling illumination distribution
US20020041377A1 (en) 2000-04-25 2002-04-11 Nikon Corporation Aerial image measurement method and unit, optical properties measurement method and unit, adjustment method of projection optical system, exposure method and apparatus, making method of exposure apparatus, and device manufacturing method
TW527526B (en) 2000-08-24 2003-04-11 Asml Netherlands Bv Lithographic apparatus, device manufacturing method, and device manufactured thereby
US7289212B2 (en) 2000-08-24 2007-10-30 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and device manufacturing thereby
US7561270B2 (en) 2000-08-24 2009-07-14 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and device manufactured thereby
US6611316B2 (en) 2001-02-27 2003-08-26 Asml Holding N.V. Method and system for dual reticle image exposure
TW529172B (en) 2001-07-24 2003-04-21 Asml Netherlands Bv Imaging apparatus
JP4415674B2 (ja) 2002-01-29 2010-02-17 株式会社ニコン 像形成状態調整システム、露光方法及び露光装置、並びにプログラム及び情報記録媒体
TW594431B (en) 2002-03-01 2004-06-21 Asml Netherlands Bv Calibration methods, calibration substrates, lithographic apparatus and device manufacturing methods
JP2004083180A (ja) * 2002-08-26 2004-03-18 Sharp Corp シート状基板の搬送装置及び搬送方法
JP2004101362A (ja) 2002-09-10 2004-04-02 Canon Inc ステージ位置計測および位置決め装置
JP2004140058A (ja) * 2002-10-16 2004-05-13 Hitachi Electronics Eng Co Ltd ウエハ搬送装置およびウエハ処理装置
KR101178756B1 (ko) 2003-04-11 2012-08-31 가부시키가이샤 니콘 액침 리소그래피 머신에서 웨이퍼 교환동안 투영 렌즈 아래의 갭에서 액침액체를 유지하는 장치 및 방법
US7025498B2 (en) 2003-05-30 2006-04-11 Asml Holding N.V. System and method of measuring thermal expansion
KR101134957B1 (ko) 2003-06-19 2012-04-10 가부시키가이샤 니콘 노광 장치 및 디바이스 제조방법
TWI295408B (en) 2003-10-22 2008-04-01 Asml Netherlands Bv Lithographic apparatus and device manufacturing method, and measurement system
US7589822B2 (en) 2004-02-02 2009-09-15 Nikon Corporation Stage drive method and stage unit, exposure apparatus, and device manufacturing method
US7102729B2 (en) 2004-02-03 2006-09-05 Asml Netherlands B.V. Lithographic apparatus, measurement system, and device manufacturing method
US7256871B2 (en) 2004-07-27 2007-08-14 Asml Netherlands B.V. Lithographic apparatus and method for calibrating the same
KR101157003B1 (ko) 2004-09-30 2012-06-21 가부시키가이샤 니콘 투영 광학 디바이스 및 노광 장치
US7251018B2 (en) 2004-11-29 2007-07-31 Asml Netherlands B.V. Substrate table, method of measuring a position of a substrate and a lithographic apparatus
US7528931B2 (en) 2004-12-20 2009-05-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20060139595A1 (en) 2004-12-27 2006-06-29 Asml Netherlands B.V. Lithographic apparatus and method for determining Z position errors/variations and substrate table flatness
US7515281B2 (en) 2005-04-08 2009-04-07 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7161659B2 (en) 2005-04-08 2007-01-09 Asml Netherlands B.V. Dual stage lithographic apparatus and device manufacturing method
US7349069B2 (en) 2005-04-20 2008-03-25 Asml Netherlands B.V. Lithographic apparatus and positioning apparatus
US7405811B2 (en) 2005-04-20 2008-07-29 Asml Netherlands B.V. Lithographic apparatus and positioning apparatus
US7348574B2 (en) 2005-09-02 2008-03-25 Asml Netherlands, B.V. Position measurement system and lithographic apparatus
US7362446B2 (en) 2005-09-15 2008-04-22 Asml Netherlands B.V. Position measurement unit, measurement system and lithographic apparatus comprising such position measurement unit
US7978339B2 (en) 2005-10-04 2011-07-12 Asml Netherlands B.V. Lithographic apparatus temperature compensation
CN101356623B (zh) 2006-01-19 2012-05-09 株式会社尼康 移动体驱动方法及移动体驱动系统、图案形成方法及图案形成装置、曝光方法及曝光装置、以及元件制造方法
EP2541325B1 (en) 2006-02-21 2018-02-21 Nikon Corporation Exposure apparatus and exposure method
EP2003681B1 (en) 2006-02-21 2014-11-12 Nikon Corporation Measuring apparatus, measuring method, pattern forming apparatus, pattern forming method, and device manufacturing method
KR101342765B1 (ko) 2006-02-21 2013-12-19 가부시키가이샤 니콘 패턴 형성 장치, 마크 검출 장치, 노광 장치, 패턴 형성 방법, 노광 방법 및 디바이스 제조 방법
US7602489B2 (en) 2006-02-22 2009-10-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7253875B1 (en) 2006-03-03 2007-08-07 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7636165B2 (en) 2006-03-21 2009-12-22 Asml Netherlands B.V. Displacement measurement systems lithographic apparatus and device manufacturing method
US7483120B2 (en) 2006-05-09 2009-01-27 Asml Netherlands B.V. Displacement measurement system, lithographic apparatus, displacement measurement method and device manufacturing method
JP4642787B2 (ja) * 2006-05-09 2011-03-02 東京エレクトロン株式会社 基板搬送装置及び縦型熱処理装置
KR20180063382A (ko) 2006-08-31 2018-06-11 가부시키가이샤 니콘 이동체 구동 방법 및 이동체 구동 시스템, 패턴 형성 방법 및 장치, 노광 방법 및 장치, 그리고 디바이스 제조 방법
EP3312676B1 (en) 2006-08-31 2019-05-15 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
TWI442191B (zh) 2006-08-31 2014-06-21 尼康股份有限公司 Mobile body drive system and moving body driving method, pattern forming apparatus and method, exposure apparatus and method, component manufacturing method, and method of determining
CN102749813B (zh) 2006-09-01 2014-12-03 株式会社尼康 曝光方法及装置、以及组件制造方法
EP2993524B1 (en) 2006-09-01 2017-10-25 Nikon Corporation Exposure method and apparatus and device manufacturing method
JP5105197B2 (ja) 2006-09-29 2012-12-19 株式会社ニコン 移動体システム、露光装置及び露光方法、並びにデバイス製造方法
JP4925281B2 (ja) 2006-10-13 2012-04-25 オリンパスイメージング株式会社 電子撮像装置
US7619207B2 (en) 2006-11-08 2009-11-17 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
WO2008056735A1 (en) 2006-11-09 2008-05-15 Nikon Corporation Holding unit, position detecting system and exposure system, moving method, position detecting method, exposure method, adjusting method of detection system, and device producing method
JP4607910B2 (ja) * 2007-01-16 2011-01-05 東京エレクトロン株式会社 基板搬送装置及び縦型熱処理装置
US7561280B2 (en) 2007-03-15 2009-07-14 Agilent Technologies, Inc. Displacement measurement sensor head and system having measurement sub-beams comprising zeroth order and first order diffraction components
KR20080088843A (ko) 2007-03-30 2008-10-06 주식회사 신라공업 자동차용 벨트풀리의 제조방법
US7710540B2 (en) 2007-04-05 2010-05-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8098362B2 (en) 2007-05-30 2012-01-17 Nikon Corporation Detection device, movable body apparatus, pattern formation apparatus and pattern formation method, exposure apparatus and exposure method, and device manufacturing method
KR101409149B1 (ko) 2007-07-24 2014-06-17 가부시키가이샤 니콘 이동체 구동 방법 및 이동체 구동 시스템, 패턴 형성 방법 및 장치, 노광 방법 및 장치, 그리고 디바이스 제조 방법
TWI534408B (zh) 2007-07-24 2016-05-21 尼康股份有限公司 Position measuring system, exposure apparatus, position measuring method, exposure method and component manufacturing method, and measuring tool and measuring method
US8547527B2 (en) 2007-07-24 2013-10-01 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and pattern formation apparatus, and device manufacturing method
US8194232B2 (en) 2007-07-24 2012-06-05 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, position control method and position control system, and device manufacturing method
US8218129B2 (en) 2007-08-24 2012-07-10 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, measuring method, and position measurement system
JPWO2009028157A1 (ja) 2007-08-24 2010-11-25 株式会社ニコン 移動体駆動方法及び移動体駆動システム、並びにパターン形成方法及びパターン形成装置
US8867022B2 (en) 2007-08-24 2014-10-21 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, and device manufacturing method
US8023106B2 (en) 2007-08-24 2011-09-20 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method
US8237919B2 (en) 2007-08-24 2012-08-07 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method for continuous position measurement of movable body before and after switching between sensor heads
US9304412B2 (en) 2007-08-24 2016-04-05 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, and measuring method
US20090051895A1 (en) 2007-08-24 2009-02-26 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, device manufacturing method, and processing system
US9013681B2 (en) 2007-11-06 2015-04-21 Nikon Corporation Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method
US9256140B2 (en) 2007-11-07 2016-02-09 Nikon Corporation Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method with measurement device to measure movable body in Z direction
JP4986185B2 (ja) 2007-11-07 2012-07-25 株式会社ニコン 露光装置及び露光方法、並びにデバイス製造方法
US8665455B2 (en) 2007-11-08 2014-03-04 Nikon Corporation Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method
US8422015B2 (en) 2007-11-09 2013-04-16 Nikon Corporation Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method
US8115906B2 (en) 2007-12-14 2012-02-14 Nikon Corporation Movable body system, pattern formation apparatus, exposure apparatus and measurement device, and device manufacturing method
US8711327B2 (en) 2007-12-14 2014-04-29 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US8237916B2 (en) 2007-12-28 2012-08-07 Nikon Corporation Movable body drive system, pattern formation apparatus, exposure apparatus and exposure method, and device manufacturing method
TWI437373B (zh) 2008-04-30 2014-05-11 尼康股份有限公司 A mounting apparatus, a pattern forming apparatus, an exposure apparatus, a stage driving method, an exposure method, and an element manufacturing method
US8228482B2 (en) 2008-05-13 2012-07-24 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US8817236B2 (en) 2008-05-13 2014-08-26 Nikon Corporation Movable body system, movable body drive method, pattern formation apparatus, pattern formation method, exposure apparatus, exposure method, and device manufacturing method
US8786829B2 (en) 2008-05-13 2014-07-22 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US8508735B2 (en) 2008-09-22 2013-08-13 Nikon Corporation Movable body apparatus, movable body drive method, exposure apparatus, exposure method, and device manufacturing method
US8994923B2 (en) 2008-09-22 2015-03-31 Nikon Corporation Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method
US8325325B2 (en) 2008-09-22 2012-12-04 Nikon Corporation Movable body apparatus, movable body drive method, exposure apparatus, exposure method, and device manufacturing method
US8902402B2 (en) * 2008-12-19 2014-12-02 Nikon Corporation Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method
US8760629B2 (en) 2008-12-19 2014-06-24 Nikon Corporation Exposure apparatus including positional measurement system of movable body, exposure method of exposing object including measuring positional information of movable body, and device manufacturing method that includes exposure method of exposing object, including measuring positional information of movable body
US8599359B2 (en) 2008-12-19 2013-12-03 Nikon Corporation Exposure apparatus, exposure method, device manufacturing method, and carrier method
US8773635B2 (en) * 2008-12-19 2014-07-08 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
KR101056795B1 (ko) 2008-12-23 2011-08-12 하지성 한지(韓紙)를 이용한 장례용 관(棺)의 제조방법
KR101052544B1 (ko) 2008-12-23 2011-07-29 삼성중공업 주식회사 영상 필링 방법 및 그 영상 변환 장치
US8553204B2 (en) 2009-05-20 2013-10-08 Nikon Corporation Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method
US8970820B2 (en) * 2009-05-20 2015-03-03 Nikon Corporation Object exchange method, exposure method, carrier system, exposure apparatus, and device manufacturing method
US8792084B2 (en) 2009-05-20 2014-07-29 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
NL2005013A (en) * 2009-07-31 2011-02-02 Asml Netherlands Bv Positioning system, lithographic apparatus and method.
US8488109B2 (en) 2009-08-25 2013-07-16 Nikon Corporation Exposure method, exposure apparatus, and device manufacturing method
US8493547B2 (en) 2009-08-25 2013-07-23 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US8514395B2 (en) 2009-08-25 2013-08-20 Nikon Corporation Exposure method, exposure apparatus, and device manufacturing method
JP5507392B2 (ja) * 2009-09-11 2014-05-28 エーエスエムエル ネザーランズ ビー．ブイ． シャッター部材、リソグラフィ装置及びデバイス製造方法
US20110085150A1 (en) * 2009-09-30 2011-04-14 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US20110075120A1 (en) 2009-09-30 2011-03-31 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US8488106B2 (en) 2009-12-28 2013-07-16 Nikon Corporation Movable body drive method, movable body apparatus, exposure method, exposure apparatus, and device manufacturing method
NL2006118A (en) 2010-03-03 2011-09-06 Asml Netherlands Bv Lithographic apparatus and method for measuring a position.

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