JP2009520110A5 - - Google Patents

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Publication number
JP2009520110A5
JP2009520110A5 JP2008545723A JP2008545723A JP2009520110A5 JP 2009520110 A5 JP2009520110 A5 JP 2009520110A5 JP 2008545723 A JP2008545723 A JP 2008545723A JP 2008545723 A JP2008545723 A JP 2008545723A JP 2009520110 A5 JP2009520110 A5 JP 2009520110A5
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JP
Japan
Prior art keywords
substrate
jig
pattern
selected jig
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2008545723A
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English (en)
Japanese (ja)
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JP2009520110A (ja
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Publication date
Priority claimed from US11/275,170 external-priority patent/US20070137568A1/en
Application filed filed Critical
Publication of JP2009520110A publication Critical patent/JP2009520110A/ja
Publication of JP2009520110A5 publication Critical patent/JP2009520110A5/ja
Withdrawn legal-status Critical Current

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JP2008545723A 2005-12-16 2006-12-12 往復運動する開口マスクシステム及び方法 Withdrawn JP2009520110A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/275,170 US20070137568A1 (en) 2005-12-16 2005-12-16 Reciprocating aperture mask system and method
PCT/US2006/047292 WO2007078694A1 (en) 2005-12-16 2006-12-12 Reciprocating aperture mask system and method

Publications (2)

Publication Number Publication Date
JP2009520110A JP2009520110A (ja) 2009-05-21
JP2009520110A5 true JP2009520110A5 (enExample) 2010-01-21

Family

ID=38171959

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008545723A Withdrawn JP2009520110A (ja) 2005-12-16 2006-12-12 往復運動する開口マスクシステム及び方法

Country Status (5)

Country Link
US (1) US20070137568A1 (enExample)
EP (1) EP1961037A4 (enExample)
JP (1) JP2009520110A (enExample)
CN (1) CN101331587B (enExample)
WO (1) WO2007078694A1 (enExample)

Families Citing this family (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20080111967A (ko) * 2007-06-20 2008-12-24 삼성전기주식회사 섀도우 마스크
WO2009085004A1 (en) * 2007-12-28 2009-07-09 Rolling Optics Ab Method of producing a microstructured product
KR100992229B1 (ko) * 2008-08-29 2010-11-05 삼성전기주식회사 롤투롤타입의 박막형성장치
KR100992304B1 (ko) * 2008-08-29 2010-11-05 삼성전기주식회사 롤투롤타입의 박막패턴 형성장치
WO2010029492A1 (en) * 2008-09-15 2010-03-18 Nxp B.V. Method of manufacturing a plurality of ics and transponders
US8252189B2 (en) * 2009-05-19 2012-08-28 Korea University Research And Business Foundation Nano structure fabrication
JP2010280943A (ja) * 2009-06-04 2010-12-16 Sony Corp 蒸着装置及び蒸着方法
JP5677785B2 (ja) 2009-08-27 2015-02-25 三星ディスプレイ株式會社Ｓａｍｓｕｎｇ Ｄｉｓｐｌａｙ Ｃｏ．，Ｌｔｄ． 薄膜蒸着装置及びこれを利用した有機発光表示装置の製造方法
EP2479311B1 (en) * 2009-09-15 2017-04-05 Sharp Kabushiki Kaisha Vapor deposition method
KR101084184B1 (ko) 2010-01-11 2011-11-17 삼성모바일디스플레이주식회사 박막 증착 장치
DE102010000447A1 (de) * 2010-02-17 2011-08-18 Aixtron Ag, 52134 Beschichtungsvorrichtung sowie Verfahren zum Betrieb einer Beschichtungsvorrichtung mit einer Schirmplatte
JP2011184738A (ja) * 2010-03-09 2011-09-22 Fujifilm Corp ガスバリアフィルムの製造方法
KR101223723B1 (ko) 2010-07-07 2013-01-18 삼성디스플레이 주식회사 박막 증착 장치, 이를 이용한 유기 발광 디스플레이 장치의 제조방법 및 이에 따라 제조된 유기 발광 디스플레이 장치
KR101182448B1 (ko) * 2010-07-12 2012-09-12 삼성디스플레이 주식회사 박막 증착 장치 및 이를 이용한 유기 발광 표시장치의 제조 방법
KR101723506B1 (ko) 2010-10-22 2017-04-19 삼성디스플레이 주식회사 유기층 증착 장치 및 이를 이용한 유기 발광 디스플레이 장치의 제조 방법
KR101760897B1 (ko) 2011-01-12 2017-07-25 삼성디스플레이 주식회사 증착원 및 이를 구비하는 유기막 증착 장치
KR101852517B1 (ko) 2011-05-25 2018-04-27 삼성디스플레이 주식회사 유기층 증착 장치 및 이를 이용한 유기 발광 디스플레이 장치의 제조 방법
KR20130004830A (ko) 2011-07-04 2013-01-14 삼성디스플레이 주식회사 유기층 증착 장치 및 이를 이용한 유기 발광 표시 장치의 제조 방법
JP5804457B2 (ja) * 2011-10-06 2015-11-04 株式会社ブイ・テクノロジー マスク
JP5856839B2 (ja) * 2011-12-27 2016-02-10 日東電工株式会社 有機ｅｌ素子の製造方法及び製造装置
KR102081284B1 (ko) 2013-04-18 2020-02-26 삼성디스플레이 주식회사 증착장치, 이를 이용한 유기발광 디스플레이 장치 제조 방법 및 유기발광 디스플레이 장치
KR20140130972A (ko) * 2013-05-02 2014-11-12 삼성디스플레이 주식회사 유기층 증착 장치 및 이를 이용한 유기 발광 디스플레이 장치의 제조 방법
JP6347105B2 (ja) * 2013-06-28 2018-06-27 大日本印刷株式会社 蒸着マスクの製造方法、金属フレーム付き蒸着マスクの製造方法、及び有機半導体素子の製造方法
KR102124426B1 (ko) * 2013-07-08 2020-06-19 삼성디스플레이 주식회사 진공 증착 장치 및 이를 이용한 진공 증착 방법
JP6163376B2 (ja) * 2013-07-30 2017-07-12 株式会社ブイ・テクノロジー 成膜マスクの製造方法及び成膜マスク
US9804310B2 (en) * 2015-02-17 2017-10-31 Materion Corporation Method of fabricating anisotropic optical interference filter
TWI567512B (zh) * 2015-11-06 2017-01-21 興城科技股份有限公司 治具調整方法
KR102696806B1 (ko) * 2016-09-22 2024-08-21 삼성디스플레이 주식회사 증착용 마스크, 표시 장치의 제조 장치 및 표시 장치의 제조 방법
US10895011B2 (en) * 2017-03-14 2021-01-19 Eastman Kodak Company Modular thin film deposition system
US11248292B2 (en) * 2017-03-14 2022-02-15 Eastman Kodak Company Deposition system with moveable-position web guides
KR102217879B1 (ko) * 2018-03-14 2021-02-18 어플라이드 머티어리얼스, 인코포레이티드 기판을 프로세싱하기 위한 방법, 진공 프로세싱을 위한 장치, 및 진공 프로세싱 시스템
KR102707691B1 (ko) * 2018-12-28 2024-09-13 엘지디스플레이 주식회사 표시장치용 마스크
TWI839613B (zh) * 2020-06-04 2024-04-21 美商應用材料股份有限公司 用於蒸發源的溫度控制屏蔽、用於在基板上沉積材料的材料沉積設備及方法

Family Cites Families (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2948261A (en) * 1956-12-07 1960-08-09 Western Electric Co Apparatus for producing printed wiring by metal vaporization
US3669060A (en) * 1970-09-24 1972-06-13 Westinghouse Electric Corp Mask changing mechanism for use in the evaporation of thin film devices
US3735728A (en) * 1971-12-01 1973-05-29 Andvari Inc Apparatus for continuous vacuum deposition
US3866565A (en) * 1973-12-21 1975-02-18 David E U Ridout Vapor deposition apparatus with rotating drum mask
US4096821A (en) * 1976-12-13 1978-06-27 Westinghouse Electric Corp. System for fabricating thin-film electronic components
US4344988A (en) * 1978-08-01 1982-08-17 Nippon Sheet Glass Co., Ltd. Method for forming patterned coating
US4945252A (en) * 1980-07-07 1990-07-31 Automated Packaging Systems, Inc. Continuous web registration
US4335161A (en) * 1980-11-03 1982-06-15 Xerox Corporation Thin film transistors, thin film transistor arrays, and a process for preparing the same
US4777909A (en) * 1981-02-09 1988-10-18 Applied Magnetics Corporation Carriage apparatus for indexing and accurately registering a selected stabilized mask of a plurality of stabilizing masks between a substrate and a source
US4492180A (en) * 1981-03-16 1985-01-08 Applied Magnetics Corporation Apparatus for indexing and registering a selected deposition mask to a substrate and method therefor
JPS57179952A (en) * 1981-04-24 1982-11-05 Fuji Photo Film Co Ltd Method and apparatus for magnetic recording medium
US4549843A (en) * 1983-03-15 1985-10-29 Micronix Partners Mask loading apparatus, method and cassette
US4681780A (en) * 1983-12-01 1987-07-21 Polaroid Corporation Continuously cleaned rotary coating mask
US4746548A (en) * 1985-10-23 1988-05-24 Gte Products Corporation Method for registration of shadow masked thin-film patterns
US4915057A (en) * 1985-10-23 1990-04-10 Gte Products Corporation Apparatus and method for registration of shadow masked thin-film patterns
ES2032566T3 (es) * 1987-10-07 1993-02-16 Thorn Emi Plc Aparato y metodo para revestir bandas.
US5026239A (en) * 1988-09-06 1991-06-25 Canon Kabushiki Kaisha Mask cassette and mask cassette loading device
FR2662015B1 (fr) * 1990-05-11 1995-02-17 Europ Composants Electron Dispositif de positionnement de bandes-cache dans une machine de metallisation.
DE19906676A1 (de) * 1999-02-18 2000-08-24 Leybold Systems Gmbh Bedampfungsvorrichtung
AU3879500A (en) * 1999-03-10 2000-09-28 American Bank Note Holographics, Inc. Techniques of printing micro-structure patterns such as holograms directly onto final documents or other substrates in discrete areas thereof
US6475287B1 (en) * 2001-06-27 2002-11-05 Eastman Kodak Company Alignment device which facilitates deposition of organic material through a deposition mask
CA2356066A1 (en) * 2001-08-28 2003-02-28 John M. Goston Arrangements for the de-icing and anti-icing of aircraft
JP4336869B2 (ja) * 2001-11-27 2009-09-30 日本電気株式会社 真空成膜装置、真空成膜方法および電池用電極の製造方法
US6756348B2 (en) * 2001-11-29 2004-06-29 Chevron Oronite Company Llc Lubricating oil having enhanced resistance to oxidation, nitration and viscosity increase
US20030151118A1 (en) * 2002-02-14 2003-08-14 3M Innovative Properties Company Aperture masks for circuit fabrication
US6897164B2 (en) * 2002-02-14 2005-05-24 3M Innovative Properties Company Aperture masks for circuit fabrication
US6821348B2 (en) * 2002-02-14 2004-11-23 3M Innovative Properties Company In-line deposition processes for circuit fabrication
US6709962B2 (en) * 2002-03-19 2004-03-23 N. Edward Berg Process for manufacturing printed circuit boards
US6746946B2 (en) * 2002-03-19 2004-06-08 N. Edward Berg Process and apparatus for manufacturing printed circuit boards
US6943066B2 (en) * 2002-06-05 2005-09-13 Advantech Global, Ltd Active matrix backplane for controlling controlled elements and method of manufacture thereof
US7132016B2 (en) * 2002-09-26 2006-11-07 Advantech Global, Ltd System for and method of manufacturing a large-area backplane by use of a small-area shadow mask
US6926840B2 (en) * 2002-12-31 2005-08-09 Eastman Kodak Company Flexible frame for mounting a deposition mask
KR100909422B1 (ko) * 2002-12-31 2009-07-24 엘지디스플레이 주식회사 액정표시소자의 패턴 및 그 형성방법
KR100534580B1 (ko) * 2003-03-27 2005-12-07 삼성에스디아이 주식회사 표시장치용 증착 마스크 및 그의 제조방법
US7121496B2 (en) * 2003-10-23 2006-10-17 Hewlett-Packard Development Company, L.P. Method and system for correcting web deformation during a roll-to-roll process
US7153180B2 (en) * 2003-11-13 2006-12-26 Eastman Kodak Company Continuous manufacture of flat panel light emitting devices

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