JP2015505154A5 - - Google Patents

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JP2015505154A5
JP2015505154A5 JP2014520850A JP2014520850A JP2015505154A5 JP 2015505154 A5 JP2015505154 A5 JP 2015505154A5 JP 2014520850 A JP2014520850 A JP 2014520850A JP 2014520850 A JP2014520850 A JP 2014520850A JP 2015505154 A5 JP2015505154 A5 JP 2015505154A5
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substrate
substrate stage
measurement
exposure
exposure apparatus
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JP2014520850A
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JP2015505154A (ja
JP6016200B2 (ja
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JP2014520850A 2011-12-29 2012-12-28 露光装置及び露光方法、並びにデバイス製造方法 Active JP6016200B2 (ja)

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JP2014520850A JP6016200B2 (ja) 2011-12-29 2012-12-28 露光装置及び露光方法、並びにデバイス製造方法

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Application Number Priority Date Filing Date Title
US201161581293P 2011-12-29 2011-12-29
US201161581360P 2011-12-29 2011-12-29
US61/581,293 2011-12-29
US61/581,360 2011-12-29
JP2012248419 2012-11-12
JP2012248419 2012-11-12
US13/727,286 US9207549B2 (en) 2011-12-29 2012-12-26 Exposure apparatus and exposure method, and device manufacturing method with encoder of higher reliability for position measurement
US13/727,286 2012-12-26
JP2014520850A JP6016200B2 (ja) 2011-12-29 2012-12-28 露光装置及び露光方法、並びにデバイス製造方法
PCT/JP2012/084310 WO2013100202A1 (en) 2011-12-29 2012-12-28 Exposure apparatus, exposure method, and device manufacturing method

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JP2015505154A JP2015505154A (ja) 2015-02-16
JP2015505154A5 true JP2015505154A5 (enExample) 2015-09-24
JP6016200B2 JP6016200B2 (ja) 2016-10-26

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US (1) US9207549B2 (enExample)
JP (1) JP6016200B2 (enExample)
KR (1) KR101698249B1 (enExample)
TW (1) TWI639057B (enExample)
WO (1) WO2013100202A1 (enExample)

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