JP2011040547A5 - - Google Patents

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Publication number
JP2011040547A5
JP2011040547A5 JP2009186142A JP2009186142A JP2011040547A5 JP 2011040547 A5 JP2011040547 A5 JP 2011040547A5 JP 2009186142 A JP2009186142 A JP 2009186142A JP 2009186142 A JP2009186142 A JP 2009186142A JP 2011040547 A5 JP2011040547 A5 JP 2011040547A5
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JP
Japan
Prior art keywords
light
measurement
region
measured
height
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Pending
Application number
JP2009186142A
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English (en)
Japanese (ja)
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JP2011040547A (ja
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Priority to JP2009186142A priority Critical patent/JP2011040547A/ja
Priority claimed from JP2009186142A external-priority patent/JP2011040547A/ja
Priority to US12/840,495 priority patent/US9164405B2/en
Publication of JP2011040547A publication Critical patent/JP2011040547A/ja
Publication of JP2011040547A5 publication Critical patent/JP2011040547A5/ja
Pending legal-status Critical Current

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JP2009186142A 2009-08-10 2009-08-10 計測装置、露光装置及びデバイスの製造方法 Pending JP2011040547A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2009186142A JP2011040547A (ja) 2009-08-10 2009-08-10 計測装置、露光装置及びデバイスの製造方法
US12/840,495 US9164405B2 (en) 2009-08-10 2010-07-21 Measurement apparatus for calculation of substrate tilt, exposure apparatus, and device fabrication method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009186142A JP2011040547A (ja) 2009-08-10 2009-08-10 計測装置、露光装置及びデバイスの製造方法

Publications (2)

Publication Number Publication Date
JP2011040547A JP2011040547A (ja) 2011-02-24
JP2011040547A5 true JP2011040547A5 (enExample) 2012-09-13

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ID=43534613

Family Applications (1)

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JP2009186142A Pending JP2011040547A (ja) 2009-08-10 2009-08-10 計測装置、露光装置及びデバイスの製造方法

Country Status (2)

Country Link
US (1) US9164405B2 (enExample)
JP (1) JP2011040547A (enExample)

Families Citing this family (14)

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Publication number Priority date Publication date Assignee Title
PT2634551T (pt) * 2010-10-28 2021-07-15 Foss Analytical As Interferómetro e analisador espectroscópico de transformada de fourier
NL2009273A (en) * 2011-08-31 2013-03-04 Asml Netherlands Bv Level sensor arrangement for lithographic apparatus, lithographic apparatus and device manufacturing method.
KR101358091B1 (ko) * 2012-01-11 2014-02-06 주식회사 고영테크놀러지 간섭계 및 이를 이용한 광학장치
JP5971965B2 (ja) * 2012-02-07 2016-08-17 キヤノン株式会社 面形状計測方法、面形状計測装置、プログラム、および、光学素子の製造方法
CN103744271B (zh) * 2014-01-28 2015-10-28 苏州苏大维格光电科技股份有限公司 一种激光直写系统与光刻方法
KR20160056466A (ko) * 2014-11-11 2016-05-20 삼성디스플레이 주식회사 표면 검사 장치, 표면 검사 방법 및 표시 장치의 제조 방법
JP6685741B2 (ja) * 2015-02-16 2020-04-22 キヤノン株式会社 形状計測方法、形状計測装置、プログラム、記録媒体及び光学素子の製造方法
CN104677314A (zh) * 2015-03-02 2015-06-03 合肥京东方光电科技有限公司 检测显示面板表面平坦度的装置及方法
WO2017003983A1 (en) * 2015-06-30 2017-01-05 Corning Incorporated Interferometric roll-off measurement using a static fringe pattern
JP6462614B2 (ja) 2016-03-16 2019-01-30 東芝メモリ株式会社 パターン精度検出装置及び加工システム
EP3309616A1 (en) * 2016-10-14 2018-04-18 ASML Netherlands B.V. Method of inspecting a substrate, metrology apparatus, and lithographic system
EP3770546A1 (de) * 2019-07-25 2021-01-27 sentronics metrology GmbH Vorrichtung und verfahren zur messung von höhenprofilen an einem objekt
JP2021081324A (ja) * 2019-11-20 2021-05-27 株式会社リコー 形状測定装置、システムおよび方法
KR102804207B1 (ko) * 2022-10-04 2025-05-09 세메스 주식회사 기판 검사 장치 및 방법

Family Cites Families (14)

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Publication number Priority date Publication date Assignee Title
US4340306A (en) 1980-02-04 1982-07-20 Balasubramanian N Optical system for surface topography measurement
US6449048B1 (en) * 2000-05-11 2002-09-10 Veeco Instruments, Inc. Lateral-scanning interferometer with tilted optical axis
DE10039239A1 (de) * 2000-08-11 2002-03-07 Bosch Gmbh Robert Optische Messvorrichtung
JP4216805B2 (ja) * 2002-07-01 2009-01-28 ライトゲイジ インコーポレイテッド 非鏡面基準表面をもつ周波数走査型干渉計
US7292346B2 (en) * 2003-09-15 2007-11-06 Zygo Corporation Triangulation methods and systems for profiling surfaces through a thin film coating
KR100641885B1 (ko) 2004-06-15 2006-11-02 주식회사 나노시스템 수평 방향 스캐닝 방식의 광위상 간섭측정방법 및 장치
JP4554385B2 (ja) * 2005-01-27 2010-09-29 浜松ホトニクス株式会社 表面形状計測方法及び計測装置
JP2006242570A (ja) * 2005-02-28 2006-09-14 Fuji Xerox Co Ltd 表面形状測定装置
WO2007044786A2 (en) * 2005-10-11 2007-04-19 Zygo Corporation Interferometry method and system including spectral decomposition
KR101257538B1 (ko) 2006-02-01 2013-04-24 토레 엔지니어링 가부시키가이샤 표면형상의 측정방법 및 이것을 이용한 장치
JP4884850B2 (ja) * 2006-06-13 2012-02-29 浜松ホトニクス株式会社 干渉測定装置
JP4987359B2 (ja) * 2006-06-13 2012-07-25 浜松ホトニクス株式会社 表面形状計測装置
US7916284B2 (en) 2006-07-18 2011-03-29 Asml Netherlands B.V. Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
JP4512627B2 (ja) 2007-10-03 2010-07-28 キヤノン株式会社 測定装置、露光装置及びデバイス製造方法

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