JP2013149928A5 - - Google Patents
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- Publication number
- JP2013149928A5 JP2013149928A5 JP2012011558A JP2012011558A JP2013149928A5 JP 2013149928 A5 JP2013149928 A5 JP 2013149928A5 JP 2012011558 A JP2012011558 A JP 2012011558A JP 2012011558 A JP2012011558 A JP 2012011558A JP 2013149928 A5 JP2013149928 A5 JP 2013149928A5
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- measurement
- rotation mechanism
- lithography
- lithographic apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 239000000758 substrate Substances 0.000 claims description 24
- 238000005259 measurement Methods 0.000 claims description 12
- 238000001459 lithography Methods 0.000 claims description 7
- 230000003287 optical effect Effects 0.000 claims 2
- 238000004519 manufacturing process Methods 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 239000002245 particle Substances 0.000 claims 1
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012011558A JP2013149928A (ja) | 2012-01-23 | 2012-01-23 | リソグラフィー装置および物品を製造する方法 |
| US13/739,196 US20130188165A1 (en) | 2012-01-23 | 2013-01-11 | Lithography apparatus, and method of manufacturing article |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012011558A JP2013149928A (ja) | 2012-01-23 | 2012-01-23 | リソグラフィー装置および物品を製造する方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2013149928A JP2013149928A (ja) | 2013-08-01 |
| JP2013149928A5 true JP2013149928A5 (enExample) | 2015-03-05 |
Family
ID=48796959
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012011558A Abandoned JP2013149928A (ja) | 2012-01-23 | 2012-01-23 | リソグラフィー装置および物品を製造する方法 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US20130188165A1 (enExample) |
| JP (1) | JP2013149928A (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2014045041A (ja) * | 2012-08-24 | 2014-03-13 | Sharp Corp | 露光装置、露光方法、および電子デバイス製造方法 |
| CN106463354B (zh) * | 2014-06-25 | 2019-12-20 | 英特尔公司 | 用于形成功能单元的紧凑阵列的技术 |
| JP6791051B2 (ja) * | 2017-07-28 | 2020-11-25 | 株式会社ニューフレアテクノロジー | マルチ荷電粒子ビーム描画装置及びマルチ荷電粒子ビーム描画方法 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5151750A (en) * | 1989-04-14 | 1992-09-29 | Nikon Corporation | Alignment apparatus |
| JPH04304615A (ja) * | 1991-04-01 | 1992-10-28 | Hitachi Ltd | 荷電粒子線描画装置及び方法 |
| US6225012B1 (en) * | 1994-02-22 | 2001-05-01 | Nikon Corporation | Method for positioning substrate |
| JPH08227839A (ja) * | 1995-02-20 | 1996-09-03 | Nikon Corp | 移動鏡曲がりの計測方法 |
| US5648854A (en) * | 1995-04-19 | 1997-07-15 | Nikon Corporation | Alignment system with large area search for wafer edge and global marks |
| KR100525521B1 (ko) * | 1996-10-21 | 2006-01-27 | 가부시키가이샤 니콘 | 노광장치및노광방법 |
| JP4366031B2 (ja) * | 2001-09-17 | 2009-11-18 | キヤノン株式会社 | 位置検出装置及び方法並びに露光装置、デバイスの製造方法 |
-
2012
- 2012-01-23 JP JP2012011558A patent/JP2013149928A/ja not_active Abandoned
-
2013
- 2013-01-11 US US13/739,196 patent/US20130188165A1/en not_active Abandoned