JP2014150264A5 - - Google Patents

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JP2014150264A5
JP2014150264A5 JP2014045897A JP2014045897A JP2014150264A5 JP 2014150264 A5 JP2014150264 A5 JP 2014150264A5 JP 2014045897 A JP2014045897 A JP 2014045897A JP 2014045897 A JP2014045897 A JP 2014045897A JP 2014150264 A5 JP2014150264 A5 JP 2014150264A5
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JP2014045897A 2009-08-25 2014-03-10 露光装置及び露光方法、並びにデバイス製造方法 Active JP6035686B2 (ja)

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US23670109P 2009-08-25 2009-08-25
US61/236,701 2009-08-25
US12/859,983 US8493547B2 (en) 2009-08-25 2010-08-20 Exposure apparatus, exposure method, and device manufacturing method
US12/859,983 2010-08-20

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JP2014150264A JP2014150264A (ja) 2014-08-21
JP2014150264A5 true JP2014150264A5 (enExample) 2015-02-26
JP6035686B2 JP6035686B2 (ja) 2016-11-30

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JP2010187025A Active JP5637495B2 (ja) 2009-08-25 2010-08-24 露光装置及び露光方法、並びにデバイス製造方法
JP2014045897A Active JP6035686B2 (ja) 2009-08-25 2014-03-10 露光装置及び露光方法、並びにデバイス製造方法
JP2015002607A Active JP6035691B2 (ja) 2009-08-25 2015-01-08 露光装置及び露光方法、並びにデバイス製造方法
JP2015121609A Active JP6035694B2 (ja) 2009-08-25 2015-06-17 露光装置及び露光方法、並びにデバイス製造方法
JP2016004156A Active JP6107980B2 (ja) 2009-08-25 2016-01-13 露光装置及び露光方法、並びにデバイス製造方法
JP2016218369A Active JP6292547B2 (ja) 2009-08-25 2016-11-08 露光装置及び露光方法、並びにデバイス製造方法
JP2018016060A Active JP6566389B2 (ja) 2009-08-25 2018-02-01 露光装置及び露光方法、並びにデバイス製造方法
JP2019138896A Active JP6788812B2 (ja) 2009-08-25 2019-07-29 露光装置及び露光方法、並びにデバイス製造方法
JP2020171916A Active JP6948581B2 (ja) 2009-08-25 2020-10-12 露光装置及び露光方法、並びにデバイス製造方法

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JP2015121609A Active JP6035694B2 (ja) 2009-08-25 2015-06-17 露光装置及び露光方法、並びにデバイス製造方法
JP2016004156A Active JP6107980B2 (ja) 2009-08-25 2016-01-13 露光装置及び露光方法、並びにデバイス製造方法
JP2016218369A Active JP6292547B2 (ja) 2009-08-25 2016-11-08 露光装置及び露光方法、並びにデバイス製造方法
JP2018016060A Active JP6566389B2 (ja) 2009-08-25 2018-02-01 露光装置及び露光方法、並びにデバイス製造方法
JP2019138896A Active JP6788812B2 (ja) 2009-08-25 2019-07-29 露光装置及び露光方法、並びにデバイス製造方法
JP2020171916A Active JP6948581B2 (ja) 2009-08-25 2020-10-12 露光装置及び露光方法、並びにデバイス製造方法

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US (11) US8493547B2 (enExample)
EP (5) EP2470962B1 (enExample)
JP (9) JP5637495B2 (enExample)
KR (8) KR101680546B1 (enExample)
CN (4) CN102549501B (enExample)
HK (2) HK1250795A1 (enExample)
TW (7) TWI649644B (enExample)
WO (1) WO2011024985A1 (enExample)

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US8115906B2 (en) * 2007-12-14 2012-02-14 Nikon Corporation Movable body system, pattern formation apparatus, exposure apparatus and measurement device, and device manufacturing method
US8711327B2 (en) * 2007-12-14 2014-04-29 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
WO2009078443A1 (ja) * 2007-12-17 2009-06-25 Nikon Corporation 露光装置、露光方法及びデバイス製造方法
US8237916B2 (en) * 2007-12-28 2012-08-07 Nikon Corporation Movable body drive system, pattern formation apparatus, exposure apparatus and exposure method, and device manufacturing method
TWI454851B (zh) * 2007-12-28 2014-10-01 尼康股份有限公司 An exposure apparatus, a moving body driving system, a pattern forming apparatus, and an exposure method, and an element manufacturing method
NL1036742A1 (nl) * 2008-04-18 2009-10-20 Asml Netherlands Bv Stage system calibration method, stage system and lithographic apparatus comprising such stage system.
US8817236B2 (en) 2008-05-13 2014-08-26 Nikon Corporation Movable body system, movable body drive method, pattern formation apparatus, pattern formation method, exposure apparatus, exposure method, and device manufacturing method
US8786829B2 (en) * 2008-05-13 2014-07-22 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US8334983B2 (en) * 2009-05-22 2012-12-18 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8493547B2 (en) 2009-08-25 2013-07-23 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
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JP2014045897A (ja) * 2012-08-30 2014-03-17 Hds:Kk ボード玩具
KR102203305B1 (ko) 2012-10-02 2021-01-14 가부시키가이샤 니콘 노광 장치 및 노광 방법, 그리고 디바이스 제조 방법

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