JP2006191079A - リソグラフィ装置及びデバイス製造方法 - Google Patents

リソグラフィ装置及びデバイス製造方法 Download PDF

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Publication number
JP2006191079A
JP2006191079A JP2005376924A JP2005376924A JP2006191079A JP 2006191079 A JP2006191079 A JP 2006191079A JP 2005376924 A JP2005376924 A JP 2005376924A JP 2005376924 A JP2005376924 A JP 2005376924A JP 2006191079 A JP2006191079 A JP 2006191079A
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JP
Japan
Prior art keywords
projection system
substrate
optical element
lithographic apparatus
physical property
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Pending
Application number
JP2005376924A
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English (en)
Japanese (ja)
Inventor
Johannes Jacobus Matheus Baselmans
ヤコブス マテウス バーゼルマンス ヨハネス
Sjoerd Nicolaas Lambertus Donders
ニコラース ランベルトゥス ドンダース シュールト
Alexander Hoogendam Christiaan
アレクサンダー ホーゲンダム クリスティアーン
Jeroen Johannes Sophia Maria Mertens
ヨハネス ソフィア マリア メルテンス ジェローン
Johannes Catharinus Hubertus Mulkens
キャサリヌス フーベルトゥス ムルケンス ヨハネス
Bob Streefkerk
シュトレーフケルク ボブ
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ASML Netherlands BV
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ASML Netherlands BV
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Publication of JP2006191079A publication Critical patent/JP2006191079A/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2005376924A 2004-12-30 2005-12-28 リソグラフィ装置及びデバイス製造方法 Pending JP2006191079A (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/025,603 US20060147821A1 (en) 2004-12-30 2004-12-30 Lithographic apparatus and device manufacturing method

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2008309635A Division JP4806703B2 (ja) 2004-12-30 2008-12-04 リソグラフィ装置及びデバイス製造方法

Publications (1)

Publication Number Publication Date
JP2006191079A true JP2006191079A (ja) 2006-07-20

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ID=35790378

Family Applications (3)

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JP2005376924A Pending JP2006191079A (ja) 2004-12-30 2005-12-28 リソグラフィ装置及びデバイス製造方法
JP2008309635A Expired - Fee Related JP4806703B2 (ja) 2004-12-30 2008-12-04 リソグラフィ装置及びデバイス製造方法
JP2010198845A Expired - Fee Related JP5286338B2 (ja) 2004-12-30 2010-09-06 リソグラフィ装置及びデバイス製造方法

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JP2008309635A Expired - Fee Related JP4806703B2 (ja) 2004-12-30 2008-12-04 リソグラフィ装置及びデバイス製造方法
JP2010198845A Expired - Fee Related JP5286338B2 (ja) 2004-12-30 2010-09-06 リソグラフィ装置及びデバイス製造方法

Country Status (7)

Country Link
US (4) US20060147821A1 (enExample)
EP (2) EP1677156B1 (enExample)
JP (3) JP2006191079A (enExample)
KR (1) KR100742765B1 (enExample)
CN (1) CN1808279A (enExample)
SG (1) SG123752A1 (enExample)
TW (1) TWI342468B (enExample)

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JP4888388B2 (ja) * 2005-03-31 2012-02-29 株式会社ニコン 露光方法、露光装置、及びデバイス製造方法
TWI421651B (zh) * 2009-03-19 2014-01-01 Asml Netherlands Bv 定位裝置及微影裝置
US8739082B2 (en) 2009-10-28 2014-05-27 Hua-yu Liu Method of pattern selection for source and mask optimization
TWI460561B (zh) * 2007-05-29 2014-11-11 尼康股份有限公司 Exposure method and apparatus, and component manufacturing method
TWI470341B (zh) * 2008-01-03 2015-01-21 Zeiss Carl Sms Ltd 光罩線寬大小分佈之映射方法及裝置
TWI475336B (zh) * 2007-07-24 2015-03-01 尼康股份有限公司 Mobile body driving method and moving body driving system, pattern forming method and apparatus, exposure method and apparatus, and component manufacturing method
KR20160089489A (ko) * 2013-12-05 2016-07-27 에이에스엠엘 네델란즈 비.브이. 기판 상의 구조체를 측정하는 방법 및 장치, 오차 보정을 위한 모델, 이러한 방법 및 장치를 구현하기 위한 컴퓨터 프로그램 제품
KR20170077214A (ko) * 2014-12-12 2017-07-05 에이에스엠엘 네델란즈 비.브이. 기판 모델 파라미터를 계산하고 리소그래피 처리를 제어하기 위한 방법 및 장치

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CN103545174B (zh) * 2012-07-16 2016-08-24 无锡华润上华科技有限公司 光刻对焦参数测试方法及系统
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US8354209B2 (en) 2013-01-15
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