ES2032566T3 - Aparato y metodo para revestir bandas. - Google Patents

Aparato y metodo para revestir bandas.

Info

Publication number
ES2032566T3
ES2032566T3 ES198888309038T ES88309038T ES2032566T3 ES 2032566 T3 ES2032566 T3 ES 2032566T3 ES 198888309038 T ES198888309038 T ES 198888309038T ES 88309038 T ES88309038 T ES 88309038T ES 2032566 T3 ES2032566 T3 ES 2032566T3
Authority
ES
Spain
Prior art keywords
coating
tape
station
support
coating bands
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES198888309038T
Other languages
English (en)
Inventor
Ashok Wasudeo Vaidya
James Lance Sander Wales
Robert Alex Woolley
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Thorn EMI PLC
Original Assignee
Thorn EMI PLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GB878723545A external-priority patent/GB8723545D0/en
Priority claimed from GB878723774A external-priority patent/GB8723774D0/en
Application filed by Thorn EMI PLC filed Critical Thorn EMI PLC
Application granted granted Critical
Publication of ES2032566T3 publication Critical patent/ES2032566T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • Cookers (AREA)
  • Manufacturing Of Electric Cables (AREA)

Abstract

EL APARATO COMPRENDE MEDIOS (1 - 3) PARA HACER CIRCULAR LA CINTA SOBRE LA QUE SE VA A DEPOSITAR EL RECUBRIMIENTO, HASTA LA ESTACION DE DEPOSICION DEL RECUBRIMIENTO (5); MEDIOS (3) PARA SOPORTAR CINTA EN LA ESTACION DE DEPOSICION; MEDIOS (5) PARA APLICAR EL RECUBRIMIENTO EN LA ESTACION DE DEPOSICION DEL RECUBRIMIENTO; Y MEDIOS (16) PARA IMPULSAR GAS EN LA REGION ENTRE LA CINTA Y LOS MEDIOS SOPORTE. TAL APARATO ES CAPAZ DE AUMENTAR EN UNA CANTIDAD ACEPTABLE LA VELOCIDAD DE FABRICACION DE CINTA RECUBIERTA.
ES198888309038T 1987-10-07 1988-09-29 Aparato y metodo para revestir bandas. Expired - Lifetime ES2032566T3 (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB878723545A GB8723545D0 (en) 1987-10-07 1987-10-07 Deposition of thin films
GB878723774A GB8723774D0 (en) 1987-10-09 1987-10-09 Deposition of thin films

Publications (1)

Publication Number Publication Date
ES2032566T3 true ES2032566T3 (es) 1993-02-16

Family

ID=26292846

Family Applications (1)

Application Number Title Priority Date Filing Date
ES198888309038T Expired - Lifetime ES2032566T3 (es) 1987-10-07 1988-09-29 Aparato y metodo para revestir bandas.

Country Status (5)

Country Link
US (1) US5076203A (es)
EP (1) EP0311302B1 (es)
JP (1) JPH01152262A (es)
DE (1) DE3872339T2 (es)
ES (1) ES2032566T3 (es)

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DE4128382C1 (es) * 1991-08-27 1992-07-02 Leybold Ag, 6450 Hanau, De
DE4203632C2 (de) * 1992-02-08 2003-01-23 Applied Films Gmbh & Co Kg Vakuumbeschichtungsanlage
DE4207525C2 (de) * 1992-03-10 1999-12-16 Leybold Ag Hochvakuum-Beschichtungsanlage
DE4222013A1 (de) * 1992-07-04 1994-01-05 Leybold Ag Vorrichtung zur Vakuumbeschichtung von Folien
MY139695A (en) * 1996-05-21 2009-10-30 Panasonic Corp Thin film, method and apparatus for forming the same, and electronic component incorporating the same
GB2326647B (en) * 1997-06-25 2001-12-19 Gen Vacuum Equipment Ltd Apparatus for and method of vacuum metallizing
DE19853418B4 (de) * 1998-11-19 2013-09-26 Applied Materials Gmbh & Co. Kg Vakuum-Beschichtungsanlage und Verfahren zum Beschichten einer Folie mit einer solchen Vakuum-Beschichtungsanlage
WO2000056949A1 (fr) * 1999-03-23 2000-09-28 Evgeny Stepanovich Senokosov Procede de traitement par arc et sous vide de fil (cable, bande) metallique, dispositif de mise en oeuvre de ce procede et variantes
US6833031B2 (en) 2000-03-21 2004-12-21 Wavezero, Inc. Method and device for coating a substrate
US6461667B1 (en) * 2000-04-04 2002-10-08 Eastman Kodak Company Apparatus and method for vapor depositing lubricant coating on a web
US6436739B1 (en) 2000-04-27 2002-08-20 The Regents Of The University Of California Thick adherent dielectric films on plastic substrates and method for depositing same
WO2002070778A1 (en) * 2001-03-05 2002-09-12 Applied Process Technologies Apparatus and method for web cooling in a vacuum coating chamber
US7025833B2 (en) * 2002-02-27 2006-04-11 Applied Process Technologies, Inc. Apparatus and method for web cooling in a vacuum coating chamber
US20040261707A1 (en) * 2003-06-26 2004-12-30 Venkat Selvamanickam Apparatus for and method of cooling and positioning a translating substrate tape for use with a continuous vapor deposition process
US7758699B2 (en) * 2003-06-26 2010-07-20 Superpower, Inc. Apparatus for and method of continuous HTS tape buffer layer deposition using large scale ion beam assisted deposition
DE102004050821A1 (de) * 2004-10-19 2006-04-20 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Vorrichtung und Verfahren zum Kühlen bandförmiger Substrate
US20070137568A1 (en) * 2005-12-16 2007-06-21 Schreiber Brian E Reciprocating aperture mask system and method
US7763114B2 (en) * 2005-12-28 2010-07-27 3M Innovative Properties Company Rotatable aperture mask assembly and deposition system
WO2009060597A1 (ja) * 2007-11-06 2009-05-14 Panasonic Corporation 薄膜形成装置及び薄膜の形成方法
KR101226390B1 (ko) * 2007-12-05 2013-01-24 파나소닉 주식회사 박막 형성 장치 및 박막 형성 방법
JP4369531B2 (ja) * 2008-02-20 2009-11-25 パナソニック株式会社 薄膜形成装置および薄膜形成方法
US20100028533A1 (en) * 2008-03-04 2010-02-04 Brent Bollman Methods and Devices for Processing a Precursor Layer in a Group VIA Environment
US20090325340A1 (en) * 2008-06-30 2009-12-31 Mohd Aslami Plasma vapor deposition system and method for making multi-junction silicon thin film solar cell modules and panels
US9045819B2 (en) 2008-12-10 2015-06-02 Panasonic Intellectual Property Management Co., Ltd. Method for forming thin film while providing cooling gas to rear surface of substrate
US20110081487A1 (en) * 2009-03-04 2011-04-07 Brent Bollman Methods and devices for processing a precursor layer in a group via environment
JP2010235968A (ja) * 2009-03-30 2010-10-21 Sumitomo Metal Mining Co Ltd 真空処理装置
EP2423351A4 (en) * 2009-04-22 2013-02-27 Panasonic Corp APPARATUS FOR FORMING THIN FILM AND METHOD FOR FORMING THIN FILM
US20100291308A1 (en) * 2009-05-14 2010-11-18 Veeco Instruments Inc. Web Substrate Deposition System
US9340865B2 (en) 2010-01-26 2016-05-17 Panasonic Intellectual Property Management Co., Ltd. Thin film-manufacturing apparatus,thin film-manufacturing method,and substrate-conveying roller
US8225527B2 (en) 2010-07-08 2012-07-24 Aventa Technologies Llc Cooling apparatus for a web deposition system
WO2012172722A1 (ja) * 2011-06-15 2012-12-20 パナソニック株式会社 基板搬送ローラ、薄膜製造装置及び薄膜製造方法
WO2013076922A1 (ja) * 2011-11-22 2013-05-30 パナソニック株式会社 基板搬送ローラ、薄膜の製造装置及び薄膜の製造方法
DE102012207172A1 (de) * 2012-04-30 2013-10-31 Osram Gmbh Vorrichtung und verfahren zur oberflächenbehandlung eines substrats und verfahren zum herstellen eines optoelektronischen bauelements
DE102012013726B4 (de) 2012-07-11 2021-03-18 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Vorrichtung zum Kühlen bandförmiger Substrate
JP2015007283A (ja) 2013-05-30 2015-01-15 パナソニックＩｐマネジメント株式会社 薄膜製造装置及び薄膜製造方法、並びに、電気化学デバイス及び電気化学デバイスの製造方法
DE102013212395A1 (de) 2013-06-27 2014-12-31 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zum Kühlen eines bandförmigen Substrates
DE102013223151A1 (de) * 2013-11-13 2015-05-13 Sandvik Materials Technology Deutschland Gmbh Vorrichtung und Verfahren zum Behandeln von flächigem Material
JP6652066B2 (ja) * 2014-12-29 2020-02-19 ソニー株式会社 磁気記録媒体およびその製造方法、ならびに成膜装置
DE102018111105A1 (de) 2018-05-09 2019-11-14 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Vorrichtung zum Beschichten eines bandförmigen Substrates
DE102018113039A1 (de) * 2018-05-31 2019-12-05 VON ARDENNE Asset GmbH & Co. KG Verfahren und Vakuumanordnung
DE102019102008A1 (de) 2019-01-28 2020-07-30 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Vorrichtung zum Beschichten eines bandförmigen Substrates
DE102019107719A1 (de) * 2019-03-26 2020-10-01 VON ARDENNE Asset GmbH & Co. KG Temperierrolle, Transportanordnung und Vakuumanordnung
KR20230170951A (ko) * 2021-04-21 2023-12-19 어플라이드 머티어리얼스, 인코포레이티드 재료 증착 장치, 기판 상에 재료를 증착하는 방법, 및 재료 증착 시스템
DE102021207398A1 (de) * 2021-07-13 2023-01-19 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung eingetragener Verein Vorrichtung und Verfahren zur Beschichtung eines Substrates
CN113832435A (zh) * 2021-11-29 2021-12-24 江苏卓高新材料科技有限公司 锂离子电池集流体的制造设备

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US3245334A (en) * 1962-08-27 1966-04-12 Du Pont Noncontacting sealing method and apparatus
US3414048A (en) * 1967-12-26 1968-12-03 United States Steel Corp Contact drum and method for heat exchange with traveling strip
US4354686A (en) * 1979-07-06 1982-10-19 Matsushita Electric Industrial Co., Ltd. Contact-free sealing member
JPS5798133A (en) * 1980-12-05 1982-06-18 Matsushita Electric Ind Co Ltd Magnetic recording medium
JPS57179952A (en) * 1981-04-24 1982-11-05 Fuji Photo Film Co Ltd Method and apparatus for magnetic recording medium
JPS58111127A (ja) * 1981-12-24 1983-07-02 Ulvac Corp 耐摩耗性磁気記録体の製造法

Also Published As

Publication number Publication date
DE3872339T2 (de) 1993-01-14
JPH01152262A (ja) 1989-06-14
US5076203A (en) 1991-12-31
EP0311302A1 (en) 1989-04-12
EP0311302B1 (en) 1992-06-24
DE3872339D1 (de) 1992-07-30

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