JP2009055068A5 - - Google Patents

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Publication number
JP2009055068A5
JP2009055068A5 JP2008309635A JP2008309635A JP2009055068A5 JP 2009055068 A5 JP2009055068 A5 JP 2009055068A5 JP 2008309635 A JP2008309635 A JP 2008309635A JP 2008309635 A JP2008309635 A JP 2008309635A JP 2009055068 A5 JP2009055068 A5 JP 2009055068A5
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JP
Japan
Prior art keywords
optical element
height
lithographic apparatus
measuring
measure
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JP2008309635A
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Japanese (ja)
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JP2009055068A (ja
JP4806703B2 (ja
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Priority claimed from US11/025,603 external-priority patent/US20060147821A1/en
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Publication of JP2009055068A5 publication Critical patent/JP2009055068A5/ja
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Publication of JP4806703B2 publication Critical patent/JP4806703B2/ja
Anticipated expiration legal-status Critical
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JP2008309635A 2004-12-30 2008-12-04 リソグラフィ装置及びデバイス製造方法 Expired - Fee Related JP4806703B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/025,603 2004-12-30
US11/025,603 US20060147821A1 (en) 2004-12-30 2004-12-30 Lithographic apparatus and device manufacturing method

Related Parent Applications (1)

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JP2005376924A Division JP2006191079A (ja) 2004-12-30 2005-12-28 リソグラフィ装置及びデバイス製造方法

Related Child Applications (1)

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JP2010198845A Division JP5286338B2 (ja) 2004-12-30 2010-09-06 リソグラフィ装置及びデバイス製造方法

Publications (3)

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JP2009055068A JP2009055068A (ja) 2009-03-12
JP2009055068A5 true JP2009055068A5 (enExample) 2010-04-08
JP4806703B2 JP4806703B2 (ja) 2011-11-02

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JP2005376924A Pending JP2006191079A (ja) 2004-12-30 2005-12-28 リソグラフィ装置及びデバイス製造方法
JP2008309635A Expired - Fee Related JP4806703B2 (ja) 2004-12-30 2008-12-04 リソグラフィ装置及びデバイス製造方法
JP2010198845A Expired - Fee Related JP5286338B2 (ja) 2004-12-30 2010-09-06 リソグラフィ装置及びデバイス製造方法

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JP2005376924A Pending JP2006191079A (ja) 2004-12-30 2005-12-28 リソグラフィ装置及びデバイス製造方法

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Country Status (7)

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US (4) US20060147821A1 (enExample)
EP (2) EP1677156B1 (enExample)
JP (3) JP2006191079A (enExample)
KR (1) KR100742765B1 (enExample)
CN (1) CN1808279A (enExample)
SG (1) SG123752A1 (enExample)
TW (1) TWI342468B (enExample)

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