JP5457767B2 - 露光装置およびデバイス製造方法 - Google Patents

露光装置およびデバイス製造方法 Download PDF

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Publication number
JP5457767B2
JP5457767B2 JP2009207533A JP2009207533A JP5457767B2 JP 5457767 B2 JP5457767 B2 JP 5457767B2 JP 2009207533 A JP2009207533 A JP 2009207533A JP 2009207533 A JP2009207533 A JP 2009207533A JP 5457767 B2 JP5457767 B2 JP 5457767B2
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JP
Japan
Prior art keywords
measurement
mark
substrate
optical system
reticle
Prior art date
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Expired - Fee Related
Application number
JP2009207533A
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English (en)
Japanese (ja)
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JP2011060919A5 (enExample
JP2011060919A (ja
Inventor
務 竹中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
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Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2009207533A priority Critical patent/JP5457767B2/ja
Priority to US12/872,972 priority patent/US8472009B2/en
Publication of JP2011060919A publication Critical patent/JP2011060919A/ja
Publication of JP2011060919A5 publication Critical patent/JP2011060919A5/ja
Application granted granted Critical
Publication of JP5457767B2 publication Critical patent/JP5457767B2/ja
Expired - Fee Related legal-status Critical Current
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7007—Alignment other than original with workpiece
    • G03F9/7015—Reference, i.e. alignment of original or workpiece with respect to a reference not on the original or workpiece
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7007—Alignment other than original with workpiece
    • G03F9/7011—Pre-exposure scan; original with original holder alignment; Prealignment, i.e. workpiece with workpiece holder
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2009207533A 2009-09-08 2009-09-08 露光装置およびデバイス製造方法 Expired - Fee Related JP5457767B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2009207533A JP5457767B2 (ja) 2009-09-08 2009-09-08 露光装置およびデバイス製造方法
US12/872,972 US8472009B2 (en) 2009-09-08 2010-08-31 Exposure apparatus and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009207533A JP5457767B2 (ja) 2009-09-08 2009-09-08 露光装置およびデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2011060919A JP2011060919A (ja) 2011-03-24
JP2011060919A5 JP2011060919A5 (enExample) 2012-10-25
JP5457767B2 true JP5457767B2 (ja) 2014-04-02

Family

ID=43647515

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009207533A Expired - Fee Related JP5457767B2 (ja) 2009-09-08 2009-09-08 露光装置およびデバイス製造方法

Country Status (2)

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US (1) US8472009B2 (enExample)
JP (1) JP5457767B2 (enExample)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5773735B2 (ja) * 2011-05-09 2015-09-02 キヤノン株式会社 露光装置、および、デバイス製造方法
US9691163B2 (en) 2013-01-07 2017-06-27 Wexenergy Innovations Llc System and method of measuring distances related to an object utilizing ancillary objects
US10883303B2 (en) 2013-01-07 2021-01-05 WexEnergy LLC Frameless supplemental window for fenestration
US8923650B2 (en) 2013-01-07 2014-12-30 Wexenergy Innovations Llc System and method of measuring distances related to an object
US9230339B2 (en) 2013-01-07 2016-01-05 Wexenergy Innovations Llc System and method of measuring distances related to an object
US10196850B2 (en) 2013-01-07 2019-02-05 WexEnergy LLC Frameless supplemental window for fenestration
US9845636B2 (en) 2013-01-07 2017-12-19 WexEnergy LLC Frameless supplemental window for fenestration
CN105005182B (zh) * 2014-04-25 2017-06-27 上海微电子装备有限公司 多个传感器间相互位置关系校准方法
CN111158220A (zh) 2015-02-23 2020-05-15 株式会社尼康 测量装置及方法、光刻系统、曝光装置及方法
CN107278279B (zh) 2015-02-23 2020-07-03 株式会社尼康 基板处理系统及基板处理方法、以及组件制造方法
TWI693477B (zh) 2015-02-23 2020-05-11 日商尼康股份有限公司 測量裝置、微影系統及曝光裝置、以及元件製造方法
US10222713B2 (en) * 2015-12-17 2019-03-05 Asml Netherlands B.V. Patterning device cooling apparatus
JP6818501B2 (ja) 2016-10-19 2021-01-20 キヤノン株式会社 リソグラフィ装置、および物品製造方法
WO2018152202A1 (en) * 2017-02-14 2018-08-23 Massachusetts Institute Of Technology Systems and methods for automated microscopy
JP7212037B2 (ja) 2017-05-30 2023-01-24 ウェクスエナジー リミテッド ライアビリティ カンパニー 採光用開口のためのフレームレス補助窓
WO2021236107A1 (en) * 2020-05-22 2021-11-25 Purdue Research Foundation Fiducial patterns

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3379238B2 (ja) * 1994-09-08 2003-02-24 株式会社ニコン 走査型露光装置
JP3506155B2 (ja) * 1995-02-21 2004-03-15 株式会社ニコン 投影露光装置
WO2003069276A1 (en) * 2002-02-15 2003-08-21 Nikon Corporation Position measuring method, exposure method, and device producing method
JP2005175400A (ja) * 2003-12-15 2005-06-30 Canon Inc 露光装置
JP2008053618A (ja) * 2006-08-28 2008-03-06 Canon Inc 露光装置及び方法並びに該露光装置を用いたデバイス製造方法
JP5219534B2 (ja) * 2008-01-31 2013-06-26 キヤノン株式会社 露光装置及びデバイスの製造方法

Also Published As

Publication number Publication date
US8472009B2 (en) 2013-06-25
US20110058151A1 (en) 2011-03-10
JP2011060919A (ja) 2011-03-24

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