JP2015109459A5 - - Google Patents
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- JP2015109459A5 JP2015109459A5 JP2015002653A JP2015002653A JP2015109459A5 JP 2015109459 A5 JP2015109459 A5 JP 2015109459A5 JP 2015002653 A JP2015002653 A JP 2015002653A JP 2015002653 A JP2015002653 A JP 2015002653A JP 2015109459 A5 JP2015109459 A5 JP 2015109459A5
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Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US23670409P | 2009-08-25 | 2009-08-25 | |
| US61/236,704 | 2009-08-25 | ||
| US12/860,097 | 2010-08-20 | ||
| US12/860,097 US8514395B2 (en) | 2009-08-25 | 2010-08-20 | Exposure method, exposure apparatus, and device manufacturing method |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014045912A Division JP5812370B2 (ja) | 2009-08-25 | 2014-03-10 | 露光装置及び露光方法、並びにデバイス製造方法 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015127274A Division JP6035695B2 (ja) | 2009-08-25 | 2015-06-25 | 露光装置及び露光方法、並びにデバイス製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015109459A JP2015109459A (ja) | 2015-06-11 |
| JP2015109459A5 true JP2015109459A5 (enExample) | 2015-07-23 |
| JP6035692B2 JP6035692B2 (ja) | 2016-11-30 |
Family
ID=43625432
Family Applications (8)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010187052A Active JP5637496B2 (ja) | 2009-08-25 | 2010-08-24 | 露光方法及び露光装置、並びにデバイス製造方法 |
| JP2014045912A Active JP5812370B2 (ja) | 2009-08-25 | 2014-03-10 | 露光装置及び露光方法、並びにデバイス製造方法 |
| JP2014125963A Active JP5846255B2 (ja) | 2009-08-25 | 2014-06-19 | 露光装置及び露光方法、並びにデバイス製造方法 |
| JP2015002653A Active JP6035692B2 (ja) | 2009-08-25 | 2015-01-08 | 露光装置及び露光方法、並びにデバイス製造方法 |
| JP2015127274A Active JP6035695B2 (ja) | 2009-08-25 | 2015-06-25 | 露光装置及び露光方法、並びにデバイス製造方法 |
| JP2016004179A Active JP6107981B2 (ja) | 2009-08-25 | 2016-01-13 | 露光装置及び露光方法、並びにデバイス製造方法 |
| JP2016218331A Active JP6292546B2 (ja) | 2009-08-25 | 2016-11-08 | 露光装置及び露光方法、並びにデバイス製造方法 |
| JP2018025540A Active JP6548150B2 (ja) | 2009-08-25 | 2018-02-16 | 露光装置及び露光方法、並びにデバイス製造方法 |
Family Applications Before (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010187052A Active JP5637496B2 (ja) | 2009-08-25 | 2010-08-24 | 露光方法及び露光装置、並びにデバイス製造方法 |
| JP2014045912A Active JP5812370B2 (ja) | 2009-08-25 | 2014-03-10 | 露光装置及び露光方法、並びにデバイス製造方法 |
| JP2014125963A Active JP5846255B2 (ja) | 2009-08-25 | 2014-06-19 | 露光装置及び露光方法、並びにデバイス製造方法 |
Family Applications After (4)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015127274A Active JP6035695B2 (ja) | 2009-08-25 | 2015-06-25 | 露光装置及び露光方法、並びにデバイス製造方法 |
| JP2016004179A Active JP6107981B2 (ja) | 2009-08-25 | 2016-01-13 | 露光装置及び露光方法、並びにデバイス製造方法 |
| JP2016218331A Active JP6292546B2 (ja) | 2009-08-25 | 2016-11-08 | 露光装置及び露光方法、並びにデバイス製造方法 |
| JP2018025540A Active JP6548150B2 (ja) | 2009-08-25 | 2018-02-16 | 露光装置及び露光方法、並びにデバイス製造方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (10) | US8514395B2 (enExample) |
| EP (7) | EP2818928B8 (enExample) |
| JP (8) | JP5637496B2 (enExample) |
| KR (7) | KR101840582B1 (enExample) |
| CN (4) | CN105182695B (enExample) |
| TW (8) | TWI554845B (enExample) |
| WO (1) | WO2011024984A1 (enExample) |
Families Citing this family (44)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8493547B2 (en) | 2009-08-25 | 2013-07-23 | Nikon Corporation | Exposure apparatus, exposure method, and device manufacturing method |
| US8514395B2 (en) * | 2009-08-25 | 2013-08-20 | Nikon Corporation | Exposure method, exposure apparatus, and device manufacturing method |
| US9207549B2 (en) | 2011-12-29 | 2015-12-08 | Nikon Corporation | Exposure apparatus and exposure method, and device manufacturing method with encoder of higher reliability for position measurement |
| JP5832345B2 (ja) * | 2012-03-22 | 2015-12-16 | 株式会社ニューフレアテクノロジー | 検査装置および検査方法 |
| DE102012218039A1 (de) * | 2012-10-02 | 2014-04-03 | Schaeffler Technologies Gmbh & Co. Kg | Planarantrieb sowie Verfahren zu dessen Kalibrierung |
| EP2905805B1 (en) * | 2012-10-02 | 2020-07-22 | Nikon Corporation | Exposure apparatus, exposure method, and pattern-manufacturing method by lithography |
| CN103198035B (zh) * | 2013-02-28 | 2016-07-20 | 北京优纳科技有限公司 | 对位方法及对位系统 |
| JP6229311B2 (ja) * | 2013-05-28 | 2017-11-15 | 株式会社ニコン | 露光装置及びデバイス製造方法 |
| WO2015101220A1 (zh) * | 2013-12-31 | 2015-07-09 | 上海微电子装备有限公司 | 一种硅片预对准装置及其方法 |
| CN104865798B (zh) * | 2014-02-21 | 2017-07-11 | 无锡华润上华科技有限公司 | 光刻工艺中的曝光场的尺寸选择方法 |
| CN105185703B (zh) * | 2014-06-18 | 2019-09-17 | 上海华力微电子有限公司 | 一种晶圆边缘找平的方法 |
| JP6661270B2 (ja) | 2015-01-16 | 2020-03-11 | キヤノン株式会社 | 露光装置、露光システム、および物品の製造方法 |
| JP6475756B2 (ja) * | 2015-02-04 | 2019-02-27 | 川崎重工業株式会社 | ロボットのぶれ自動調整装置及びロボットのぶれ自動調整方法 |
| JP6649636B2 (ja) | 2015-02-23 | 2020-02-19 | 株式会社ニコン | 計測装置、リソグラフィシステム及び露光装置、並びにデバイス製造方法 |
| TWI702474B (zh) * | 2015-02-23 | 2020-08-21 | 日商尼康股份有限公司 | 基板處理系統及基板處理方法、以及元件製造方法 |
| CN107250915B (zh) | 2015-02-23 | 2020-03-13 | 株式会社尼康 | 测量装置、光刻系统及曝光装置、以及管理方法、重迭测量方法及组件制造方法 |
| CN107430357B (zh) * | 2015-03-31 | 2021-02-05 | 株式会社尼康 | 曝光装置、平面显示器的制造方法、元件制造方法、及曝光方法 |
| TW201643558A (zh) * | 2015-03-31 | 2016-12-16 | 尼康股份有限公司 | 曝光裝置、平面顯示器之製造方法、元件製造方法、及曝光方法 |
| JP6819887B2 (ja) * | 2015-09-30 | 2021-01-27 | 株式会社ニコン | 露光装置及び露光方法、並びにフラットパネルディスプレイ製造方法 |
| CN108139683B (zh) * | 2015-09-30 | 2021-11-05 | 株式会社尼康 | 曝光装置及曝光方法、以及平面显示器制造方法 |
| DE102015219810A1 (de) * | 2015-10-13 | 2017-04-13 | Dr. Johannes Heidenhain Gmbh | X-Y-Tisch mit einer Positionsmesseinrichtung |
| CN105425550A (zh) * | 2016-01-14 | 2016-03-23 | 哈尔滨工业大学 | 基于交错磁钢排布的动线圈气磁结合气浮双工件台矢量圆弧换台方法及装置 |
| US9865477B2 (en) * | 2016-02-24 | 2018-01-09 | Taiwan Semiconductor Manufacturing Co., Ltd. | Backside polisher with dry frontside design and method using the same |
| CN205427436U (zh) * | 2016-03-23 | 2016-08-03 | 北京京东方光电科技有限公司 | 显示器件的对位检测设备及曝光工艺系统 |
| JP6718279B2 (ja) * | 2016-03-31 | 2020-07-08 | 株式会社オーク製作所 | 露光装置、ステージ較正システム、およびステージ較正方法 |
| CN109791368B (zh) | 2016-09-27 | 2021-11-26 | 株式会社尼康 | 决定方法及装置、程序、信息记录媒体、曝光装置、布局信息提供方法、布局方法、标记检测方法、曝光方法、以及器件制造方法 |
| CN107883884B (zh) * | 2016-09-30 | 2019-10-25 | 上海微电子装备（集团）股份有限公司 | 一种光学测量装置和方法 |
| KR20210119582A (ko) * | 2016-09-30 | 2021-10-05 | 가부시키가이샤 니콘 | 이동체 장치, 이동 방법, 노광 장치, 노광 방법, 플랫 패널 디스플레이의 제조 방법, 그리고 디바이스 제조 방법 |
| JP6787404B2 (ja) * | 2016-09-30 | 2020-11-18 | 株式会社ニコン | 移動体装置、移動方法、露光装置、露光方法、フラットパネルディスプレイの製造方法、並びにデバイス製造方法 |
| CN112965345B (zh) * | 2016-09-30 | 2023-05-16 | 株式会社尼康 | 移动体装置、曝光装置、平板显示器的制造方法 |
| CN107883887B (zh) * | 2016-09-30 | 2019-11-26 | 上海微电子装备（集团）股份有限公司 | 一种光学测量装置和方法 |
| CN106773525B (zh) * | 2017-03-01 | 2020-06-16 | 合肥京东方光电科技有限公司 | 掩模板、对位方法、显示面板、显示装置及其对盒方法 |
| US10585360B2 (en) * | 2017-08-25 | 2020-03-10 | Applied Materials, Inc. | Exposure system alignment and calibration method |
| JP6493481B2 (ja) * | 2017-10-18 | 2019-04-03 | 株式会社ニコン | 露光装置及びデバイス製造方法 |
| CN109116593B (zh) * | 2018-08-02 | 2021-07-20 | 深圳市华星光电半导体显示技术有限公司 | 母板曝光方法 |
| NL2023546A (en) * | 2018-08-23 | 2020-02-27 | Asml Netherlands Bv | Stage apparatus and method for calibrating an object loading process |
| KR102722920B1 (ko) | 2019-04-18 | 2024-10-28 | 삼성전자주식회사 | 진공 챔버용 계측 장치, 및 그 계측 장치를 포함한 계측 시스템 |
| US11637030B2 (en) * | 2019-06-18 | 2023-04-25 | Kla Corporation | Multi-stage, multi-zone substrate positioning systems |
| CN111948917B (zh) * | 2020-08-26 | 2021-06-25 | 清华大学 | 基于光刻机双工件台运动系统的垂向保护方法及装置 |
| KR20230033925A (ko) * | 2021-09-02 | 2023-03-09 | 세메스 주식회사 | 기판 처리 장치 및 기판 처리 방법 |
| CN114056937B (zh) * | 2021-12-13 | 2023-06-23 | 芯峰光电技术(深圳)有限公司 | 一种电子芯片多工位自动吸取加工生产线 |
| TWI814668B (zh) * | 2021-12-31 | 2023-09-01 | 南韓商細美事有限公司 | 用於處理基板之設備及用於處理基板之方法 |
| CN115574722B (zh) * | 2022-11-04 | 2024-03-29 | 中国计量科学研究院 | 一种自溯源干涉式位移传感器 |
| EP4372790A1 (de) * | 2022-11-18 | 2024-05-22 | Dr. Johannes Heidenhain GmbH | Positioniereinrichtung |
Family Cites Families (79)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3330964A (en) | 1963-09-09 | 1967-07-11 | Itck Corp | Photoelectric coordinate measuring system |
| US4780617A (en) | 1984-08-09 | 1988-10-25 | Nippon Kogaku K.K. | Method for successive alignment of chip patterns on a substrate |
| JP2829642B2 (ja) * | 1989-09-29 | 1998-11-25 | キヤノン株式会社 | 露光装置 |
| JP3149472B2 (ja) * | 1991-08-30 | 2001-03-26 | 株式会社ニコン | 走査露光装置および物体の移動測定装置 |
| US5196745A (en) | 1991-08-16 | 1993-03-23 | Massachusetts Institute Of Technology | Magnetic positioning device |
| KR100300618B1 (ko) | 1992-12-25 | 2001-11-22 | 오노 시게오 | 노광방법,노광장치,및그장치를사용하는디바이스제조방법 |
| JP3412704B2 (ja) * | 1993-02-26 | 2003-06-03 | 株式会社ニコン | 投影露光方法及び装置、並びに露光装置 |
| JP2963603B2 (ja) * | 1993-05-31 | 1999-10-18 | 東京エレクトロン株式会社 | プローブ装置のアライメント方法 |
| JPH07270122A (ja) * | 1994-03-30 | 1995-10-20 | Canon Inc | 変位検出装置、該変位検出装置を備えた露光装置およびデバイスの製造方法 |
| CN1144263C (zh) | 1996-11-28 | 2004-03-31 | 株式会社尼康 | 曝光装置以及曝光方法 |
| EP0890136B9 (en) | 1996-12-24 | 2003-12-10 | ASML Netherlands B.V. | Two-dimensionally balanced positioning device with two object holders, and lithographic device provided with such a positioning device |
| US6208407B1 (en) | 1997-12-22 | 2001-03-27 | Asm Lithography B.V. | Method and apparatus for repetitively projecting a mask pattern on a substrate, using a time-saving height measurement |
| KR100819239B1 (ko) | 1998-03-11 | 2008-04-03 | 가부시키가이샤 니콘 | 자외 레이저 장치, 레이저 장치, 노광 장치와 노광 방법, 디바이스 제조 방법, 자외광 조사 장치, 물체 패턴 검출 장치, 자외광 조사 방법 및 물체 패턴 검출 방법 |
| AU2747999A (en) | 1998-03-26 | 1999-10-18 | Nikon Corporation | Projection exposure method and system |
| WO2001035168A1 (en) | 1999-11-10 | 2001-05-17 | Massachusetts Institute Of Technology | Interference lithography utilizing phase-locked scanning beams |
| KR20010085493A (ko) | 2000-02-25 | 2001-09-07 | 시마무라 기로 | 노광장치, 그 조정방법, 및 상기 노광장치를 이용한디바이스 제조방법 |
| DE10011130A1 (de) | 2000-03-10 | 2001-09-13 | Mannesmann Vdo Ag | Entlüftungseinrichtung für einen Kraftstoffbehälter |
| US7289212B2 (en) | 2000-08-24 | 2007-10-30 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method and device manufacturing thereby |
| TW527526B (en) | 2000-08-24 | 2003-04-11 | Asml Netherlands Bv | Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| US7561270B2 (en) | 2000-08-24 | 2009-07-14 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method and device manufactured thereby |
| EP1182509B1 (en) * | 2000-08-24 | 2009-04-08 | ASML Netherlands B.V. | Lithographic apparatus, calibration method thereof and device manufacturing method |
| US6480271B1 (en) * | 2001-01-08 | 2002-11-12 | The Boeing Company | Traversing laser locating system |
| WO2002069049A2 (en) | 2001-02-27 | 2002-09-06 | Asml Us, Inc. | Simultaneous imaging of two reticles |
| TW529172B (en) | 2001-07-24 | 2003-04-21 | Asml Netherlands Bv | Imaging apparatus |
| EP1571697A4 (en) | 2002-12-10 | 2007-07-04 | Nikon Corp | EXPOSURE SYSTEM AND COMPONENT MANUFACTURING METHOD |
| US7025498B2 (en) | 2003-05-30 | 2006-04-11 | Asml Holding N.V. | System and method of measuring thermal expansion |
| TWI295408B (en) | 2003-10-22 | 2008-04-01 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method, and measurement system |
| US7589822B2 (en) | 2004-02-02 | 2009-09-15 | Nikon Corporation | Stage drive method and stage unit, exposure apparatus, and device manufacturing method |
| US7102729B2 (en) | 2004-02-03 | 2006-09-05 | Asml Netherlands B.V. | Lithographic apparatus, measurement system, and device manufacturing method |
| US7256871B2 (en) | 2004-07-27 | 2007-08-14 | Asml Netherlands B.V. | Lithographic apparatus and method for calibrating the same |
| EP1804278A4 (en) * | 2004-09-14 | 2011-03-02 | Nikon Corp | CORRECTION METHOD AND EXPOSURE DEVICE |
| WO2006038952A2 (en) | 2004-09-30 | 2006-04-13 | Nikon Corporation | Projection optical device and exposure apparatus |
| JP4613910B2 (ja) * | 2004-10-08 | 2011-01-19 | 株式会社ニコン | 露光装置及びデバイス製造方法 |
| US20060139595A1 (en) | 2004-12-27 | 2006-06-29 | Asml Netherlands B.V. | Lithographic apparatus and method for determining Z position errors/variations and substrate table flatness |
| US7515281B2 (en) | 2005-04-08 | 2009-04-07 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7161659B2 (en) | 2005-04-08 | 2007-01-09 | Asml Netherlands B.V. | Dual stage lithographic apparatus and device manufacturing method |
| US7405811B2 (en) | 2005-04-20 | 2008-07-29 | Asml Netherlands B.V. | Lithographic apparatus and positioning apparatus |
| US7349069B2 (en) | 2005-04-20 | 2008-03-25 | Asml Netherlands B.V. | Lithographic apparatus and positioning apparatus |
| WO2006112554A1 (en) * | 2005-04-21 | 2006-10-26 | Fujifilm Corporation | Method of and system for drawing |
| US8693006B2 (en) * | 2005-06-28 | 2014-04-08 | Nikon Corporation | Reflector, optical element, interferometer system, stage device, exposure apparatus, and device fabricating method |
| US7348574B2 (en) | 2005-09-02 | 2008-03-25 | Asml Netherlands, B.V. | Position measurement system and lithographic apparatus |
| KR100869306B1 (ko) * | 2005-09-13 | 2008-11-18 | 에이에스엠엘 네델란즈 비.브이. | 리소그래피 장치 및 디바이스 제조 방법 |
| US7362446B2 (en) | 2005-09-15 | 2008-04-22 | Asml Netherlands B.V. | Position measurement unit, measurement system and lithographic apparatus comprising such position measurement unit |
| US7978339B2 (en) | 2005-10-04 | 2011-07-12 | Asml Netherlands B.V. | Lithographic apparatus temperature compensation |
| SG10201510758QA (en) * | 2006-01-19 | 2016-01-28 | Nikon Corp | Movable Body Drive Method, Movable Body Drive System, Pattern Formation Method, Pattern Forming Apparatus, Exposure Method, Exposure Apparatus, and Device Manufacturing Method |
| JP5195417B2 (ja) | 2006-02-21 | 2013-05-08 | 株式会社ニコン | パターン形成装置、露光装置、露光方法及びデバイス製造方法 |
| US7602489B2 (en) | 2006-02-22 | 2009-10-13 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7253875B1 (en) | 2006-03-03 | 2007-08-07 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7636165B2 (en) | 2006-03-21 | 2009-12-22 | Asml Netherlands B.V. | Displacement measurement systems lithographic apparatus and device manufacturing method |
| US7483120B2 (en) * | 2006-05-09 | 2009-01-27 | Asml Netherlands B.V. | Displacement measurement system, lithographic apparatus, displacement measurement method and device manufacturing method |
| US20070281149A1 (en) * | 2006-06-06 | 2007-12-06 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| KR101477448B1 (ko) * | 2006-08-31 | 2014-12-29 | 가부시키가이샤 니콘 | 이동체 구동 방법 및 이동체 구동 시스템, 패턴 형성 방법 및 장치, 노광 방법 및 장치, 그리고 디바이스 제조 방법 |
| KR101881716B1 (ko) * | 2006-09-01 | 2018-07-24 | 가부시키가이샤 니콘 | 이동체 구동 방법 및 이동체 구동 시스템, 패턴 형성 방법 및 장치, 노광 방법 및 장치, 디바이스 제조 방법, 그리고 캘리브레이션 방법 |
| TWI623825B (zh) * | 2006-09-01 | 2018-05-11 | Nikon Corporation | 曝光裝置及方法、以及元件製造方法 |
| EP2068112A4 (en) * | 2006-09-29 | 2017-11-15 | Nikon Corporation | Mobile unit system, pattern forming device, exposing device, exposing method, and device manufacturing method |
| US7619207B2 (en) | 2006-11-08 | 2009-11-17 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7561280B2 (en) | 2007-03-15 | 2009-07-14 | Agilent Technologies, Inc. | Displacement measurement sensor head and system having measurement sub-beams comprising zeroth order and first order diffraction components |
| US7903866B2 (en) | 2007-03-29 | 2011-03-08 | Asml Netherlands B.V. | Measurement system, lithographic apparatus and method for measuring a position dependent signal of a movable object |
| US7710540B2 (en) | 2007-04-05 | 2010-05-04 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7804579B2 (en) * | 2007-06-21 | 2010-09-28 | Asml Netherlands B.V. | Control system, lithographic projection apparatus, method of controlling a support structure, and a computer program product |
| US8194232B2 (en) * | 2007-07-24 | 2012-06-05 | Nikon Corporation | Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, position control method and position control system, and device manufacturing method |
| WO2009013905A1 (ja) * | 2007-07-24 | 2009-01-29 | Nikon Corporation | 位置計測システム、露光装置、位置計測方法、露光方法及びデバイス製造方法、並びに工具及び計測方法 |
| EP2184768B1 (en) * | 2007-07-24 | 2015-09-09 | Nikon Corporation | Mobile object driving method, mobile object driving system, pattern forming method and apparatus, exposure method and apparatus and device manufacturing method |
| US9304412B2 (en) * | 2007-08-24 | 2016-04-05 | Nikon Corporation | Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, and measuring method |
| US8237919B2 (en) * | 2007-08-24 | 2012-08-07 | Nikon Corporation | Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method for continuous position measurement of movable body before and after switching between sensor heads |
| DE102007046927A1 (de) | 2007-09-28 | 2009-04-02 | Carl Zeiss Smt Ag | Kalibrierung einer Positionsmesseinrichtung einer optischen Einrichtung |
| US8665455B2 (en) * | 2007-11-08 | 2014-03-04 | Nikon Corporation | Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method |
| NL1036180A1 (nl) * | 2007-11-20 | 2009-05-25 | Asml Netherlands Bv | Stage system, lithographic apparatus including such stage system, and correction method. |
| CN101681809B (zh) * | 2007-12-28 | 2012-04-25 | 株式会社尼康 | 曝光装置、曝光方法以及器件制造方法 |
| US8269945B2 (en) | 2007-12-28 | 2012-09-18 | Nikon Corporation | Movable body drive method and apparatus, exposure method and apparatus, pattern formation method and apparatus, and device manufacturing method |
| US8237916B2 (en) | 2007-12-28 | 2012-08-07 | Nikon Corporation | Movable body drive system, pattern formation apparatus, exposure apparatus and exposure method, and device manufacturing method |
| NL1036742A1 (nl) * | 2008-04-18 | 2009-10-20 | Asml Netherlands Bv | Stage system calibration method, stage system and lithographic apparatus comprising such stage system. |
| JP4922338B2 (ja) * | 2008-04-25 | 2012-04-25 | エーエスエムエル ネザーランズ ビー．ブイ． | 位置制御システム、リソグラフィ装置、および可動オブジェクトの位置を制御する方法 |
| EP2131243B1 (en) * | 2008-06-02 | 2015-07-01 | ASML Netherlands B.V. | Lithographic apparatus and method for calibrating a stage position |
| US8493547B2 (en) * | 2009-08-25 | 2013-07-23 | Nikon Corporation | Exposure apparatus, exposure method, and device manufacturing method |
| US8514395B2 (en) | 2009-08-25 | 2013-08-20 | Nikon Corporation | Exposure method, exposure apparatus, and device manufacturing method |
| JP5926153B2 (ja) * | 2012-08-31 | 2016-05-25 | ジーイー・メディカル・システムズ・グローバル・テクノロジー・カンパニー・エルエルシー | クレードル、テーブル、および医用装置 |
| JP6207390B2 (ja) * | 2013-12-27 | 2017-10-04 | 日本化薬株式会社 | 赤外線遮蔽シート及びその用途 |
| JP6211821B2 (ja) * | 2013-06-18 | 2017-10-11 | 東芝産業機器システム株式会社 | 固定子鉄心の製造方法 |
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