JP2014116403A5 - - Google Patents

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Publication number
JP2014116403A5
JP2014116403A5 JP2012268340A JP2012268340A JP2014116403A5 JP 2014116403 A5 JP2014116403 A5 JP 2014116403A5 JP 2012268340 A JP2012268340 A JP 2012268340A JP 2012268340 A JP2012268340 A JP 2012268340A JP 2014116403 A5 JP2014116403 A5 JP 2014116403A5
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JP
Japan
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detection
mark
reference member
exposure
projection optical
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JP2012268340A
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English (en)
Japanese (ja)
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JP2014116403A (ja
JP6102230B2 (ja
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Publication of JP2014116403A5 publication Critical patent/JP2014116403A5/ja
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JP2012268340A 2012-12-07 2012-12-07 露光装置及び露光方法、並びにデバイス製造方法 Active JP6102230B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2012268340A JP6102230B2 (ja) 2012-12-07 2012-12-07 露光装置及び露光方法、並びにデバイス製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012268340A JP6102230B2 (ja) 2012-12-07 2012-12-07 露光装置及び露光方法、並びにデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2014116403A JP2014116403A (ja) 2014-06-26
JP2014116403A5 true JP2014116403A5 (enExample) 2015-12-03
JP6102230B2 JP6102230B2 (ja) 2017-03-29

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JP2012268340A Active JP6102230B2 (ja) 2012-12-07 2012-12-07 露光装置及び露光方法、並びにデバイス製造方法

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JP (1) JP6102230B2 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6885336B2 (ja) * 2015-09-30 2021-06-16 株式会社ニコン 露光装置、露光方法、フラットパネルディスプレイの製造方法、及びデバイス製造方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1068604A (ja) * 1996-08-27 1998-03-10 Canon Inc 光干渉計測方法およびそれを用いた光干渉計測装置
AU2003298003A1 (en) * 2002-12-05 2004-06-30 Kla-Tencor Technologies Corporation Apparatus and methods for detecting overlay errors using scatterometry
SG178816A1 (en) * 2006-02-21 2012-03-29 Nikon Corp Measuring apparatus and method, processing apparatus and method, pattern forming apparatus and method, exposure appararus and method, and device manufacturing method
US8908145B2 (en) * 2006-02-21 2014-12-09 Nikon Corporation Pattern forming apparatus and pattern forming method, movable body drive system and movable body drive method, exposure apparatus and exposure method, and device manufacturing method
EP2993524B1 (en) * 2006-09-01 2017-10-25 Nikon Corporation Exposure method and apparatus and device manufacturing method
EP2275871B1 (en) * 2009-07-16 2018-06-27 ASML Netherlands B.V. Position Calibration of Alignment Heads in a Multi-Head Alignment System
NL2005092A (en) * 2009-07-16 2011-01-18 Asml Netherlands Bv Object alignment measurement method and apparatus.

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