JP2019008323A5 - - Google Patents

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JP2019008323A5
JP2019008323A5 JP2018178796A JP2018178796A JP2019008323A5 JP 2019008323 A5 JP2019008323 A5 JP 2019008323A5 JP 2018178796 A JP2018178796 A JP 2018178796A JP 2018178796 A JP2018178796 A JP 2018178796A JP 2019008323 A5 JP2019008323 A5 JP 2019008323A5
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substrate
holder
exposure apparatus
sensor
alignment
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JP2018178796A
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JP6674989B2 (ja
JP2019008323A (ja
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JP2018178796A 2017-02-03 2018-09-25 露光装置 Active JP6674989B2 (ja)

Applications Claiming Priority (8)

Application Number Priority Date Filing Date Title
EP17154551 2017-02-03
EP17154551 2017-02-03
EP17169025 2017-05-02
EP17169025 2017-05-02
EP17193990 2017-09-29
EP17193990 2017-09-29
EP17201092 2017-11-10
EP17201092 2017-11-10

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JP2018016095A Division JP6470856B2 (ja) 2017-02-03 2018-02-01 露光装置

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JP2018205234A Division JP6557394B2 (ja) 2017-02-03 2018-10-31 露光装置
JP2018205206A Division JP6556929B2 (ja) 2017-02-03 2018-10-31 露光装置

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JP2019008323A JP2019008323A (ja) 2019-01-17
JP2019008323A5 true JP2019008323A5 (enExample) 2019-02-28
JP6674989B2 JP6674989B2 (ja) 2020-04-01

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JP2019538369A Active JP6883655B2 (ja) 2017-02-03 2018-01-30 露光装置
JP2018016095A Active JP6470856B2 (ja) 2017-02-03 2018-02-01 露光装置
JP2018102751A Active JP6518819B2 (ja) 2017-02-03 2018-05-29 露光装置
JP2018178796A Active JP6674989B2 (ja) 2017-02-03 2018-09-25 露光装置
JP2018190700A Active JP6518831B2 (ja) 2017-02-03 2018-10-09 露光装置
JP2018205234A Active JP6557394B2 (ja) 2017-02-03 2018-10-31 露光装置
JP2018205206A Active JP6556929B2 (ja) 2017-02-03 2018-10-31 露光装置
JP2018205284A Active JP6620208B2 (ja) 2017-02-03 2018-10-31 露光装置
JP2018205217A Active JP6741736B2 (ja) 2017-02-03 2018-10-31 露光装置
JP2019006923A Active JP6775040B2 (ja) 2017-02-03 2019-01-18 露光装置
JP2019032352A Active JP7041643B2 (ja) 2017-02-03 2019-02-26 露光装置

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JP2019538369A Active JP6883655B2 (ja) 2017-02-03 2018-01-30 露光装置
JP2018016095A Active JP6470856B2 (ja) 2017-02-03 2018-02-01 露光装置
JP2018102751A Active JP6518819B2 (ja) 2017-02-03 2018-05-29 露光装置

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JP2018190700A Active JP6518831B2 (ja) 2017-02-03 2018-10-09 露光装置
JP2018205234A Active JP6557394B2 (ja) 2017-02-03 2018-10-31 露光装置
JP2018205206A Active JP6556929B2 (ja) 2017-02-03 2018-10-31 露光装置
JP2018205284A Active JP6620208B2 (ja) 2017-02-03 2018-10-31 露光装置
JP2018205217A Active JP6741736B2 (ja) 2017-02-03 2018-10-31 露光装置
JP2019006923A Active JP6775040B2 (ja) 2017-02-03 2019-01-18 露光装置
JP2019032352A Active JP7041643B2 (ja) 2017-02-03 2019-02-26 露光装置

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US (2) US11092903B2 (enExample)
EP (1) EP3577525A1 (enExample)
JP (11) JP6883655B2 (enExample)
KR (2) KR102458052B1 (enExample)
CN (1) CN110268334B (enExample)
IL (1) IL268217B2 (enExample)
NL (1) NL2020344A (enExample)
SG (1) SG11201906413XA (enExample)
TW (2) TWI781467B (enExample)
WO (1) WO2018141713A1 (enExample)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL2020344A (en) 2017-02-03 2018-08-14 Asml Netherlands Bv Exposure apparatus
US11105611B2 (en) * 2018-05-15 2021-08-31 Applejack 199 L.P. Non-contact measurement of a stress in a film on substrate
CN112740111A (zh) 2018-09-21 2021-04-30 Asml荷兰有限公司 辐射系统
CN111123667B (zh) * 2018-10-31 2021-09-24 上海微电子装备（集团）股份有限公司 光刻装置、光刻装置的垂向控制方法及曝光方法
CN111830790A (zh) * 2019-04-17 2020-10-27 上海微电子装备（集团）股份有限公司 一种气浴装置和光刻机
KR102897291B1 (ko) * 2020-02-06 2025-12-09 에이에스엠엘 네델란즈 비.브이. 듀얼 스테이지 리소그래피 장치를 사용하는 방법 및 리소그래피 장치
WO2021160423A1 (en) * 2020-02-14 2021-08-19 Asml Holding N.V. Reticle gripper damper and isolation system for lithographic apparatuses
NL2025372A (en) 2020-04-20 2020-05-07 Asml Netherlands Bv System, lithographic apparatus and method
JP7445532B2 (ja) * 2020-06-15 2024-03-07 東京エレクトロン株式会社 実行装置及び実行方法
DE102020209638B3 (de) * 2020-07-30 2021-11-11 Carl Zeiss Smt Gmbh Verfahren und vorrichtung zum bestimmen einer ausrichtung einer fotomaske auf einem probentisch, der entlang zumindest einer achse verschiebbar und um zumindest eine achse drehbar ist
KR20230150880A (ko) * 2021-04-09 2023-10-31 가부시키가이샤 니콘 노광 장치, 디바이스 제조 방법, 플랫 패널 디스플레이의 제조 방법 및 노광 방법
WO2022240477A1 (en) * 2021-05-13 2022-11-17 Ohio State Innovation Foundation IN SITU DAMAGE FREE ETCHING OF Ga 2O3 USING Ga FLUX FOR FABRICATING HIGH ASPECT RATIO 3D STRUCTURES
WO2023138916A1 (en) * 2022-01-21 2023-07-27 Asml Netherlands B.V. Systems and methods for inspecting a portion of a lithography apparatus
DE102022108279A1 (de) 2022-04-06 2023-10-12 Testo SE & Co. KGaA Automatische Messorterkennung eines Loggers
US20250166143A1 (en) * 2023-11-22 2025-05-22 Varjo Technologies Oy Static distortion correction for head mounted display

Family Cites Families (88)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100300618B1 (ko) * 1992-12-25 2001-11-22 오노 시게오 노광방법,노광장치,및그장치를사용하는디바이스제조방법
JP2832673B2 (ja) * 1993-10-29 1998-12-09 株式会社オーク製作所 露光装置およびワークの露光方法
EP0722123B1 (en) 1995-01-12 1999-04-14 Orc Manufacturing Co., Ltd. Apparatus and method for exposing of workpiece
US5677758A (en) 1995-02-09 1997-10-14 Mrs Technology, Inc. Lithography System using dual substrate stages
JP4029182B2 (ja) * 1996-11-28 2008-01-09 株式会社ニコン 露光方法
JP3303758B2 (ja) 1996-12-28 2002-07-22 キヤノン株式会社 投影露光装置及びデバイスの製造方法
JPH11224854A (ja) 1997-11-22 1999-08-17 Nikon Corp 露光装置及び露光方法、並びにデバイス製造方法
JP2002014005A (ja) 2000-04-25 2002-01-18 Nikon Corp 空間像計測方法、結像特性計測方法、空間像計測装置及び露光装置
JP2002198303A (ja) 2000-12-27 2002-07-12 Nikon Corp 露光装置、光学特性計測方法、及びデバイス製造方法
US20020041377A1 (en) 2000-04-25 2002-04-11 Nikon Corporation Aerial image measurement method and unit, optical properties measurement method and unit, adjustment method of projection optical system, exposure method and apparatus, making method of exposure apparatus, and device manufacturing method
JP4905617B2 (ja) 2001-05-28 2012-03-28 株式会社ニコン 露光方法及びデバイス製造方法
JP2003100612A (ja) 2001-09-26 2003-04-04 Nikon Corp 面位置検出装置、合焦装置の調整方法、面位置検出方法、露光装置及びデバイスの製造方法
JP4661015B2 (ja) 2001-09-26 2011-03-30 株式会社ニコン 波面収差測定装置及び波面収差測定方法、並びに、露光装置及びデバイスの製造方法
US6987555B2 (en) * 2002-04-23 2006-01-17 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method, and device manufactured thereby
JP3966211B2 (ja) 2002-05-08 2007-08-29 株式会社ニコン 露光方法、露光装置及びデバイス製造方法
JP2004260117A (ja) 2003-02-27 2004-09-16 Nikon Corp ステージ装置、露光装置、及びデバイス製造方法
JP2005017734A (ja) 2003-06-26 2005-01-20 Nikon Corp 投影光学系、露光装置、およびデバイス製造方法
JP4023416B2 (ja) 2003-08-19 2007-12-19 株式会社デンソー 冷却器
JP2005064373A (ja) 2003-08-19 2005-03-10 Nikon Corp 露光装置
JP3870182B2 (ja) * 2003-09-09 2007-01-17 キヤノン株式会社 露光装置及びデバイス製造方法
JP2005086093A (ja) 2003-09-10 2005-03-31 Canon Inc 露光装置及びステージ装置の制御方法
WO2005064382A1 (ja) 2003-12-25 2005-07-14 Nikon Corporation 光学素子の保持装置、鏡筒、露光装置、及びデバイスの製造方法
US7589822B2 (en) 2004-02-02 2009-09-15 Nikon Corporation Stage drive method and stage unit, exposure apparatus, and device manufacturing method
EP1713115B1 (en) 2004-02-04 2016-05-04 Nikon Corporation Exposure apparatus, exposure method, and device producing method
WO2005096354A1 (ja) 2004-03-30 2005-10-13 Nikon Corporation 露光装置、露光方法及びデバイス製造方法、並びに面形状検出装置
JP2005322721A (ja) 2004-05-07 2005-11-17 Nikon Corp 情報保存方法及び情報使用方法
JP2005322755A (ja) 2004-05-07 2005-11-17 Nikon Corp 誤差検出方法、位置合わせ方法、露光方法
JP2006005140A (ja) 2004-06-17 2006-01-05 Nikon Corp 位置計測方法及びその装置、露光方法及びその装置、並びにデバイス製造方法
US7345736B2 (en) * 2004-06-21 2008-03-18 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7308368B2 (en) 2004-09-15 2007-12-11 Asml Netherlands B.V. Method and apparatus for vibration detection, method and apparatus for vibration analysis, lithographic apparatus, device manufacturing method, and computer program
US20060092399A1 (en) * 2004-10-29 2006-05-04 Asml Netherlands B.V. Lithographic apparatus, a control system for controlling a lithographic apparatus, and a device manufacturing method
US7528931B2 (en) * 2004-12-20 2009-05-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2006286747A (ja) 2005-03-31 2006-10-19 Sony Corp 位置合わせ方法、その装置、プロセス制御装置およびプログラム
JP4609167B2 (ja) 2005-04-13 2011-01-12 株式会社ニコン 露光システム、露光方法及びマイクロデバイスの製造方法
JP5105135B2 (ja) 2005-06-28 2012-12-19 株式会社ニコン 推定方法、露光方法、デバイス製造方法、検査方法、デバイス製造装置、及びプログラム
JP4632091B2 (ja) 2005-08-30 2011-02-16 株式会社ダイフク 物品搬送設備
JP4835087B2 (ja) 2005-09-30 2011-12-14 サンケン電気株式会社 Ｄｃ−ｄｃコンバータ
KR20080066836A (ko) 2005-11-09 2008-07-16 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
TWI457977B (zh) 2005-12-28 2014-10-21 尼康股份有限公司 A pattern forming method and a pattern forming apparatus, and an element manufacturing method
JP5370708B2 (ja) 2006-01-16 2013-12-18 株式会社ニコン 工具物体、計測装置及び露光装置、並びに計測方法及び調整方法
JPWO2007091463A1 (ja) 2006-02-07 2009-07-02 株式会社ニコン 反射屈折結像光学系、露光装置、およびデバイス製造方法
KR101400571B1 (ko) 2006-02-21 2014-05-28 가부시키가이샤 니콘 측정 장치 및 방법, 처리 장치 및 방법, 패턴 형성 장치 및방법, 노광 장치 및 방법, 그리고 디바이스 제조 방법
EP3115844B1 (en) 2006-02-21 2018-08-15 Nikon Corporation Exposure apparatus, exposure method and device manufacturing method
JP2008004581A (ja) 2006-06-20 2008-01-10 Nikon Corp 露光装置及びセンサ
SG174102A1 (en) 2006-09-01 2011-09-29 Nikon Corp Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, and calibration method
JP5151989B2 (ja) * 2006-11-09 2013-02-27 株式会社ニコン 保持装置、位置検出装置及び露光装置、並びにデバイス製造方法
US7683351B2 (en) * 2006-12-01 2010-03-23 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7804579B2 (en) * 2007-06-21 2010-09-28 Asml Netherlands B.V. Control system, lithographic projection apparatus, method of controlling a support structure, and a computer program product
KR101488048B1 (ko) 2007-07-18 2015-01-29 가부시키가이샤 니콘 계측 방법, 스테이지 장치, 및 노광 장치
JP2009054737A (ja) 2007-08-24 2009-03-12 Nikon Corp マーク検出方法及び装置、位置制御方法及び装置、露光方法及び装置、並びにデバイス製造方法
US20090123874A1 (en) 2007-11-14 2009-05-14 Tadashi Nagayama Exposure method, exposure apparatus, and method for manufacturing device
NL1036180A1 (nl) 2007-11-20 2009-05-25 Asml Netherlands Bv Stage system, lithographic apparatus including such stage system, and correction method.
US8711327B2 (en) 2007-12-14 2014-04-29 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US20090174873A1 (en) 2007-12-17 2009-07-09 Nikon Corporation Exposure apparatus, exposure method and device manufacturing method
JP5177380B2 (ja) 2008-01-08 2013-04-03 ルネサスエレクトロニクス株式会社 位置ずれ補正装置および半導体装置の製造方法
JP2009170559A (ja) 2008-01-14 2009-07-30 Canon Inc 露光装置およびデバイス製造方法
JP2009302400A (ja) 2008-06-16 2009-12-24 Canon Inc 露光装置及びデバイス製造方法
US20100045949A1 (en) 2008-08-11 2010-02-25 Nikon Corporation Exposure apparatus, maintaining method and device fabricating method
US8760629B2 (en) * 2008-12-19 2014-06-24 Nikon Corporation Exposure apparatus including positional measurement system of movable body, exposure method of exposing object including measuring positional information of movable body, and device manufacturing method that includes exposure method of exposing object, including measuring positional information of movable body
JP2010212383A (ja) 2009-03-09 2010-09-24 Nikon Corp 露光方法、露光システム、及びデバイス製造方法
JP5299638B2 (ja) * 2009-09-14 2013-09-25 株式会社ニコン 露光装置及びデバイス製造方法
US20110096306A1 (en) 2009-09-28 2011-04-28 Nikon Corporation Stage apparatus, exposure apparatus, driving method, exposing method, and device fabricating method
NL2006099A (en) * 2010-02-19 2011-08-22 Asml Netherlands Bv Calibration of lithographic apparatus.
KR20120116329A (ko) 2010-02-20 2012-10-22 가부시키가이샤 니콘 광원 최적화 방법, 노광 방법, 디바이스 제조 방법, 프로그램, 노광 장치, 리소그래피 시스템, 광원 평가 방법 및 광원 변조 방법
JP5988537B2 (ja) 2010-06-10 2016-09-07 株式会社ニコン 荷電粒子線露光装置及びデバイス製造方法
NL2007216A (en) 2010-09-08 2012-03-12 Asml Netherlands Bv Self-referencing interferometer, alignment system, and lithographic apparatus.
NL2009533A (en) * 2011-10-27 2013-05-07 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
US9360772B2 (en) 2011-12-29 2016-06-07 Nikon Corporation Carrier method, exposure method, carrier system and exposure apparatus, and device manufacturing method
JP2013161992A (ja) * 2012-02-06 2013-08-19 Nikon Corp 変形可能な反射光学素子、光学系、及び露光装置
JP5994970B2 (ja) 2012-02-10 2016-09-21 株式会社ニコン 瞳強度分布の調整方法、照明光学系およびその調整方法、露光装置、並びにデバイス製造方法
US20130250271A1 (en) 2012-02-17 2013-09-26 Nikon Corporation Stage assembly with secure device holder
US9323160B2 (en) 2012-04-10 2016-04-26 Nikon Corporation Liquid immersion member, exposure apparatus, exposure method, device fabricating method, program, and recording medium
WO2014042044A1 (ja) 2012-09-11 2014-03-20 株式会社ニコン 瞳輝度分布の設定方法
US9772564B2 (en) 2012-11-12 2017-09-26 Nikon Corporation Exposure apparatus and exposure method, and device manufacturing method
JP2014120693A (ja) 2012-12-18 2014-06-30 Nikon Corp 液浸部材、露光装置、露光方法、デバイス製造方法、プログラム、及び記録媒体
JP6260847B2 (ja) 2013-02-23 2018-01-17 株式会社ニコン 露光方法及び装置、並びにデバイス製造方法
JP2015032800A (ja) 2013-08-07 2015-02-16 キヤノン株式会社 リソグラフィ装置、および物品製造方法
KR102242414B1 (ko) * 2013-10-02 2021-04-21 에이에스엠엘 네델란즈 비.브이. 산업 공정과 관련된 진단 정보를 얻는 방법 및 장치
US10338480B2 (en) 2014-05-30 2019-07-02 Nikon Corporation Lithography system, simulation apparatus, and pattern forming method
KR101941596B1 (ko) 2014-06-16 2019-01-23 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치, 기판을 이송하는 방법 및 디바이스 제조 방법
US10289007B2 (en) 2014-07-10 2019-05-14 Nikon Corporation Lithography tool having a reticle stage capable of dynamic reticle bending to compensate for distortion
JP6689602B2 (ja) 2014-12-22 2020-04-28 カール ツァイス マイクロスコーピー エルエルシー 荷電粒子ビームシステム及び方法
TWI702474B (zh) * 2015-02-23 2020-08-21 日商尼康股份有限公司 基板處理系統及基板處理方法、以及元件製造方法
WO2016150631A1 (en) 2015-03-23 2016-09-29 Asml Netherlands B.V. Lithographic apparatus, and device manufacturing method
CN107466381B (zh) * 2015-03-30 2021-03-09 株式会社尼康 物体搬运装置及方法、曝光装置及方法、平板显示器的制造方法、元件制造方法
JP6566192B2 (ja) 2015-03-31 2019-08-28 株式会社ニコン 防振装置、露光装置、及びデバイス製造方法
US11094927B2 (en) 2016-10-12 2021-08-17 Semiconductor Energy Laboratory Co., Ltd. Positive electrode active material particle and manufacturing method of positive electrode active material particle
NL2020344A (en) 2017-02-03 2018-08-14 Asml Netherlands Bv Exposure apparatus

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