JP2009239286A5 - - Google Patents

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Publication number
JP2009239286A5
JP2009239286A5 JP2009074674A JP2009074674A JP2009239286A5 JP 2009239286 A5 JP2009239286 A5 JP 2009239286A5 JP 2009074674 A JP2009074674 A JP 2009074674A JP 2009074674 A JP2009074674 A JP 2009074674A JP 2009239286 A5 JP2009239286 A5 JP 2009239286A5
Authority
JP
Japan
Prior art keywords
liquid
immersion system
liquid recovery
recovery port
optical path
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2009074674A
Other languages
English (en)
Japanese (ja)
Other versions
JP2009239286A (ja
Filing date
Publication date
Priority claimed from US12/382,742 external-priority patent/US8233139B2/en
Application filed filed Critical
Publication of JP2009239286A publication Critical patent/JP2009239286A/ja
Publication of JP2009239286A5 publication Critical patent/JP2009239286A5/ja
Pending legal-status Critical Current

Links

JP2009074674A 2008-03-27 2009-03-25 液浸システム、露光装置、露光方法、及びデバイス製造方法 Pending JP2009239286A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US6481008P 2008-03-27 2008-03-27
US12/382,742 US8233139B2 (en) 2008-03-27 2009-03-23 Immersion system, exposure apparatus, exposing method, and device fabricating method

Publications (2)

Publication Number Publication Date
JP2009239286A JP2009239286A (ja) 2009-10-15
JP2009239286A5 true JP2009239286A5 (enExample) 2013-03-14

Family

ID=40793250

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009074674A Pending JP2009239286A (ja) 2008-03-27 2009-03-25 液浸システム、露光装置、露光方法、及びデバイス製造方法

Country Status (5)

Country Link
US (2) US8233139B2 (enExample)
JP (1) JP2009239286A (enExample)
KR (1) KR20100133446A (enExample)
TW (1) TW200947145A (enExample)
WO (1) WO2009119898A1 (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007129753A1 (ja) * 2006-05-10 2007-11-15 Nikon Corporation 露光装置及びデバイス製造方法
US8233139B2 (en) * 2008-03-27 2012-07-31 Nikon Corporation Immersion system, exposure apparatus, exposing method, and device fabricating method
US8896806B2 (en) * 2008-12-29 2014-11-25 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
WO2011083724A1 (ja) * 2010-01-08 2011-07-14 株式会社ニコン 液浸部材、露光装置、露光方法、及びデバイス製造方法
NL2009692A (en) * 2011-12-07 2013-06-10 Asml Netherlands Bv A lithographic apparatus and a device manufacturing method.
US9323160B2 (en) * 2012-04-10 2016-04-26 Nikon Corporation Liquid immersion member, exposure apparatus, exposure method, device fabricating method, program, and recording medium
US9823580B2 (en) 2012-07-20 2017-11-21 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
US9494870B2 (en) * 2012-10-12 2016-11-15 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9720331B2 (en) 2012-12-27 2017-08-01 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
WO2016000903A1 (en) 2014-07-01 2016-01-07 Asml Netherlands B.V. A lithographic apparatus and a method of manufacturing a lithographic apparatus

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AU5067898A (en) * 1996-11-28 1998-06-22 Nikon Corporation Aligner and method for exposure
WO1998040791A1 (en) * 1997-03-10 1998-09-17 Koninklijke Philips Electronics N.V. Positioning device having two object holders
US6897963B1 (en) * 1997-12-18 2005-05-24 Nikon Corporation Stage device and exposure apparatus
US6208407B1 (en) * 1997-12-22 2001-03-27 Asm Lithography B.V. Method and apparatus for repetitively projecting a mask pattern on a substrate, using a time-saving height measurement
KR100841147B1 (ko) * 1998-03-11 2008-06-24 가부시키가이샤 니콘 레이저 장치, 자외광 조사 장치 및 방법, 물체의 패턴 검출장치 및 방법
WO2001035168A1 (en) 1999-11-10 2001-05-17 Massachusetts Institute Of Technology Interference lithography utilizing phase-locked scanning beams
US6611316B2 (en) * 2001-02-27 2003-08-26 Asml Holding N.V. Method and system for dual reticle image exposure
TW529172B (en) * 2001-07-24 2003-04-21 Asml Netherlands Bv Imaging apparatus
WO2004019128A2 (en) 2002-08-23 2004-03-04 Nikon Corporation Projection optical system and method for photolithography and exposure apparatus and method using same
KR101745223B1 (ko) * 2003-04-10 2017-06-08 가부시키가이샤 니콘 액침 리소그래피 장치용 운반 영역을 포함하는 환경 시스템
EP2270599A1 (en) 2003-05-13 2011-01-05 ASML Netherlands BV Lithographic apparatus
TWI295414B (en) * 2003-05-13 2008-04-01 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
EP1660925B1 (en) * 2003-09-03 2015-04-29 Nikon Corporation Apparatus and method for providing fluid for immersion lithography
JP4378136B2 (ja) * 2003-09-04 2009-12-02 キヤノン株式会社 露光装置及びデバイス製造方法
KR20180042456A (ko) * 2004-03-25 2018-04-25 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
KR101264936B1 (ko) * 2004-06-04 2013-05-15 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
JP4543767B2 (ja) * 2004-06-10 2010-09-15 株式会社ニコン 露光装置及びデバイス製造方法
US7701550B2 (en) * 2004-08-19 2010-04-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR101264939B1 (ko) 2004-09-17 2013-05-15 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
US7161654B2 (en) * 2004-12-02 2007-01-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP5005226B2 (ja) * 2005-01-31 2012-08-22 株式会社ニコン 露光装置及びデバイス製造方法、液体保持方法
US7411654B2 (en) * 2005-04-05 2008-08-12 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4802604B2 (ja) * 2005-08-17 2011-10-26 株式会社ニコン 露光装置、露光方法、及びデバイス製造方法
US7751026B2 (en) * 2005-08-25 2010-07-06 Nikon Corporation Apparatus and method for recovering fluid for immersion lithography
US7804577B2 (en) * 2005-11-16 2010-09-28 Asml Netherlands B.V. Lithographic apparatus
US7864292B2 (en) * 2005-11-16 2011-01-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
WO2007129753A1 (ja) * 2006-05-10 2007-11-15 Nikon Corporation 露光装置及びデバイス製造方法
JP2007335662A (ja) * 2006-06-15 2007-12-27 Canon Inc 露光装置
JP2008034801A (ja) * 2006-06-30 2008-02-14 Canon Inc 露光装置およびデバイス製造方法
US8134685B2 (en) * 2007-03-23 2012-03-13 Nikon Corporation Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
US20090122282A1 (en) * 2007-05-21 2009-05-14 Nikon Corporation Exposure apparatus, liquid immersion system, exposing method, and device fabricating method
US8233139B2 (en) * 2008-03-27 2012-07-31 Nikon Corporation Immersion system, exposure apparatus, exposing method, and device fabricating method

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