|
JPS57117238A
(en)
|
1981-01-14 |
1982-07-21 |
Nippon Kogaku Kk <Nikon> |
Exposing and baking device for manufacturing integrated circuit with illuminometer
|
|
JPS58113706A
(ja)
|
1981-12-26 |
1983-07-06 |
Nippon Kogaku Kk <Nikon> |
水平位置検出装置
|
|
US4780617A
(en)
|
1984-08-09 |
1988-10-25 |
Nippon Kogaku K.K. |
Method for successive alignment of chip patterns on a substrate
|
|
DE4033556A1
(de)
|
1990-10-22 |
1992-04-23 |
Suess Kg Karl |
Messanordnung fuer x,y,(phi)-koordinatentische
|
|
US5196745A
(en)
|
1991-08-16 |
1993-03-23 |
Massachusetts Institute Of Technology |
Magnetic positioning device
|
|
JPH05102287A
(ja)
*
|
1991-10-02 |
1993-04-23 |
Hitachi Ltd |
板状物搬送装置
|
|
KR100300618B1
(ko)
|
1992-12-25 |
2001-11-22 |
오노 시게오 |
노광방법,노광장치,및그장치를사용하는디바이스제조방법
|
|
US6624433B2
(en)
|
1994-02-22 |
2003-09-23 |
Nikon Corporation |
Method and apparatus for positioning substrate and the like
|
|
JPH07270122A
(ja)
|
1994-03-30 |
1995-10-20 |
Canon Inc |
変位検出装置、該変位検出装置を備えた露光装置およびデバイスの製造方法
|
|
CN1144263C
(zh)
|
1996-11-28 |
2004-03-31 |
株式会社尼康 |
曝光装置以及曝光方法
|
|
JPH10167470A
(ja)
*
|
1996-12-02 |
1998-06-23 |
Kiyoyuki Horii |
非接触保持方法とその装置
|
|
DE69829614T2
(de)
|
1997-03-10 |
2006-03-09 |
Asml Netherlands B.V. |
Lithographiegerät mit einer positioniervorrichtung mit zwei objekthaltern
|
|
JPH1116816A
(ja)
|
1997-06-25 |
1999-01-22 |
Nikon Corp |
投影露光装置、該装置を用いた露光方法、及び該装置を用いた回路デバイスの製造方法
|
|
KR100819239B1
(ko)
|
1998-03-11 |
2008-04-03 |
가부시키가이샤 니콘 |
자외 레이저 장치, 레이저 장치, 노광 장치와 노광 방법, 디바이스 제조 방법, 자외광 조사 장치, 물체 패턴 검출 장치, 자외광 조사 방법 및 물체 패턴 검출 방법
|
|
EP1079223A4
(en)
|
1998-05-19 |
2002-11-27 |
Nikon Corp |
INSTRUMENT AND METHOD FOR MEASURING ABERATIONS, PROJECTION DEVICE INCLUDING THIS INSTRUMENT AND ITS MANUFACTURING METHOD
|
|
WO2001035168A1
(en)
|
1999-11-10 |
2001-05-17 |
Massachusetts Institute Of Technology |
Interference lithography utilizing phase-locked scanning beams
|
|
KR20010085493A
(ko)
|
2000-02-25 |
2001-09-07 |
시마무라 기로 |
노광장치, 그 조정방법, 및 상기 노광장치를 이용한디바이스 제조방법
|
|
US20020041377A1
(en)
|
2000-04-25 |
2002-04-11 |
Nikon Corporation |
Aerial image measurement method and unit, optical properties measurement method and unit, adjustment method of projection optical system, exposure method and apparatus, making method of exposure apparatus, and device manufacturing method
|
|
TW527526B
(en)
|
2000-08-24 |
2003-04-11 |
Asml Netherlands Bv |
Lithographic apparatus, device manufacturing method, and device manufactured thereby
|
|
US7561270B2
(en)
|
2000-08-24 |
2009-07-14 |
Asml Netherlands B.V. |
Lithographic apparatus, device manufacturing method and device manufactured thereby
|
|
US7289212B2
(en)
|
2000-08-24 |
2007-10-30 |
Asml Netherlands B.V. |
Lithographic apparatus, device manufacturing method and device manufacturing thereby
|
|
WO2002069049A2
(en)
|
2001-02-27 |
2002-09-06 |
Asml Us, Inc. |
Simultaneous imaging of two reticles
|
|
TW529172B
(en)
|
2001-07-24 |
2003-04-21 |
Asml Netherlands Bv |
Imaging apparatus
|
|
EP1478010A4
(en)
|
2002-01-29 |
2007-12-12 |
Nikon Corp |
PICTURE CONTROL STATE SETUP SYSTEM, EXPOSURE METHOD, EXPOSURE DEVICE, PROGRAM AND INFORMATION RECORDING MEDIUM
|
|
TW594431B
(en)
|
2002-03-01 |
2004-06-21 |
Asml Netherlands Bv |
Calibration methods, calibration substrates, lithographic apparatus and device manufacturing methods
|
|
JP2004083180A
(ja)
*
|
2002-08-26 |
2004-03-18 |
Sharp Corp |
シート状基板の搬送装置及び搬送方法
|
|
JP2004101362A
(ja)
|
2002-09-10 |
2004-04-02 |
Canon Inc |
ステージ位置計測および位置決め装置
|
|
JP2004140058A
(ja)
*
|
2002-10-16 |
2004-05-13 |
Hitachi Electronics Eng Co Ltd |
ウエハ搬送装置およびウエハ処理装置
|
|
KR20180054929A
(ko)
|
2003-04-11 |
2018-05-24 |
가부시키가이샤 니콘 |
액침 리소그래피 머신에서 웨이퍼 교환동안 투영 렌즈 아래의 갭에서 액침 액체를 유지하는 장치 및 방법
|
|
US7025498B2
(en)
|
2003-05-30 |
2006-04-11 |
Asml Holding N.V. |
System and method of measuring thermal expansion
|
|
TWI482200B
(zh)
|
2003-06-19 |
2015-04-21 |
尼康股份有限公司 |
An exposure apparatus, an exposure method, and an element manufacturing method
|
|
TWI295408B
(en)
|
2003-10-22 |
2008-04-01 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method, and measurement system
|
|
US7589822B2
(en)
|
2004-02-02 |
2009-09-15 |
Nikon Corporation |
Stage drive method and stage unit, exposure apparatus, and device manufacturing method
|
|
US7102729B2
(en)
|
2004-02-03 |
2006-09-05 |
Asml Netherlands B.V. |
Lithographic apparatus, measurement system, and device manufacturing method
|
|
US7256871B2
(en)
|
2004-07-27 |
2007-08-14 |
Asml Netherlands B.V. |
Lithographic apparatus and method for calibrating the same
|
|
WO2006038952A2
(en)
|
2004-09-30 |
2006-04-13 |
Nikon Corporation |
Projection optical device and exposure apparatus
|
|
US7251018B2
(en)
|
2004-11-29 |
2007-07-31 |
Asml Netherlands B.V. |
Substrate table, method of measuring a position of a substrate and a lithographic apparatus
|
|
US7528931B2
(en)
|
2004-12-20 |
2009-05-05 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US20060139595A1
(en)
|
2004-12-27 |
2006-06-29 |
Asml Netherlands B.V. |
Lithographic apparatus and method for determining Z position errors/variations and substrate table flatness
|
|
US7515281B2
(en)
|
2005-04-08 |
2009-04-07 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US7161659B2
(en)
|
2005-04-08 |
2007-01-09 |
Asml Netherlands B.V. |
Dual stage lithographic apparatus and device manufacturing method
|
|
US7349069B2
(en)
|
2005-04-20 |
2008-03-25 |
Asml Netherlands B.V. |
Lithographic apparatus and positioning apparatus
|
|
US7405811B2
(en)
|
2005-04-20 |
2008-07-29 |
Asml Netherlands B.V. |
Lithographic apparatus and positioning apparatus
|
|
US7348574B2
(en)
|
2005-09-02 |
2008-03-25 |
Asml Netherlands, B.V. |
Position measurement system and lithographic apparatus
|
|
US7362446B2
(en)
|
2005-09-15 |
2008-04-22 |
Asml Netherlands B.V. |
Position measurement unit, measurement system and lithographic apparatus comprising such position measurement unit
|
|
US7978339B2
(en)
|
2005-10-04 |
2011-07-12 |
Asml Netherlands B.V. |
Lithographic apparatus temperature compensation
|
|
SG10201510758QA
(en)
|
2006-01-19 |
2016-01-28 |
Nikon Corp |
Movable Body Drive Method, Movable Body Drive System, Pattern Formation Method, Pattern Forming Apparatus, Exposure Method, Exposure Apparatus, and Device Manufacturing Method
|
|
EP3267259A1
(en)
|
2006-02-21 |
2018-01-10 |
Nikon Corporation |
Exposure apparatus, exposure method, and device manufacturing method
|
|
JP5195417B2
(ja)
|
2006-02-21 |
2013-05-08 |
株式会社ニコン |
パターン形成装置、露光装置、露光方法及びデバイス製造方法
|
|
KR101346581B1
(ko)
|
2006-02-21 |
2014-01-02 |
가부시키가이샤 니콘 |
패턴 형성 장치 및 패턴 형성 방법, 이동체 구동 시스템 및이동체 구동 방법, 노광 장치 및 노광 방법, 그리고 디바이스 제조 방법
|
|
US7602489B2
(en)
|
2006-02-22 |
2009-10-13 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US7253875B1
(en)
|
2006-03-03 |
2007-08-07 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US7636165B2
(en)
|
2006-03-21 |
2009-12-22 |
Asml Netherlands B.V. |
Displacement measurement systems lithographic apparatus and device manufacturing method
|
|
US7483120B2
(en)
|
2006-05-09 |
2009-01-27 |
Asml Netherlands B.V. |
Displacement measurement system, lithographic apparatus, displacement measurement method and device manufacturing method
|
|
JP4642787B2
(ja)
*
|
2006-05-09 |
2011-03-02 |
東京エレクトロン株式会社 |
基板搬送装置及び縦型熱処理装置
|
|
TWI609252B
(zh)
|
2006-08-31 |
2017-12-21 |
尼康股份有限公司 |
Moving body driving system and moving body driving method, pattern forming apparatus and method, exposure apparatus and method, element manufacturing method, and determination method
|
|
KR101477448B1
(ko)
|
2006-08-31 |
2014-12-29 |
가부시키가이샤 니콘 |
이동체 구동 방법 및 이동체 구동 시스템, 패턴 형성 방법 및 장치, 노광 방법 및 장치, 그리고 디바이스 제조 방법
|
|
SG182983A1
(en)
|
2006-08-31 |
2012-08-30 |
Nikon Corp |
Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method
|
|
TWI623825B
(zh)
|
2006-09-01 |
2018-05-11 |
Nikon Corporation |
曝光裝置及方法、以及元件製造方法
|
|
KR101881716B1
(ko)
|
2006-09-01 |
2018-07-24 |
가부시키가이샤 니콘 |
이동체 구동 방법 및 이동체 구동 시스템, 패턴 형성 방법 및 장치, 노광 방법 및 장치, 디바이스 제조 방법, 그리고 캘리브레이션 방법
|
|
EP2068112A4
(en)
|
2006-09-29 |
2017-11-15 |
Nikon Corporation |
Mobile unit system, pattern forming device, exposing device, exposing method, and device manufacturing method
|
|
JP4925281B2
(ja)
|
2006-10-13 |
2012-04-25 |
オリンパスイメージング株式会社 |
電子撮像装置
|
|
US7619207B2
(en)
|
2006-11-08 |
2009-11-17 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
WO2008056735A1
(en)
|
2006-11-09 |
2008-05-15 |
Nikon Corporation |
Holding unit, position detecting system and exposure system, moving method, position detecting method, exposure method, adjusting method of detection system, and device producing method
|
|
JP4607910B2
(ja)
*
|
2007-01-16 |
2011-01-05 |
東京エレクトロン株式会社 |
基板搬送装置及び縦型熱処理装置
|
|
US7561280B2
(en)
|
2007-03-15 |
2009-07-14 |
Agilent Technologies, Inc. |
Displacement measurement sensor head and system having measurement sub-beams comprising zeroth order and first order diffraction components
|
|
KR20080088843A
(ko)
|
2007-03-30 |
2008-10-06 |
주식회사 신라공업 |
자동차용 벨트풀리의 제조방법
|
|
US7710540B2
(en)
|
2007-04-05 |
2010-05-04 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US8098362B2
(en)
|
2007-05-30 |
2012-01-17 |
Nikon Corporation |
Detection device, movable body apparatus, pattern formation apparatus and pattern formation method, exposure apparatus and exposure method, and device manufacturing method
|
|
EP2184768B1
(en)
|
2007-07-24 |
2015-09-09 |
Nikon Corporation |
Mobile object driving method, mobile object driving system, pattern forming method and apparatus, exposure method and apparatus and device manufacturing method
|
|
US8194232B2
(en)
|
2007-07-24 |
2012-06-05 |
Nikon Corporation |
Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, position control method and position control system, and device manufacturing method
|
|
US8547527B2
(en)
|
2007-07-24 |
2013-10-01 |
Nikon Corporation |
Movable body drive method and movable body drive system, pattern formation method and pattern formation apparatus, and device manufacturing method
|
|
WO2009013905A1
(ja)
|
2007-07-24 |
2009-01-29 |
Nikon Corporation |
位置計測システム、露光装置、位置計測方法、露光方法及びデバイス製造方法、並びに工具及び計測方法
|
|
US8237919B2
(en)
|
2007-08-24 |
2012-08-07 |
Nikon Corporation |
Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method for continuous position measurement of movable body before and after switching between sensor heads
|
|
JPWO2009028157A1
(ja)
|
2007-08-24 |
2010-11-25 |
株式会社ニコン |
移動体駆動方法及び移動体駆動システム、並びにパターン形成方法及びパターン形成装置
|
|
US8218129B2
(en)
|
2007-08-24 |
2012-07-10 |
Nikon Corporation |
Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, measuring method, and position measurement system
|
|
US20090051895A1
(en)
|
2007-08-24 |
2009-02-26 |
Nikon Corporation |
Movable body drive method and movable body drive system, pattern formation method and apparatus, device manufacturing method, and processing system
|
|
US8867022B2
(en)
|
2007-08-24 |
2014-10-21 |
Nikon Corporation |
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|
|
US8023106B2
(en)
|
2007-08-24 |
2011-09-20 |
Nikon Corporation |
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|
|
US9304412B2
(en)
|
2007-08-24 |
2016-04-05 |
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|
|
US9013681B2
(en)
|
2007-11-06 |
2015-04-21 |
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|
|
US9256140B2
(en)
|
2007-11-07 |
2016-02-09 |
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|
|
KR101470671B1
(ko)
|
2007-11-07 |
2014-12-08 |
가부시키가이샤 니콘 |
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|
|
US8665455B2
(en)
|
2007-11-08 |
2014-03-04 |
Nikon Corporation |
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|
|
US8422015B2
(en)
|
2007-11-09 |
2013-04-16 |
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|
|
US8115906B2
(en)
|
2007-12-14 |
2012-02-14 |
Nikon Corporation |
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|
|
US8711327B2
(en)
|
2007-12-14 |
2014-04-29 |
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|
|
US8237916B2
(en)
|
2007-12-28 |
2012-08-07 |
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|
|
KR20110018332A
(ko)
|
2008-04-30 |
2011-02-23 |
가부시키가이샤 니콘 |
스테이지 장치, 패턴 형성 장치, 노광 장치, 스테이지 구동 방법, 노광 방법, 그리고 디바이스 제조 방법
|
|
US8228482B2
(en)
|
2008-05-13 |
2012-07-24 |
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|
|
US8786829B2
(en)
|
2008-05-13 |
2014-07-22 |
Nikon Corporation |
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|
|
US8817236B2
(en)
|
2008-05-13 |
2014-08-26 |
Nikon Corporation |
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|
|
US8994923B2
(en)
|
2008-09-22 |
2015-03-31 |
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|
|
US8508735B2
(en)
|
2008-09-22 |
2013-08-13 |
Nikon Corporation |
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|
|
US8325325B2
(en)
|
2008-09-22 |
2012-12-04 |
Nikon Corporation |
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|
|
US8902402B2
(en)
*
|
2008-12-19 |
2014-12-02 |
Nikon Corporation |
Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method
|
|
US8760629B2
(en)
|
2008-12-19 |
2014-06-24 |
Nikon Corporation |
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|
|
US8599359B2
(en)
|
2008-12-19 |
2013-12-03 |
Nikon Corporation |
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|
|
US8773635B2
(en)
|
2008-12-19 |
2014-07-08 |
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|
|
KR101052544B1
(ko)
|
2008-12-23 |
2011-07-29 |
삼성중공업 주식회사 |
영상 필링 방법 및 그 영상 변환 장치
|
|
KR101056795B1
(ko)
|
2008-12-23 |
2011-08-12 |
하지성 |
한지(韓紙)를 이용한 장례용 관(棺)의 제조방법
|
|
US8553204B2
(en)
|
2009-05-20 |
2013-10-08 |
Nikon Corporation |
Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method
|
|
US8970820B2
(en)
|
2009-05-20 |
2015-03-03 |
Nikon Corporation |
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|
|
US8792084B2
(en)
|
2009-05-20 |
2014-07-29 |
Nikon Corporation |
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|
|
NL2005013A
(en)
*
|
2009-07-31 |
2011-02-02 |
Asml Netherlands Bv |
Positioning system, lithographic apparatus and method.
|
|
US8514395B2
(en)
|
2009-08-25 |
2013-08-20 |
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|
|
US8488109B2
(en)
|
2009-08-25 |
2013-07-16 |
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|
|
US8493547B2
(en)
|
2009-08-25 |
2013-07-23 |
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|
|
JP5507392B2
(ja)
*
|
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|
|
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|
|
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*
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|
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|
|
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