JP2013149928A - リソグラフィー装置および物品を製造する方法 - Google Patents

リソグラフィー装置および物品を製造する方法 Download PDF

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Publication number
JP2013149928A
JP2013149928A JP2012011558A JP2012011558A JP2013149928A JP 2013149928 A JP2013149928 A JP 2013149928A JP 2012011558 A JP2012011558 A JP 2012011558A JP 2012011558 A JP2012011558 A JP 2012011558A JP 2013149928 A JP2013149928 A JP 2013149928A
Authority
JP
Japan
Prior art keywords
wafer
substrate
accuracy
lithography apparatus
alignment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
JP2012011558A
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English (en)
Japanese (ja)
Other versions
JP2013149928A5 (enExample
Inventor
Shigeki Ogawa
茂樹 小川
Koichi Chitoku
孝一 千徳
Hideki Ine
秀樹 稲
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2012011558A priority Critical patent/JP2013149928A/ja
Priority to US13/739,196 priority patent/US20130188165A1/en
Publication of JP2013149928A publication Critical patent/JP2013149928A/ja
Publication of JP2013149928A5 publication Critical patent/JP2013149928A5/ja
Abandoned legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7007—Alignment other than original with workpiece
    • G03F9/7011—Pre-exposure scan; original with original holder alignment; Prealignment, i.e. workpiece with workpiece holder

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP2012011558A 2012-01-23 2012-01-23 リソグラフィー装置および物品を製造する方法 Abandoned JP2013149928A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2012011558A JP2013149928A (ja) 2012-01-23 2012-01-23 リソグラフィー装置および物品を製造する方法
US13/739,196 US20130188165A1 (en) 2012-01-23 2013-01-11 Lithography apparatus, and method of manufacturing article

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012011558A JP2013149928A (ja) 2012-01-23 2012-01-23 リソグラフィー装置および物品を製造する方法

Publications (2)

Publication Number Publication Date
JP2013149928A true JP2013149928A (ja) 2013-08-01
JP2013149928A5 JP2013149928A5 (enExample) 2015-03-05

Family

ID=48796959

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012011558A Abandoned JP2013149928A (ja) 2012-01-23 2012-01-23 リソグラフィー装置および物品を製造する方法

Country Status (2)

Country Link
US (1) US20130188165A1 (enExample)
JP (1) JP2013149928A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014045041A (ja) * 2012-08-24 2014-03-13 Sharp Corp 露光装置、露光方法、および電子デバイス製造方法
JP2017520786A (ja) * 2014-06-25 2017-07-27 インテル・コーポレーション 機能セルのコンパクトアレイを形成するための技術

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6791051B2 (ja) * 2017-07-28 2020-11-25 株式会社ニューフレアテクノロジー マルチ荷電粒子ビーム描画装置及びマルチ荷電粒子ビーム描画方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5151750A (en) * 1989-04-14 1992-09-29 Nikon Corporation Alignment apparatus
JPH04304615A (ja) * 1991-04-01 1992-10-28 Hitachi Ltd 荷電粒子線描画装置及び方法
US6225012B1 (en) * 1994-02-22 2001-05-01 Nikon Corporation Method for positioning substrate
JPH08227839A (ja) * 1995-02-20 1996-09-03 Nikon Corp 移動鏡曲がりの計測方法
US5648854A (en) * 1995-04-19 1997-07-15 Nikon Corporation Alignment system with large area search for wafer edge and global marks
KR100525521B1 (ko) * 1996-10-21 2006-01-27 가부시키가이샤 니콘 노광장치및노광방법
JP4366031B2 (ja) * 2001-09-17 2009-11-18 キヤノン株式会社 位置検出装置及び方法並びに露光装置、デバイスの製造方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014045041A (ja) * 2012-08-24 2014-03-13 Sharp Corp 露光装置、露光方法、および電子デバイス製造方法
JP2017520786A (ja) * 2014-06-25 2017-07-27 インテル・コーポレーション 機能セルのコンパクトアレイを形成するための技術
US10217732B2 (en) 2014-06-25 2019-02-26 Intel Corporation Techniques for forming a compacted array of functional cells

Also Published As

Publication number Publication date
US20130188165A1 (en) 2013-07-25

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