JP2014116403A5 - - Google Patents
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- Publication number
- JP2014116403A5 JP2014116403A5 JP2012268340A JP2012268340A JP2014116403A5 JP 2014116403 A5 JP2014116403 A5 JP 2014116403A5 JP 2012268340 A JP2012268340 A JP 2012268340A JP 2012268340 A JP2012268340 A JP 2012268340A JP 2014116403 A5 JP2014116403 A5 JP 2014116403A5
- Authority
- JP
- Japan
- Prior art keywords
- detection
- mark
- reference member
- exposure
- projection optical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000001514 detection method Methods 0.000 claims description 69
- 230000003287 optical effect Effects 0.000 claims description 24
- 238000000034 method Methods 0.000 claims description 9
- 239000007788 liquid Substances 0.000 claims 8
- 238000005259 measurement Methods 0.000 claims 7
- 238000007654 immersion Methods 0.000 claims 6
- 238000005286 illumination Methods 0.000 claims 5
- 230000001678 irradiating effect Effects 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012268340A JP6102230B2 (ja) | 2012-12-07 | 2012-12-07 | 露光装置及び露光方法、並びにデバイス製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012268340A JP6102230B2 (ja) | 2012-12-07 | 2012-12-07 | 露光装置及び露光方法、並びにデバイス製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2014116403A JP2014116403A (ja) | 2014-06-26 |
| JP2014116403A5 true JP2014116403A5 (enExample) | 2015-12-03 |
| JP6102230B2 JP6102230B2 (ja) | 2017-03-29 |
Family
ID=51172120
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012268340A Active JP6102230B2 (ja) | 2012-12-07 | 2012-12-07 | 露光装置及び露光方法、並びにデバイス製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP6102230B2 (enExample) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6885336B2 (ja) * | 2015-09-30 | 2021-06-16 | 株式会社ニコン | 露光装置、露光方法、フラットパネルディスプレイの製造方法、及びデバイス製造方法 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1068604A (ja) * | 1996-08-27 | 1998-03-10 | Canon Inc | 光干渉計測方法およびそれを用いた光干渉計測装置 |
| AU2003298003A1 (en) * | 2002-12-05 | 2004-06-30 | Kla-Tencor Technologies Corporation | Apparatus and methods for detecting overlay errors using scatterometry |
| EP2003680B1 (en) * | 2006-02-21 | 2013-05-29 | Nikon Corporation | Exposure apparatus, exposure method and device manufacturing method |
| EP2003681B1 (en) * | 2006-02-21 | 2014-11-12 | Nikon Corporation | Measuring apparatus, measuring method, pattern forming apparatus, pattern forming method, and device manufacturing method |
| EP2993524B1 (en) * | 2006-09-01 | 2017-10-25 | Nikon Corporation | Exposure method and apparatus and device manufacturing method |
| SG168488A1 (en) * | 2009-07-16 | 2011-02-28 | Asml Netherlands Bv | Position calibration of alignment heads in a multi-head alignment system |
| NL2005092A (en) * | 2009-07-16 | 2011-01-18 | Asml Netherlands Bv | Object alignment measurement method and apparatus. |
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2012
- 2012-12-07 JP JP2012268340A patent/JP6102230B2/ja active Active