JP2009239286A5 - - Google Patents

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Publication number
JP2009239286A5
JP2009239286A5 JP2009074674A JP2009074674A JP2009239286A5 JP 2009239286 A5 JP2009239286 A5 JP 2009239286A5 JP 2009074674 A JP2009074674 A JP 2009074674A JP 2009074674 A JP2009074674 A JP 2009074674A JP 2009239286 A5 JP2009239286 A5 JP 2009239286A5
Authority
JP
Japan
Prior art keywords
liquid
immersion system
liquid recovery
recovery port
optical path
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2009074674A
Other languages
English (en)
Japanese (ja)
Other versions
JP2009239286A (ja
Filing date
Publication date
Priority claimed from US12/382,742 external-priority patent/US8233139B2/en
Application filed filed Critical
Publication of JP2009239286A publication Critical patent/JP2009239286A/ja
Publication of JP2009239286A5 publication Critical patent/JP2009239286A5/ja
Pending legal-status Critical Current

Links

JP2009074674A 2008-03-27 2009-03-25 液浸システム、露光装置、露光方法、及びデバイス製造方法 Pending JP2009239286A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US6481008P 2008-03-27 2008-03-27
US12/382,742 US8233139B2 (en) 2008-03-27 2009-03-23 Immersion system, exposure apparatus, exposing method, and device fabricating method

Publications (2)

Publication Number Publication Date
JP2009239286A JP2009239286A (ja) 2009-10-15
JP2009239286A5 true JP2009239286A5 (enExample) 2013-03-14

Family

ID=40793250

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009074674A Pending JP2009239286A (ja) 2008-03-27 2009-03-25 液浸システム、露光装置、露光方法、及びデバイス製造方法

Country Status (5)

Country Link
US (2) US8233139B2 (enExample)
JP (1) JP2009239286A (enExample)
KR (1) KR20100133446A (enExample)
TW (1) TW200947145A (enExample)
WO (1) WO2009119898A1 (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101486086B1 (ko) * 2006-05-10 2015-01-23 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
US8233139B2 (en) * 2008-03-27 2012-07-31 Nikon Corporation Immersion system, exposure apparatus, exposing method, and device fabricating method
US8896806B2 (en) 2008-12-29 2014-11-25 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
KR20120113238A (ko) * 2010-01-08 2012-10-12 가부시키가이샤 니콘 액침 부재, 노광 장치, 노광 방법, 및 디바이스 제조 방법
NL2009692A (en) * 2011-12-07 2013-06-10 Asml Netherlands Bv A lithographic apparatus and a device manufacturing method.
US9323160B2 (en) * 2012-04-10 2016-04-26 Nikon Corporation Liquid immersion member, exposure apparatus, exposure method, device fabricating method, program, and recording medium
US9823580B2 (en) 2012-07-20 2017-11-21 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
US9494870B2 (en) 2012-10-12 2016-11-15 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9720331B2 (en) 2012-12-27 2017-08-01 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
CN106662822A (zh) 2014-07-01 2017-05-10 Asml荷兰有限公司 光刻设备和制造光刻设备的方法

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EP1944654A3 (en) 1996-11-28 2010-06-02 Nikon Corporation An exposure apparatus and an exposure method
EP0900412B1 (en) 1997-03-10 2005-04-06 ASML Netherlands B.V. Lithographic apparatus comprising a positioning device having two object holders
US6897963B1 (en) 1997-12-18 2005-05-24 Nikon Corporation Stage device and exposure apparatus
US6208407B1 (en) 1997-12-22 2001-03-27 Asm Lithography B.V. Method and apparatus for repetitively projecting a mask pattern on a substrate, using a time-saving height measurement
IL138374A (en) 1998-03-11 2004-07-25 Nikon Corp An ultraviolet laser device and an exposure device that includes such a device
WO2001035168A1 (en) 1999-11-10 2001-05-17 Massachusetts Institute Of Technology Interference lithography utilizing phase-locked scanning beams
JP4714403B2 (ja) 2001-02-27 2011-06-29 エーエスエムエル ユーエス，インコーポレイテッド デュアルレチクルイメージを露光する方法および装置
TW529172B (en) 2001-07-24 2003-04-21 Asml Netherlands Bv Imaging apparatus
CN100462844C (zh) 2002-08-23 2009-02-18 株式会社尼康 投影光学系统、微影方法、曝光装置及使用此装置的方法
EP3062152B1 (en) 2003-04-10 2017-12-20 Nikon Corporation Environmental system including vaccum scavenge for an immersion lithography apparatus
TWI295414B (en) * 2003-05-13 2008-04-01 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
EP2282233A1 (en) 2003-05-13 2011-02-09 ASML Netherlands BV Lithographic apparatus
KR101288140B1 (ko) 2003-09-03 2013-07-19 가부시키가이샤 니콘 액침 리소그래피용 유체를 제공하기 위한 장치 및 방법
JP4378136B2 (ja) 2003-09-04 2009-12-02 キヤノン株式会社 露光装置及びデバイス製造方法
KR101504445B1 (ko) * 2004-03-25 2015-03-19 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
EP1768169B9 (en) 2004-06-04 2013-03-06 Nikon Corporation Exposure apparatus, exposure method, and device producing method
JP4543767B2 (ja) 2004-06-10 2010-09-15 株式会社ニコン 露光装置及びデバイス製造方法
US7701550B2 (en) 2004-08-19 2010-04-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
TWI610340B (zh) * 2004-09-17 2018-01-01 尼康股份有限公司 曝光裝置、曝光方法及元件製造方法
US7161654B2 (en) * 2004-12-02 2007-01-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP5005226B2 (ja) * 2005-01-31 2012-08-22 株式会社ニコン 露光装置及びデバイス製造方法、液体保持方法
US7411654B2 (en) 2005-04-05 2008-08-12 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4802604B2 (ja) * 2005-08-17 2011-10-26 株式会社ニコン 露光装置、露光方法、及びデバイス製造方法
US7751026B2 (en) 2005-08-25 2010-07-06 Nikon Corporation Apparatus and method for recovering fluid for immersion lithography
US7864292B2 (en) * 2005-11-16 2011-01-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7804577B2 (en) 2005-11-16 2010-09-28 Asml Netherlands B.V. Lithographic apparatus
KR101486086B1 (ko) 2006-05-10 2015-01-23 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
JP2007335662A (ja) * 2006-06-15 2007-12-27 Canon Inc 露光装置
JP2008034801A (ja) 2006-06-30 2008-02-14 Canon Inc 露光装置およびデバイス製造方法
US8134685B2 (en) 2007-03-23 2012-03-13 Nikon Corporation Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
US20090122282A1 (en) 2007-05-21 2009-05-14 Nikon Corporation Exposure apparatus, liquid immersion system, exposing method, and device fabricating method
US8233139B2 (en) * 2008-03-27 2012-07-31 Nikon Corporation Immersion system, exposure apparatus, exposing method, and device fabricating method

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