SG11201906413XA - Exposure apparatus - Google Patents

Exposure apparatus

Info

Publication number
SG11201906413XA
SG11201906413XA SG11201906413XA SG11201906413XA SG11201906413XA SG 11201906413X A SG11201906413X A SG 11201906413XA SG 11201906413X A SG11201906413X A SG 11201906413XA SG 11201906413X A SG11201906413X A SG 11201906413XA SG 11201906413X A SG11201906413X A SG 11201906413XA
Authority
SG
Singapore
Prior art keywords
configured
substrate
nl
international
sensor
Prior art date
Application number
SG11201906413XA
Inventor
Junichi Kanehara
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to EP17154551 priority Critical
Priority to EP17169025 priority
Priority to EP17193990 priority
Priority to EP17201092 priority
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Priority to PCT/EP2018/052211 priority patent/WO2018141713A1/en
Publication of SG11201906413XA publication Critical patent/SG11201906413XA/en

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7046Strategy, e.g. mark, sensor or wavelength selection
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70216Systems for imaging mask onto workpiece
    • G03F7/70341Immersion
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70483Information management, control, testing, and wafer monitoring, e.g. pattern monitoring
    • G03F7/70491Information management and control, including software
    • G03F7/705Modelling and simulation from physical phenomena up to complete wafer process or whole workflow in wafer fabrication

Abstract

INTERNATIONAL APPLICATION PUBLISHED UNDER THE PATENT COOPERATION TREATY (PCT) (19) World Intellectual Property Organization International Bureau (43) International Publication Date 09 August 2018 (09.08.2018) WIPO I PCT ill 1111u°11101VIIIVIIIVIIIolo mil How olli nium oimiE (10) International Publication Number WO 2018/141713 Al (51) International Patent Classification: G03F 9/00 (2006.01) GO3F 7/20 (2006.01) (21) International Application Number: PCT/EP2018/052211 (22) International Filing Date: 30 January 2018 (30.01.2018) (25) Filing Language: English (26) Publication Language: English (30) Priority Data: 17154551.0 03 February 2017 (03.02.2017) EP 17169025.8 02 May 2017 (02.05.2017) EP 17193990.3 29 September 2017 (29.09.2017) EP 17201092.8 10 November 2017 (10.11.2017) EP (71) Applicant: ASML NETHERLANDS B.V. [NL/NL]; P.O. Box 324, 5500 AH Veldhoven (NL). (72) Inventor: KANEHARA, Junichi; P.O. Box 324, 5500 AH Veldhoven (NL). (74) Agent: RAS, Michael; PO Box 324, 5500 AH Veldhoven (NL). (81) Designated States (unless otherwise indicated, for every kind of national protection available): AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW. (84) Designated States (unless otherwise indicated, for every kind of regional protection available): ARIPO (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, TJ, TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, = (54) Title: EXPOSURE APPARATUS Figure 9 910 920 930 (57) : There is provided an exposure apparatus comprising a first substrate holder, a second substrate holder, a sensor holder, a projection system, a measurement device and a further measurement device. The first substrate holder is configured to hold a substrate. The second substrate holder is configured to hold the substrate. The sensor holder is configured to hold a sensor. The projection system is configured to expose the substrate with an exposure beam. The measurement device is configured to provide measurement information of the substrate. The further measurement device is configured to provide further measurement information of the substrate. The sensor is configured to measure a property of the exposure beam and/or the projection system. The projection system is configured to expose the sensor with the exposure beam. [Continued on next page] WO 2018/141713 Al MIDEDIMOMMIONEEMOMOMMMOMORIEVOIS TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG). Published: — with international search report (Art. 21(3))
SG11201906413XA 2017-02-03 2018-01-30 Exposure apparatus SG11201906413XA (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
EP17154551 2017-02-03
EP17169025 2017-05-02
EP17193990 2017-09-29
EP17201092 2017-11-10
PCT/EP2018/052211 WO2018141713A1 (en) 2017-02-03 2018-01-30 Exposure apparatus

Publications (1)

Publication Number Publication Date
SG11201906413XA true SG11201906413XA (en) 2019-08-27

Family

ID=61132430

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201906413XA SG11201906413XA (en) 2017-02-03 2018-01-30 Exposure apparatus

Country Status (8)

Country Link
JP (10) JP6470856B2 (en)
KR (1) KR20190112795A (en)
CN (1) CN110268334A (en)
IL (1) IL268217D0 (en)
NL (1) NL2020344A (en)
SG (1) SG11201906413XA (en)
TW (1) TW201835687A (en)
WO (1) WO2018141713A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110268334A (en) * 2017-02-03 2019-09-20 Asml荷兰有限公司 Exposure sources

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Also Published As

Publication number Publication date
JP6557394B2 (en) 2019-08-07
JP2019015991A (en) 2019-01-31
KR20190112795A (en) 2019-10-07
JP2019008323A (en) 2019-01-17
TW201835687A (en) 2018-10-01
JP6556929B2 (en) 2019-08-07
JP2019049728A (en) 2019-03-28
JP2018124557A (en) 2018-08-09
JP2018156100A (en) 2018-10-04
JP6518831B2 (en) 2019-05-22
JP2019015988A (en) 2019-01-31
CN110268334A (en) 2019-09-20
IL268217D0 (en) 2019-09-26
NL2020344A (en) 2018-08-14
JP2019056943A (en) 2019-04-11
WO2018141713A1 (en) 2018-08-09
JP6518819B2 (en) 2019-05-22
JP6470856B2 (en) 2019-02-13
JP2019015990A (en) 2019-01-31
JP2019105854A (en) 2019-06-27
JP2019015989A (en) 2019-01-31

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