JP2008098311A5 - - Google Patents

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Publication number
JP2008098311A5
JP2008098311A5 JP2006276949A JP2006276949A JP2008098311A5 JP 2008098311 A5 JP2008098311 A5 JP 2008098311A5 JP 2006276949 A JP2006276949 A JP 2006276949A JP 2006276949 A JP2006276949 A JP 2006276949A JP 2008098311 A5 JP2008098311 A5 JP 2008098311A5
Authority
JP
Japan
Prior art keywords
support
substrate
exposure apparatus
measurement
projection optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2006276949A
Other languages
English (en)
Japanese (ja)
Other versions
JP2008098311A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2006276949A priority Critical patent/JP2008098311A/ja
Priority claimed from JP2006276949A external-priority patent/JP2008098311A/ja
Priority to US11/866,686 priority patent/US7463334B2/en
Priority to KR1020070100816A priority patent/KR100882046B1/ko
Priority to TW096137858A priority patent/TW200837805A/zh
Publication of JP2008098311A publication Critical patent/JP2008098311A/ja
Publication of JP2008098311A5 publication Critical patent/JP2008098311A5/ja
Withdrawn legal-status Critical Current

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JP2006276949A 2006-10-10 2006-10-10 露光装置及びデバイス製造方法 Withdrawn JP2008098311A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2006276949A JP2008098311A (ja) 2006-10-10 2006-10-10 露光装置及びデバイス製造方法
US11/866,686 US7463334B2 (en) 2006-10-10 2007-10-03 Exposure apparatus and device manufacturing method
KR1020070100816A KR100882046B1 (ko) 2006-10-10 2007-10-08 노광장치 및 디바이스의 제조방법
TW096137858A TW200837805A (en) 2006-10-10 2007-10-09 Exposure apparatus and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006276949A JP2008098311A (ja) 2006-10-10 2006-10-10 露光装置及びデバイス製造方法

Publications (2)

Publication Number Publication Date
JP2008098311A JP2008098311A (ja) 2008-04-24
JP2008098311A5 true JP2008098311A5 (enExample) 2009-01-29

Family

ID=39274711

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006276949A Withdrawn JP2008098311A (ja) 2006-10-10 2006-10-10 露光装置及びデバイス製造方法

Country Status (4)

Country Link
US (1) US7463334B2 (enExample)
JP (1) JP2008098311A (enExample)
KR (1) KR100882046B1 (enExample)
TW (1) TW200837805A (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5381029B2 (ja) * 2008-11-10 2014-01-08 ウシオ電機株式会社 露光装置
EP2469340B1 (en) * 2010-12-21 2021-01-06 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
TWI571707B (zh) 2011-04-22 2017-02-21 瑪波微影Ｉｐ公司 用於處理諸如晶圓的標靶的微影系統，用於操作用於處理諸如晶圓的標靶的微影系統的方法，以及使用在此種微影系統的基板
NL2008679C2 (en) 2011-04-22 2013-06-26 Mapper Lithography Ip Bv Position determination in a lithography system using a substrate having a partially reflective position mark.
US9383662B2 (en) 2011-05-13 2016-07-05 Mapper Lithography Ip B.V. Lithography system for processing at least a part of a target
US9575768B1 (en) 2013-01-08 2017-02-21 Marvell International Ltd. Loading boot code from multiple memories
JP6229311B2 (ja) * 2013-05-28 2017-11-15 株式会社ニコン 露光装置及びデバイス製造方法
EP3028145A1 (en) * 2013-07-31 2016-06-08 Marvell World Trade Ltd. Parallelizing boot operations
JP6493481B2 (ja) * 2017-10-18 2019-04-03 株式会社ニコン 露光装置及びデバイス製造方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2249189B (en) * 1990-10-05 1994-07-27 Canon Kk Exposure apparatus
JP3266515B2 (ja) * 1996-08-02 2002-03-18 キヤノン株式会社 露光装置、デバイス製造方法およびステージ装置
US6020964A (en) * 1997-12-02 2000-02-01 Asm Lithography B.V. Interferometer system and lithograph apparatus including an interferometer system
JP3554186B2 (ja) * 1998-04-08 2004-08-18 キヤノン株式会社 露光装置、デバイス製造方法および反力受け方法
JP2000031015A (ja) 1998-07-13 2000-01-28 Nikon Corp 位置検出方法、位置調整方法、走査露光方法及び走査型露光装置並びにデバイス製造方法
US20030173833A1 (en) 2000-04-21 2003-09-18 Hazelton Andrew J. Wafer stage with magnetic bearings
US6538720B2 (en) * 2001-02-28 2003-03-25 Silicon Valley Group, Inc. Lithographic tool with dual isolation system and method for configuring the same
KR20060001127A (ko) * 2004-06-30 2006-01-06 삼성전자주식회사 반도체 제조장치

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