WO2009028157A1 - 移動体駆動方法及び移動体駆動システム、並びにパターン形成方法及びパターン形成装置 - Google Patents

移動体駆動方法及び移動体駆動システム、並びにパターン形成方法及びパターン形成装置 Download PDF

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Publication number
WO2009028157A1
WO2009028157A1 PCT/JP2008/002265 JP2008002265W WO2009028157A1 WO 2009028157 A1 WO2009028157 A1 WO 2009028157A1 JP 2008002265 W JP2008002265 W JP 2008002265W WO 2009028157 A1 WO2009028157 A1 WO 2009028157A1
Authority
WO
WIPO (PCT)
Prior art keywords
moving body
pattern forming
body driving
position information
wst
Prior art date
Application number
PCT/JP2008/002265
Other languages
English (en)
French (fr)
Inventor
Yuho Kanaya
Original Assignee
Nikon Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP2007-219103 priority Critical
Priority to JP2007219103 priority
Application filed by Nikon Corporation filed Critical Nikon Corporation
Publication of WO2009028157A1 publication Critical patent/WO2009028157A1/ja

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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70691Handling of masks or wafers
    • G03F7/70775Position control
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70691Handling of masks or wafers
    • G03F7/70716Stages
    • G03F7/70725Stages control
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/708Construction of apparatus, e.g. environment, hygiene aspects or materials
    • G03F7/7085Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7007Alignment other than original with workpiece
    • G03F9/7011Pre-exposure scan; original with original holder alignment; Prealignment, i.e. workpiece with workpiece holder
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7019Calibration
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection

Abstract

 干渉計システム、例えばZ干渉計(43A,43B)を用いてステージ(WST)の第1の位置情報を計測する。同時に、面位置計測システム、例えば2つの(Zヘッド743,763)を用いてステージ(WST)の第2の位置情報を計測する。第1の位置情報と第2の位置情報の差を所定の計測時間にわたって移動平均して座標オフセットを設定し、該座標オフセットを用いて面位置計測システムの出力信号の信頼性を検証する。正常が確認されたら、第1の位置情報と座標オフセットの和を用いてステージ(WST)をサーボ制御する。このハイブリッド方式のサーボ制御により、干渉計の安定性とZヘッドの精密さを兼ね備えたステージ(WST)の駆動制御が可能になる。
PCT/JP2008/002265 2007-08-24 2008-08-21 移動体駆動方法及び移動体駆動システム、並びにパターン形成方法及びパターン形成装置 WO2009028157A1 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2007-219103 2007-08-24
JP2007219103 2007-08-24

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009529978A JPWO2009028157A1 (ja) 2007-08-24 2008-08-21 移動体駆動方法及び移動体駆動システム、並びにパターン形成方法及びパターン形成装置

Publications (1)

Publication Number Publication Date
WO2009028157A1 true WO2009028157A1 (ja) 2009-03-05

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Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/002265 WO2009028157A1 (ja) 2007-08-24 2008-08-21 移動体駆動方法及び移動体駆動システム、並びにパターン形成方法及びパターン形成装置

Country Status (5)

Country Link
US (2) US8085385B2 (ja)
JP (1) JPWO2009028157A1 (ja)
KR (1) KR20100057758A (ja)
TW (1) TW200931186A (ja)
WO (1) WO2009028157A1 (ja)

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JP2011040614A (ja) * 2009-08-12 2011-02-24 Nuflare Technology Inc 荷電粒子ビーム描画装置、荷電粒子ビーム描画方法および振動成分抽出方法
WO2017057465A1 (ja) * 2015-09-30 2017-04-06 株式会社ニコン 移動体装置、露光装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法、並びに計測方法
WO2017057560A1 (ja) * 2015-09-30 2017-04-06 株式会社ニコン 露光装置及び露光方法、並びにフラットパネルディスプレイ製造方法

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US8902402B2 (en) * 2008-12-19 2014-12-02 Nikon Corporation Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method
US8599359B2 (en) 2008-12-19 2013-12-03 Nikon Corporation Exposure apparatus, exposure method, device manufacturing method, and carrier method
JP5431831B2 (ja) * 2009-08-21 2014-03-05 株式会社ディスコ レーザー加工装置
US8488109B2 (en) 2009-08-25 2013-07-16 Nikon Corporation Exposure method, exposure apparatus, and device manufacturing method
US8493547B2 (en) 2009-08-25 2013-07-23 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US20110096318A1 (en) * 2009-09-28 2011-04-28 Nikon Corporation Exposure apparatus and device fabricating method
US20110102761A1 (en) * 2009-09-28 2011-05-05 Nikon Corporation Stage apparatus, exposure apparatus, and device fabricating method
US20110096306A1 (en) * 2009-09-28 2011-04-28 Nikon Corporation Stage apparatus, exposure apparatus, driving method, exposing method, and device fabricating method
US20110096312A1 (en) * 2009-09-28 2011-04-28 Nikon Corporation Exposure apparatus and device fabricating method
US8606426B2 (en) * 2009-10-23 2013-12-10 Academia Sinica Alignment and anti-drift mechanism
US20110128523A1 (en) * 2009-11-19 2011-06-02 Nikon Corporation Stage apparatus, exposure apparatus, driving method, exposing method, and device fabricating method
US20110123913A1 (en) * 2009-11-19 2011-05-26 Nikon Corporation Exposure apparatus, exposing method, and device fabricating method
US8488106B2 (en) * 2009-12-28 2013-07-16 Nikon Corporation Movable body drive method, movable body apparatus, exposure method, exposure apparatus, and device manufacturing method
US9207549B2 (en) 2011-12-29 2015-12-08 Nikon Corporation Exposure apparatus and exposure method, and device manufacturing method with encoder of higher reliability for position measurement
EP2823361A2 (en) * 2012-03-08 2015-01-14 Mapper Lithography IP B.V. Lithography system and method for processing a target, such as a wafer
US9074871B1 (en) * 2012-08-01 2015-07-07 Steven M. Lubeck Pipe measuring system
JP2016017862A (ja) * 2014-07-09 2016-02-01 株式会社日立ハイテクサイエンス 3次元微動装置
JPWO2016136691A1 (ja) * 2015-02-23 2017-11-30 株式会社ニコン 基板処理システム及び基板処理方法、並びにデバイス製造方法
CN107408520A (zh) * 2015-03-03 2017-11-28 卢茨·瑞布斯道克 检查系统
CN205427436U (zh) * 2016-03-23 2016-08-03 北京京东方光电科技有限公司 显示器件的对位检测设备及曝光工艺系统
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CN109065477B (zh) * 2018-07-26 2020-02-07 长江存储科技有限责任公司 晶圆键合装置、晶圆键合过程的检测方法

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
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Also Published As

Publication number Publication date
KR20100057758A (ko) 2010-06-01
US20120127450A1 (en) 2012-05-24
TW200931186A (en) 2009-07-16
JPWO2009028157A1 (ja) 2010-11-25
US8085385B2 (en) 2011-12-27
US20090073405A1 (en) 2009-03-19
US8792086B2 (en) 2014-07-29

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