JP2011060919A5 - - Google Patents

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Publication number
JP2011060919A5
JP2011060919A5 JP2009207533A JP2009207533A JP2011060919A5 JP 2011060919 A5 JP2011060919 A5 JP 2011060919A5 JP 2009207533 A JP2009207533 A JP 2009207533A JP 2009207533 A JP2009207533 A JP 2009207533A JP 2011060919 A5 JP2011060919 A5 JP 2011060919A5
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JP2009207533A
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Japanese (ja)
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JP2011060919A (ja
JP5457767B2 (ja
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Priority to JP2009207533A priority Critical patent/JP5457767B2/ja
Priority claimed from JP2009207533A external-priority patent/JP5457767B2/ja
Priority to US12/872,972 priority patent/US8472009B2/en
Publication of JP2011060919A publication Critical patent/JP2011060919A/ja
Publication of JP2011060919A5 publication Critical patent/JP2011060919A5/ja
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JP2009207533A 2009-09-08 2009-09-08 露光装置およびデバイス製造方法 Expired - Fee Related JP5457767B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2009207533A JP5457767B2 (ja) 2009-09-08 2009-09-08 露光装置およびデバイス製造方法
US12/872,972 US8472009B2 (en) 2009-09-08 2010-08-31 Exposure apparatus and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009207533A JP5457767B2 (ja) 2009-09-08 2009-09-08 露光装置およびデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2011060919A JP2011060919A (ja) 2011-03-24
JP2011060919A5 true JP2011060919A5 (enExample) 2012-10-25
JP5457767B2 JP5457767B2 (ja) 2014-04-02

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ID=43647515

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JP2009207533A Expired - Fee Related JP5457767B2 (ja) 2009-09-08 2009-09-08 露光装置およびデバイス製造方法

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US (1) US8472009B2 (enExample)
JP (1) JP5457767B2 (enExample)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5773735B2 (ja) * 2011-05-09 2015-09-02 キヤノン株式会社 露光装置、および、デバイス製造方法
US9691163B2 (en) 2013-01-07 2017-06-27 Wexenergy Innovations Llc System and method of measuring distances related to an object utilizing ancillary objects
US10196850B2 (en) 2013-01-07 2019-02-05 WexEnergy LLC Frameless supplemental window for fenestration
US9230339B2 (en) 2013-01-07 2016-01-05 Wexenergy Innovations Llc System and method of measuring distances related to an object
US10883303B2 (en) 2013-01-07 2021-01-05 WexEnergy LLC Frameless supplemental window for fenestration
US9845636B2 (en) 2013-01-07 2017-12-19 WexEnergy LLC Frameless supplemental window for fenestration
US8923650B2 (en) 2013-01-07 2014-12-30 Wexenergy Innovations Llc System and method of measuring distances related to an object
CN105005182B (zh) * 2014-04-25 2017-06-27 上海微电子装备有限公司 多个传感器间相互位置关系校准方法
JP6649636B2 (ja) 2015-02-23 2020-02-19 株式会社ニコン 計測装置、リソグラフィシステム及び露光装置、並びにデバイス製造方法
TWI702474B (zh) * 2015-02-23 2020-08-21 日商尼康股份有限公司 基板處理系統及基板處理方法、以及元件製造方法
CN107250915B (zh) 2015-02-23 2020-03-13 株式会社尼康 测量装置、光刻系统及曝光装置、以及管理方法、重迭测量方法及组件制造方法
WO2017102255A1 (en) * 2015-12-17 2017-06-22 Asml Netherlands B.V. Patterning device cooling apparatus
JP6818501B2 (ja) 2016-10-19 2021-01-20 キヤノン株式会社 リソグラフィ装置、および物品製造方法
WO2018152202A1 (en) * 2017-02-14 2018-08-23 Massachusetts Institute Of Technology Systems and methods for automated microscopy
IL271006B2 (en) 2017-05-30 2024-09-01 WexEnergy LLC Frameless supplemental window for fenestration
US20230196707A1 (en) * 2020-05-22 2023-06-22 Purdue Research Foundation Fiducial patterns
WO2023198444A1 (en) * 2022-04-15 2023-10-19 Asml Netherlands B.V. Metrology apparatus with configurable printed optical routing for parallel optical detection

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3379238B2 (ja) * 1994-09-08 2003-02-24 株式会社ニコン 走査型露光装置
JP3506155B2 (ja) * 1995-02-21 2004-03-15 株式会社ニコン 投影露光装置
WO2003069276A1 (en) * 2002-02-15 2003-08-21 Nikon Corporation Position measuring method, exposure method, and device producing method
JP2005175400A (ja) 2003-12-15 2005-06-30 Canon Inc 露光装置
JP2008053618A (ja) * 2006-08-28 2008-03-06 Canon Inc 露光装置及び方法並びに該露光装置を用いたデバイス製造方法
JP5219534B2 (ja) * 2008-01-31 2013-06-26 キヤノン株式会社 露光装置及びデバイスの製造方法

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